DE19856307C1 - Vorrichtung zur Erzeugung eines freien kalten Plasmastrahles - Google Patents
Vorrichtung zur Erzeugung eines freien kalten PlasmastrahlesInfo
- Publication number
- DE19856307C1 DE19856307C1 DE19856307A DE19856307A DE19856307C1 DE 19856307 C1 DE19856307 C1 DE 19856307C1 DE 19856307 A DE19856307 A DE 19856307A DE 19856307 A DE19856307 A DE 19856307A DE 19856307 C1 DE19856307 C1 DE 19856307C1
- Authority
- DE
- Germany
- Prior art keywords
- plasma
- gas
- hollow body
- free
- cold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005495 cold plasma Effects 0.000 title claims abstract description 28
- 238000000576 coating method Methods 0.000 claims abstract description 18
- 230000005670 electromagnetic radiation Effects 0.000 claims abstract description 13
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 238000005530 etching Methods 0.000 claims abstract description 7
- 238000004140 cleaning Methods 0.000 claims abstract description 4
- 239000011521 glass Substances 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 74
- 230000008878 coupling Effects 0.000 claims description 11
- 238000010168 coupling process Methods 0.000 claims description 11
- 238000005859 coupling reaction Methods 0.000 claims description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 description 102
- 238000000034 method Methods 0.000 description 13
- 230000008569 process Effects 0.000 description 12
- 230000008021 deposition Effects 0.000 description 8
- 230000008901 benefit Effects 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 230000004913 activation Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19856307A DE19856307C1 (de) | 1998-12-07 | 1998-12-07 | Vorrichtung zur Erzeugung eines freien kalten Plasmastrahles |
| PCT/DE1999/003612 WO2000035256A1 (de) | 1998-12-07 | 1999-11-12 | Vorrichtung zur erzeugung eines freien kalten plasmastrahles |
| US09/601,732 US6396214B1 (en) | 1998-12-07 | 1999-11-12 | Device for producing a free cold plasma jet |
| EP99963225.0A EP1053660B1 (de) | 1998-12-07 | 1999-11-12 | Vorrichtung zur erzeugung eines freien kalten nicht-thermischen plasmastrahles |
| JP2000587588A JP2002532838A (ja) | 1998-12-07 | 1999-11-12 | 低温フリープラズマビームを発生する装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19856307A DE19856307C1 (de) | 1998-12-07 | 1998-12-07 | Vorrichtung zur Erzeugung eines freien kalten Plasmastrahles |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19856307C1 true DE19856307C1 (de) | 2000-01-13 |
Family
ID=7890189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19856307A Expired - Lifetime DE19856307C1 (de) | 1998-12-07 | 1998-12-07 | Vorrichtung zur Erzeugung eines freien kalten Plasmastrahles |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6396214B1 (enExample) |
| EP (1) | EP1053660B1 (enExample) |
| JP (1) | JP2002532838A (enExample) |
| DE (1) | DE19856307C1 (enExample) |
| WO (1) | WO2000035256A1 (enExample) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10104614A1 (de) * | 2001-02-02 | 2002-08-22 | Bosch Gmbh Robert | Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung |
| DE10104613A1 (de) * | 2001-02-02 | 2002-08-22 | Bosch Gmbh Robert | Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung |
| DE10358329A1 (de) * | 2003-12-12 | 2005-07-07 | R3T Gmbh Rapid Reactive Radicals Technology | Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma und Verfahren zur Erzeugung ionisierter Teilchen |
