GB1293722A - Photoresist process - Google Patents

Photoresist process

Info

Publication number
GB1293722A
GB1293722A GB238271A GB238271A GB1293722A GB 1293722 A GB1293722 A GB 1293722A GB 238271 A GB238271 A GB 238271A GB 238271 A GB238271 A GB 238271A GB 1293722 A GB1293722 A GB 1293722A
Authority
GB
United Kingdom
Prior art keywords
photo
support
composition
curable composition
compound containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB238271A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace and Co
Original Assignee
WR Grace and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace and Co filed Critical WR Grace and Co
Publication of GB1293722A publication Critical patent/GB1293722A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
GB238271A 1970-02-26 1971-01-18 Photoresist process Expired GB1293722A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1444970A 1970-02-26 1970-02-26

Publications (1)

Publication Number Publication Date
GB1293722A true GB1293722A (en) 1972-10-25

Family

ID=21765543

Family Applications (1)

Application Number Title Priority Date Filing Date
GB238271A Expired GB1293722A (en) 1970-02-26 1971-01-18 Photoresist process

Country Status (6)

Country Link
JP (1) JPS497002B1 (enrdf_load_stackoverflow)
BR (1) BR7101076D0 (enrdf_load_stackoverflow)
CA (1) CA926183A (enrdf_load_stackoverflow)
DE (1) DE2107286A1 (enrdf_load_stackoverflow)
FR (1) FR2083085A5 (enrdf_load_stackoverflow)
GB (1) GB1293722A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4435497A (en) 1981-06-19 1984-03-06 Ciba-Geigy Corporation Carboxyl-containing compositions and their polymerization
US4604344A (en) * 1984-02-03 1986-08-05 Ciba-Geigy Corporation Process for the production of images using sequentially liquid polymerizing compositions and photocuring
US4634644A (en) * 1983-12-20 1987-01-06 Ciba-Geigy Corporation Process for the production images using sequentially gaseous polymerizing agents and photocuring
EP1674287A1 (de) * 2004-12-22 2006-06-28 Atlantic ZeiserGmbH Verfahren und Einrichtung zum Erzeugen von dreidimensionalen Informationen auf einer Oberfläche
CN114393939A (zh) * 2021-12-30 2022-04-26 浙江美浓世纪集团有限公司 一种无膜烫金方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4248960A (en) * 1978-01-23 1981-02-03 W. R. Grace & Co. Radiation responsive relief imageable plastic laminate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4435497A (en) 1981-06-19 1984-03-06 Ciba-Geigy Corporation Carboxyl-containing compositions and their polymerization
US4634644A (en) * 1983-12-20 1987-01-06 Ciba-Geigy Corporation Process for the production images using sequentially gaseous polymerizing agents and photocuring
US4604344A (en) * 1984-02-03 1986-08-05 Ciba-Geigy Corporation Process for the production of images using sequentially liquid polymerizing compositions and photocuring
EP1674287A1 (de) * 2004-12-22 2006-06-28 Atlantic ZeiserGmbH Verfahren und Einrichtung zum Erzeugen von dreidimensionalen Informationen auf einer Oberfläche
CN114393939A (zh) * 2021-12-30 2022-04-26 浙江美浓世纪集团有限公司 一种无膜烫金方法

Also Published As

Publication number Publication date
JPS497002B1 (enrdf_load_stackoverflow) 1974-02-18
BR7101076D0 (pt) 1973-04-26
FR2083085A5 (enrdf_load_stackoverflow) 1971-12-10
DE2107286A1 (de) 1971-09-02
DE2107286B2 (enrdf_load_stackoverflow) 1978-09-07
CA926183A (en) 1973-05-15
DE2107286C3 (enrdf_load_stackoverflow) 1979-05-03

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee