DE102011051261A1 - Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu - Google Patents
Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu Download PDFInfo
- Publication number
- DE102011051261A1 DE102011051261A1 DE102011051261A DE102011051261A DE102011051261A1 DE 102011051261 A1 DE102011051261 A1 DE 102011051261A1 DE 102011051261 A DE102011051261 A DE 102011051261A DE 102011051261 A DE102011051261 A DE 102011051261A DE 102011051261 A1 DE102011051261 A1 DE 102011051261A1
- Authority
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- Germany
- Prior art keywords
- temperature
- heat transfer
- transfer surface
- evaporator
- gas stream
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011051261A DE102011051261A1 (de) | 2011-06-22 | 2011-06-22 | Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu |
KR1020147001649A KR101956829B1 (ko) | 2011-06-22 | 2012-06-06 | 증착 방법 및 장치 |
JP2014516262A JP5989107B2 (ja) | 2011-06-22 | 2012-06-06 | 有機出発物質の堆積方法、蒸発装置および堆積装置 |
CN201280030857.7A CN103620086B (zh) | 2011-06-22 | 2012-06-06 | 沉积方法及装置 |
KR1020187022191A KR102035813B1 (ko) | 2011-06-22 | 2012-06-06 | 증착 방법 및 장치 |
PCT/EP2012/060645 WO2012175334A2 (de) | 2011-06-22 | 2012-06-06 | Verfahren und vorrichtung zum abscheiden von oleds insbesondere verdampfungsvorrichtung dazu |
TW101120867A TWI572728B (zh) | 2011-06-22 | 2012-06-11 | A method and apparatus for depositing an OLED, and more particularly to an evaporation apparatus having such use |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011051261A DE102011051261A1 (de) | 2011-06-22 | 2011-06-22 | Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu |
Publications (1)
Publication Number | Publication Date |
---|---|
DE102011051261A1 true DE102011051261A1 (de) | 2012-12-27 |
Family
ID=46210260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102011051261A Pending DE102011051261A1 (de) | 2011-06-22 | 2011-06-22 | Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP5989107B2 (zh) |
KR (2) | KR101956829B1 (zh) |
CN (1) | CN103620086B (zh) |
DE (1) | DE102011051261A1 (zh) |
TW (1) | TWI572728B (zh) |
WO (1) | WO2012175334A2 (zh) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014102484A1 (de) | 2014-02-26 | 2015-08-27 | Aixtron Se | Verwendung eines QCM-Sensors zur Bestimmung der Dampfkonzentration beim OVPD-Verfahren beziehungsweise in einem OVPD-Beschichtungssystem |
EP2963147A2 (de) | 2014-07-01 | 2016-01-06 | Aixtron SE | Vorrichtung zum erzeugen eines dampfes aus einem festen oder flüssigen ausgangsstoff für eine cvd- oder pvd-einrichtung |
DE102014109195A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes aus mehreren flüssigen oder festen Ausgangsstoffen für eine CVD- oder PVD-Einrichtung |
DE102014109194A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes für eine CVD- oder PVD-Einrichtung |
DE102016100625A1 (de) | 2016-01-15 | 2017-07-20 | Aixtron Se | Vorrichtung zum Bereitstellen eines Prozessgases in einer Beschichtungseinrichtung |
DE102017103047A1 (de) * | 2016-11-29 | 2018-05-30 | Aixtron Se | Aerosolverdampfer |
DE102017123233A1 (de) * | 2017-10-06 | 2019-04-11 | Aixtron Se | Vorrichtung und Verfahren zur Erzeugung eines in einem Trägergas transportierten Dampfes |
DE102017126126A1 (de) * | 2017-11-08 | 2019-05-09 | Aixtron Se | Verfahren und Vorrichtung zum Erzeugen eines Dampfes durch die Verwendung von in einem Regelmodus gewonnenen Steuerdaten |
DE102020122800A1 (de) | 2020-09-01 | 2022-03-03 | Apeva Se | Vorrichtung zum Abscheiden von OLED-Schichten mit einer Run-/Vent-Leitung |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014115497A1 (de) * | 2014-10-24 | 2016-05-12 | Aixtron Se | Temperierte Gaszuleitung mit an mehreren Stellen eingespeisten Verdünnungsgasströmen |
DE102017106431A1 (de) * | 2017-03-24 | 2018-09-27 | Aixtron Se | Vorrichtung und Verfahren zum Herabsetzen des Wasserpartialdrucks in einer OVPD-Beschichtungseinrichtung |
DE102017112668A1 (de) * | 2017-06-08 | 2018-12-13 | Aixtron Se | Verfahren zum Abscheiden von OLEDs |
US11459654B2 (en) * | 2020-11-19 | 2022-10-04 | Eugenus, Inc. | Liquid precursor injection for thin film deposition |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