| EP1829837A1 (de) * | 2006-03-01 | 2007-09-05 | Schott AG | Verfahren und Vorrichtung zur Plasmabehandlung von alkali- und erdalkalihaltgen Oberflächen |
| WO2013014213A2 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verfahren zur substratbeschichtung und verwendung additivversehener, pulverförmiger beschichtungsmaterialien in derartigen verfahren |
| WO2013014214A2 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Beschichtungsverfahren nutzend spezielle pulverförmige beschichtungsmaterialien und verwendung derartiger beschichtungsmaterialien |
| DE102011052120A1 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verwendung speziell belegter, pulverförmiger Beschichtungsmaterialien und Beschichtungsverfahren unter Einsatz derartiger Beschichtungsmaterialien |
| DE102011052119A1 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verfahren zur Substratbeschichtung und Verwendung additivversehener, pulverförmiger Beschichtungsmaterialien in derartigen Verfahren |
| EP2959992A1 (de) | 2014-06-26 | 2015-12-30 | Eckart GmbH | Verfahren zur Herstellung eines partikelhaltigen Aerosols |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6840910B2 (en) | 2001-08-01 | 2005-01-11 | Johnson & Johnson Consumer Companies, Inc. | Method of distributing skin care products |
| TW200308187A (en) * | 2002-04-10 | 2003-12-16 | Dow Corning Ireland Ltd | An atmospheric pressure plasma assembly |
| TW200409669A (en) * | 2002-04-10 | 2004-06-16 | Dow Corning Ireland Ltd | Protective coating composition |
| GB0208261D0 (en) * | 2002-04-10 | 2002-05-22 | Dow Corning | An atmospheric pressure plasma assembly |
| DE10328250B4 (de) * | 2003-06-24 | 2015-05-13 | Jenoptik Optical Systems Gmbh | Verfahren zur Oberflächenbearbeitung |
| CH696811A5 (de) * | 2003-09-26 | 2007-12-14 | Michael Dvorak Dr Ing Dipl Phy | Verfahren zur Beschichtung einer Substratoberfläche unter Verwendung eines Plasmastrahles. |
| GB0323295D0 (en) * | 2003-10-04 | 2003-11-05 | Dow Corning | Deposition of thin films |
| WO2006048649A1 (en) * | 2004-11-05 | 2006-05-11 | Dow Corning Ireland Limited | Plasma system |
| GB0509648D0 (en) * | 2005-05-12 | 2005-06-15 | Dow Corning Ireland Ltd | Plasma system to deposit adhesion primer layers |
| DE102005040266A1 (de) | 2005-08-24 | 2007-03-01 | Schott Ag | Verfahren und Vorrichtung zur innenseitigen Plasmabehandlung von Hohlkörpern |
| RU2328095C2 (ru) * | 2006-06-23 | 2008-06-27 | Закрытое акционерное общество "КОТЭС-Сибирь" | Свч-плазмотрон |
| EP1884249A1 (fr) * | 2006-08-01 | 2008-02-06 | L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Procédé de traitement de bouteilles plastiques par plasma froid et dispositif permettant sa mise en oeuvre |
| JP5725688B2 (ja) * | 2006-11-24 | 2015-05-27 | 学校法人トヨタ学園 | 大気圧プラズマジェット装置 |
| US7633231B2 (en) * | 2007-04-23 | 2009-12-15 | Cold Plasma Medical Technologies, Inc. | Harmonic cold plasma device and associated methods |
| WO2009128741A1 (ru) * | 2008-04-14 | 2009-10-22 | Закрытое Акционерное Общество "Kotэc-Cибиpь" | Свч-плазмотрон |
| EP2297377B1 (en) | 2008-05-30 | 2017-12-27 | Colorado State University Research Foundation | Plasma-based chemical source device and method of use thereof |
| US8994270B2 (en) | 2008-05-30 | 2015-03-31 | Colorado State University Research Foundation | System and methods for plasma application |
| US9272359B2 (en) | 2008-05-30 | 2016-03-01 | Colorado State University Research Foundation | Liquid-gas interface plasma device |
