DE102011100468B4 - Mit akustischen Volumenwellen arbeitendes BAW-Filter, Herstellungsverfahren hierfür und Duplexer - Google Patents

Mit akustischen Volumenwellen arbeitendes BAW-Filter, Herstellungsverfahren hierfür und Duplexer Download PDF

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Publication number
DE102011100468B4
DE102011100468B4 DE102011100468A DE102011100468A DE102011100468B4 DE 102011100468 B4 DE102011100468 B4 DE 102011100468B4 DE 102011100468 A DE102011100468 A DE 102011100468A DE 102011100468 A DE102011100468 A DE 102011100468A DE 102011100468 B4 DE102011100468 B4 DE 102011100468B4
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DE
Germany
Prior art keywords
baw
balun
layers
structured
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102011100468A
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German (de)
English (en)
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DE102011100468A1 (de
Inventor
Gerhard Maurer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SnapTrack Inc
Original Assignee
Epcos AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Epcos AG filed Critical Epcos AG
Priority to DE102011100468A priority Critical patent/DE102011100468B4/de
Priority to KR1020137029151A priority patent/KR101889817B1/ko
Priority to US14/115,328 priority patent/US9859868B2/en
Priority to JP2014508782A priority patent/JP6114260B2/ja
Priority to PCT/EP2012/058028 priority patent/WO2012150261A1/de
Publication of DE102011100468A1 publication Critical patent/DE102011100468A1/de
Application granted granted Critical
Publication of DE102011100468B4 publication Critical patent/DE102011100468B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders or supports
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/542—Filters comprising resonators of piezoelectric or electrostrictive material including passive elements
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/0023—Networks for transforming balanced signals into unbalanced signals and vice versa, e.g. baluns, or networks having balanced input and output
    • H03H9/0095—Networks for transforming balanced signals into unbalanced signals and vice versa, e.g. baluns, or networks having balanced input and output using bulk acoustic wave devices
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders or supports
    • H03H9/0538—Constructional combinations of supports or holders with electromechanical or other electronic elements
    • H03H9/0542—Constructional combinations of supports or holders with electromechanical or other electronic elements consisting of a lateral arrangement
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders or supports
    • H03H9/0538—Constructional combinations of supports or holders with electromechanical or other electronic elements
    • H03H9/0566—Constructional combinations of supports or holders with electromechanical or other electronic elements for duplexers
    • H03H9/0571—Constructional combinations of supports or holders with electromechanical or other electronic elements for duplexers including bulk acoustic wave [BAW] devices
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
    • H03H9/703—Networks using bulk acoustic wave devices
    • H03H9/706—Duplexers
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
    • H03H9/72—Networks using surface acoustic waves
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H2003/025—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks comprising an acoustic mirror
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
DE102011100468A 2011-05-04 2011-05-04 Mit akustischen Volumenwellen arbeitendes BAW-Filter, Herstellungsverfahren hierfür und Duplexer Expired - Fee Related DE102011100468B4 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE102011100468A DE102011100468B4 (de) 2011-05-04 2011-05-04 Mit akustischen Volumenwellen arbeitendes BAW-Filter, Herstellungsverfahren hierfür und Duplexer
KR1020137029151A KR101889817B1 (ko) 2011-05-04 2012-05-02 벌크 탄성파를 이용하여 동작하는 ｂａｗ-필터
US14/115,328 US9859868B2 (en) 2011-05-04 2012-05-02 BAW-filter operating using bulk acoustic waves and passive components forming a balun
JP2014508782A JP6114260B2 (ja) 2011-05-04 2012-05-02 音響体積波で動作するｂａｗフィルタ
PCT/EP2012/058028 WO2012150261A1 (de) 2011-05-04 2012-05-02 Mit akustischen volumenwellen arbeitendes baw-filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011100468A DE102011100468B4 (de) 2011-05-04 2011-05-04 Mit akustischen Volumenwellen arbeitendes BAW-Filter, Herstellungsverfahren hierfür und Duplexer

Publications (2)

Publication Number Publication Date
DE102011100468A1 DE102011100468A1 (de) 2012-11-08
DE102011100468B4 true DE102011100468B4 (de) 2013-07-04