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DE8808098U1 (zh) * | 1988-06-23 | 1988-11-10 | Balzers Hochvakuum Gmbh, 6200 Wiesbaden, De | |
EP0982411A2 (en) * | 1998-08-26 | 2000-03-01 | TDK Corporation | Evaporation source, apparatus and method for the preparation of organic EL device |
US6037241A (en) | 1998-02-19 | 2000-03-14 | First Solar, Llc | Apparatus and method for depositing a semiconductor material |
US20020192375A1 (en) * | 1997-06-02 | 2002-12-19 | Sun James J. | Method and apparatus for vapor generation and film deposition |
WO2006100058A2 (de) * | 2005-03-24 | 2006-09-28 | Creaphys Gmbh | Heizeinrichtung, beschichtungsanlage und verfahren zur verdampfung oder sublimation von beschichtungsmaterialien |
US7238389B2 (en) | 2004-03-22 | 2007-07-03 | Eastman Kodak Company | Vaporizing fluidized organic materials |
DE102006026576A1 (de) | 2006-06-06 | 2008-01-10 | Aixtron Ag | Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs |
US20090039175A1 (en) | 2007-08-06 | 2009-02-12 | Michael Long | Vaporization of thermally sensitive materials |
US7501152B2 (en) | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
WO2010060646A1 (de) * | 2008-11-28 | 2010-06-03 | Volker Probst | Verfahren zum herstellen von halbleiterschichten bzw. von mit elementarem selen und/oder schwefel behandelten beschichteten substraten, insbesondere flächigen substraten |
US20100173067A1 (en) * | 2009-01-07 | 2010-07-08 | Canon Kabushiki Kaisha | Film forming apparatus and film forming method |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
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FR2800754B1 (fr) * | 1999-11-08 | 2003-05-09 | Joint Industrial Processors For Electronics | Dispositif evaporateur d'une installation de depot chimique en phase vapeur |
US6701066B2 (en) * | 2001-10-11 | 2004-03-02 | Micron Technology, Inc. | Delivery of solid chemical precursors |
US20060185597A1 (en) * | 2004-11-29 | 2006-08-24 | Kenji Suzuki | Film precursor evaporation system and method of using |
JP4974504B2 (ja) | 2005-10-13 | 2012-07-11 | 株式会社半導体エネルギー研究所 | 成膜装置、発光装置の作製方法 |
FR2900070B1 (fr) * | 2006-04-19 | 2008-07-11 | Kemstream Soc Par Actions Simp | Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif. |
JP5200551B2 (ja) * | 2008-01-18 | 2013-06-05 | 東京エレクトロン株式会社 | 気化原料供給装置、成膜装置及び気化原料供給方法 |
DE102008026974A1 (de) * | 2008-06-03 | 2009-12-10 | Aixtron Ag | Verfahren und Vorrichtung zum Abscheiden dünner Schichten aus polymeren Para-Xylylene oder substituiertem Para-Xylylene |
US7972443B2 (en) * | 2008-11-14 | 2011-07-05 | Global Oled Technology Llc | Metering of particulate material and vaporization thereof |
WO2010123027A1 (ja) * | 2009-04-24 | 2010-10-28 | 東京エレクトロン株式会社 | 蒸着処理装置および蒸着処理方法 |
KR20110004081A (ko) * | 2009-07-07 | 2011-01-13 | 삼성모바일디스플레이주식회사 | 증착 장치용 캐니스터, 이를 이용한 증착 장치 및 증착 방법 |
-
2011
- 2011-06-22 DE DE102011051261A patent/DE102011051261A1/de active Pending
-
2012
- 2012-06-06 CN CN201280030857.7A patent/CN103620086B/zh active Active
- 2012-06-06 KR KR1020147001649A patent/KR101956829B1/ko active IP Right Grant
- 2012-06-06 KR KR1020187022191A patent/KR102035813B1/ko active IP Right Grant
- 2012-06-06 WO PCT/EP2012/060645 patent/WO2012175334A2/de active Application Filing
- 2012-06-06 JP JP2014516262A patent/JP5989107B2/ja not_active Expired - Fee Related
- 2012-06-11 TW TW101120867A patent/TWI572728B/zh active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE8808098U1 (zh) * | 1988-06-23 | 1988-11-10 | Balzers Hochvakuum Gmbh, 6200 Wiesbaden, De | |
US20020192375A1 (en) * | 1997-06-02 | 2002-12-19 | Sun James J. | Method and apparatus for vapor generation and film deposition |
US6037241A (en) | 1998-02-19 | 2000-03-14 | First Solar, Llc | Apparatus and method for depositing a semiconductor material |
EP0982411A2 (en) * | 1998-08-26 | 2000-03-01 | TDK Corporation | Evaporation source, apparatus and method for the preparation of organic EL device |
US7238389B2 (en) | 2004-03-22 | 2007-07-03 | Eastman Kodak Company | Vaporizing fluidized organic materials |
US7501152B2 (en) | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
