DE112022006866T5 - Laserbearbeitungsvorrichtung, Laserbearbeitungsverfahren, Laserbearbeitungsprogramm, Aufzeichnungsmedium, Halbleiterchip-Herstellungsverfahren und Halbleiterchip - Google Patents
Laserbearbeitungsvorrichtung, Laserbearbeitungsverfahren, Laserbearbeitungsprogramm, Aufzeichnungsmedium, Halbleiterchip-Herstellungsverfahren und Halbleiterchip Download PDFInfo
- Publication number
- DE112022006866T5 DE112022006866T5 DE112022006866.3T DE112022006866T DE112022006866T5 DE 112022006866 T5 DE112022006866 T5 DE 112022006866T5 DE 112022006866 T DE112022006866 T DE 112022006866T DE 112022006866 T5 DE112022006866 T5 DE 112022006866T5
- Authority
- DE
- Germany
- Prior art keywords
- irradiation position
- machining
- laser
- processing
- speed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multi-focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
- B23K26/0876—Devices involving movement of the laser head in at least one axial direction in at least two axial directions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P54/00—Cutting or separating of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
- H10P72/53—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7416—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H10P72/742—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Dicing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/018063 WO2023203613A1 (ja) | 2022-04-18 | 2022-04-18 | レーザ加工装置、レーザ加工方法、レーザ加工プログラム、記録媒体、半導体チップ製造方法および半導体チップ |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE112022006866T5 true DE112022006866T5 (de) | 2025-02-20 |
Family
ID=88419404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE112022006866.3T Pending DE112022006866T5 (de) | 2022-04-18 | 2022-04-18 | Laserbearbeitungsvorrichtung, Laserbearbeitungsverfahren, Laserbearbeitungsprogramm, Aufzeichnungsmedium, Halbleiterchip-Herstellungsverfahren und Halbleiterchip |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250285888A1 (https=) |
| JP (1) | JP7571345B2 (https=) |
| KR (1) | KR102948781B1 (https=) |
| CN (1) | CN118900742A (https=) |
| DE (1) | DE112022006866T5 (https=) |
| TW (1) | TWI840841B (https=) |
| WO (1) | WO2023203613A1 (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5037082B1 (https=) | 1970-12-31 | 1975-11-29 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5554593U (https=) | 1978-10-06 | 1980-04-12 | ||
| JPS584716U (ja) | 1981-07-02 | 1983-01-12 | 本田技研工業株式会社 | 内燃機関用消音器 |
| IL135139A0 (en) | 1997-09-19 | 2001-05-20 | Nikon Corp | Stage apparatus, scanning type exposure apparatus, and device produced with the same |
| JP2000106340A (ja) * | 1997-09-26 | 2000-04-11 | Nikon Corp | 露光装置及び走査露光方法、並びにステージ装置 |
| JP2008042032A (ja) * | 2006-08-08 | 2008-02-21 | Sumitomo Heavy Ind Ltd | ステージ駆動方法及び該方法を用いたレーザ加工装置 |
| JP2009123875A (ja) * | 2007-11-14 | 2009-06-04 | Tokyo Seimitsu Co Ltd | レーザーダイシング方法 |
| JP2012146723A (ja) * | 2011-01-07 | 2012-08-02 | Disco Abrasive Syst Ltd | ダイシング加工装置 |
| JP5777415B2 (ja) * | 2011-06-10 | 2015-09-09 | 株式会社ディスコ | 分割予定ライン検出方法 |
| TWI516327B (zh) * | 2012-11-30 | 2016-01-11 | Lts有限公司 | 用於控制雷射圖案成形裝置之階段的方法 |
| JP2018120913A (ja) * | 2017-01-24 | 2018-08-02 | 株式会社ディスコ | レーザー加工装置 |
| JP7032050B2 (ja) * | 2017-03-14 | 2022-03-08 | 株式会社ディスコ | レーザー加工装置 |
| JP7313128B2 (ja) * | 2018-10-04 | 2023-07-24 | 浜松ホトニクス株式会社 | 撮像装置、レーザ加工装置、及び、撮像方法 |
| JP7644328B2 (ja) * | 2020-07-14 | 2025-03-12 | 株式会社東京精密 | レーザ加工装置、ウェーハ加工システム及びレーザ加工装置の制御方法 |
| JP7487045B2 (ja) * | 2020-08-20 | 2024-05-20 | 浜松ホトニクス株式会社 | レーザ加工装置 |
-
2022
- 2022-04-18 US US18/857,213 patent/US20250285888A1/en active Pending
- 2022-04-18 CN CN202280094648.2A patent/CN118900742A/zh active Pending
- 2022-04-18 DE DE112022006866.3T patent/DE112022006866T5/de active Pending
- 2022-04-18 WO PCT/JP2022/018063 patent/WO2023203613A1/ja not_active Ceased
- 2022-04-18 KR KR1020247030035A patent/KR102948781B1/ko active Active
- 2022-04-18 JP JP2024515755A patent/JP7571345B2/ja active Active
- 2022-06-20 TW TW111122836A patent/TWI840841B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5037082B1 (https=) | 1970-12-31 | 1975-11-29 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI840841B (zh) | 2024-05-01 |
| TW202342215A (zh) | 2023-11-01 |
| KR20240148879A (ko) | 2024-10-11 |
| WO2023203613A1 (ja) | 2023-10-26 |
| JP7571345B2 (ja) | 2024-10-22 |
| CN118900742A (zh) | 2024-11-05 |
| US20250285888A1 (en) | 2025-09-11 |
| KR102948781B1 (ko) | 2026-04-06 |
| JPWO2023203613A1 (https=) | 2023-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed |