DE1289714B - Verfahren zur Herstellung einer Maske aus einer Metallfolie - Google Patents

Verfahren zur Herstellung einer Maske aus einer Metallfolie

Info

Publication number
DE1289714B
DE1289714B DET26892A DET0026892A DE1289714B DE 1289714 B DE1289714 B DE 1289714B DE T26892 A DET26892 A DE T26892A DE T0026892 A DET0026892 A DE T0026892A DE 1289714 B DE1289714 B DE 1289714B
Authority
DE
Germany
Prior art keywords
metal foil
covered
oxide layer
mask
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DET26892A
Other languages
German (de)
English (en)
Other versions
DE1289714C2 (enrdf_load_stackoverflow
Inventor
Bertsch
Dr Ludwig
Schaefer
Dipl-Mineraloge Horst
Stork Fritz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Telefunken Patentverwertungs GmbH
Original Assignee
Telefunken Patentverwertungs GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Telefunken Patentverwertungs GmbH filed Critical Telefunken Patentverwertungs GmbH
Priority to DET26892A priority Critical patent/DE1289714B/de
Publication of DE1289714B publication Critical patent/DE1289714B/de
Application granted granted Critical
Publication of DE1289714C2 publication Critical patent/DE1289714C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
DET26892A 1964-08-27 1964-08-27 Verfahren zur Herstellung einer Maske aus einer Metallfolie Granted DE1289714B (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DET26892A DE1289714B (de) 1964-08-27 1964-08-27 Verfahren zur Herstellung einer Maske aus einer Metallfolie

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DET26892A DE1289714B (de) 1964-08-27 1964-08-27 Verfahren zur Herstellung einer Maske aus einer Metallfolie

Publications (2)

Publication Number Publication Date
DE1289714B true DE1289714B (de) 1969-02-20
DE1289714C2 DE1289714C2 (enrdf_load_stackoverflow) 1969-10-16

Family

ID=7553112

Family Applications (1)

Application Number Title Priority Date Filing Date
DET26892A Granted DE1289714B (de) 1964-08-27 1964-08-27 Verfahren zur Herstellung einer Maske aus einer Metallfolie

Country Status (1)

Country Link
DE (1) DE1289714B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0019779A3 (en) * 1979-06-01 1981-10-28 International Business Machines Corporation Apertured mask for creating patterned surfaces and process for its manufacture

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2885273A (en) * 1956-03-14 1959-05-05 North American Aviation Inc Method of etching metallic materials
GB869239A (en) * 1958-06-10 1961-05-31 Mullard Ltd Improvements in or relating to the manufacture of metallic grid structures
US3035990A (en) * 1958-11-05 1962-05-22 Collins Radio Co Chemical blanking of aluminum sheet metal

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2885273A (en) * 1956-03-14 1959-05-05 North American Aviation Inc Method of etching metallic materials
GB869239A (en) * 1958-06-10 1961-05-31 Mullard Ltd Improvements in or relating to the manufacture of metallic grid structures
US3035990A (en) * 1958-11-05 1962-05-22 Collins Radio Co Chemical blanking of aluminum sheet metal

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0019779A3 (en) * 1979-06-01 1981-10-28 International Business Machines Corporation Apertured mask for creating patterned surfaces and process for its manufacture

Also Published As

Publication number Publication date
DE1289714C2 (enrdf_load_stackoverflow) 1969-10-16

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Legal Events

Date Code Title Description
E771 Valid patent as to the heymanns-index 1977, willingness to grant licences
EHJ Ceased/non-payment of the annual fee