DE102013112396B3 - Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas - Google Patents

Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas Download PDF

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Publication number
DE102013112396B3
DE102013112396B3 DE102013112396.1A DE102013112396A DE102013112396B3 DE 102013112396 B3 DE102013112396 B3 DE 102013112396B3 DE 102013112396 A DE102013112396 A DE 102013112396A DE 102013112396 B3 DE102013112396 B3 DE 102013112396B3
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DE
Germany
Prior art keywords
fluorine
sio
tio
doped
titanium
Prior art date
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DE102013112396.1A
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German (de)
English (en)
Inventor
Stefan Ochs
Klaus Becker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Heraeus Quarzglas GmbH and Co KG filed Critical Heraeus Quarzglas GmbH and Co KG
Priority to DE102013112396.1A priority Critical patent/DE102013112396B3/de
Priority to TW103136400A priority patent/TWI572568B/zh
Priority to PCT/EP2014/073921 priority patent/WO2015071167A1/de
Priority to CN201480061478.3A priority patent/CN105683102A/zh
Priority to EP14793584.5A priority patent/EP3068735A1/de
Priority to US15/035,776 priority patent/US20170217814A2/en
Priority to JP2016530157A priority patent/JP6651445B2/ja
Priority to KR1020167015089A priority patent/KR102174836B1/ko
Application granted granted Critical
Publication of DE102013112396B3 publication Critical patent/DE102013112396B3/de
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C03B19/1461—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering for doping the shaped article with flourine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
DE102013112396.1A 2013-11-12 2013-11-12 Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas Active DE102013112396B3 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE102013112396.1A DE102013112396B3 (de) 2013-11-12 2013-11-12 Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas
TW103136400A TWI572568B (zh) 2013-11-12 2014-10-22 摻鈦和氟之高矽酸含量玻璃胚件之製造方法
CN201480061478.3A CN105683102A (zh) 2013-11-12 2014-11-06 由具有高硅酸含量的钛和氟掺杂玻璃制造坯料的方法
EP14793584.5A EP3068735A1 (de) 2013-11-12 2014-11-06 Verfahren zur herstellung eines rohlings aus titan- und fluor-dotiertem, hochkieselsäurehaltigem glas
PCT/EP2014/073921 WO2015071167A1 (de) 2013-11-12 2014-11-06 Verfahren zur herstellung eines rohlings aus titan- und fluor-dotiertem, hochkieselsäurehaltigem glas
US15/035,776 US20170217814A2 (en) 2013-11-12 2014-11-06 Method for producing a blank from titanium- and fluorine-doped glass having a high silicic-acid content
JP2016530157A JP6651445B2 (ja) 2013-11-12 2014-11-06 チタンおよびフッ素でドープされた、高ケイ酸含量のガラスからなるブランクの製造法
KR1020167015089A KR102174836B1 (ko) 2013-11-12 2014-11-06 높은 규산 함량을 갖는 티탄 도핑 유리 및 플루오르 도핑 유리로부터 블랭크의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102013112396.1A DE102013112396B3 (de) 2013-11-12 2013-11-12 Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas

Publications (1)

Publication Number Publication Date
DE102013112396B3 true DE102013112396B3 (de) 2014-11-13

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DE102013112396.1A Active DE102013112396B3 (de) 2013-11-12 2013-11-12 Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas

Country Status (8)

Country Link
US (1) US20170217814A2 (https=)
EP (1) EP3068735A1 (https=)
JP (1) JP6651445B2 (https=)
KR (1) KR102174836B1 (https=)
CN (1) CN105683102A (https=)
DE (1) DE102013112396B3 (https=)
TW (1) TWI572568B (https=)
WO (1) WO2015071167A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016094494A3 (en) * 2014-12-12 2016-10-06 Corning Incorporated Doped ultra-low expansion glass and methods for making the same

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3034476A1 (de) * 2014-12-16 2016-06-22 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung
US9932261B2 (en) 2015-11-23 2018-04-03 Corning Incorporated Doped ultra-low expansion glass and methods for annealing the same
JP7122997B2 (ja) * 2019-04-05 2022-08-22 信越石英株式会社 紫外線吸収性に優れたチタン含有石英ガラス及びその製造方法
KR102539330B1 (ko) * 2021-06-02 2023-06-01 한국세라믹기술원 플라즈마내식성이 우수한 석영유리 및 그 제조방법
CN113340504B (zh) * 2021-07-13 2022-03-01 中国工程物理研究院激光聚变研究中心 一种从熔石英假想温度分布获取残余应力分布的方法
CN116375315B (zh) * 2022-11-29 2024-11-22 湖北菲利华石英玻璃股份有限公司 一种掺钛合成石英砂的制备方法
CN117865436B (zh) * 2024-02-23 2025-09-23 创昇光电科技(苏州)有限公司 一种超低膨胀系数氟化石英玻璃及其制备方法

