DE1571088A1 - Verfahren zum Herstellen einer chemisch bestaendigen Beschichtung auf der Oberflaeche eines Koerpers - Google Patents
Verfahren zum Herstellen einer chemisch bestaendigen Beschichtung auf der Oberflaeche eines KoerpersInfo
- Publication number
- DE1571088A1 DE1571088A1 DE19651571088 DE1571088A DE1571088A1 DE 1571088 A1 DE1571088 A1 DE 1571088A1 DE 19651571088 DE19651571088 DE 19651571088 DE 1571088 A DE1571088 A DE 1571088A DE 1571088 A1 DE1571088 A1 DE 1571088A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- photochromic
- polar
- substance
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 29
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000011248 coating agent Substances 0.000 title claims description 4
- 238000000576 coating method Methods 0.000 title claims description 4
- 239000000126 substance Substances 0.000 claims description 53
- 239000002904 solvent Substances 0.000 claims description 28
- 150000001875 compounds Chemical class 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 17
- 239000007787 solid Substances 0.000 claims description 10
- 230000005855 radiation Effects 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 claims description 7
- 229910052980 cadmium sulfide Inorganic materials 0.000 claims description 7
- 239000004744 fabric Substances 0.000 claims description 7
- 238000011282 treatment Methods 0.000 claims description 7
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- 150000002430 hydrocarbons Chemical class 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- -1 indoline benzospiropyran compound Chemical class 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- 239000013078 crystal Substances 0.000 claims 1
- UFULAYFCSOUIOV-UHFFFAOYSA-N cysteamine Chemical compound NCCS UFULAYFCSOUIOV-UHFFFAOYSA-N 0.000 claims 1
- 230000002611 ovarian Effects 0.000 claims 1
- 229960005486 vaccine Drugs 0.000 claims 1
- 239000000243 solution Substances 0.000 description 18
- 239000007788 liquid Substances 0.000 description 12
- 238000005530 etching Methods 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000001427 coherent effect Effects 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 239000006193 liquid solution Substances 0.000 description 4
- 239000012454 non-polar solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 206010011224 Cough Diseases 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZTUKGBOUHWYFGC-UHFFFAOYSA-N 1,3,3-trimethyl-2-methylideneindole Chemical compound C1=CC=C2N(C)C(=C)C(C)(C)C2=C1 ZTUKGBOUHWYFGC-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 241001658031 Eris Species 0.000 description 1
- 235000008694 Humulus lupulus Nutrition 0.000 description 1
- 244000025221 Humulus lupulus Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000001891 dimethoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000004880 oxines Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000011269 treatment regimen Methods 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- ing And Chemical Polishing (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US338135A US3346385A (en) | 1964-01-16 | 1964-01-16 | Process for photo-engraving by use of photo-chromic dye and product |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1571088A1 true DE1571088A1 (de) | 1970-07-09 |
Family
ID=23323547
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19651571088 Pending DE1571088A1 (de) | 1964-01-16 | 1965-01-14 | Verfahren zum Herstellen einer chemisch bestaendigen Beschichtung auf der Oberflaeche eines Koerpers |
Country Status (8)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0034707A1 (de) * | 1980-02-22 | 1981-09-02 | Hüls Troisdorf Aktiengesellschaft | Verfahren zum Herstellen von farblichen und figürlichen Dessinierungen von Formkörpern aus Kunststoff |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3451811A (en) * | 1965-07-01 | 1969-06-24 | Xerox Corp | Electrophotographic imaging processes using electrically photosensitive photochromic materials |
| US3442646A (en) * | 1965-10-01 | 1969-05-06 | Xerox Corp | Formation of light scattering images in layers comprising organic photochromic materials |
| US3441411A (en) * | 1965-10-01 | 1969-04-29 | Xerox Corp | Image formation through the chemical reaction of photochromic materials |
| US3471290A (en) * | 1965-10-01 | 1969-10-07 | Xerox Corp | Photochromic photoresist imaging |
| US3450533A (en) * | 1965-10-01 | 1969-06-17 | Xerox Corp | Formation of light scattering images in photochromic layers |
| US3678850A (en) * | 1966-05-02 | 1972-07-25 | Xerox Corp | Porous printing plate prepared from particulate photosensitive resinous material |
| US3532540A (en) * | 1967-10-26 | 1970-10-06 | Ncr Co | Differential adhesion process for making high resolution thin film patterns |
| JPS6070939A (ja) * | 1983-09-26 | 1985-04-22 | 松下電器産業株式会社 | 遠隔制御装置 |
