FR1461122A - Système de photopolymérisation à base de sels cériques - Google Patents

Système de photopolymérisation à base de sels cériques

Info

Publication number
FR1461122A
FR1461122A FR43248A FR43248A FR1461122A FR 1461122 A FR1461122 A FR 1461122A FR 43248 A FR43248 A FR 43248A FR 43248 A FR43248 A FR 43248A FR 1461122 A FR1461122 A FR 1461122A
Authority
FR
France
Prior art keywords
system based
photopolymerization system
ceric salts
ceric
salts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR43248A
Other languages
English (en)
Inventor
Andre Kurt Schwerin
Eward Cerwonka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Chemicals Corp
Original Assignee
General Aniline and Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Aniline and Film Corp filed Critical General Aniline and Film Corp
Application granted granted Critical
Publication of FR1461122A publication Critical patent/FR1461122A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
FR43248A 1964-12-21 1965-12-21 Système de photopolymérisation à base de sels cériques Expired FR1461122A (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US420210A US3341328A (en) 1964-12-21 1964-12-21 Photopolymerization system using ceric salts
BE673958A BE673958A (fr) 1964-12-21 1965-12-17
DEG0045493 1965-12-18

Publications (1)

Publication Number Publication Date
FR1461122A true FR1461122A (fr) 1966-12-02

Family

ID=27159135

Family Applications (1)

Application Number Title Priority Date Filing Date
FR43248A Expired FR1461122A (fr) 1964-12-21 1965-12-21 Système de photopolymérisation à base de sels cériques

Country Status (5)

Country Link
US (1) US3341328A (fr)
BE (2) BE638336A (fr)
DE (1) DE1547900A1 (fr)
FR (1) FR1461122A (fr)
GB (1) GB1125937A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5213949A (en) * 1986-11-12 1993-05-25 Asahi Kasei Kogyo Kabushiki Kaisha Method for selectively curing a liquid photosensitive resin by masking exposure
ATE345396T1 (de) * 2002-05-16 2006-12-15 Hoffmann La Roche Verfahren zur herstellung von polymerschichten
DE102004013397A1 (de) * 2004-03-17 2005-10-06 Basf Ag Cer-Verbindungen als Initiatoren für die Strahlungshärtung
US9547238B2 (en) 2012-10-16 2017-01-17 Eugen Pavel Photoresist with rare-earth sensitizers

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE582954A (fr) * 1958-12-30

Also Published As

Publication number Publication date
BE638336A (fr) 1964-02-03
US3341328A (en) 1967-09-12
BE673958A (fr) 1966-04-15
DE1547900A1 (de) 1969-12-11
GB1125937A (en) 1968-09-05

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