DE1547900A1 - Lichtempfindliches Material - Google Patents

Lichtempfindliches Material

Info

Publication number
DE1547900A1
DE1547900A1 DE19651547900 DE1547900A DE1547900A1 DE 1547900 A1 DE1547900 A1 DE 1547900A1 DE 19651547900 DE19651547900 DE 19651547900 DE 1547900 A DE1547900 A DE 1547900A DE 1547900 A1 DE1547900 A1 DE 1547900A1
Authority
DE
Germany
Prior art keywords
acid
salt
light
polymerization
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19651547900
Other languages
German (de)
English (en)
Inventor
Edward Cerwonka
Schwerin Andre Kurt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Chemicals Corp
Original Assignee
General Aniline and Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Aniline and Film Corp filed Critical General Aniline and Film Corp
Publication of DE1547900A1 publication Critical patent/DE1547900A1/de
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
DE19651547900 1964-12-21 1965-12-18 Lichtempfindliches Material Pending DE1547900A1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US420210A US3341328A (en) 1964-12-21 1964-12-21 Photopolymerization system using ceric salts
BE673958A BE673958A (US07714131-20100511-C00038.png) 1964-12-21 1965-12-17
DEG0045493 1965-12-18

Publications (1)

Publication Number Publication Date
DE1547900A1 true DE1547900A1 (de) 1969-12-11

Family

ID=27159135

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19651547900 Pending DE1547900A1 (de) 1964-12-21 1965-12-18 Lichtempfindliches Material

Country Status (5)

Country Link
US (1) US3341328A (US07714131-20100511-C00038.png)
BE (2) BE638336A (US07714131-20100511-C00038.png)
DE (1) DE1547900A1 (US07714131-20100511-C00038.png)
FR (1) FR1461122A (US07714131-20100511-C00038.png)
GB (1) GB1125937A (US07714131-20100511-C00038.png)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5213949A (en) * 1986-11-12 1993-05-25 Asahi Kasei Kogyo Kabushiki Kaisha Method for selectively curing a liquid photosensitive resin by masking exposure
JP5118288B2 (ja) * 2002-05-16 2013-01-16 エフ ホフマン−ラ ロッシュ アクチェン ゲゼルシャフト ポリマー層の製造方法
DE102004013397A1 (de) * 2004-03-17 2005-10-06 Basf Ag Cer-Verbindungen als Initiatoren für die Strahlungshärtung
WO2013119134A1 (en) * 2012-10-16 2013-08-15 Eugen Pavel Photoresist with rare-earth sensitizers

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE582954A (US07714131-20100511-C00038.png) * 1958-12-30

Also Published As

Publication number Publication date
GB1125937A (en) 1968-09-05
US3341328A (en) 1967-09-12
BE638336A (US07714131-20100511-C00038.png) 1964-02-03
FR1461122A (fr) 1966-12-02
BE673958A (US07714131-20100511-C00038.png) 1966-04-15

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