DE102013103063A1 - Laserbearbeitungsgerät - Google Patents
Laserbearbeitungsgerät Download PDFInfo
- Publication number
- DE102013103063A1 DE102013103063A1 DE102013103063A DE102013103063A DE102013103063A1 DE 102013103063 A1 DE102013103063 A1 DE 102013103063A1 DE 102013103063 A DE102013103063 A DE 102013103063A DE 102013103063 A DE102013103063 A DE 102013103063A DE 102013103063 A1 DE102013103063 A1 DE 102013103063A1
- Authority
- DE
- Germany
- Prior art keywords
- laser light
- laser
- light source
- processed
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 35
- 230000001678 irradiating effect Effects 0.000 claims abstract description 11
- 238000007493 shaping process Methods 0.000 claims abstract description 10
- 230000010287 polarization Effects 0.000 claims description 24
- 229910009372 YVO4 Inorganic materials 0.000 claims description 7
- 229910052594 sapphire Inorganic materials 0.000 claims description 7
- 239000010980 sapphire Substances 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 5
- 238000003754 machining Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2012-0035515 | 2012-04-05 | ||
KR1020120035515A KR101497763B1 (ko) | 2012-04-05 | 2012-04-05 | 레이저 가공 장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE102013103063A1 true DE102013103063A1 (de) | 2013-10-10 |
Family
ID=49210037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102013103063A Withdrawn DE102013103063A1 (de) | 2012-04-05 | 2013-03-26 | Laserbearbeitungsgerät |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2013215804A (ko) |
KR (1) | KR101497763B1 (ko) |
DE (1) | DE102013103063A1 (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6471528B2 (ja) | 2014-02-24 | 2019-02-20 | 株式会社リコー | 物体認識装置、物体認識方法 |
JP6459659B2 (ja) | 2014-03-18 | 2019-01-30 | 株式会社リコー | 画像処理装置、画像処理方法、運転支援システム、プログラム |
KR101825922B1 (ko) * | 2015-08-28 | 2018-03-22 | 주식회사 이오테크닉스 | 레이저 가공장치 및 방법 |
KR101872441B1 (ko) * | 2017-01-26 | 2018-06-28 | 주식회사 이오테크닉스 | 마스크 세정 장치 및 레이저 어닐링 장치 |
TWI842293B (zh) | 2021-12-30 | 2024-05-11 | 南韓商細美事有限公司 | 遮罩處理設備及基板處理設備 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20120035515A (ko) | 2010-10-05 | 2012-04-16 | 엘지이노텍 주식회사 | 태양광 발전장치 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19544502C1 (de) * | 1995-11-29 | 1997-05-15 | Baasel Scheel Lasergraphics Gm | Lasergravuranlage |
US6141030A (en) * | 1997-04-24 | 2000-10-31 | Konica Corporation | Laser exposure unit including plural laser beam sources differing in wavelength |
JPH10315425A (ja) * | 1997-05-20 | 1998-12-02 | Dainippon Screen Mfg Co Ltd | レーザ製版装置 |
JP4322359B2 (ja) * | 1999-07-08 | 2009-08-26 | 住友重機械工業株式会社 | レーザ加工装置 |
JP2003203874A (ja) * | 2002-01-10 | 2003-07-18 | Sharp Corp | レーザ照射装置 |
DE10201476B4 (de) * | 2002-01-16 | 2005-02-24 | Siemens Ag | Laserbearbeitungsvorrichtung |
JP5080009B2 (ja) * | 2005-03-22 | 2012-11-21 | 日立ビアメカニクス株式会社 | 露光方法 |
JP2010115670A (ja) * | 2008-11-11 | 2010-05-27 | Olympus Corp | レーザリペア装置 |
-
2012
- 2012-04-05 KR KR1020120035515A patent/KR101497763B1/ko not_active IP Right Cessation
-
2013
- 2013-03-19 JP JP2013056572A patent/JP2013215804A/ja active Pending
- 2013-03-26 DE DE102013103063A patent/DE102013103063A1/de not_active Withdrawn
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20120035515A (ko) | 2010-10-05 | 2012-04-16 | 엘지이노텍 주식회사 | 태양광 발전장치 |
Also Published As
Publication number | Publication date |
---|---|
KR20130113154A (ko) | 2013-10-15 |
KR101497763B1 (ko) | 2015-03-02 |
JP2013215804A (ja) | 2013-10-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R012 | Request for examination validly filed | ||
R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |