DE10392942T5 - Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung - Google Patents

Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung Download PDF

Info

Publication number
DE10392942T5
DE10392942T5 DE10392942T DE10392942T DE10392942T5 DE 10392942 T5 DE10392942 T5 DE 10392942T5 DE 10392942 T DE10392942 T DE 10392942T DE 10392942 T DE10392942 T DE 10392942T DE 10392942 T5 DE10392942 T5 DE 10392942T5
Authority
DE
Germany
Prior art keywords
glass substrate
mask blank
producing
precision polishing
main surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10392942T
Other languages
German (de)
English (en)
Inventor
Kouji Takahashi
Hiroo Itoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of DE10392942T5 publication Critical patent/DE10392942T5/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31—Surface property or characteristic of web, sheet or block
    • Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE10392942T 2002-07-17 2003-07-17 Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung Withdrawn DE10392942T5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-208049 2002-07-17
JP2002208049 2002-07-17
PCT/JP2003/009103 WO2004008247A1 (ja) 2002-07-17 2003-07-17 マスクブランクス用ガラス基板、及びその製造方法

Publications (1)

Publication Number Publication Date
DE10392942T5 true DE10392942T5 (de) 2005-08-11

Family

ID=30112834

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10392942T Withdrawn DE10392942T5 (de) 2002-07-17 2003-07-17 Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung

Country Status (3)

