JPS5024620B1 - - Google Patents
Info
- Publication number
- JPS5024620B1 JPS5024620B1 JP46080267A JP8026771A JPS5024620B1 JP S5024620 B1 JPS5024620 B1 JP S5024620B1 JP 46080267 A JP46080267 A JP 46080267A JP 8026771 A JP8026771 A JP 8026771A JP S5024620 B1 JPS5024620 B1 JP S5024620B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US8085370A | 1970-10-15 | 1970-10-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5024620B1 true JPS5024620B1 (ja) | 1975-08-16 |
Family
ID=22160051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46080267A Pending JPS5024620B1 (ja) | 1970-10-15 | 1971-10-13 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3669662A (ja) |
| JP (1) | JPS5024620B1 (ja) |
| DE (1) | DE2151068A1 (ja) |
| FR (1) | FR2109748A5 (ja) |
| GB (1) | GB1363002A (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3948667A (en) * | 1971-06-21 | 1976-04-06 | Japan Synthetic Rubber Company Limited | Photosensitive compositions |
| US3887373A (en) * | 1973-04-11 | 1975-06-03 | Motorola Inc | Non-polluting photoresist developing process |
| US4106943A (en) * | 1973-09-27 | 1978-08-15 | Japan Synthetic Rubber Co., Ltd. | Photosensitive cross-linkable azide containing polymeric composition |
| JPS6057584B2 (ja) * | 1979-04-24 | 1985-12-16 | ジェイエスアール株式会社 | ホトレジスト組成物 |
| JPS57171331A (en) * | 1981-04-10 | 1982-10-21 | Hunt Chem Corp Philip A | Composition of negative photo-resist forming cyclic rubber film |
| JPS57189134A (en) * | 1981-05-16 | 1982-11-20 | Toyo Soda Mfg Co Ltd | Formation of pattern using negative type resist material |
| DE3582697D1 (de) * | 1984-06-07 | 1991-06-06 | Hoechst Ag | Positiv arbeitende strahlungsempfindliche beschichtungsloesung. |
-
1970
- 1970-10-15 US US80853A patent/US3669662A/en not_active Expired - Lifetime
-
1971
- 1971-09-02 FR FR7132349A patent/FR2109748A5/fr not_active Expired
- 1971-09-07 GB GB4175771A patent/GB1363002A/en not_active Expired
- 1971-10-13 JP JP46080267A patent/JPS5024620B1/ja active Pending
- 1971-10-13 DE DE19712151068 patent/DE2151068A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1363002A (en) | 1974-08-14 |
| US3669662A (en) | 1972-06-13 |
| FR2109748A5 (ja) | 1972-05-26 |
| DE2151068A1 (de) | 1972-04-20 |