DE2151068A1 - Photolackzusammensetzung - Google Patents

Photolackzusammensetzung

Info

Publication number
DE2151068A1
DE2151068A1 DE19712151068 DE2151068A DE2151068A1 DE 2151068 A1 DE2151068 A1 DE 2151068A1 DE 19712151068 DE19712151068 DE 19712151068 DE 2151068 A DE2151068 A DE 2151068A DE 2151068 A1 DE2151068 A1 DE 2151068A1
Authority
DE
Germany
Prior art keywords
cyclized
cyclization
polymers
sensitizer
degree
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712151068
Other languages
German (de)
English (en)
Inventor
Agnihotri Ram K
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2151068A1 publication Critical patent/DE2151068A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19712151068 1970-10-15 1971-10-13 Photolackzusammensetzung Pending DE2151068A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8085370A 1970-10-15 1970-10-15

Publications (1)

Publication Number Publication Date
DE2151068A1 true DE2151068A1 (de) 1972-04-20

Family

ID=22160051

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712151068 Pending DE2151068A1 (de) 1970-10-15 1971-10-13 Photolackzusammensetzung

Country Status (5)

Country Link
US (1) US3669662A (https=)
JP (1) JPS5024620B1 (https=)
DE (1) DE2151068A1 (https=)
FR (1) FR2109748A5 (https=)
GB (1) GB1363002A (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3948667A (en) * 1971-06-21 1976-04-06 Japan Synthetic Rubber Company Limited Photosensitive compositions
US3887373A (en) * 1973-04-11 1975-06-03 Motorola Inc Non-polluting photoresist developing process
US4106943A (en) * 1973-09-27 1978-08-15 Japan Synthetic Rubber Co., Ltd. Photosensitive cross-linkable azide containing polymeric composition
JPS6057584B2 (ja) * 1979-04-24 1985-12-16 ジェイエスアール株式会社 ホトレジスト組成物
JPS57171331A (en) * 1981-04-10 1982-10-21 Hunt Chem Corp Philip A Composition of negative photo-resist forming cyclic rubber film
JPS57189134A (en) * 1981-05-16 1982-11-20 Toyo Soda Mfg Co Ltd Formation of pattern using negative type resist material
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.

Also Published As

Publication number Publication date
FR2109748A5 (https=) 1972-05-26
JPS5024620B1 (https=) 1975-08-16
US3669662A (en) 1972-06-13
GB1363002A (en) 1974-08-14

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