Family

ID=46197231

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102011100468A Expired - Fee Related DE102011100468B4 (de) 2011-05-04 2011-05-04 Mit akustischen Volumenwellen arbeitendes BAW-Filter, Herstellungsverfahren hierfür und Duplexer

Country Status (5)

Country Link
US (1) US9859868B2 (enExample)
JP (1) JP6114260B2 (enExample)
KR (1) KR101889817B1 (enExample)
DE (1) DE102011100468B4 (enExample)
WO (1) WO2012150261A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10069474B2 (en) 2015-11-17 2018-09-04 Qualcomm Incorporated Encapsulation of acoustic resonator devices
KR102456843B1 (ko) 2017-12-28 2022-10-21 한국전자통신연구원 발룬을 포함하는 고주파 신호 증폭기
DE102018121689B3 (de) * 2018-09-05 2020-02-13 RF360 Europe GmbH BAW-Resonator mit erhöhter Bandbreite
KR102875955B1 (ko) 2021-09-29 2025-10-24 (주)와이솔 Baw형 공진기를 포함하는 필터
WO2025146559A1 (en) * 2024-01-03 2025-07-10 Skyworks Global Pte. Ltd. Bulk acoustic wave resonator with bragg grating embedded in electrode

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US6670866B2 (en) * 2002-01-09 2003-12-30 Nokia Corporation Bulk acoustic wave resonator with two piezoelectric layers as balun in filters and duplexers
DE102005003834B4 (de) * 2004-09-23 2010-11-04 Samsung Electro-Mechanics Co., Ltd., Suwon Film-Bulk-Acoustic-Resonator-Filter mit unbalancierter-balancierter Eingabe-Ausgabe-Struktur

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US5194836A (en) * 1990-03-26 1993-03-16 Westinghouse Electric Corp. Thin film, microwave frequency manifolded filter bank
US6262637B1 (en) * 1999-06-02 2001-07-17 Agilent Technologies, Inc. Duplexer incorporating thin-film bulk acoustic resonators (FBARs)
DE19962028A1 (de) 1999-12-22 2001-06-28 Philips Corp Intellectual Pty Filteranordnung
US6407649B1 (en) 2001-01-05 2002-06-18 Nokia Corporation Monolithic FBAR duplexer and method of making the same
JP3973915B2 (ja) * 2001-03-30 2007-09-12 株式会社日立メディアエレクトロニクス 高周波フィルタ、高周波回路、アンテナ共用器及び無線端末
US6472954B1 (en) * 2001-04-23 2002-10-29 Agilent Technologies, Inc. Controlled effective coupling coefficients for film bulk acoustic resonators
US6710681B2 (en) * 2001-07-13 2004-03-23 Agilent Technologies, Inc. Thin film bulk acoustic resonator (FBAR) and inductor on a monolithic substrate and method of fabricating the same
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KR100565799B1 (ko) 2003-12-22 2006-03-29 삼성전자주식회사 일체화된 ＦＢＡＲ 및 Ｉｓｏｌａｔｉｏｎ부를 사용하여제조된 듀플렉서 및 그 제조 방법
JP4223428B2 (ja) * 2004-03-31 2009-02-12 富士通メディアデバイス株式会社 フィルタおよびその製造方法
KR100635268B1 (ko) 2004-05-17 2006-10-19 삼성전자주식회사 인덕터가 내장된 필터, 듀플렉서 및 그 제조방법
KR100750736B1 (ko) * 2004-11-10 2007-08-22 삼성전자주식회사 하나의 트리밍 인덕터를 사용하는 필터
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Also Published As

Publication number Publication date
KR20140030177A (ko) 2014-03-11
US20140184358A1 (en) 2014-07-03
JP6114260B2 (ja) 2017-04-12
WO2012150261A1 (de) 2012-11-08
US9859868B2 (en) 2018-01-02
JP2014519234A (ja) 2014-08-07
KR101889817B1 (ko) 2018-08-20
DE102011100468A1 (de) 2012-11-08

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R083 Amendment of/additions to inventor(s)
R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final

Effective date: 20131005

R081 Change of applicant/patentee

Owner name: SNAPTRACK, INC., SAN DIEGO, US

Free format text: FORMER OWNER: EPCOS AG, 81669 MUENCHEN, DE

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Representative=s name: BARDEHLE PAGENBERG PARTNERSCHAFT MBB PATENTANW, DE

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee