DE1931026A1 - Lichtempfindliche harzartige Zusammensetzungen - Google Patents
Lichtempfindliche harzartige ZusammensetzungenInfo
- Publication number
- DE1931026A1 DE1931026A1 DE19691931026 DE1931026A DE1931026A1 DE 1931026 A1 DE1931026 A1 DE 1931026A1 DE 19691931026 DE19691931026 DE 19691931026 DE 1931026 A DE1931026 A DE 1931026A DE 1931026 A1 DE1931026 A1 DE 1931026A1
- Authority
- DE
- Germany
- Prior art keywords
- acid
- resin
- coating
- sulfonic acid
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73885768A | 1968-06-21 | 1968-06-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1931026A1 true DE1931026A1 (de) | 1970-01-02 |
Family
ID=24969785
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19691931026 Pending DE1931026A1 (de) | 1968-06-21 | 1969-06-19 | Lichtempfindliche harzartige Zusammensetzungen |
Country Status (7)
Country | Link |
---|---|
CA (1) | CA924954A (enrdf_load_stackoverflow) |
CH (1) | CH531194A (enrdf_load_stackoverflow) |
DE (1) | DE1931026A1 (enrdf_load_stackoverflow) |
FR (1) | FR2011413A1 (enrdf_load_stackoverflow) |
GB (1) | GB1280885A (enrdf_load_stackoverflow) |
NL (1) | NL167037C (enrdf_load_stackoverflow) |
SE (1) | SE372981B (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4289838A (en) * | 1972-12-14 | 1981-09-15 | Polychrome Corporation | Diazo-unsaturated monomer light sensitive compositions |
US4093465A (en) * | 1973-08-14 | 1978-06-06 | Polychrome Corporation | Photosensitive diazo condensate compositions |
GB1523762A (en) * | 1975-02-25 | 1978-09-06 | Oce Van Der Grinten Nv | Photocopying materials |
US4189320A (en) * | 1975-04-29 | 1980-02-19 | American Hoechst Corporation | Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures |
FR2452731A1 (fr) * | 1979-03-28 | 1980-10-24 | Rhone Poulenc Syst | Compositions photopolymerisables filmogenes developpables a l'eau |
FR2452729A1 (fr) * | 1979-03-28 | 1980-10-24 | Rhone Poulenc Syst | Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique |
US4533619A (en) * | 1982-03-18 | 1985-08-06 | American Hoechst Corporation | Acid stabilizers for diazonium compound condensation products |
US4568628A (en) * | 1982-09-21 | 1986-02-04 | Polychrome Corporation | Water developable diazo printing plate composition with quaternary nitrogen stabilizer |
GB8603405D0 (en) * | 1986-02-12 | 1986-03-19 | Vickers Plc | Radiation sensitive material |
-
1969
- 1969-05-21 CA CA052141A patent/CA924954A/en not_active Expired
- 1969-06-17 CH CH925169A patent/CH531194A/de not_active IP Right Cessation
- 1969-06-19 DE DE19691931026 patent/DE1931026A1/de active Pending
- 1969-06-19 SE SE880969A patent/SE372981B/xx unknown
- 1969-06-20 FR FR6920721A patent/FR2011413A1/fr active Pending
- 1969-06-20 NL NL6909517A patent/NL167037C/xx not_active IP Right Cessation
- 1969-06-20 GB GB3139669A patent/GB1280885A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
CA924954A (en) | 1973-04-24 |
GB1280885A (en) | 1972-07-05 |
NL167037C (nl) | 1981-10-15 |
NL167037B (nl) | 1981-05-15 |
NL6909517A (enrdf_load_stackoverflow) | 1969-12-23 |
FR2011413A1 (enrdf_load_stackoverflow) | 1970-02-27 |
CH531194A (de) | 1972-11-30 |
SE372981B (enrdf_load_stackoverflow) | 1975-01-20 |
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