DE2218766C2 - Verfahren und Vorrichtung zum Herstellen dünnwandiger Gefäße aus feinzerkleinerten Teilchen glasiger Kieselsäure hohen Reinheitsgrades - Google Patents
Verfahren und Vorrichtung zum Herstellen dünnwandiger Gefäße aus feinzerkleinerten Teilchen glasiger Kieselsäure hohen ReinheitsgradesInfo
- Publication number
- DE2218766C2 DE2218766C2 DE19722218766 DE2218766A DE2218766C2 DE 2218766 C2 DE2218766 C2 DE 2218766C2 DE 19722218766 DE19722218766 DE 19722218766 DE 2218766 A DE2218766 A DE 2218766A DE 2218766 C2 DE2218766 C2 DE 2218766C2
- Authority
- DE
- Germany
- Prior art keywords
- vessel
- furnace
- carrier
- cooling device
- cup
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 51
- 238000000034 method Methods 0.000 title claims description 18
- 239000002245 particle Substances 0.000 title claims description 11
- 239000000377 silicon dioxide Substances 0.000 title claims description 3
- 238000001816 cooling Methods 0.000 claims description 50
- 230000006698 induction Effects 0.000 claims description 30
- 238000005245 sintering Methods 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
- 229910002804 graphite Inorganic materials 0.000 claims description 15
- 239000010439 graphite Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 238000013461 design Methods 0.000 claims description 11
- 239000001307 helium Substances 0.000 claims description 10
- 229910052734 helium Inorganic materials 0.000 claims description 10
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 10
- 238000011068 loading method Methods 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 230000004323 axial length Effects 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 230000009970 fire resistant effect Effects 0.000 claims description 2
- 238000012546 transfer Methods 0.000 claims description 2
- 239000011521 glass Substances 0.000 description 34
- 235000000396 iron Nutrition 0.000 description 16
- 229910052906 cristobalite Inorganic materials 0.000 description 13
- 239000013078 crystal Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000012545 processing Methods 0.000 description 7
- 239000011819 refractory material Substances 0.000 description 7
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 6
- 238000004031 devitrification Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000007569 slipcasting Methods 0.000 description 5
- 238000007511 glassblowing Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000005281 excited state Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003225 polyurethane elastomer Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 238000003908 quality control method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 238000012549 training Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- XTPJLNSARGBDNC-UHFFFAOYSA-N 3-[diethyl(prop-2-ynyl)azaniumyl]propane-1-sulfonate Chemical compound C#CC[N+](CC)(CC)CCCS([O-])(=O)=O XTPJLNSARGBDNC-UHFFFAOYSA-N 0.000 description 1
- 241000251730 Chondrichthyes Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 206010041662 Splinter Diseases 0.000 description 1
- 229910000746 Structural steel Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000003763 resistance to breakage Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000011034 rock crystal Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Crucibles And Fluidized-Bed Furnaces (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13514071A | 1971-04-19 | 1971-04-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2218766A1 DE2218766A1 (de) | 1972-12-07 |
| DE2218766C2 true DE2218766C2 (de) | 1982-06-03 |
Family
ID=22466731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19722218766 Expired DE2218766C2 (de) | 1971-04-19 | 1972-04-18 | Verfahren und Vorrichtung zum Herstellen dünnwandiger Gefäße aus feinzerkleinerten Teilchen glasiger Kieselsäure hohen Reinheitsgrades |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5333965B1 (cs) |
| CA (1) | CA965590A (cs) |
| DE (1) | DE2218766C2 (cs) |
| FR (1) | FR2133840A1 (cs) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5867985U (ja) * | 1981-11-02 | 1983-05-09 | 三井造船株式会社 | 海水温度差発電用取水管構造 |
| DD300159A7 (de) * | 1990-09-03 | 1992-05-27 | Universal Quarzgut Schmelze | Verfahren zur Herstellung von Erzeugnissen mit hohem SiO2-Gehalt |
| US5674792A (en) * | 1993-11-12 | 1997-10-07 | Heraeus Quarzglas Gmbh | Shaped body having a high silicon dioxide content and a process for producing such shaped bodies |
| DE4338807C1 (de) * | 1993-11-12 | 1995-01-26 | Heraeus Quarzglas | Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper |
| DE19943103A1 (de) | 1999-09-09 | 2001-03-15 | Wacker Chemie Gmbh | Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung |
| DE10158521B4 (de) * | 2001-11-29 | 2005-06-02 | Wacker-Chemie Gmbh | In Teilbereichen oder vollständig verglaster SiO2-Formkörper und Verfahren zu seiner Herstellung |
| DE10260320B4 (de) * | 2002-12-20 | 2006-03-30 | Wacker Chemie Ag | Verglaster SiO2-Formkörper, Verfahren zu seiner Herstellung und Vorrichtung |
| DE10319300B4 (de) * | 2003-04-29 | 2006-03-30 | Wacker Chemie Ag | Verfahren zur Herstellung eines Formkörpers aus Kieselglas |
| DE10339676A1 (de) * | 2003-08-28 | 2005-03-24 | Wacker-Chemie Gmbh | SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE621936C (de) * | 1931-01-10 | 1935-11-15 | Franz Skaupy Dr | Verfahren zum Herstellen von aus glasigem Quarz bestehenden Formkoerpern |
| NL52053C (cs) * | 1936-12-19 | |||
| DE688782C (de) * | 1936-12-20 | 1940-03-01 | Dr Franz Skaupy | Verfahren zum Herstellen von Gegenstaenden aus glasiger Kieselsaeure |
| DE682719C (de) * | 1936-12-20 | 1939-10-20 | Dr Franz Skaupy | Verfahren zum Herstellen von Gegenstaenden aus glasiger Kieselsaeure |
| DE722174C (de) * | 1937-03-26 | 1942-07-06 | Dr Franz Skaupy | Verfahren zur Herstellung von Koerpern, insbesondere Hohlkoerpern, aus gesintertem Quarz |
-
1972
- 1972-04-18 DE DE19722218766 patent/DE2218766C2/de not_active Expired
- 1972-04-18 FR FR7213541A patent/FR2133840A1/fr active Granted
- 1972-04-18 CA CA139,951A patent/CA965590A/en not_active Expired
- 1972-04-19 JP JP3877772A patent/JPS5333965B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CA965590A (en) | 1975-04-08 |
| FR2133840A1 (en) | 1972-12-01 |
| JPS5333965B1 (cs) | 1978-09-18 |
| FR2133840B1 (cs) | 1977-04-01 |
| DE2218766A1 (de) | 1972-12-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| AG | Has addition no. |
Ref country code: DE Ref document number: 2425262 Format of ref document f/p: P |
|
| D2 | Grant after examination | ||
| 8339 | Ceased/non-payment of the annual fee |