DE1935088U - Leistungstransistor. - Google Patents
Leistungstransistor.Info
- Publication number
- DE1935088U DE1935088U DEM47770U DEM0047770U DE1935088U DE 1935088 U DE1935088 U DE 1935088U DE M47770 U DEM47770 U DE M47770U DE M0047770 U DEM0047770 U DE M0047770U DE 1935088 U DE1935088 U DE 1935088U
- Authority
- DE
- Germany
- Prior art keywords
- base
- transistor
- alloyed
- layer
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910045601 alloy Inorganic materials 0.000 claims description 26
- 239000000956 alloy Substances 0.000 claims description 26
- 229910052732 germanium Inorganic materials 0.000 claims description 11
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 11
- 229910052787 antimony Inorganic materials 0.000 claims description 9
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000006386 neutralization reaction Methods 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 9
- 238000005275 alloying Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000002019 doping agent Substances 0.000 description 5
- 235000013601 eggs Nutrition 0.000 description 5
- 238000004804 winding Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910000978 Pb alloy Inorganic materials 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 241000234282 Allium Species 0.000 description 1
- 208000012503 Bathing suit ichthyosis Diseases 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 241000237858 Gastropoda Species 0.000 description 1
- 241000183666 Nepsera aquatica Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009411 base construction Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000007499 fusion processing Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/228—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a liquid phase, e.g. alloy diffusion processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/035—Diffusion through a layer
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US267220A US3309244A (en) | 1963-03-22 | 1963-03-22 | Alloy-diffused method for producing semiconductor devices |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1935088U true DE1935088U (de) | 1966-03-24 |
Family
ID=23017838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEM47770U Expired DE1935088U (de) | 1963-03-22 | 1964-03-23 | Leistungstransistor. |
Country Status (9)
Country | Link |
---|---|
US (1) | US3309244A (hu) |
JP (1) | JPS4911033B1 (hu) |
BE (1) | BE645252A (hu) |
DE (1) | DE1935088U (hu) |
DK (1) | DK117363B (hu) |
FR (1) | FR1397401A (hu) |
GB (1) | GB995527A (hu) |
NL (1) | NL6402683A (hu) |
NO (1) | NO116431B (hu) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3577045A (en) * | 1968-09-18 | 1971-05-04 | Gen Electric | High emitter efficiency simiconductor device with low base resistance and by selective diffusion of base impurities |
US3905844A (en) * | 1971-06-15 | 1975-09-16 | Matsushita Electric Ind Co Ltd | Method of making a PN junction device by metal dot alloying and recrystallization |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB807995A (en) * | 1955-09-02 | 1959-01-28 | Gen Electric Co Ltd | Improvements in or relating to the production of semiconductor bodies |
US2943006A (en) * | 1957-05-06 | 1960-06-28 | Westinghouse Electric Corp | Diffused transistors and processes for making the same |
NL257150A (hu) * | 1960-10-22 | 1900-01-01 | ||
US3211594A (en) * | 1961-12-19 | 1965-10-12 | Hughes Aircraft Co | Semiconductor device manufacture |
-
1963
- 1963-03-22 US US267220A patent/US3309244A/en not_active Expired - Lifetime
-
1964
- 1964-03-12 GB GB10546/64A patent/GB995527A/en not_active Expired
- 1964-03-13 NL NL6402683A patent/NL6402683A/xx unknown
- 1964-03-16 BE BE645252D patent/BE645252A/xx unknown
- 1964-03-17 NO NO152483A patent/NO116431B/no unknown
- 1964-03-18 FR FR967809A patent/FR1397401A/fr not_active Expired
- 1964-03-18 DK DK137664AA patent/DK117363B/da unknown
- 1964-03-21 JP JP39015303A patent/JPS4911033B1/ja active Pending
- 1964-03-23 DE DEM47770U patent/DE1935088U/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DK117363B (da) | 1970-04-20 |
BE645252A (hu) | 1964-07-16 |
GB995527A (en) | 1965-06-16 |
FR1397401A (fr) | 1965-04-30 |
JPS4911033B1 (hu) | 1974-03-14 |
US3309244A (en) | 1967-03-14 |
NO116431B (hu) | 1969-03-24 |
NL6402683A (hu) | 1964-09-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE102011076243B4 (de) | Halbleitervorrichtung | |
DE3633161C2 (hu) | ||
DE2901193A1 (de) | Halbleiteranordnung | |
DE1295093B (de) | Halbleiterbauelement mit mindestens zwei Zonen entgegengesetzten Leitungstyps | |
DE1154872B (de) | Halbleiterbauelement mit einem mindestens drei pn-UEbergaenge aufweisenden Halbleiterkoerper | |
DE112019003790T5 (de) | Superjunction-siliziumkarbid-halbleitervorrichtung und verfahren zum herstellen einer superjunction-siliziumkarbid-halbleitervorrichtung | |
DE1564527B1 (de) | Halbleiterschalter fuer beide stromrichtungen | |
DE3428067C2 (de) | Halbleiter-Überspannungsunterdrücker mit genau vorherbestimmbarer Einsatzspannung und Verfahren zur Herstellung desselben | |
DE1489031B1 (de) | Transistor mit einem scheibenfoermigen Halbleiterkoerper und Verfahren zu seiner Herstellung | |
DE1614300C3 (de) | Feldeffekttransistor mit isolierter Gateelektrode | |
DE2712114A1 (de) | Selbstschuetzende halbleitervorrichtung | |
DE3011778A1 (de) | Feldeffekttransistor | |
DE2227697A1 (de) | Halbleiteranordnung mit einem transistoraufbau | |
DE1228343B (de) | Steuerbare Halbleiterdiode mit stellenweise negativer Strom-Spannungs-Kennlinie | |
DE3010986A1 (de) | Integrierte halbleiterschaltung | |
DE1639177C3 (de) | Monolithisch integrierte Gleichrichterschaltung | |
DE1171534B (de) | Flaechen-Vierzonentransistor mit einer Stromverstaerkung groesser als eins, insbesondere fuer Schaltzwecke | |
DE1935088U (de) | Leistungstransistor. | |
DE2458735C2 (de) | Transistor mit einem hohen Stromverstärkungsfaktor bei kleinen Kollektorströmen | |
DE2316599A1 (de) | Hochspannungs-halbleiteranordnung | |
EP0007099B1 (de) | Thyristor mit Amplifying Gate und Verfahren zur Herstellung | |
DE1439674B2 (de) | Steuerbares und schaltbares pn-Halbleiterbauelement für große elektrische Leistungen | |
DE1464979C3 (de) | Halbleiterschaltelement | |
DE2616925C2 (de) | Halbleiterbauelement und Verfahren zu seiner Herstellung | |
AT202600B (de) | Feldeffekt-Transistor und Verfahren zur Herstellung eines solchen Transistors |