DE1289737B - Lichtempfindliche Schicht - Google Patents

Lichtempfindliche Schicht

Info

Publication number
DE1289737B
DE1289737B DEK55149A DEK0055149A DE1289737B DE 1289737 B DE1289737 B DE 1289737B DE K55149 A DEK55149 A DE K55149A DE K0055149 A DEK0055149 A DE K0055149A DE 1289737 B DE1289737 B DE 1289737B
Authority
DE
Germany
Prior art keywords
aryl
alkyl
alkenyl
hydrogen
aralkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DEK55149A
Other languages
German (de)
English (en)
Inventor
Dr Ernst-August
Hackmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Priority to DEK55149A priority Critical patent/DE1289737B/de
Priority to US469872A priority patent/US3423206A/en
Priority to US512785A priority patent/US3522044A/en
Priority to NL6600757A priority patent/NL6600757A/xx
Priority to AT77066A priority patent/AT265858B/de
Priority to BE675698D priority patent/BE675698A/xx
Priority to CH111866A priority patent/CH468027A/de
Priority to FR47593A priority patent/FR1466079A/fr
Priority to GB396566A priority patent/GB1081982A/en
Priority to SE110566A priority patent/SE343692B/xx
Publication of DE1289737B publication Critical patent/DE1289737B/de
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/675Compositions containing polyhalogenated compounds as photosensitive substances
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D207/00Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/30Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
    • C07D207/32Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04Indoles; Hydrogenated indoles
    • C07D209/08Indoles; Hydrogenated indoles with only hydrogen atoms or radicals containing only hydrogen and carbon atoms, directly attached to carbon atoms of the hetero ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/12Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/14Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D231/18One oxygen or sulfur atom
    • C07D231/20One oxygen atom attached in position 3 or 5
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/14Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D231/18One oxygen or sulfur atom
    • C07D231/20One oxygen atom attached in position 3 or 5
    • C07D231/22One oxygen atom attached in position 3 or 5 with aryl radicals attached to ring nitrogen atoms
    • C07D231/261-Phenyl-3-methyl-5- pyrazolones, unsubstituted or substituted on the phenyl ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/02Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D249/081,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D257/00Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms
    • C07D257/02Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms not condensed with other rings
    • C07D257/04Five-membered rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Indole Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DEK55149A 1964-12-10 1965-01-30 Lichtempfindliche Schicht Pending DE1289737B (de)

Priority Applications (10)

Application Number Priority Date Filing Date Title
DEK55149A DE1289737B (de) 1965-01-30 1965-01-30 Lichtempfindliche Schicht
US469872A US3423206A (en) 1965-01-30 1965-07-06 Light-sensitive color forming reproduction materials
US512785A US3522044A (en) 1964-12-10 1965-12-09 Negative-working reproduction material
NL6600757A NL6600757A (es) 1965-01-30 1966-01-20
AT77066A AT265858B (de) 1965-01-30 1966-01-27 Lichtempfindliches Material
BE675698D BE675698A (es) 1965-01-30 1966-01-27
CH111866A CH468027A (de) 1965-01-30 1966-01-27 Lichtempfindliches Material
FR47593A FR1466079A (fr) 1965-01-30 1966-01-28 Matériel de reproduction travaillant négativement
GB396566A GB1081982A (en) 1965-01-30 1966-01-28 Light-sensitive copying material
SE110566A SE343692B (es) 1965-01-30 1966-01-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK55149A DE1289737B (de) 1965-01-30 1965-01-30 Lichtempfindliche Schicht

Publications (1)

Publication Number Publication Date
DE1289737B true DE1289737B (de) 1969-02-20

Family

ID=7227363

Family Applications (1)

Application Number Title Priority Date Filing Date
DEK55149A Pending DE1289737B (de) 1964-12-10 1965-01-30 Lichtempfindliche Schicht

Country Status (6)

Country Link
AT (1) AT265858B (es)
BE (1) BE675698A (es)
CH (1) CH468027A (es)
DE (1) DE1289737B (es)
GB (1) GB1081982A (es)
SE (1) SE343692B (es)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1175986B (de) * 1959-09-28 1964-08-13 Horizons Inc Lichtempfindliche Schicht zur Herstellung photographischer Bilder

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1175986B (de) * 1959-09-28 1964-08-13 Horizons Inc Lichtempfindliche Schicht zur Herstellung photographischer Bilder

Also Published As

Publication number Publication date
CH468027A (de) 1969-01-31
GB1081982A (en) 1967-09-06
SE343692B (es) 1972-03-13
BE675698A (es) 1966-07-27
AT265858B (de) 1968-10-25

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