DE112008000366T5 - Ceroxid und Verfahren zu dessen Herstellung - Google Patents

Ceroxid und Verfahren zu dessen Herstellung Download PDF

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Publication number
DE112008000366T5
DE112008000366T5 DE112008000366T DE112008000366T DE112008000366T5 DE 112008000366 T5 DE112008000366 T5 DE 112008000366T5 DE 112008000366 T DE112008000366 T DE 112008000366T DE 112008000366 T DE112008000366 T DE 112008000366T DE 112008000366 T5 DE112008000366 T5 DE 112008000366T5
Authority
DE
Germany
Prior art keywords
ceria
cerium
polishing
slurry
particle size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE112008000366T
Other languages
German (de)
English (en)
Inventor
Shuji Ageo Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Kinzoku Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Publication of DE112008000366T5 publication Critical patent/DE112008000366T5/de
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224—Oxides or hydroxides of lanthanides
    • C01F17/235—Cerium oxides or hydroxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/54—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
    • B01J23/56—Platinum group metals
    • B01J23/63—Platinum group metals with rare earths or actinides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/10—Preparation or treatment, e.g. separation or purification
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/60—Compounds characterised by their crystallite size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Geology (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
DE112008000366T 2007-09-13 2008-09-04 Ceroxid und Verfahren zu dessen Herstellung Ceased DE112008000366T5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007-237484 2007-09-13
JP2007237484A JP4294710B2 (ja) 2007-09-13 2007-09-13 酸化セリウム及びその製造方法
PCT/JP2008/065937 WO2009034905A1 (ja) 2007-09-13 2008-09-04 酸化セリウム及びその製造方法

Publications (1)

Publication Number Publication Date
DE112008000366T5 true DE112008000366T5 (de) 2009-12-10

Family

ID=40451914

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112008000366T Ceased DE112008000366T5 (de) 2007-09-13 2008-09-04 Ceroxid und Verfahren zu dessen Herstellung

Country Status (5)

Country Link
US (1) US20100058671A1 (https=)
JP (1) JP4294710B2 (https=)
KR (1) KR20090079976A (https=)
DE (1) DE112008000366T5 (https=)
WO (1) WO2009034905A1 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010275179A (ja) * 2009-04-28 2010-12-09 Tsurumi Soda Co Ltd セリウムの回収方法
JP5574527B2 (ja) * 2009-12-25 2014-08-20 日揮触媒化成株式会社 酸化セリウム微粒子の製造方法
WO2011111421A1 (ja) 2010-03-12 2011-09-15 日立化成工業株式会社 スラリ、研磨液セット、研磨液及びこれらを用いた基板の研磨方法
CN103497732B (zh) * 2010-11-22 2016-08-10 日立化成株式会社 悬浮液、研磨液套剂、研磨液、基板的研磨方法及基板
CN103222036B (zh) 2010-11-22 2016-11-09 日立化成株式会社 悬浮液、研磨液套剂、研磨液、基板的研磨方法及基板
KR20130129398A (ko) * 2010-11-22 2013-11-28 히타치가세이가부시끼가이샤 지립의 제조 방법, 슬러리의 제조 방법 및 연마액의 제조 방법
CN104137232A (zh) 2012-02-21 2014-11-05 日立化成株式会社 研磨剂、研磨剂组和基体的研磨方法
JP6044629B2 (ja) 2012-02-21 2016-12-14 日立化成株式会社 研磨剤、研磨剤セット及び基体の研磨方法
JP5943073B2 (ja) 2012-05-22 2016-06-29 日立化成株式会社 スラリー、研磨液セット、研磨液及び基体の研磨方法
WO2013175854A1 (ja) 2012-05-22 2013-11-28 日立化成株式会社 スラリー、研磨液セット、研磨液、基体の研磨方法及び基体
CN104321852B (zh) 2012-05-22 2016-12-28 日立化成株式会社 悬浮液、研磨液套剂、研磨液、基体的研磨方法及基体
WO2014156114A1 (ja) * 2013-03-25 2014-10-02 Hoya株式会社 情報記録媒体用ガラス基板の製造方法
WO2014208379A1 (ja) * 2013-06-27 2014-12-31 コニカミノルタ株式会社 研磨材、研磨材の製造方法及び研磨加工方法
JP2019131447A (ja) * 2018-02-02 2019-08-08 ヒロセホールディングス株式会社 酸化セリウム微粒子の製造方法
US11384254B2 (en) * 2020-04-15 2022-07-12 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing composition containing composite silica particles, method of making the silica composite particles and method of polishing a substrate
TWI896411B (zh) * 2020-08-31 2025-09-01 南韓商秀博瑞殷股份有限公司 氧化鈰粒子、其製造方法、包含其的化學機械研磨用漿料組合物以及半導體器件的製造方法
JP7601266B2 (ja) * 2021-06-11 2024-12-17 Dic株式会社 セリア粒子及びその製造方法
EP4640634A1 (en) * 2022-12-23 2025-10-29 Toray Industries, Inc. Cerium oxide nanoparticles and production method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09142840A (ja) 1995-11-20 1997-06-03 Mitsui Mining & Smelting Co Ltd 酸化セリウム超微粒子及びその製造方法
JP2000203834A (ja) 1998-12-28 2000-07-25 Kose Corp 超微粒子酸化セリウム及び超微粒子金属酸化物・酸化セリウム複合体、その製造方法並びにそれを配合した樹脂組成物及び化粧料
JP2001253709A (ja) 2000-03-09 2001-09-18 Sumitomo Chem Co Ltd 結晶性酸化第二セリウム粒子の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5174984A (en) * 1987-06-29 1992-12-29 Rhone-Poulenc Chimie Ceric oxide with new morphological characteristics and method for obtaining same
KR100336598B1 (ko) * 1996-02-07 2002-05-16 이사오 우치가사키 산화 세륨 연마제 제조용 산화 세륨 입자
JP4067759B2 (ja) * 2000-11-17 2008-03-26 株式会社コーセー 酸化亜鉛固溶酸化セリウムの製造方法
JP2006249129A (ja) * 2005-03-08 2006-09-21 Hitachi Chem Co Ltd 研磨剤の製造方法及び研磨剤
CN101039876B (zh) * 2005-10-14 2011-07-27 Lg化学株式会社 用于化学机械抛光的二氧化铈粉末的制备方法及使用该粉末制备化学机械抛光浆料的方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09142840A (ja) 1995-11-20 1997-06-03 Mitsui Mining & Smelting Co Ltd 酸化セリウム超微粒子及びその製造方法
JP2000203834A (ja) 1998-12-28 2000-07-25 Kose Corp 超微粒子酸化セリウム及び超微粒子金属酸化物・酸化セリウム複合体、その製造方法並びにそれを配合した樹脂組成物及び化粧料
JP2001253709A (ja) 2000-03-09 2001-09-18 Sumitomo Chem Co Ltd 結晶性酸化第二セリウム粒子の製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JIS R 1629-1997

Also Published As

Publication number Publication date
WO2009034905A1 (ja) 2009-03-19
KR20090079976A (ko) 2009-07-22
JP4294710B2 (ja) 2009-07-15
US20100058671A1 (en) 2010-03-11
JP2009067627A (ja) 2009-04-02

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