DE2123623A1 - Strahlungsempfindliche Polymere und Verfahren zu ihrer Herstellung - Google Patents

Strahlungsempfindliche Polymere und Verfahren zu ihrer Herstellung

Info

Publication number
DE2123623A1
DE2123623A1 DE19712123623 DE2123623A DE2123623A1 DE 2123623 A1 DE2123623 A1 DE 2123623A1 DE 19712123623 DE19712123623 DE 19712123623 DE 2123623 A DE2123623 A DE 2123623A DE 2123623 A1 DE2123623 A1 DE 2123623A1
Authority
DE
Germany
Prior art keywords
formula
radical
radiation
polymers
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712123623
Other languages
German (de)
English (en)
Inventor
Adnan Abdul Rida; Stuber Fred Arnold; North Haven; Ulrich Henri Northford; Conn. Sayigh (V.St.A.). M
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pharmacia and Upjohn Co
Original Assignee
Upjohn Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Upjohn Co filed Critical Upjohn Co
Publication of DE2123623A1 publication Critical patent/DE2123623A1/de
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/34Introducing sulfur atoms or sulfur-containing groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides
    • G03F7/012Macromolecular azides; Macromolecular additives, e.g. binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE19712123623 1970-05-20 1971-05-12 Strahlungsempfindliche Polymere und Verfahren zu ihrer Herstellung Pending DE2123623A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US3917870A 1970-05-20 1970-05-20
US9344570A 1970-11-27 1970-11-27

Publications (1)

Publication Number Publication Date
DE2123623A1 true DE2123623A1 (de) 1971-12-02

Family

ID=26715885

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712123623 Pending DE2123623A1 (de) 1970-05-20 1971-05-12 Strahlungsempfindliche Polymere und Verfahren zu ihrer Herstellung

Country Status (6)

Country Link
BE (1) BE767412A (enExample)
CA (1) CA972097A (enExample)
CH (3) CH579290A (enExample)
DE (1) DE2123623A1 (enExample)
FR (1) FR2091827A5 (enExample)
GB (1) GB1331852A (enExample)

Also Published As

Publication number Publication date
CH732171A4 (enExample) 1976-02-27
CA972097A (en) 1975-07-29
FR2091827A5 (enExample) 1972-01-14
CH579290A (enExample) 1976-08-31
CH583753A5 (enExample) 1977-01-14
GB1331852A (en) 1973-09-26
BE767412A (fr) 1971-11-19

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