DE1285987B - Verfahren und Vorrichtung zur Herstellung von Oxyden - Google Patents
Verfahren und Vorrichtung zur Herstellung von OxydenInfo
- Publication number
- DE1285987B DE1285987B DEB85449A DEB0085449A DE1285987B DE 1285987 B DE1285987 B DE 1285987B DE B85449 A DEB85449 A DE B85449A DE B0085449 A DEB0085449 A DE B0085449A DE 1285987 B DE1285987 B DE 1285987B
- Authority
- DE
- Germany
- Prior art keywords
- gas
- wall
- plasma
- coil
- reactor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000007789 gas Substances 0.000 claims description 79
- 238000006243 chemical reaction Methods 0.000 claims description 30
- 239000002184 metal Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000007788 liquid Substances 0.000 claims description 16
- 229910052752 metalloid Inorganic materials 0.000 claims description 15
- 238000007254 oxidation reaction Methods 0.000 claims description 12
- 230000006698 induction Effects 0.000 claims description 11
- 150000002738 metalloids Chemical class 0.000 claims description 11
- 238000004804 winding Methods 0.000 claims description 10
- 230000001590 oxidative effect Effects 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 150000004820 halides Chemical class 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 7
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 6
- 239000011148 porous material Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- 239000000376 reactant Substances 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 4
- -1 metalloid halide Chemical class 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 239000002356 single layer Substances 0.000 claims description 3
- 239000012265 solid product Substances 0.000 claims description 3
- 230000001939 inductive effect Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims description 2
- 238000009827 uniform distribution Methods 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000004408 titanium dioxide Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 241000270295 Serpentes Species 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000004924 electrostatic deposition Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/007—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor in the presence of catalytically active bodies, e.g. porous plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/04—Feed or outlet devices; Feed or outlet control devices using osmotic pressure using membranes, porous plates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
- C01B13/28—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
- C01F7/30—Preparation of aluminium oxide or hydroxide by thermal decomposition or by hydrolysis or oxidation of aluminium compounds
- C01F7/302—Hydrolysis or oxidation of gaseous aluminium compounds in the gaseous phase
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G25/00—Compounds of zirconium
- C01G25/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F15/00—Other methods of preventing corrosion or incrustation
- C23F15/005—Inhibiting incrustation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Geology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- General Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Metallurgy (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Thermal Sciences (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2135/65A GB1066651A (en) | 1965-01-18 | 1965-01-18 | Oxides |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1285987B true DE1285987B (de) | 1969-01-02 |
Family
ID=9734216
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEB85449A Pending DE1285987B (de) | 1965-01-18 | 1966-01-18 | Verfahren und Vorrichtung zur Herstellung von Oxyden |
Country Status (6)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107497127A (zh) * | 2017-10-23 | 2017-12-22 | 青岛同兴天然色素有限公司 | 一种色素浓缩设备 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH525705A (de) * | 1968-12-24 | 1972-07-31 | Lonza Ag | Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen |
| BE755316A (fr) * | 1969-08-28 | 1971-02-26 | Ppg Industries Inc | Procede pour produire du bioxyde de titane |
| US3652213A (en) * | 1969-09-25 | 1972-03-28 | Procter & Gamble | Process for the preparation of an anhydride of trivalent phosphorus |
| US3652211A (en) * | 1969-09-25 | 1972-03-28 | Procter & Gamble | Process for the preparation of an anhydride of trivalent phosphorus using excited carbon dioxide or nitric oxide |
| US4012201A (en) * | 1973-03-22 | 1977-03-15 | Tioxide Group Limited | Reactor |
| DE2849851C3 (de) * | 1978-11-17 | 1981-11-05 | Degussa Ag, 6000 Frankfurt | Verfahren zur pyrogenen Herstellung von feinstteiligem Oxid eines Metalls und/oder eines Metalloids |
| US4687560A (en) * | 1985-08-16 | 1987-08-18 | The United States Of America As Represented By The United States Department Of Energy | Method of synthesizing a plurality of reactants and producing thin films of electro-optically active transition metal oxides |
| US4997476A (en) * | 1988-12-08 | 1991-03-05 | Plasma Energy Corporation | Recovery of free aluminum from aluminum dross using plasma energy without use of a salt flux |
| FR2723438B1 (fr) * | 1994-08-02 | 1996-09-20 | Lorraine Carbone | Reacteur de pompe a chaleur chimique a puissance amelioree |
| US6193878B1 (en) * | 1995-01-25 | 2001-02-27 | Zpm, Inc. | Multi-modal method and apparatus for treating a solution |
| US7473374B2 (en) * | 2002-05-30 | 2009-01-06 | Ralph Suddath | Fluid treatment apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB926716A (en) * | 1954-02-08 | 1963-05-22 | Du Pont | Improvements in the production of metal oxides |
| DE1183482B (de) * | 1962-09-04 | 1964-12-17 | Bayer Ag | Verfahren zum Zufuehren von Waerme bei der UEberfuehrung von Metallhalogeniden in ihre Oxyde durch Umsetzen mit Sauerstoff bzw. Wasserdampf |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2670275A (en) * | 1950-09-02 | 1954-02-23 | Du Pont | Metal oxide production |
| US2750260A (en) * | 1953-02-10 | 1956-06-12 | American Cyanamid Co | Combustion of titanium tetrachloride with oxygen |
| US2945797A (en) * | 1956-05-12 | 1960-07-19 | Saint Gobain | Manufacture of metals of high purity |
| FR1328326A (fr) * | 1961-12-01 | 1963-05-31 | Dispositif pour la fusion des produits réfractaires pulvérulents au chalumeau à plasma | |
| US3203763A (en) * | 1963-01-17 | 1965-08-31 | Du Pont | Production of metal oxides through oxidation of metal halides |
| US3275411A (en) * | 1963-04-08 | 1966-09-27 | American Cyanamid Co | Plasma production of titanium dioxide |
| GB1019940A (en) * | 1963-10-23 | 1966-02-09 | Western Electric Co | Method of growing an oxide film on the surface of a silicon body |
-
1965
- 1965-01-18 GB GB2135/65A patent/GB1066651A/en not_active Expired
-
1966
- 1966-01-11 US US520006A patent/US3438720A/en not_active Expired - Lifetime
- 1966-01-17 NO NO161275A patent/NO120071B/no unknown
- 1966-01-18 DE DEB85449A patent/DE1285987B/de active Pending
- 1966-01-18 NL NL6600617A patent/NL6600617A/xx unknown
- 1966-01-18 BE BE675290D patent/BE675290A/xx unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB926716A (en) * | 1954-02-08 | 1963-05-22 | Du Pont | Improvements in the production of metal oxides |
| DE1183482B (de) * | 1962-09-04 | 1964-12-17 | Bayer Ag | Verfahren zum Zufuehren von Waerme bei der UEberfuehrung von Metallhalogeniden in ihre Oxyde durch Umsetzen mit Sauerstoff bzw. Wasserdampf |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107497127A (zh) * | 2017-10-23 | 2017-12-22 | 青岛同兴天然色素有限公司 | 一种色素浓缩设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| NO120071B (US07122603-20061017-C00045.png) | 1970-08-24 |
| BE675290A (US07122603-20061017-C00045.png) | 1966-07-18 |
| US3438720A (en) | 1969-04-15 |
| GB1066651A (en) | 1967-04-26 |
| NL6600617A (US07122603-20061017-C00045.png) | 1966-07-19 |
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