AT288158B - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
AT288158B
AT288158B AT278169A AT278169A AT288158B AT 288158 B AT288158 B AT 288158B AT 278169 A AT278169 A AT 278169A AT 278169 A AT278169 A AT 278169A AT 288158 B AT288158 B AT 288158B
Authority
AT
Austria
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Application number
AT278169A
Other languages
English (en)
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Application granted granted Critical
Publication of AT288158B publication Critical patent/AT288158B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461—Unsaturated monoacids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
AT278169A 1968-03-20 1969-03-20 Lichtempfindliche Zusammensetzung AT288158B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1772003A DE1772003C3 (de) 1968-03-20 1968-03-20 Lichtempfindliche Schicht

Publications (1)

Publication Number Publication Date
AT288158B true AT288158B (de) 1971-02-25

Family

ID=5701069

Family Applications (1)

Application Number Title Priority Date Filing Date
AT278169A AT288158B (de) 1968-03-20 1969-03-20 Lichtempfindliche Zusammensetzung

Country Status (9)

Country Link
US (1) US3635720A (de)
JP (1) JPS4842964B1 (de)
AT (1) AT288158B (de)
BE (1) BE730177A (de)
DE (1) DE1772003C3 (de)
FR (1) FR2004339A1 (de)
GB (1) GB1251107A (de)
NL (1) NL164399C (de)
SE (1) SE354129B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4919643B1 (de) * 1970-11-14 1974-05-18
US3929489A (en) * 1973-09-14 1975-12-30 Eastman Kodak Co Lithographic plates having radiation sensitive elements developable with aqueous alcohol
JPS52123062U (de) * 1976-03-11 1977-09-19
JPS52123059U (de) * 1976-03-11 1977-09-19

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB574244A (en) * 1958-07-25 1945-12-28 Sparklets Ltd Improvements in or relating to means for producing a spray of atomised liquid
US3031301A (en) * 1959-03-30 1962-04-24 Gen Electric Photosensitive resin compositions
US3255006A (en) * 1963-03-04 1966-06-07 Purex Corp Ltd Photosensitive masking for chemical etching
US3278305A (en) * 1963-07-12 1966-10-11 Gevaert Photo Prod Nv Photochemical cross-linking of polymers
US3455689A (en) * 1965-04-13 1969-07-15 Agfa Gevaert Nv Photochemical cross-linking of polymers

Also Published As

Publication number Publication date
DE1772003B2 (de) 1977-11-24
NL164399C (nl) 1980-12-15
DE1772003C3 (de) 1978-07-13
JPS4842964B1 (de) 1973-12-15
DE1772003A1 (de) 1971-01-07
GB1251107A (de) 1971-10-27
US3635720A (en) 1972-01-18
FR2004339A1 (de) 1969-11-21
NL6903661A (de) 1969-09-23
SE354129B (de) 1973-02-26
BE730177A (de) 1969-09-22
NL164399B (nl) 1980-07-15

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Legal Events

Date Code Title Description
EIH Change in the person of patent owner
ELJ Ceased due to non-payment of the annual fee