DE10328327B4 - Strahlungsdetektor für Bildgebungsarrays - Google Patents
Strahlungsdetektor für Bildgebungsarrays Download PDFInfo
- Publication number
- DE10328327B4 DE10328327B4 DE10328327A DE10328327A DE10328327B4 DE 10328327 B4 DE10328327 B4 DE 10328327B4 DE 10328327 A DE10328327 A DE 10328327A DE 10328327 A DE10328327 A DE 10328327A DE 10328327 B4 DE10328327 B4 DE 10328327B4
- Authority
- DE
- Germany
- Prior art keywords
- data line
- thin film
- film transistor
- dielectric layer
- radiation detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 15
- 238000003384 imaging method Methods 0.000 title description 6
- 238000003491 array Methods 0.000 title description 4
- 239000010409 thin film Substances 0.000 claims abstract description 54
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 238000001465 metallisation Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 21
- 238000000059 patterning Methods 0.000 description 18
- 238000000151 deposition Methods 0.000 description 17
- 238000005530 etching Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 230000008021 deposition Effects 0.000 description 10
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- -1 silicon nitrides Chemical class 0.000 description 5
- 238000002161 passivation Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/189—X-ray, gamma-ray or corpuscular radiation imagers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/016—Manufacture or treatment of image sensors covered by group H10F39/12 of thin-film-based image sensors
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/183904 | 2002-06-25 | ||
| US10/183,904 US6784434B2 (en) | 2002-06-25 | 2002-06-25 | Imaging array and method for manufacturing same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE10328327A1 DE10328327A1 (de) | 2004-03-18 |
| DE10328327B4 true DE10328327B4 (de) | 2012-07-12 |
Family
ID=29735217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10328327A Expired - Lifetime DE10328327B4 (de) | 2002-06-25 | 2003-06-24 | Strahlungsdetektor für Bildgebungsarrays |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6784434B2 (https=) |
| JP (1) | JP2004048000A (https=) |
| DE (1) | DE10328327B4 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100683526B1 (ko) * | 2000-12-29 | 2007-02-15 | 엘지.필립스 엘시디 주식회사 | 엑스-선 검출소자 및 그의 제조방법 |
| KR100730066B1 (ko) * | 2000-12-29 | 2007-06-20 | 엘지.필립스 엘시디 주식회사 | 엑스-선 검출소자 및 그 제조방법 |
| US7081628B2 (en) * | 2003-11-10 | 2006-07-25 | Ge Medical Systems Global Technology Company, Llc | Spatially patterned light-blocking layers for radiation imaging detectors |
| KR100626009B1 (ko) * | 2004-06-30 | 2006-09-20 | 삼성에스디아이 주식회사 | 박막 트랜지스터 구조체 및 이를 구비하는 평판디스플레이 장치 |
| WO2007136372A1 (en) * | 2006-05-22 | 2007-11-29 | Thomson Licensing | Video system having a touch screen |
| JP5286691B2 (ja) * | 2007-05-14 | 2013-09-11 | 三菱電機株式会社 | フォトセンサー |
| US7687790B2 (en) * | 2007-06-07 | 2010-03-30 | General Electric Company | EMI shielding of digital x-ray detectors with non-metallic enclosures |
| US9935152B2 (en) * | 2012-12-27 | 2018-04-03 | General Electric Company | X-ray detector having improved noise performance |
| US9917133B2 (en) | 2013-12-12 | 2018-03-13 | General Electric Company | Optoelectronic device with flexible substrate |
| WO2015138329A1 (en) | 2014-03-13 | 2015-09-17 | General Electric Company | Curved digital x-ray detector for weld inspection |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0964451A2 (en) * | 1998-06-02 | 1999-12-15 | Canon Kabushiki Kaisha | Photosensor and radiation detection system |
| US20010022363A1 (en) * | 2000-03-07 | 2001-09-20 | Hisashi Nagata | Image sensor and method of manufacturing the same |
| US6297862B1 (en) * | 1996-10-16 | 2001-10-02 | Seiko Epson Corporation | Light shielding structure of a substrate for a liquid crystal device, liquid crystal device and projection type display device |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5198673A (en) * | 1992-01-23 | 1993-03-30 | General Electric Company | Radiation image detector with optical gain selenium photosensors |
| US5399884A (en) * | 1993-11-10 | 1995-03-21 | General Electric Company | Radiation imager with single passivation dielectric for transistor and diode |
| US5435608A (en) * | 1994-06-17 | 1995-07-25 | General Electric Company | Radiation imager with common passivation dielectric for gate electrode and photosensor |
| US5838054A (en) * | 1996-12-23 | 1998-11-17 | General Electric Company | Contact pads for radiation imagers |
| KR100443902B1 (ko) * | 1999-03-25 | 2004-08-09 | 엘지.필립스 엘시디 주식회사 | 엑스레이 영상 감지소자 및 그 제조방법 |
| KR100630880B1 (ko) * | 1999-12-31 | 2006-10-02 | 엘지.필립스 엘시디 주식회사 | 엑스레이 영상 감지소자 및 그 제조방법 |
| KR100763137B1 (ko) * | 2000-12-29 | 2007-10-02 | 엘지.필립스 엘시디 주식회사 | 엑스-선 검출소자 및 그의 제조방법 |
| US6847039B2 (en) * | 2001-03-28 | 2005-01-25 | Canon Kabushiki Kaisha | Photodetecting device, radiation detecting device, and radiation imaging system |
| KR100396162B1 (ko) * | 2001-11-01 | 2003-08-27 | 엘지.필립스 엘시디 주식회사 | 엑스-선 감지장치의 구동방법 및 장치 |
| US6777685B2 (en) * | 2002-04-03 | 2004-08-17 | General Electric Company | Imaging array and methods for fabricating same |
-
2002
- 2002-06-25 US US10/183,904 patent/US6784434B2/en not_active Expired - Lifetime
-
2003
- 2003-06-24 DE DE10328327A patent/DE10328327B4/de not_active Expired - Lifetime
- 2003-06-25 JP JP2003180550A patent/JP2004048000A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6297862B1 (en) * | 1996-10-16 | 2001-10-02 | Seiko Epson Corporation | Light shielding structure of a substrate for a liquid crystal device, liquid crystal device and projection type display device |
| EP0964451A2 (en) * | 1998-06-02 | 1999-12-15 | Canon Kabushiki Kaisha | Photosensor and radiation detection system |
| US20010022363A1 (en) * | 2000-03-07 | 2001-09-20 | Hisashi Nagata | Image sensor and method of manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004048000A (ja) | 2004-02-12 |
| DE10328327A1 (de) | 2004-03-18 |
| US20030234364A1 (en) | 2003-12-25 |
| US6784434B2 (en) | 2004-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division | ||
| R006 | Appeal filed | ||
| R007 | Decision rectified on appeal | ||
| R018 | Grant decision by examination section/examining division | ||
| R020 | Patent grant now final |
Effective date: 20121013 |
|
| R071 | Expiry of right |