Citations (3)

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Publication number Priority date Publication date Assignee Title
DE10359951A1 (de) * 2002-12-20 2004-07-08 Coming Inc. Verfahren zur Herstellung von ultratrockenem, Cl-freiem und F-dotiertem hochreinem Quarzglas
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses
WO2011078414A2 (en) * 2009-12-25 2011-06-30 Asahi Glass Company, Limited. Substrate for euvl optical member

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JPS5756335A (en) * 1980-09-16 1982-04-03 Nippon Telegr & Teleph Corp <Ntt> Manufacture of doped silica glass
DE3328709A1 (de) * 1983-08-09 1985-02-28 Bayer Ag, 5090 Leverkusen Drehrohrofen und dessen verwendung
JP2946536B2 (ja) * 1988-07-06 1999-09-06 東ソー株式会社 均質なフッ素含有シリカガラス塊の製造方法
EP0737653B1 (en) * 1995-04-10 1998-01-14 Heraeus Quarzglas GmbH Process for continuously refining of quartz powder
JP2888275B2 (ja) * 1995-04-14 1999-05-10 ヘラウス・クワルツグラス・ゲーエムベーハー 石英粉の連続精製方法
US6039894A (en) * 1997-12-05 2000-03-21 Sri International Production of substantially monodisperse phosphor particles
FR2781475B1 (fr) * 1998-07-23 2000-09-08 Alsthom Cge Alcatel Utilisation d'un creuset en graphite poreux pour traiter des granules de silice
DE19921059A1 (de) * 1999-05-07 2000-11-16 Heraeus Quarzglas Verfahren zum Reinigen von Si0¶2¶-Partikeln, Vorrichtung zur Durchführung des Verfahrens, und nach dem Verfahren hergestellte Körnung
JP4453939B2 (ja) * 1999-09-16 2010-04-21 信越石英株式会社 Ｆ２エキシマレーザー透過用光学シリカガラス部材及びその製造方法
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
FR2825357B1 (fr) * 2001-05-31 2004-04-30 Cit Alcatel Procede de dopage de la silice par du fluor
DE102004060600A1 (de) * 2003-12-18 2005-07-14 Schott Ag Mit Fluor dotiertes Silicatglas und Verwendung eines solchen
JP4957249B2 (ja) * 2004-07-01 2012-06-20 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
US20060162382A1 (en) * 2004-12-30 2006-07-27 Hrdina Kenneth E Method and apparatus for producing oxide particles via flame
US20080004169A1 (en) * 2006-06-28 2008-01-03 Adam James Ellison Ultra low expansion glass and methods for making
JPWO2010131662A1 (ja) * 2009-05-13 2012-11-01 旭硝子株式会社 ＴｉＯ２−ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２−ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材
US8901019B2 (en) * 2012-11-30 2014-12-02 Corning Incorporated Very low CTE slope doped silica-titania glass

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
DE10359951A1 (de) * 2002-12-20 2004-07-08 Coming Inc. Verfahren zur Herstellung von ultratrockenem, Cl-freiem und F-dotiertem hochreinem Quarzglas
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses
WO2011078414A2 (en) * 2009-12-25 2011-06-30 Asahi Glass Company, Limited. Substrate for euvl optical member

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016094494A3 (en) * 2014-12-12 2016-10-06 Corning Incorporated Doped ultra-low expansion glass and methods for making the same

Also Published As

Publication number Publication date
EP3068735A1 (de) 2016-09-21
TWI572568B (zh) 2017-03-01
KR102174836B1 (ko) 2020-11-06
TW201527232A (zh) 2015-07-16
US20170217814A2 (en) 2017-08-03
JP2016536252A (ja) 2016-11-24
WO2015071167A1 (de) 2015-05-21
US20160264447A1 (en) 2016-09-15
CN105683102A (zh) 2016-06-15
JP6651445B2 (ja) 2020-02-19
KR20160083098A (ko) 2016-07-11

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