DE102006012034A1 - Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage - Google Patents

Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage Download PDF

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Publication number
DE102006012034A1
DE102006012034A1 DE102006012034A DE102006012034A DE102006012034A1 DE 102006012034 A1 DE102006012034 A1 DE 102006012034A1 DE 102006012034 A DE102006012034 A DE 102006012034A DE 102006012034 A DE102006012034 A DE 102006012034A DE 102006012034 A1 DE102006012034 A1 DE 102006012034A1
Authority
DE
Germany
Prior art keywords
optical system
light
crystal material
doe
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102006012034A
Other languages
German (de)
English (en)
Inventor
Karl-Heinz Schuster
Jürgen HARTMAIER
Manfred Maul
Dieter Schmerek
Detlef Müller
Otto Hahnemann
Frank Marianek
Gundula Weiss
Damian Fiolka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102006012034A priority Critical patent/DE102006012034A1/de
Priority to DE602007014285T priority patent/DE602007014285D1/de
Priority to EP07103867A priority patent/EP1835312B1/en
Priority to US11/685,620 priority patent/US8068279B2/en
Priority to JP2007064831A priority patent/JP5179077B2/ja
Publication of DE102006012034A1 publication Critical patent/DE102006012034A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
    • G02B5/1823—Plural gratings positioned on the same surface, e.g. array of gratings in an overlapping or superposed manner
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1833—Diffraction gratings comprising birefringent materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Holo Graphy (AREA)
DE102006012034A 2006-03-14 2006-03-14 Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage Withdrawn DE102006012034A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE102006012034A DE102006012034A1 (de) 2006-03-14 2006-03-14 Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage
DE602007014285T DE602007014285D1 (de) 2006-03-14 2007-03-09 Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen
EP07103867A EP1835312B1 (en) 2006-03-14 2007-03-09 Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis
US11/685,620 US8068279B2 (en) 2006-03-14 2007-03-13 Optical system of an illumination device of a projection exposure apparatus
JP2007064831A JP5179077B2 (ja) 2006-03-14 2007-03-14 投影露光装置の照明デバイスの光学システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102006012034A DE102006012034A1 (de) 2006-03-14 2006-03-14 Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage

Publications (1)

Publication Number Publication Date
DE102006012034A1 true DE102006012034A1 (de) 2007-09-20

Family

ID=38374829

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102006012034A Withdrawn DE102006012034A1 (de) 2006-03-14 2006-03-14 Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage
DE602007014285T Active DE602007014285D1 (de) 2006-03-14 2007-03-09 Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE602007014285T Active DE602007014285D1 (de) 2006-03-14 2007-03-09 Beleuchtungsvorrichtung für eine mikrolithographische Projektionsbelichtungsanlage mit einem optischen Element aus einem uniaxialen Kristall mit mehreren parallel oder senkrecht zur Kristallachse angeordneten refraktiven oder diffraktiven Strukturen

Country Status (4)

Country Link
US (1) US8068279B2 (pt-PT)
EP (1) EP1835312B1 (pt-PT)
JP (1) JP5179077B2 (pt-PT)
DE (2) DE102006012034A1 (pt-PT)

