DE2107286A1 - Photoresistverfahren - Google Patents

Photoresistverfahren

Info

Publication number
DE2107286A1
DE2107286A1 DE19712107286 DE2107286A DE2107286A1 DE 2107286 A1 DE2107286 A1 DE 2107286A1 DE 19712107286 DE19712107286 DE 19712107286 DE 2107286 A DE2107286 A DE 2107286A DE 2107286 A1 DE2107286 A1 DE 2107286A1
Authority
DE
Germany
Prior art keywords
mixture
polyene
carbon
moles
polythiol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19712107286
Other languages
German (de)
English (en)
Other versions
DE2107286B2 (enrdf_load_stackoverflow
DE2107286C3 (enrdf_load_stackoverflow
Inventor
Kehr Clifton Leroy Silver Spring Frank Victor Samuel, Md (V St A )
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace and Co
Original Assignee
WR Grace and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co filed Critical WR Grace and Co
Publication of DE2107286A1 publication Critical patent/DE2107286A1/de
Publication of DE2107286B2 publication Critical patent/DE2107286B2/de
Application granted granted Critical
Publication of DE2107286C3 publication Critical patent/DE2107286C3/de
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE19712107286 1970-02-26 1971-02-16 Photoresistverfahren Granted DE2107286A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1444970A 1970-02-26 1970-02-26

Publications (3)

Publication Number Publication Date
DE2107286A1 true DE2107286A1 (de) 1971-09-02
DE2107286B2 DE2107286B2 (enrdf_load_stackoverflow) 1978-09-07
DE2107286C3 DE2107286C3 (enrdf_load_stackoverflow) 1979-05-03

Family

ID=21765543

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712107286 Granted DE2107286A1 (de) 1970-02-26 1971-02-16 Photoresistverfahren

Country Status (6)

Country Link
JP (1) JPS497002B1 (enrdf_load_stackoverflow)
BR (1) BR7101076D0 (enrdf_load_stackoverflow)
CA (1) CA926183A (enrdf_load_stackoverflow)
DE (1) DE2107286A1 (enrdf_load_stackoverflow)
FR (1) FR2083085A5 (enrdf_load_stackoverflow)
GB (1) GB1293722A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2415325A1 (fr) * 1978-01-23 1979-08-17 Grace W R Ltd Structure stratifiee permettant d'obtenir une image en relief sous l'action de radiations, et plaque d'impression obtenue a partir de cette structure

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4435497A (en) 1981-06-19 1984-03-06 Ciba-Geigy Corporation Carboxyl-containing compositions and their polymerization
GB8333853D0 (en) * 1983-12-20 1984-02-01 Ciba Geigy Ag Production of images
GB8402937D0 (en) * 1984-02-03 1984-03-07 Ciba Geigy Ag Production of images
EP1674287A1 (de) * 2004-12-22 2006-06-28 Atlantic ZeiserGmbH Verfahren und Einrichtung zum Erzeugen von dreidimensionalen Informationen auf einer Oberfläche
CN114393939B (zh) * 2021-12-30 2023-06-27 浙江美浓世纪集团有限公司 一种无膜烫金方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2415325A1 (fr) * 1978-01-23 1979-08-17 Grace W R Ltd Structure stratifiee permettant d'obtenir une image en relief sous l'action de radiations, et plaque d'impression obtenue a partir de cette structure

Also Published As

Publication number Publication date
JPS497002B1 (enrdf_load_stackoverflow) 1974-02-18
BR7101076D0 (pt) 1973-04-26
FR2083085A5 (enrdf_load_stackoverflow) 1971-12-10
GB1293722A (en) 1972-10-25
DE2107286B2 (enrdf_load_stackoverflow) 1978-09-07
CA926183A (en) 1973-05-15
DE2107286C3 (enrdf_load_stackoverflow) 1979-05-03

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
EHJ Ceased/non-payment of the annual fee