WO2006100058A2 (de) * | 2005-03-24 | 2006-09-28 | Creaphys Gmbh | Heizeinrichtung, beschichtungsanlage und verfahren zur verdampfung oder sublimation von beschichtungsmaterialien |
DE102006026576A1 (de) | 2006-06-06 | 2008-01-10 | Aixtron Ag | Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs |
US20090039175A1 (en) | 2007-08-06 | 2009-02-12 | Michael Long | Vaporization of thermally sensitive materials |
WO2010060646A1 (de) * | 2008-11-28 | 2010-06-03 | Volker Probst | Verfahren zum herstellen von halbleiterschichten bzw. von mit elementarem selen und/oder schwefel behandelten beschichteten substraten, insbesondere flächigen substraten |
US20100173067A1 (en) * | 2009-01-07 | 2010-07-08 | Canon Kabushiki Kaisha | Film forming apparatus and film forming method |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014102484A1 (de) | 2014-02-26 | 2015-08-27 | Aixtron Se | Verwendung eines QCM-Sensors zur Bestimmung der Dampfkonzentration beim OVPD-Verfahren beziehungsweise in einem OVPD-Beschichtungssystem |
US10267768B2 (en) | 2014-02-26 | 2019-04-23 | Aixtron Se | Device and method for determining the concentration of a vapor by means of an oscillating body sensor |
US9942946B2 (en) | 2014-07-01 | 2018-04-10 | Aixtron Se | Device for generating vapor from solid or liquid starting material for CVD or PVD apparatus |
US10060022B2 (en) | 2014-07-01 | 2018-08-28 | Aixtron Se | Device and method for generating a vapor for a CVD or PVD device from multiple liquid or solid source materials |
WO2016000958A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und verfahren zum erzeugen eines dampfes für eine cvd- oder pvd-einrichtung |
DE102014109196A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung zum Erzeugen eines Dampfes aus einem festen oder flüssigen Ausgangsstoff für eine CVD- oder PVD-Einrichtung |
US10501847B2 (en) | 2014-07-01 | 2019-12-10 | Aixtron Se | Apparatus and method for generating a vapor for a CVD or PVD device |
DE102014109194A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes für eine CVD- oder PVD-Einrichtung |
DE102014109195A1 (de) | 2014-07-01 | 2016-01-07 | Aixtron Se | Vorrichtung und Verfahren zum Erzeugen eines Dampfes aus mehreren flüssigen oder festen Ausgangsstoffen für eine CVD- oder PVD-Einrichtung |
EP2963147A2 (de) | 2014-07-01 | 2016-01-06 | Aixtron SE | Vorrichtung zum erzeugen eines dampfes aus einem festen oder flüssigen ausgangsstoff für eine cvd- oder pvd-einrichtung |
WO2017121704A1 (de) | 2016-01-15 | 2017-07-20 | Aixtron Se | Vorrichtung zum bereitstellen eines prozessgases in einer beschichtungseinrichtung |
DE102016100625A1 (de) | 2016-01-15 | 2017-07-20 | Aixtron Se | Vorrichtung zum Bereitstellen eines Prozessgases in einer Beschichtungseinrichtung |
WO2018099718A1 (de) | 2016-11-29 | 2018-06-07 | Aixtron Se | Aerosolverdampfer |
DE102017103047A1 (de) * | 2016-11-29 | 2018-05-30 | Aixtron Se | Aerosolverdampfer |
DE102017123233A1 (de) * | 2017-10-06 | 2019-04-11 | Aixtron Se | Vorrichtung und Verfahren zur Erzeugung eines in einem Trägergas transportierten Dampfes |
WO2019068609A1 (de) * | 2017-10-06 | 2019-04-11 | Aixtron Se | Vorrichtung und verfahren zur erzeugung eines in einem trägergas transportierten dampfes |
DE102017126126A1 (de) * | 2017-11-08 | 2019-05-09 | Aixtron Se | Verfahren und Vorrichtung zum Erzeugen eines Dampfes durch die Verwendung von in einem Regelmodus gewonnenen Steuerdaten |
WO2019091804A1 (de) * | 2017-11-08 | 2019-05-16 | Aixtron Se | Verfahren und vorrichtung zum erzeugen eines dampfes durch die verwendung von in einem regelmodus gewonnenen steuerdaten |
DE102020122800A1 (de) | 2020-09-01 | 2022-03-03 | Apeva Se | Vorrichtung zum Abscheiden von OLED-Schichten mit einer Run-/Vent-Leitung |
Also Published As
Publication number | Publication date |
---|---|
KR20140043791A (ko) | 2014-04-10 |
WO2012175334A2 (de) | 2012-12-27 |
TW201305366A (zh) | 2013-02-01 |
CN103620086B (zh) | 2017-09-29 |
KR101956829B1 (ko) | 2019-03-11 |
KR20180090391A (ko) | 2018-08-10 |
JP5989107B2 (ja) | 2016-09-07 |
CN103620086A (zh) | 2014-03-05 |
JP2014520210A (ja) | 2014-08-21 |
KR102035813B1 (ko) | 2019-10-23 |
TWI572728B (zh) | 2017-03-01 |
WO2012175334A3 (de) | 2013-04-11 |
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