DE112014001376T5 - Suszeptorhalterungswelle mit Gleichförmigkeitsabstimmungslinsen für einen EPI-Prozess - Google Patents

Suszeptorhalterungswelle mit Gleichförmigkeitsabstimmungslinsen für einen EPI-Prozess Download PDF

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Publication number
DE112014001376T5
DE112014001376T5 DE112014001376.5T DE112014001376T DE112014001376T5 DE 112014001376 T5 DE112014001376 T5 DE 112014001376T5 DE 112014001376 T DE112014001376 T DE 112014001376T DE 112014001376 T5 DE112014001376 T5 DE 112014001376T5
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DE
Germany
Prior art keywords
susceptor
support shaft
substrate
refractive element
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
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DE112014001376.5T
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German (de)
English (en)
Inventor
Zhepeng Cong
Balasubramanian Ramachandran
Masato Ishii
Xuebin Li
Mehmet Tugrul Samir
Shu-Kwan Lau
Paul Brillhart
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Applied Materials Inc
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Applied Materials Inc
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Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of DE112014001376T5 publication Critical patent/DE112014001376T5/de
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00—Details of electric heating devices
    • H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227—Applications
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/032—Heaters specially adapted for heating by radiation heating
DE112014001376.5T 2013-03-15 2014-02-14 Suszeptorhalterungswelle mit Gleichförmigkeitsabstimmungslinsen für einen EPI-Prozess Withdrawn DE112014001376T5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361798503P 2013-03-15 2013-03-15
US61/798,503 2013-03-15
PCT/US2014/016608 WO2014143499A1 (en) 2013-03-15 2014-02-14 Susceptor support shaft with uniformity tuning lenses for epi process

Publications (1)

Publication Number Publication Date
DE112014001376T5 true DE112014001376T5 (de) 2015-11-26

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DE112014001376.5T Withdrawn DE112014001376T5 (de) 2013-03-15 2014-02-14 Suszeptorhalterungswelle mit Gleichförmigkeitsabstimmungslinsen für einen EPI-Prozess

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Country Link
US (1) US9532401B2 (https=)
JP (2) JP6396409B2 (https=)
KR (1) KR101819095B1 (https=)
CN (1) CN105027275B (https=)
DE (1) DE112014001376T5 (https=)
TW (1) TWI598936B (https=)
WO (1) WO2014143499A1 (https=)

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US12134835B2 (en) * 2021-09-01 2024-11-05 Applied Materials, Inc. Quartz susceptor for accurate non-contact temperature measurement
KR20230122477A (ko) * 2022-02-14 2023-08-22 주성엔지니어링(주) 기판 처리 장치
WO2023220681A1 (en) * 2022-05-12 2023-11-16 Watlow Electric Manufacturing Company Hybrid shaft assembly for thermal control in heated semiconductor pedestals
US12308207B2 (en) * 2022-08-18 2025-05-20 Applied Materials Israel Ltd. Enhanced deposition rate by thermal isolation cover for GIS manipulator
CN117821947A (zh) * 2022-09-29 2024-04-05 中微半导体设备(上海)股份有限公司 一种石英部件及其制作方法以及基片处理设备
CN116024655A (zh) * 2022-11-30 2023-04-28 西安奕斯伟材料科技有限公司 硅片外延生长基座支撑架及装置
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Also Published As

Publication number Publication date
TW201435979A (zh) 2014-09-16
US9532401B2 (en) 2016-12-27
JP2016519208A (ja) 2016-06-30
WO2014143499A1 (en) 2014-09-18
KR101819095B1 (ko) 2018-01-16
US20140263268A1 (en) 2014-09-18
JP6396409B2 (ja) 2018-09-26
CN105027275B (zh) 2018-06-26
CN105027275A (zh) 2015-11-04
TWI598936B (zh) 2017-09-11
JP6577104B2 (ja) 2019-09-18
KR20150130479A (ko) 2015-11-23
JP2019016800A (ja) 2019-01-31

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