CN105683102A - 由具有高硅酸含量的钛和氟掺杂玻璃制造坯料的方法 - Google Patents

由具有高硅酸含量的钛和氟掺杂玻璃制造坯料的方法 Download PDF

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Publication number
CN105683102A
CN105683102A CN201480061478.3A CN201480061478A CN105683102A CN 105683102 A CN105683102 A CN 105683102A CN 201480061478 A CN201480061478 A CN 201480061478A CN 105683102 A CN105683102 A CN 105683102A
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China
Prior art keywords
sio
tio
fluorine
aforementioned
soot particles
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CN201480061478.3A
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English (en)
Chinese (zh)
Inventor
S.奥克斯
K.贝克
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Heraeus Quarzglas GmbH and Co KG
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Heraeus Quarzglas GmbH and Co KG
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Publication of CN105683102A publication Critical patent/CN105683102A/zh
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C03B19/1461—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering for doping the shaped article with flourine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
CN201480061478.3A 2013-11-12 2014-11-06 由具有高硅酸含量的钛和氟掺杂玻璃制造坯料的方法 Pending CN105683102A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013112396.1 2013-11-12
DE102013112396.1A DE102013112396B3 (de) 2013-11-12 2013-11-12 Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas
PCT/EP2014/073921 WO2015071167A1 (de) 2013-11-12 2014-11-06 Verfahren zur herstellung eines rohlings aus titan- und fluor-dotiertem, hochkieselsäurehaltigem glas

Publications (1)

Publication Number Publication Date
CN105683102A true CN105683102A (zh) 2016-06-15

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CN201480061478.3A Pending CN105683102A (zh) 2013-11-12 2014-11-06 由具有高硅酸含量的钛和氟掺杂玻璃制造坯料的方法

Country Status (8)

Country Link
US (1) US20170217814A2 (https=)
EP (1) EP3068735A1 (https=)
JP (1) JP6651445B2 (https=)
KR (1) KR102174836B1 (https=)
CN (1) CN105683102A (https=)
DE (1) DE102013112396B3 (https=)
TW (1) TWI572568B (https=)
WO (1) WO2015071167A1 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113340504A (zh) * 2021-07-13 2021-09-03 中国工程物理研究院激光聚变研究中心 一种从熔石英假想温度分布获取残余应力分布的方法
CN113631522A (zh) * 2019-04-05 2021-11-09 信越石英株式会社 具有优异uv吸收的含钛石英玻璃及其生产方法
CN116375315A (zh) * 2022-11-29 2023-07-04 湖北菲利华石英玻璃股份有限公司 一种掺钛合成石英砂的制备方法
CN117865436A (zh) * 2024-02-23 2024-04-12 创昇光电科技(苏州)有限公司 一种超低膨胀系数氟化石英玻璃及其制备方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9611169B2 (en) * 2014-12-12 2017-04-04 Corning Incorporated Doped ultra-low expansion glass and methods for making the same
EP3034476A1 (de) * 2014-12-16 2016-06-22 Heraeus Quarzglas GmbH & Co. KG Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung
US9932261B2 (en) 2015-11-23 2018-04-03 Corning Incorporated Doped ultra-low expansion glass and methods for annealing the same
KR102539330B1 (ko) * 2021-06-02 2023-06-01 한국세라믹기술원 플라즈마내식성이 우수한 석영유리 및 그 제조방법

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03103330A (ja) * 1988-07-06 1991-04-30 Tosoh Corp 均質なフッ素含有シリカガラス塊の製造方法
CN1146429A (zh) * 1995-04-10 1997-04-02 赫罗伊斯石英玻璃有限公司 连续精制石英粉的方法
CN1302277A (zh) * 1999-05-07 2001-07-04 赫罗伊斯石英玻璃股份有限两合公司 提纯SiO2颗粒的方法,及实施该方法的装置及按此方法制备的制粒
WO2002088035A1 (en) * 2001-04-27 2002-11-07 Corning Incorporated Method for producing extreme ultraviolet lithography substrates
CN1398802A (zh) * 2001-05-31 2003-02-26 阿尔卡塔尔公司 掺杂氟的二氧化硅粉末的生产方法
CN1636904A (zh) * 2003-12-18 2005-07-13 肖特公开股份有限公司 掺氟的硅酸盐玻璃及其用途
WO2006004169A1 (en) * 2004-07-01 2006-01-12 Asahi Glass Company, Limited Silica glass containing tio2 and process for its production
CN102421713A (zh) * 2009-05-13 2012-04-18 旭硝子株式会社 TiO2-SiO2玻璃体的制造方法及热处理方法、TiO2-SiO2玻璃体、EUVL用光学基材

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JPS5756335A (en) * 1980-09-16 1982-04-03 Nippon Telegr & Teleph Corp <Ntt> Manufacture of doped silica glass
DE3328709A1 (de) * 1983-08-09 1985-02-28 Bayer Ag, 5090 Leverkusen Drehrohrofen und dessen verwendung
JP2888275B2 (ja) * 1995-04-14 1999-05-10 ヘラウス・クワルツグラス・ゲーエムベーハー 石英粉の連続精製方法
US6039894A (en) * 1997-12-05 2000-03-21 Sri International Production of substantially monodisperse phosphor particles
FR2781475B1 (fr) * 1998-07-23 2000-09-08 Alsthom Cge Alcatel Utilisation d'un creuset en graphite poreux pour traiter des granules de silice
JP4453939B2 (ja) * 1999-09-16 2010-04-21 信越石英株式会社 Ｆ２エキシマレーザー透過用光学シリカガラス部材及びその製造方法
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
US20060179879A1 (en) * 2004-12-29 2006-08-17 Ellison Adam J G Adjusting expansivity in doped silica glasses
US20060162382A1 (en) * 2004-12-30 2006-07-27 Hrdina Kenneth E Method and apparatus for producing oxide particles via flame
US20080004169A1 (en) * 2006-06-28 2008-01-03 Adam James Ellison Ultra low expansion glass and methods for making
JP5510308B2 (ja) * 2009-12-25 2014-06-04 旭硝子株式会社 Ｅｕｖｌ光学部材用基材
US8901019B2 (en) * 2012-11-30 2014-12-02 Corning Incorporated Very low CTE slope doped silica-titania glass

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03103330A (ja) * 1988-07-06 1991-04-30 Tosoh Corp 均質なフッ素含有シリカガラス塊の製造方法
CN1146429A (zh) * 1995-04-10 1997-04-02 赫罗伊斯石英玻璃有限公司 连续精制石英粉的方法
CN1302277A (zh) * 1999-05-07 2001-07-04 赫罗伊斯石英玻璃股份有限两合公司 提纯SiO2颗粒的方法,及实施该方法的装置及按此方法制备的制粒
WO2002088035A1 (en) * 2001-04-27 2002-11-07 Corning Incorporated Method for producing extreme ultraviolet lithography substrates
CN1398802A (zh) * 2001-05-31 2003-02-26 阿尔卡塔尔公司 掺杂氟的二氧化硅粉末的生产方法
CN1636904A (zh) * 2003-12-18 2005-07-13 肖特公开股份有限公司 掺氟的硅酸盐玻璃及其用途
WO2006004169A1 (en) * 2004-07-01 2006-01-12 Asahi Glass Company, Limited Silica glass containing tio2 and process for its production
CN102421713A (zh) * 2009-05-13 2012-04-18 旭硝子株式会社 TiO2-SiO2玻璃体的制造方法及热处理方法、TiO2-SiO2玻璃体、EUVL用光学基材

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113631522A (zh) * 2019-04-05 2021-11-09 信越石英株式会社 具有优异uv吸收的含钛石英玻璃及其生产方法
CN113340504A (zh) * 2021-07-13 2021-09-03 中国工程物理研究院激光聚变研究中心 一种从熔石英假想温度分布获取残余应力分布的方法
CN116375315A (zh) * 2022-11-29 2023-07-04 湖北菲利华石英玻璃股份有限公司 一种掺钛合成石英砂的制备方法
CN116375315B (zh) * 2022-11-29 2024-11-22 湖北菲利华石英玻璃股份有限公司 一种掺钛合成石英砂的制备方法
CN117865436A (zh) * 2024-02-23 2024-04-12 创昇光电科技(苏州)有限公司 一种超低膨胀系数氟化石英玻璃及其制备方法
CN117865436B (zh) * 2024-02-23 2025-09-23 创昇光电科技(苏州)有限公司 一种超低膨胀系数氟化石英玻璃及其制备方法

Also Published As

Publication number Publication date
EP3068735A1 (de) 2016-09-21
TWI572568B (zh) 2017-03-01
KR102174836B1 (ko) 2020-11-06
DE102013112396B3 (de) 2014-11-13
TW201527232A (zh) 2015-07-16
US20170217814A2 (en) 2017-08-03
JP2016536252A (ja) 2016-11-24
WO2015071167A1 (de) 2015-05-21
US20160264447A1 (en) 2016-09-15
JP6651445B2 (ja) 2020-02-19
KR20160083098A (ko) 2016-07-11

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