DE202011103798U1 - Schnellverschluss für Reaktoren und Konvertoren - Google Patents

Schnellverschluss für Reaktoren und Konvertoren Download PDF

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Publication number
DE202011103798U1
DE202011103798U1 DE201120103798 DE202011103798U DE202011103798U1 DE 202011103798 U1 DE202011103798 U1 DE 202011103798U1 DE 201120103798 DE201120103798 DE 201120103798 DE 202011103798 U DE202011103798 U DE 202011103798U DE 202011103798 U1 DE202011103798 U1 DE 202011103798U1
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DE
Germany
Prior art keywords
reactor
housing part
bayonet
bell
reactor according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE201120103798
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German (de)
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
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Individual
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Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to DE201120103798 priority Critical patent/DE202011103798U1/de
Priority to EP12742877.9A priority patent/EP2737104A1/fr
Priority to PCT/EP2012/064732 priority patent/WO2013014248A1/fr
Publication of DE202011103798U1 publication Critical patent/DE202011103798U1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4418—Methods for making free-standing articles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Silicon Compounds (AREA)
DE201120103798 2011-07-28 2011-07-28 Schnellverschluss für Reaktoren und Konvertoren Expired - Lifetime DE202011103798U1 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE201120103798 DE202011103798U1 (de) 2011-07-28 2011-07-28 Schnellverschluss für Reaktoren und Konvertoren
EP12742877.9A EP2737104A1 (fr) 2011-07-28 2012-07-26 Fermeture rapide pour réacteurs et convertisseurs
PCT/EP2012/064732 WO2013014248A1 (fr) 2011-07-28 2012-07-26 Fermeture rapide pour réacteurs et convertisseurs

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201120103798 DE202011103798U1 (de) 2011-07-28 2011-07-28 Schnellverschluss für Reaktoren und Konvertoren

Publications (1)

Publication Number Publication Date
DE202011103798U1 true DE202011103798U1 (de) 2012-10-29

Family

ID=46603945

Family Applications (1)

Application Number Title Priority Date Filing Date
DE201120103798 Expired - Lifetime DE202011103798U1 (de) 2011-07-28 2011-07-28 Schnellverschluss für Reaktoren und Konvertoren

Country Status (3)

Country Link
EP (1) EP2737104A1 (fr)
DE (1) DE202011103798U1 (fr)
WO (1) WO2013014248A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11505862B2 (en) * 2020-03-10 2022-11-22 Shin-Etsu Chemical Co., Ltd. Method for preventing contamination of base plate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015099547A1 (fr) 2014-01-31 2015-07-02 Uni-Heat Sp. Z.O.O. Collecteur de charge, en particulier pour pompe à chaleur à multiples sources

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3316562A1 (de) * 1982-10-07 1984-04-12 Klöckner-Humboldt-Deutz AG, 5000 Köln Abdichtungsvorrichtung fuer kupplungen bei gasleitungen
DE102005056324A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag CVD-Reaktor mit auswechselbarer Prozesskammerdecke
DE102005056320A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag CVD-Reaktor mit einem Gaseinlassorgan
US20090053569A1 (en) * 2007-08-15 2009-02-26 Bloom Energy Corporation Fuel cell system components
EP2168675A1 (fr) * 2008-09-30 2010-03-31 Symyx Solutions Inc. Système de réacteur
DE102009043947A1 (de) 2009-09-04 2011-03-17 G+R Technology Group Ag Vorrichtung zum Ausleiten von gasförmigen Messproben aus einem Herstellungsprozess und Verwendung der Vorrichtung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19521716C2 (de) * 1995-06-14 2000-03-30 Siemens Ag Prozeßrohr mit Endverschluß
DE102007063363B4 (de) * 2007-05-21 2016-05-12 Centrotherm Photovoltaics Ag Vorrichtung zur Dotierung und Beschichtung von Halbleitermaterial bei niedrigem Druck
JP5444839B2 (ja) * 2008-05-28 2014-03-19 三菱マテリアル株式会社 トリクロロシラン製造装置及び製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3316562A1 (de) * 1982-10-07 1984-04-12 Klöckner-Humboldt-Deutz AG, 5000 Köln Abdichtungsvorrichtung fuer kupplungen bei gasleitungen
DE102005056324A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag CVD-Reaktor mit auswechselbarer Prozesskammerdecke
DE102005056320A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag CVD-Reaktor mit einem Gaseinlassorgan
US20090053569A1 (en) * 2007-08-15 2009-02-26 Bloom Energy Corporation Fuel cell system components
EP2168675A1 (fr) * 2008-09-30 2010-03-31 Symyx Solutions Inc. Système de réacteur
DE102009043947A1 (de) 2009-09-04 2011-03-17 G+R Technology Group Ag Vorrichtung zum Ausleiten von gasförmigen Messproben aus einem Herstellungsprozess und Verwendung der Vorrichtung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11505862B2 (en) * 2020-03-10 2022-11-22 Shin-Etsu Chemical Co., Ltd. Method for preventing contamination of base plate

Also Published As

Publication number Publication date
WO2013014248A1 (fr) 2013-01-31
EP2737104A1 (fr) 2014-06-04

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Effective date: 20121220

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Effective date: 20150203