DE1584284C - - Google Patents

Info

Publication number

DE1584284C

DE1584284C DE1584284C DE 1584284 C DE1584284 C DE 1584284C DE 1584284 C DE1584284 C DE 1584284C

Authority

DE

Germany

Prior art keywords

carbide

abrasion

grains

armor plate

resistant material

Prior art date

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

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• 239000000463 material Substances 0.000 claims description 21
• 238000005299 abrasion Methods 0.000 claims description 10
• 238000005219 brazing Methods 0.000 claims description 9
• PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
• 229910000831 Steel Inorganic materials 0.000 claims description 6
• 239000010959 steel Substances 0.000 claims description 6
• UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims description 6
• 150000001875 compounds Chemical class 0.000 claims description 5
• 229910000906 Bronze Inorganic materials 0.000 claims description 4
• 239000010974 bronze Substances 0.000 claims description 4
• KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims description 4
• 229910052759 nickel Inorganic materials 0.000 claims description 4
• INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical compound C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 claims description 2
• QIJNJJZPYXGIQM-UHFFFAOYSA-N 1lambda4,2lambda4-dimolybdacyclopropa-1,2,3-triene Chemical compound [Mo]=C=[Mo] QIJNJJZPYXGIQM-UHFFFAOYSA-N 0.000 claims description 2
• 229910039444 MoC Inorganic materials 0.000 claims description 2
• 229910052778 Plutonium Inorganic materials 0.000 claims description 2
• 229910052770 Uranium Inorganic materials 0.000 claims description 2
• 229910026551 ZrC Inorganic materials 0.000 claims description 2
• OTCHGXYCWNXDOA-UHFFFAOYSA-N [C].[Zr] Chemical compound [C].[Zr] OTCHGXYCWNXDOA-UHFFFAOYSA-N 0.000 claims description 2
• UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims description 2
• YZUCHPMXUOSLOJ-UHFFFAOYSA-N ethyne;thorium Chemical compound [Th].[C-]#[C] YZUCHPMXUOSLOJ-UHFFFAOYSA-N 0.000 claims description 2
• WHJFNYXPKGDKBB-UHFFFAOYSA-N hafnium;methane Chemical compound C.[Hf] WHJFNYXPKGDKBB-UHFFFAOYSA-N 0.000 claims description 2
• UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 claims description 2
• NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 claims description 2
• OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 claims description 2
• 229910003468 tantalcarbide Inorganic materials 0.000 claims description 2
• 229910003470 tongbaite Inorganic materials 0.000 claims description 2
• MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 2
• JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 2
• 239000000945 filler Substances 0.000 description 4
• 239000002245 particle Substances 0.000 description 3
• 230000035515 penetration Effects 0.000 description 3
• 238000012856 packing Methods 0.000 description 2
• 238000005253 cladding Methods 0.000 description 1
• 238000005553 drilling Methods 0.000 description 1
• 238000000034 method Methods 0.000 description 1

Cited By (1)