JP2002532838A - 低温フリープラズマビームを発生する装置 - Google Patents

低温フリープラズマビームを発生する装置

Info

Publication number
JP2002532838A
JP2002532838A JP2000587588A JP2000587588A JP2002532838A JP 2002532838 A JP2002532838 A JP 2002532838A JP 2000587588 A JP2000587588 A JP 2000587588A JP 2000587588 A JP2000587588 A JP 2000587588A JP 2002532838 A JP2002532838 A JP 2002532838A
Authority
JP
Japan
Prior art keywords
plasma
gas
hollow body
frequency
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000587588A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002532838A5 (enExample
Inventor
グローセ シュテファン
ヴェーバー トーマス
ガール アストリート
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of JP2002532838A publication Critical patent/JP2002532838A/ja
Publication of JP2002532838A5 publication Critical patent/JP2002532838A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2000587588A 1998-12-07 1999-11-12 低温フリープラズマビームを発生する装置 Pending JP2002532838A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19856307A DE19856307C1 (de) 1998-12-07 1998-12-07 Vorrichtung zur Erzeugung eines freien kalten Plasmastrahles
DE19856307.8 1998-12-07
PCT/DE1999/003612 WO2000035256A1 (de) 1998-12-07 1999-11-12 Vorrichtung zur erzeugung eines freien kalten plasmastrahles

Publications (2)

Publication Number Publication Date
JP2002532838A true JP2002532838A (ja) 2002-10-02
JP2002532838A5 JP2002532838A5 (enExample) 2007-01-18

Family

ID=7890189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000587588A Pending JP2002532838A (ja) 1998-12-07 1999-11-12 低温フリープラズマビームを発生する装置

Country Status (5)

Country Link
US (1) US6396214B1 (enExample)
EP (1) EP1053660B1 (enExample)
JP (1) JP2002532838A (enExample)
DE (1) DE19856307C1 (enExample)
WO (1) WO2000035256A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007521395A (ja) * 2003-09-26 2007-08-02 ドヴォラック，ミヒャエル プラズマ・ビームを使用して基板表面をコーティングする方法
JP2008130503A (ja) * 2006-11-24 2008-06-05 Toyota Gakuen 大気圧プラズマジェット装置