| US8575843B2 (en) | 2008-05-30 | 2013-11-05 | Colorado State University Research Foundation | System, method and apparatus for generating plasma |
| CN101426327B (zh) * | 2008-12-02 | 2012-01-25 | 华中科技大学 | 等离子体射流装置 |
| US8222822B2 (en) | 2009-10-27 | 2012-07-17 | Tyco Healthcare Group Lp | Inductively-coupled plasma device |
| JP5553460B2 (ja) | 2010-03-31 | 2014-07-16 | コロラド ステート ユニバーシティー リサーチ ファウンデーション | 液体−気体界面プラズマデバイス |
| DE102011002501A1 (de) * | 2011-01-11 | 2012-07-12 | Ford-Werke Gmbh | Vorrichtung zum thermischen Beschichten einer Oberfläche |
| US10225919B2 (en) * | 2011-06-30 | 2019-03-05 | Aes Global Holdings, Pte. Ltd | Projected plasma source |
| CN102921675B (zh) * | 2011-08-10 | 2017-01-25 | 中国科学院微电子研究所 | 一种新型的大面积放电的常压等离子体自由基清洗喷枪 |
| US9532826B2 (en) | 2013-03-06 | 2017-01-03 | Covidien Lp | System and method for sinus surgery |
| US9555145B2 (en) | 2013-03-13 | 2017-01-31 | Covidien Lp | System and method for biofilm remediation |
| US9685306B2 (en) | 2015-06-24 | 2017-06-20 | The Boeing Company | Ventilation systems for use with a plasma treatment system |
| DE102016213830B3 (de) * | 2016-07-27 | 2017-12-07 | Carl Zeiss Smt Gmbh | Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper |
| US10300551B2 (en) * | 2016-11-14 | 2019-05-28 | Matthew Fagan | Metal analyzing plasma CNC cutting machine and associated methods |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3723865A1 (de) * | 1986-07-18 | 1988-01-28 | Sando Iron Works Co | Reaktor fuer eine plasmabehandlung |
| EP0468886B1 (fr) * | 1990-07-27 | 1998-09-02 | Atea Societe Atlantique De Techniques Avancees | Dispositif de production d'un plasma |
| WO1998039953A1 (de) * | 1997-03-04 | 1998-09-11 | Bernhard Platzer | Verfahren und vorrichtung zum erzeugen eines plasmas |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63234519A (ja) * | 1987-03-24 | 1988-09-29 | Matsushita Electric Ind Co Ltd | プラズマ処理装置 |
| FR2616614B1 (fr) * | 1987-06-10 | 1989-10-20 | Air Liquide | Torche a plasma micro-onde, dispositif comportant une telle torche et procede pour la fabrication de poudre les mettant en oeuvre |
| JPS6436021A (en) * | 1987-07-31 | 1989-02-07 | Canon Kk | Microwave plasma processor |
| KR960014434B1 (ko) * | 1987-12-09 | 1996-10-15 | 후세 노보루 | 플라즈마 처리장치 |
| JP2548786B2 (ja) * | 1988-12-21 | 1996-10-30 | 三菱重工業株式会社 | 電子サイクロトロン共鳴プラズマの化学蒸着装置 |
| US5002632A (en) * | 1989-11-22 | 1991-03-26 | Texas Instruments Incorporated | Method and apparatus for etching semiconductor materials |
| US5111111A (en) * | 1990-09-27 | 1992-05-05 | Consortium For Surface Processing, Inc. | Method and apparatus for coupling a microwave source in an electron cyclotron resonance system |
| JPH06336662A (ja) | 1993-05-28 | 1994-12-06 | Kawasaki Steel Corp | 溶融亜鉛めっき鋼板の連続製造方法 |
-
1998
- 1998-12-07 DE DE19856307A patent/DE19856307C1/de not_active Expired - Lifetime
-
1999
- 1999-11-12 JP JP2000587588A patent/JP2002532838A/ja active Pending
- 1999-11-12 WO PCT/DE1999/003612 patent/WO2000035256A1/de not_active Ceased
- 1999-11-12 US US09/601,732 patent/US6396214B1/en not_active Expired - Lifetime
- 1999-11-12 EP EP99963225.0A patent/EP1053660B1/de not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3723865A1 (de) * | 1986-07-18 | 1988-01-28 | Sando Iron Works Co | Reaktor fuer eine plasmabehandlung |
| EP0468886B1 (fr) * | 1990-07-27 | 1998-09-02 | Atea Societe Atlantique De Techniques Avancees | Dispositif de production d'un plasma |