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CN102314096B (zh) * 2006-02-17 2014-05-21 卡尔蔡司Smt有限责任公司 制造长的微透镜阵列的方法
TWI545352B (zh) 2006-02-17 2016-08-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
DE102009016608A1 (de) 2008-05-21 2009-11-26 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithographie-Projektionsbelichtungsanlage
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5078764B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2011133640A (ja) * 2009-12-24 2011-07-07 Dainippon Printing Co Ltd 透過型ホログラムの製造方法
CN103097925B (zh) * 2010-08-06 2016-04-13 旭硝子株式会社 衍射光学元件和计测装置
US8902485B2 (en) 2012-11-29 2014-12-02 Christie Digital Systems Usa, Inc. Contrast enhancing system
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
CN106687419A (zh) 2014-07-08 2017-05-17 康宁股份有限公司 用于激光处理材料的方法和设备
EP3169477B1 (en) * 2014-07-14 2020-01-29 Corning Incorporated System for and method of processing transparent materials using laser beam focal lines adjustable in length and diameter
KR102546692B1 (ko) 2015-03-24 2023-06-22 코닝 인코포레이티드 디스플레이 유리 조성물의 레이저 절단 및 가공
US10730783B2 (en) 2016-09-30 2020-08-04 Corning Incorporated Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
KR102428350B1 (ko) 2016-10-24 2022-08-02 코닝 인코포레이티드 시트형 유리 기판의 레이저 기반 기계 가공을 위한 기판 프로세싱 스테이션
CN106647179A (zh) * 2016-11-25 2017-05-10 天津津芯微电子科技有限公司 复眼匀光系统、光学引擎及光源优化装置
WO2020153504A1 (ja) * 2019-01-25 2020-07-30 大日本印刷株式会社 回折光学素子、照明装置、投射装置、投射型表示装置および要素回折光学素子の製造方法
CN114137655B (zh) * 2020-09-04 2022-12-23 宁波舜宇光电信息有限公司 用于ar设备的光波导装置及其制造方法和ar设备

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US20020003661A1 (en) * 2000-05-31 2002-01-10 Takehiko Nakai Diffractive optical element and optical system having the same
US20030231395A1 (en) * 2002-06-17 2003-12-18 Takehiko Nakai Diffractive optical element, and optical system and optical apparatus provided with the same
WO2005006774A1 (en) * 2003-07-10 2005-01-20 Ocuity Limited Lens array structure
WO2005121900A1 (de) * 2004-06-10 2005-12-22 Carl Zeiss Smt Ag Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage

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US5850300A (en) 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
JP2000206321A (ja) * 1999-01-19 2000-07-28 Canon Inc 回折光学素子、回折光学素子を備えた光学系、回折光学素子の製造方法、回折光学素子を備えた光学系を含む露光装置、及び露光装置を用いたデバイスの製造方法
DE10124803A1 (de) * 2001-05-22 2002-11-28 Zeiss Carl Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator
JP4859311B2 (ja) * 2001-09-17 2012-01-25 株式会社リコー レーザ照明光学系、該光学系を用いた露光装置、レーザ加工機、及び投射装置
JP2005032909A (ja) * 2003-07-10 2005-02-03 Fuji Photo Film Co Ltd 照明光学系およびそれを用いた露光装置
DE10344010A1 (de) * 2003-09-15 2005-04-07 Carl Zeiss Smt Ag Wabenkondensor und Beleuchtungssystem damit
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
JP4497968B2 (ja) * 2004-03-18 2010-07-07 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
DE102005030543A1 (de) * 2004-07-08 2006-02-02 Carl Zeiss Smt Ag Polarisatoreinrichtung zur Erzeugung einer definierten Ortsverteilung von Polarisationszuständen
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Publication number Priority date Publication date Assignee Title
US20020003661A1 (en) * 2000-05-31 2002-01-10 Takehiko Nakai Diffractive optical element and optical system having the same
US20030231395A1 (en) * 2002-06-17 2003-12-18 Takehiko Nakai Diffractive optical element, and optical system and optical apparatus provided with the same
WO2005006774A1 (en) * 2003-07-10 2005-01-20 Ocuity Limited Lens array structure
WO2005121900A1 (de) * 2004-06-10 2005-12-22 Carl Zeiss Smt Ag Beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage

Also Published As

Publication number Publication date
EP1835312B1 (en) 2011-05-04
US20070217013A1 (en) 2007-09-20
EP1835312A2 (en) 2007-09-19
DE602007014285D1 (de) 2011-06-16
US8068279B2 (en) 2011-11-29
JP2007258709A (ja) 2007-10-04
JP5179077B2 (ja) 2013-04-10
EP1835312A3 (en) 2007-10-10

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8127 New person/name/address of the applicant

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE

R082 Change of representative

Representative=s name: BONSMANN - BONSMANN - FRANK PATENTANWAELTE, DE

R120 Application withdrawn or ip right abandoned

Effective date: 20130514