| US4931220A (en) * | 1987-11-24 | 1990-06-05 | Ppg Industries, Inc. | Organic photochromic pigment particulates |
| US5501945A (en) * | 1994-08-30 | 1996-03-26 | The University Of Akron | Method of using multichromic polymers in packaging |
| US6286423B1 (en) | 1997-02-11 | 2001-09-11 | Geoffrey A. Mccue | Method and apparatus for preparing a screen printing screen using an image carrier |
| US6500245B1 (en) | 1998-11-06 | 2002-12-31 | Geoffrey A. Mccue | Thermoresponsive coloring formulation for use on reimageable image carrier |
| EP1200877B1 (en) | 1999-07-08 | 2003-10-01 | Kromotek Ltd. | Dry photographic printing process |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL273984A (US20040152965A1-20040805-M00009.png) * | 1961-01-25 |
-
1964
- 1964-01-16 US US338135A patent/US3346385A/en not_active Expired - Lifetime
- 1964-12-30 SE SE15868/64A patent/SE314300B/xx unknown
-
1965
- 1965-01-05 GB GB46365A patent/GB1084081A/en not_active Expired
- 1965-01-13 FR FR1682A patent/FR1461361A/fr not_active Expired
- 1965-01-14 BE BE658272A patent/BE658272A/xx unknown
- 1965-01-14 DE DE19651571088 patent/DE1571088A1/de active Pending
- 1965-01-15 CH CH62965A patent/CH444666A/fr unknown
- 1965-01-16 JP JP40001900A patent/JPS5211589B1/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0034707A1 (de) * | 1980-02-22 | 1981-09-02 | Hüls Troisdorf Aktiengesellschaft | Verfahren zum Herstellen von farblichen und figürlichen Dessinierungen von Formkörpern aus Kunststoff |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5211589B1 (US20040152965A1-20040805-M00009.png) | 1977-03-31 |
| GB1084081A (US20040152965A1-20040805-M00009.png) | 1967-09-20 |
| CH444666A (fr) | 1967-09-30 |
| US3346385A (en) | 1967-10-10 |
| SE314300B (US20040152965A1-20040805-M00009.png) | 1969-09-01 |
| BE658272A (US20040152965A1-20040805-M00009.png) | 1965-04-30 |
| FR1461361A (fr) | 1966-12-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2439848C2 (de) | Verfahren zum Aufzeichnen mittels eines Laserstrahls | |
| DE1571088A1 (de) | Verfahren zum Herstellen einer chemisch bestaendigen Beschichtung auf der Oberflaeche eines Koerpers | |
| DE1547651B2 (de) | Verwendung eines kristalline verbindungen mit mehreren acetylenischen bindungen enthaltenden aufzeichnungsmaterials zur herstellung mikroskopischer oder elektronenmikroskopischer bilder und verfahren zur herstellung derartiger bilder | |
| DE1472772A1 (de) | Lichtempfindliches Material,insbesondere fuer die fotomechanische Herstellung von Druckplatten | |
| DE2032429A1 (de) | Strahlenempfindliches Flement und Verfahren zu seiner Herstellung | |
| DE2627828A1 (de) | Verfahren zur herstellung eines hochleitenden bildes | |
| DE2728352A1 (de) | Lichtempfindlicher film und seine verwendung | |
| DE1543721A1 (de) | Naphthochinondiazidsulfosaeureester und Verfahren zu seiner Herstellung und Verfahren zur Herstellung eines den Ester enthaltenden lagerfaehigen lichtempfindlichen Materials | |
| DE2228258C3 (de) | Strahlungsempfindliches photographisches Aufzeichnungsmaterial | |
| DE2233868A1 (de) | Verfahren zur herstellung einer abrufbaren nachrichtenaufzeichnung | |
| DE2016056B2 (de) | Gefaerbte transparente photomaske | |
| DE902713C (de) | Verfahren zum Aufbringen von Kopien auf beliebiges Material | |
| DE2364850A1 (de) | Verfahren zum fotoaetzen und fototiefdrucken unter verwendung von durch spaltbruchstuecken und/oder alphateilchen verursachte strahlen-aetzspuren von getonten fotographien | |
| DE1222940B (de) | Verfahren zur Herstellung einer Druckform durch AEtzen | |
| DE1282452B (de) | Verfahren zum Stabilisieren von Bildern in Schichten aus photochromen Stoffen | |
| DE1447024C3 (de) | Verfahren zur Herstellung eines lichtempfindlichen Aufzeichnungsmaterials und dessen Verwendung | |
| DE1571088C (de) | Photographisches Verfahren zur Herstellung von insbesondere als Abdeckschichten dienenden Abbildungen | |
| DE2245234C3 (de) | Abbildungsblatt und Verfahren zur Herstellung von Bildern | |
| DE1571088B (de) | Photographisches Verfahren zur Herstellung von insbesondere als Abdeckschichten dienenden Abbildungen | |
| DE1289426B (de) | Verfahren zum Fixieren von Bildern in einer Schicht aus photochromen stickstoffhaltigen Spiropyranverbindungen | |
| DE3417888A1 (de) | Maskenstruktur fuer vakuum-ultraviolett-lithographie | |
| DE972845C (de) | Mehrschichtfolie zur Herstellung gedruckter Schaltungen oder gedruckter Schaltelemente | |
| DE2201178C3 (de) | Verfahren zur Herstellung von Bildern | |
| DE707461C (de) | Verfahren zur Erzeugung von Bildern mittels oertlicher Belichtung einer mit einer Diazoniumverbindung lichtempfindlich gemachten Schicht | |
| DE2239018A1 (de) | Beschichtete materialien |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| E77 | Valid patent as to the heymanns-index 1977 | ||
| EGA | New person/name/address of the applicant |