| WO1998039953A1 (de) * | 1997-03-04 | 1998-09-11 | Bernhard Platzer | Verfahren und vorrichtung zum erzeugen eines plasmas |
Non-Patent Citations (3)
| Title |
|---|
| F. Chen, Introduction to Plasma Physics and Controlled Fusion, Vol. 1, Plenum Press, New York (1984) * |
| Physics of surface wave discharges, Proceedings of Plasma Processing of Semiconductors, Chateau de Bonas, France (1997), 198-210 * |
| Tagungsband Workshop Plasmatechnik, Technische Universität Ilmenau, 1998, S. 1-13 * |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10104613A1 (de) * | 2001-02-02 | 2002-08-22 | Bosch Gmbh Robert | Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung |
| DE10104614A1 (de) * | 2001-02-02 | 2002-08-22 | Bosch Gmbh Robert | Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung |
| DE10358329A1 (de) * | 2003-12-12 | 2005-07-07 | R3T Gmbh Rapid Reactive Radicals Technology | Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma und Verfahren zur Erzeugung ionisierter Teilchen |
| DE10358329B4 (de) * | 2003-12-12 | 2007-08-02 | R3T Gmbh Rapid Reactive Radicals Technology | Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma und Verfahren zur Erzeugung ionisierter Teilchen |
| US7665416B2 (en) | 2003-12-12 | 2010-02-23 | R3T Gmbh Rapid Reactive Radicals Technology | Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles |
| US8673406B2 (en) | 2006-03-01 | 2014-03-18 | Schott Ag | Method and device for the plasma treatment of surfaces containing alkali and alkaline-earth metals |
| EP1829837A1 (de) * | 2006-03-01 | 2007-09-05 | Schott AG | Verfahren und Vorrichtung zur Plasmabehandlung von alkali- und erdalkalihaltgen Oberflächen |
| WO2013014213A2 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verfahren zur substratbeschichtung und verwendung additivversehener, pulverförmiger beschichtungsmaterialien in derartigen verfahren |
| DE102011052121A1 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Beschichtungsverfahren nutzend spezielle pulverförmige Beschichtungsmaterialien und Verwendung derartiger Beschichtungsmaterialien |
| DE102011052120A1 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verwendung speziell belegter, pulverförmiger Beschichtungsmaterialien und Beschichtungsverfahren unter Einsatz derartiger Beschichtungsmaterialien |
| WO2013014211A2 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verwendung speziell belegter, pulverförmiger beschichtungsmaterialien und beschichtungsverfahren unter einsatz derartiger beschichtungsmaterialien |
| DE102011052119A1 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verfahren zur Substratbeschichtung und Verwendung additivversehener, pulverförmiger Beschichtungsmaterialien in derartigen Verfahren |
| WO2013014214A2 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Beschichtungsverfahren nutzend spezielle pulverförmige beschichtungsmaterialien und verwendung derartiger beschichtungsmaterialien |
| US9580787B2 (en) | 2011-07-25 | 2017-02-28 | Eckart Gmbh | Coating method using special powdered coating materials and use of such coating materials |
| EP2959992A1 (de) | 2014-06-26 | 2015-12-30 | Eckart GmbH | Verfahren zur Herstellung eines partikelhaltigen Aerosols |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1053660A1 (de) | 2000-11-22 |
| WO2000035256A1 (de) | 2000-06-15 |
| US6396214B1 (en) | 2002-05-28 |
| EP1053660B1 (de) | 2016-08-10 |
| JP2002532838A (ja) | 2002-10-02 |
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