CH531194A - Lichtempfindliche lösungsmittellösliche, oleophile filmbildende Zusammensetzung - Google Patents

Lichtempfindliche lösungsmittellösliche, oleophile filmbildende Zusammensetzung

Info

Publication number
CH531194A
CH531194A CH925169A CH925169A CH531194A CH 531194 A CH531194 A CH 531194A CH 925169 A CH925169 A CH 925169A CH 925169 A CH925169 A CH 925169A CH 531194 A CH531194 A CH 531194A
Authority
CH
Switzerland
Prior art keywords
photosensitive
soluble
solvent
forming composition
oleophilic film
Prior art date
Application number
CH925169A
Other languages
German (de)
English (en)
Inventor
Long Chu Simon
Golda Eugene
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of CH531194A publication Critical patent/CH531194A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
CH925169A 1968-06-21 1969-06-17 Lichtempfindliche lösungsmittellösliche, oleophile filmbildende Zusammensetzung CH531194A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73885768A 1968-06-21 1968-06-21

Publications (1)

Publication Number Publication Date
CH531194A true CH531194A (de) 1972-11-30

Family

ID=24969785

Family Applications (1)

Application Number Title Priority Date Filing Date
CH925169A CH531194A (de) 1968-06-21 1969-06-17 Lichtempfindliche lösungsmittellösliche, oleophile filmbildende Zusammensetzung

Country Status (7)

Country Link
CA (1) CA924954A (enrdf_load_stackoverflow)
CH (1) CH531194A (enrdf_load_stackoverflow)
DE (1) DE1931026A1 (enrdf_load_stackoverflow)
FR (1) FR2011413A1 (enrdf_load_stackoverflow)
GB (1) GB1280885A (enrdf_load_stackoverflow)
NL (1) NL167037C (enrdf_load_stackoverflow)
SE (1) SE372981B (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289838A (en) * 1972-12-14 1981-09-15 Polychrome Corporation Diazo-unsaturated monomer light sensitive compositions
US4093465A (en) * 1973-08-14 1978-06-06 Polychrome Corporation Photosensitive diazo condensate compositions
GB1523762A (en) * 1975-02-25 1978-09-06 Oce Van Der Grinten Nv Photocopying materials
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
US4533619A (en) * 1982-03-18 1985-08-06 American Hoechst Corporation Acid stabilizers for diazonium compound condensation products
US4568628A (en) * 1982-09-21 1986-02-04 Polychrome Corporation Water developable diazo printing plate composition with quaternary nitrogen stabilizer
GB8603405D0 (en) * 1986-02-12 1986-03-19 Vickers Plc Radiation sensitive material

Also Published As

Publication number Publication date
CA924954A (en) 1973-04-24
GB1280885A (en) 1972-07-05
NL167037C (nl) 1981-10-15
NL167037B (nl) 1981-05-15
NL6909517A (enrdf_load_stackoverflow) 1969-12-23
DE1931026A1 (de) 1970-01-02
FR2011413A1 (enrdf_load_stackoverflow) 1970-02-27
SE372981B (enrdf_load_stackoverflow) 1975-01-20

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Legal Events

Date Code Title Description
PL Patent ceased