Country Link
US (1) US20040137828A1 (ja)
DE (1) DE10392942T5 (ja)
WO (1) WO2004008247A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009019122A1 (de) * 2009-04-29 2010-08-26 Carl Zeiss Smt Ag Verfahren zur Herstellung einer Projektionsbelichtungsanlage für die Mikrolithographie
DE102022200021A1 (de) 2022-01-04 2022-12-29 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004014954A1 (de) * 2003-03-27 2005-03-10 Hoya Corp Verfahren zur Herstellung eines Glassubstrats für einen Maskenrohling und Verfahren zur Herstellung eines Maskenrohlings
DE102005046135B4 (de) 2004-09-29 2017-04-13 Hoya Corp. Substrat für Maskenrohling, Maskenrohling, Belichtungsmaske und Herstellungsverfahren für Maskenrohlingssubstrat
KR100745065B1 (ko) * 2004-12-27 2007-08-01 주식회사 하이닉스반도체 위상반전 마스크의 성장성 이물질 제거방법
JP2008293552A (ja) * 2007-05-22 2008-12-04 Fujitsu Ltd 基板、磁気記録媒体及びその製造方法、並びに磁気記憶装置
JP2009167086A (ja) * 2007-12-18 2009-07-30 Hoya Corp 携帯端末用カバーガラス及びその製造方法、並びに携帯端末装置
US8673163B2 (en) * 2008-06-27 2014-03-18 Apple Inc. Method for fabricating thin sheets of glass
US7810355B2 (en) 2008-06-30 2010-10-12 Apple Inc. Full perimeter chemical strengthening of substrates
JP5321594B2 (ja) * 2008-10-17 2013-10-23 コニカミノルタ株式会社 ガラス基板の製造方法、および磁気記録媒体の製造方法
JP5616907B2 (ja) 2009-03-02 2014-10-29 アップル インコーポレイテッド ポータブル電子デバイスのガラスカバーを強化する技術
US9778685B2 (en) 2011-05-04 2017-10-03 Apple Inc. Housing for portable electronic device with reduced border region
US9213451B2 (en) 2010-06-04 2015-12-15 Apple Inc. Thin glass for touch panel sensors and methods therefor
US10189743B2 (en) 2010-08-18 2019-01-29 Apple Inc. Enhanced strengthening of glass
US8824140B2 (en) 2010-09-17 2014-09-02 Apple Inc. Glass enclosure
US10781135B2 (en) 2011-03-16 2020-09-22 Apple Inc. Strengthening variable thickness glass
US9725359B2 (en) 2011-03-16 2017-08-08 Apple Inc. Electronic device having selectively strengthened glass
US9128666B2 (en) 2011-05-04 2015-09-08 Apple Inc. Housing for portable electronic device with reduced border region
US9944554B2 (en) 2011-09-15 2018-04-17 Apple Inc. Perforated mother sheet for partial edge chemical strengthening and method therefor
US9516149B2 (en) 2011-09-29 2016-12-06 Apple Inc. Multi-layer transparent structures for electronic device housings
US10144669B2 (en) 2011-11-21 2018-12-04 Apple Inc. Self-optimizing chemical strengthening bath for glass
US8684613B2 (en) 2012-01-10 2014-04-01 Apple Inc. Integrated camera window
US10133156B2 (en) 2012-01-10 2018-11-20 Apple Inc. Fused opaque and clear glass for camera or display window
US8773848B2 (en) 2012-01-25 2014-07-08 Apple Inc. Fused glass device housings
US9946302B2 (en) 2012-09-19 2018-04-17 Apple Inc. Exposed glass article with inner recessed area for portable electronic device housing
WO2014050700A1 (ja) * 2012-09-26 2014-04-03 大日本印刷株式会社 ガラス再生処理方法および再生ガラス基板とそれを用いたフォトマスクブランクスとフォトマスク
US9459661B2 (en) 2013-06-19 2016-10-04 Apple Inc. Camouflaged openings in electronic device housings
US9886062B2 (en) 2014-02-28 2018-02-06 Apple Inc. Exposed glass article with enhanced stiffness for portable electronic device housing
JP6154860B2 (ja) * 2015-07-17 2017-06-28 野村マイクロ・サイエンス株式会社 洗浄用水素水の製造方法及び製造装置
US11676827B2 (en) * 2016-03-08 2023-06-13 Ebara Corporation Substrate cleaning apparatus, substrate cleaning method, substrate processing apparatus, and substrate drying apparatus
CN106217235B (zh) * 2016-07-20 2018-02-23 华侨大学 蓝宝石晶片腐蚀抛光复合加工方法
CN109031883A (zh) * 2018-08-23 2018-12-18 苏州瑞而美光电科技有限公司 一种报废光刻掩膜版的回收处理方法
TW202106647A (zh) * 2019-05-15 2021-02-16 美商康寧公司 在高溫下用高濃度鹼金屬氫氧化物減少紋理化玻璃、玻璃陶瓷以及陶瓷製品之厚度的方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2372536A (en) * 1942-05-08 1945-03-27 Alncin Inc Method of producing optical surfaces and the like
US3171768A (en) * 1961-04-25 1965-03-02 Ball Brothers Co Inc Method of detecting flaws in glass surfaces and solution used therefor
JPS486925B1 (ja) * 1966-08-31 1973-03-01
JPS63114866A (ja) * 1986-10-31 1988-05-19 Hoya Corp ガラスの加工方法
US6120942A (en) * 1997-02-18 2000-09-19 Micron Technology, Inc. Method for making a photomask with multiple absorption levels
US6106979A (en) * 1997-12-30 2000-08-22 Micron Technology, Inc. Use of attenuating phase-shifting mask for improved printability of clear-field patterns
US6319634B1 (en) * 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
JP3959588B2 (ja) * 1999-05-13 2007-08-15 日本板硝子株式会社 情報記録媒体用ガラス基板、情報記録媒体用ガラス基板の製造方法及び情報記録媒体
FR2797060B1 (fr) * 1999-07-29 2001-09-14 Commissariat Energie Atomique Structure pour masque de lithographie en reflexion et procede pour sa realisation
US6541168B2 (en) * 2000-04-28 2003-04-01 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
TWI268286B (en) * 2000-04-28 2006-12-11 Kao Corp Roll-off reducing agent
JP3377500B2 (ja) * 2000-05-26 2003-02-17 三井金属鉱業株式会社 磁気記録媒体用ガラス基板の製造方法
JP3351419B2 (ja) * 2000-06-16 2002-11-25 日本板硝子株式会社 情報記録媒体用ガラス基板の製造方法
US6737201B2 (en) * 2000-11-22 2004-05-18 Hoya Corporation Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device
JP3874066B2 (ja) * 2000-12-27 2007-01-31 信越化学工業株式会社 シリカガラス基板の選別方法
US6596042B1 (en) * 2001-11-16 2003-07-22 Ferro Corporation Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009019122A1 (de) * 2009-04-29 2010-08-26 Carl Zeiss Smt Ag Verfahren zur Herstellung einer Projektionsbelichtungsanlage für die Mikrolithographie
DE102022200021A1 (de) 2022-01-04 2022-12-29 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements