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DE10104613A1 (de) * 2001-02-02 2002-08-22 Bosch Gmbh Robert Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung
DE10104614A1 (de) * 2001-02-02 2002-08-22 Bosch Gmbh Robert Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung
US6840910B2 (en) 2001-08-01 2005-01-11 Johnson & Johnson Consumer Companies, Inc. Method of distributing skin care products
TW200308187A (en) * 2002-04-10 2003-12-16 Dow Corning Ireland Ltd An atmospheric pressure plasma assembly
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
GB0208261D0 (en) * 2002-04-10 2002-05-22 Dow Corning An atmospheric pressure plasma assembly
DE10328250B4 (de) * 2003-06-24 2015-05-13 Jenoptik Optical Systems Gmbh Verfahren zur Oberflächenbearbeitung
GB0323295D0 (en) * 2003-10-04 2003-11-05 Dow Corning Deposition of thin films
DE10358329B4 (de) * 2003-12-12 2007-08-02 R3T Gmbh Rapid Reactive Radicals Technology Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma und Verfahren zur Erzeugung ionisierter Teilchen
WO2006048649A1 (en) * 2004-11-05 2006-05-11 Dow Corning Ireland Limited Plasma system
GB0509648D0 (en) * 2005-05-12 2005-06-15 Dow Corning Ireland Ltd Plasma system to deposit adhesion primer layers
DE102005040266A1 (de) 2005-08-24 2007-03-01 Schott Ag Verfahren und Vorrichtung zur innenseitigen Plasmabehandlung von Hohlkörpern
DE102006009822B4 (de) 2006-03-01 2013-04-18 Schott Ag Verfahren zur Plasmabehandlung von Glasoberflächen, dessen Verwendung sowie Glassubstrat und dessen Verwendung
RU2328095C2 (ru) * 2006-06-23 2008-06-27 Закрытое акционерное общество "КОТЭС-Сибирь" Свч-плазмотрон
EP1884249A1 (fr) * 2006-08-01 2008-02-06 L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Procédé de traitement de bouteilles plastiques par plasma froid et dispositif permettant sa mise en oeuvre
US7633231B2 (en) * 2007-04-23 2009-12-15 Cold Plasma Medical Technologies, Inc. Harmonic cold plasma device and associated methods
WO2009128741A1 (ru) * 2008-04-14 2009-10-22 Закрытое Акционерное Общество "Kotэc-Cибиpь" Свч-плазмотрон
EP2297377B1 (en) 2008-05-30 2017-12-27 Colorado State University Research Foundation Plasma-based chemical source device and method of use thereof
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
US9272359B2 (en) 2008-05-30 2016-03-01 Colorado State University Research Foundation Liquid-gas interface plasma device
US8575843B2 (en) 2008-05-30 2013-11-05 Colorado State University Research Foundation System, method and apparatus for generating plasma
CN101426327B (zh) * 2008-12-02 2012-01-25 华中科技大学 等离子体射流装置
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
JP5553460B2 (ja) 2010-03-31 2014-07-16 コロラド ステート ユニバーシティー リサーチ ファウンデーション 液体−気体界面プラズマデバイス
DE102011002501A1 (de) * 2011-01-11 2012-07-12 Ford-Werke Gmbh Vorrichtung zum thermischen Beschichten einer Oberfläche
US10225919B2 (en) * 2011-06-30 2019-03-05 Aes Global Holdings, Pte. Ltd Projected plasma source
DE102011052121A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Beschichtungsverfahren nutzend spezielle pulverförmige Beschichtungsmaterialien und Verwendung derartiger Beschichtungsmaterialien
JP2014527575A (ja) 2011-07-25 2014-10-16 エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツングＥｃｋａｒｔ ＧｍｂＨ 基材コーティングのための方法、およびそのような方法における添加剤含有粉末化コーティング物質の使用
DE102011052120A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verwendung speziell belegter, pulverförmiger Beschichtungsmaterialien und Beschichtungsverfahren unter Einsatz derartiger Beschichtungsmaterialien
DE102011052119A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verfahren zur Substratbeschichtung und Verwendung additivversehener, pulverförmiger Beschichtungsmaterialien in derartigen Verfahren
CN102921675B (zh) * 2011-08-10 2017-01-25 中国科学院微电子研究所 一种新型的大面积放电的常压等离子体自由基清洗喷枪
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
EP2959992A1 (de) 2014-06-26 2015-12-30 Eckart GmbH Verfahren zur Herstellung eines partikelhaltigen Aerosols
US9685306B2 (en) 2015-06-24 2017-06-20 The Boeing Company Ventilation systems for use with a plasma treatment system
DE102016213830B3 (de) * 2016-07-27 2017-12-07 Carl Zeiss Smt Gmbh Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper
US10300551B2 (en) * 2016-11-14 2019-05-28 Matthew Fagan Metal analyzing plasma CNC cutting machine and associated methods

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US4829189A (en) * 1986-07-18 1989-05-09 Sando Iron Works Co., Ltd. Apparatus for low-temperature plasma treatment of sheet material
JPS63234519A (ja) * 1987-03-24 1988-09-29 Matsushita Electric Ind Co Ltd プラズマ処理装置
FR2616614B1 (fr) * 1987-06-10 1989-10-20 Air Liquide Torche a plasma micro-onde, dispositif comportant une telle torche et procede pour la fabrication de poudre les mettant en oeuvre
JPS6436021A (en) * 1987-07-31 1989-02-07 Canon Kk Microwave plasma processor
KR960014434B1 (ko) * 1987-12-09 1996-10-15 후세 노보루 플라즈마 처리장치
JP2548786B2 (ja) * 1988-12-21 1996-10-30 三菱重工業株式会社 電子サイクロトロン共鳴プラズマの化学蒸着装置
US5002632A (en) * 1989-11-22 1991-03-26 Texas Instruments Incorporated Method and apparatus for etching semiconductor materials
FR2665323B1 (fr) * 1990-07-27 1996-09-27 Reydel J Dispositif de production d'un plasma.
US5111111A (en) * 1990-09-27 1992-05-05 Consortium For Surface Processing, Inc. Method and apparatus for coupling a microwave source in an electron cyclotron resonance system
JPH06336662A (ja) 1993-05-28 1994-12-06 Kawasaki Steel Corp 溶融亜鉛めっき鋼板の連続製造方法
AT405472B (de) * 1997-03-04 1999-08-25 Bernhard Dr Platzer Verfahren und vorrichtung zum erzeugen eines plasmas

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007521395A (ja) * 2003-09-26 2007-08-02 ドヴォラック，ミヒャエル プラズマ・ビームを使用して基板表面をコーティングする方法
JP2008130503A (ja) * 2006-11-24 2008-06-05 Toyota Gakuen 大気圧プラズマジェット装置

Also Published As

Publication number Publication date
EP1053660A1 (de) 2000-11-22
WO2000035256A1 (de) 2000-06-15
US6396214B1 (en) 2002-05-28
DE19856307C1 (de) 2000-01-13
EP1053660B1 (de) 2016-08-10

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