DE2252484A1 - Verfahren zum ueberwachen und steuern der zusammensetzung eines niederschlagsfilms - Google Patents
Verfahren zum ueberwachen und steuern der zusammensetzung eines niederschlagsfilmsInfo
- Publication number
- DE2252484A1 DE2252484A1 DE2252484A DE2252484A DE2252484A1 DE 2252484 A1 DE2252484 A1 DE 2252484A1 DE 2252484 A DE2252484 A DE 2252484A DE 2252484 A DE2252484 A DE 2252484A DE 2252484 A1 DE2252484 A1 DE 2252484A1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- film
- composition
- evaporated
- electrical potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 27
- 239000000203 mixture Substances 0.000 title claims description 15
- 238000001556 precipitation Methods 0.000 title description 7
- 238000012544 monitoring process Methods 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims description 46
- 239000000463 material Substances 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 7
- -1 oxygen ions Chemical class 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 3
- 238000005566 electron beam evaporation Methods 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000000839 emulsion Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 19
- 238000001704 evaporation Methods 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 238000005421 electrostatic potential Methods 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000012212 insulator Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- YJLIKUSWRSEPSM-WGQQHEPDSA-N (2r,3r,4s,5r)-2-[6-amino-8-[(4-phenylphenyl)methylamino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1CNC1=NC=2C(N)=NC=NC=2N1[C@@H]1O[C@H](CO)[C@@H](O)[C@H]1O YJLIKUSWRSEPSM-WGQQHEPDSA-N 0.000 description 1
- 229910000809 Alumel Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US19578471A | 1971-11-04 | 1971-11-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2252484A1 true DE2252484A1 (de) | 1973-05-10 |
Family
ID=22722795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2252484A Pending DE2252484A1 (de) | 1971-11-04 | 1972-10-26 | Verfahren zum ueberwachen und steuern der zusammensetzung eines niederschlagsfilms |
Country Status (12)
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3889019A (en) * | 1969-03-13 | 1975-06-10 | United Aircraft Corp | Vapor randomization in vacuum deposition of coatings |
| JPS5137667B2 (enrdf_load_stackoverflow) * | 1971-11-13 | 1976-10-16 | ||
| US4021277A (en) * | 1972-12-07 | 1977-05-03 | Sprague Electric Company | Method of forming thin film resistor |
| JPS5181791A (ja) * | 1975-01-13 | 1976-07-17 | Osaka Koon Denki Kk | Ionkapureeteinguhoho |
| US4416912A (en) * | 1979-10-13 | 1983-11-22 | The Gillette Company | Formation of coatings on cutting edges |
| US4617192A (en) * | 1982-12-21 | 1986-10-14 | At&T Bell Laboratories | Process for making optical INP devices |
| US4472453A (en) * | 1983-07-01 | 1984-09-18 | Rca Corporation | Process for radiation free electron beam deposition |
| JPS60251273A (ja) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置の蒸発量制御方法 |
| US4842710A (en) * | 1987-03-23 | 1989-06-27 | Siemens Aktiengesellschaft | Method of making mixed nitride films with at least two metals |
| US5514229A (en) * | 1993-11-24 | 1996-05-07 | Ramot-University Authority For Applied Research And Industrial Development Ltd., Tel Aviv University | Method of producing transparent and other electrically conductive materials |
| US7250196B1 (en) | 1999-10-26 | 2007-07-31 | Basic Resources, Inc. | System and method for plasma plating |
| US6503379B1 (en) * | 2000-05-22 | 2003-01-07 | Basic Research, Inc. | Mobile plating system and method |
| US6521104B1 (en) * | 2000-05-22 | 2003-02-18 | Basic Resources, Inc. | Configurable vacuum system and method |
| US20030180450A1 (en) * | 2002-03-22 | 2003-09-25 | Kidd Jerry D. | System and method for preventing breaker failure |
| US20050126497A1 (en) * | 2003-09-30 | 2005-06-16 | Kidd Jerry D. | Platform assembly and method |
| US20080057195A1 (en) * | 2006-08-31 | 2008-03-06 | United Technologies Corporation | Non-line of sight coating technique |
-
0
- BE BE790940D patent/BE790940A/xx unknown
-
1971
- 1971-11-04 US US00195784A patent/US3756847A/en not_active Expired - Lifetime
-
1972
- 1972-10-04 CA CA153,262A patent/CA975628A/en not_active Expired
- 1972-10-11 SE SE7213094A patent/SE379059B/xx unknown
- 1972-10-12 CH CH1489772A patent/CH590935A5/xx not_active IP Right Cessation
- 1972-10-16 AU AU47782/72A patent/AU464727B2/en not_active Expired
- 1972-10-24 IT IT70339/72A patent/IT975345B/it active
- 1972-10-26 DE DE2252484A patent/DE2252484A1/de active Pending
- 1972-10-30 FR FR7238354A patent/FR2156413B1/fr not_active Expired
- 1972-11-02 JP JP47110167A patent/JPS5216467B2/ja not_active Expired
- 1972-11-03 GB GB5076472A patent/GB1392865A/en not_active Expired
- 1972-11-03 NL NL7214898A patent/NL7214898A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| FR2156413A1 (enrdf_load_stackoverflow) | 1973-05-25 |
| AU464727B2 (en) | 1975-09-04 |
| BE790940A (fr) | 1973-03-01 |
| JPS4855670A (enrdf_load_stackoverflow) | 1973-08-04 |
| JPS5216467B2 (enrdf_load_stackoverflow) | 1977-05-10 |
| US3756847A (en) | 1973-09-04 |
| CH590935A5 (enrdf_load_stackoverflow) | 1977-08-31 |
| SE379059B (enrdf_load_stackoverflow) | 1975-09-22 |
| IT975345B (it) | 1974-07-20 |
| FR2156413B1 (enrdf_load_stackoverflow) | 1976-05-21 |
| GB1392865A (en) | 1975-05-07 |
| CA975628A (en) | 1975-10-07 |
| NL7214898A (enrdf_load_stackoverflow) | 1973-05-08 |
| AU4778272A (en) | 1974-04-26 |
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