Also Published As

Publication number Publication date
US20040137828A1 (en) 2004-07-15
WO2004008247A1 (ja) 2004-01-22

Similar Documents

Publication Publication Date Title
DE10392942T5 (de) Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung
DE102006008734A1 (de) Verfahren zum Herstellen eines transparenten Maskenrohlingsubstrats, Verfahren zum Herstellen eines Maskenrohlings und Verfahren zum Herstellen einer Belichtungsmaske
DE102009036618B4 (de) Herstellungsverfahren für ein Maskenrohlingsubstrat, für einen Maskenrohling, für eine Photomaske und für ein Halbleiterbauelement
US10429728B2 (en) Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method
DE112006003221T5 (de) Glassubstrat für eine Maskenvorform und Polierverfahren zur Herstellung desselben
DE102009043442A1 (de) Maskenrohlingssubstrat und Maskenrohlingssatz
KR101022600B1 (ko) 그레이 톤 마스크 블랭크, 그레이 톤 마스크 및 그 제조방법
US7732101B2 (en) Method of producing a glass substrate for a mask blank by polishing with an alkaline polishing liquid that contains colloidal silica abrasive grains
EP1758962B1 (en) Polishing method for glass substrate, and glass substrate
DE112004000465B4 (de) Retikelsubstrat, Verfahren zum Herstellen des Substrats, Maskenrohling und Verfahren zum Herstellen des Maskenrohlings
JP5090633B2 (ja) ガラス基板の研磨方法
US20150017574A1 (en) Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
DE112009002622T5 (de) Maskenrohlingsubstrat
DE102004035617B4 (de) Verfahren zur Herstellung von Substraten für Fotomaskenrohlinge
DE102004035560B4 (de) Substrat für Fotomaskenrohling, Fotomaskenrohling und Fotomaske
JP5578708B2 (ja) Ｆｐｄ製造用再生フォトマスク基板の製造方法、再生フォトマスク用ブランクの製造方法、ペリクル付再生フォトマスクの製造方法及びパターン転写方法
JP3764734B2 (ja) マスクブランクスの製造方法
KR20210116244A (ko) 포토마스크 블랭크, 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 표시 장치의 제조 방법
DE102007052052A1 (de) Verfahren zum Erkennen von Wiederholungsdefekten in Lithographiemasken auf der Grundlage von Testsubstraten, die unter veränderlichen Bedingungen belichtet werden
DE102004035559B4 (de) Verfahren zur Auswahl von Substraten für Fotomaskenrohlinge
JP2006146250A (ja) マスクブランクス用ガラス基板、及び転写マスク
DE102017202649A1 (de) Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements
JP6372007B2 (ja) マスクブランク用ガラス基板
EP0965036B1 (de) Standard zur kalibrierung und überprüfung eines oberflächeninspektions-gerätes und verfahren zur herstellung des standards
DE602005004175T2 (de) Reflektierende lithographiemaske und verfahren zu deren herstellung

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: G03F0001140000

Ipc: G03F0001600000

R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: G03F0001000000

Ipc: G03F0001600000

Effective date: 20111212

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20130201