DE10055280A1 - Phasenverschiebungs-Photomaskenrohling, Phasenverschiebungs-Photomaske und Verfahren zur Herstellung von Halbleitervorrichtung - Google Patents
Phasenverschiebungs-Photomaskenrohling, Phasenverschiebungs-Photomaske und Verfahren zur Herstellung von HalbleitervorrichtungInfo
- Publication number
- DE10055280A1 DE10055280A1 DE10055280A DE10055280A DE10055280A1 DE 10055280 A1 DE10055280 A1 DE 10055280A1 DE 10055280 A DE10055280 A DE 10055280A DE 10055280 A DE10055280 A DE 10055280A DE 10055280 A1 DE10055280 A1 DE 10055280A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- phase shift
- layers
- smaller
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
- 1. Die Phasendifferenz (PS) sollte der folgenden Bedingung genügen: PS = 175° bis 180°;
- 2. der Transmissionsfaktor (Transmittanz) (Texp) bei der Wellenlänge (λexp) der für die Be lichtung benutzten Lichtstrahlen sollte der folgenden Bedingung genügen: Texp = 2% bis 30%;
- 3. die Transmittanz (Tinsp) bei der Prüfwellenlänge (λinsp) sollte der folgenden Bedingung genügen: Tinsp < etwa 40% bis 50% (z. B. λinsp = 365 nm, wenn λexp = 193 nm);
- 4. Der Reflexionsfaktor (Rexp) bei der Belichtungswellenlänge sollte vorzugsweise der fol genden Bedingung genügen: Rexp < etwa 20%; und
- 5. die Schichtdicke d ist vorzugsweise gering.
Claims (8)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP318177/99 | 1999-11-09 | ||
JP31817799 | 1999-11-09 | ||
JP243103/2000 | 2000-08-10 | ||
JP2000243103A JP2001201842A (ja) | 1999-11-09 | 2000-08-10 | 位相シフトフォトマスクブランクス及び位相シフトフォトマスク並びに半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE10055280A1 true DE10055280A1 (de) | 2001-12-06 |
DE10055280B4 DE10055280B4 (de) | 2011-05-05 |
Family
ID=26569276
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10055280A Expired - Lifetime DE10055280B4 (de) | 1999-11-09 | 2000-11-08 | Phasenverschiebungs-Photomaskenrohling, Phasenverschiebungs-Photomaske und Verfahren zur Herstellung von Halbleiterbauelementen |
Country Status (5)
Country | Link |
---|---|
US (1) | US6569577B1 (de) |
JP (1) | JP2001201842A (de) |
KR (1) | KR100669871B1 (de) |
DE (1) | DE10055280B4 (de) |
TW (1) | TW460746B (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1286217A3 (de) * | 2001-06-26 | 2003-05-07 | Shin-Etsu Chemical Co., Ltd. | Rohling für Phasenschiebermaske, deren Herstellung und Gebrauch |
US7592106B2 (en) | 2002-02-22 | 2009-09-22 | Hoya Corporation | Halftone type phase shift mask blank and phase shift mask thereof |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4163331B2 (ja) * | 1999-07-14 | 2008-10-08 | アルバック成膜株式会社 | 位相シフタ膜の製造方法、位相シフトマスク用ブランクスの製造方法、および、位相シフトマスクの製造方法 |
JP4951813B2 (ja) * | 2001-01-30 | 2012-06-13 | 凸版印刷株式会社 | ハーフトーン型位相シフトマスク用ブランク |
US6855463B2 (en) * | 2002-08-27 | 2005-02-15 | Photronics, Inc. | Photomask having an intermediate inspection film layer |
US20050026053A1 (en) * | 2002-08-27 | 2005-02-03 | Martin Patrick M. | Photomask having an internal substantially transparent etch stop layer |
JP4325175B2 (ja) * | 2002-11-07 | 2009-09-02 | 凸版印刷株式会社 | ハーフトーン型位相シフトマスクブランク、ハーフトーン型位相シフトマスク、半導体装置の製造方法、およびハーフトーン型位相シフトマスクの修正方法 |
WO2004070472A1 (ja) * | 2003-02-03 | 2004-08-19 | Hoya Corporation | フォトマスクブランク及びフォトマスク、並びにフォトマスクを用いたパターン転写方法 |
US7344806B2 (en) * | 2003-03-31 | 2008-03-18 | Shin-Etsu Chemical Co., Ltd. | Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask |
US7521000B2 (en) * | 2003-08-28 | 2009-04-21 | Applied Materials, Inc. | Process for etching photomasks |
KR20060120613A (ko) * | 2003-09-05 | 2006-11-27 | 쇼오트 아게 | 감쇄 위상 편이 마스크 블랭크 및 포토 마스크 |
US20050219578A1 (en) * | 2004-01-13 | 2005-10-06 | Yasushi Hiraoka | Image processing apparatus, image processing method, and computer program product |
JP2006078953A (ja) * | 2004-09-13 | 2006-03-23 | Ulvac Seimaku Kk | ハーフトーン型位相シフトマスク及びその製造法 |
US7879510B2 (en) | 2005-01-08 | 2011-02-01 | Applied Materials, Inc. | Method for quartz photomask plasma etching |
US8293430B2 (en) * | 2005-01-27 | 2012-10-23 | Applied Materials, Inc. | Method for etching a molybdenum layer suitable for photomask fabrication |
US7790334B2 (en) * | 2005-01-27 | 2010-09-07 | Applied Materials, Inc. | Method for photomask plasma etching using a protected mask |
US7829243B2 (en) | 2005-01-27 | 2010-11-09 | Applied Materials, Inc. | Method for plasma etching a chromium layer suitable for photomask fabrication |
US7432184B2 (en) * | 2005-08-26 | 2008-10-07 | Applied Materials, Inc. | Integrated PVD system using designated PVD chambers |
US20070048451A1 (en) * | 2005-08-26 | 2007-03-01 | Applied Materials, Inc. | Substrate movement and process chamber scheduling |
US7786019B2 (en) * | 2006-12-18 | 2010-08-31 | Applied Materials, Inc. | Multi-step photomask etching with chlorine for uniformity control |
JP5702920B2 (ja) * | 2008-06-25 | 2015-04-15 | Hoya株式会社 | 位相シフトマスクブランク、位相シフトマスクおよび位相シフトマスクブランクの製造方法 |
JP5670502B2 (ja) * | 2012-04-30 | 2015-02-18 | 株式会社エスアンドエス テック | 位相反転ブランクマスク及びその製造方法 |
JP5940755B1 (ja) | 2014-12-26 | 2016-06-29 | Hoya株式会社 | マスクブランク、位相シフトマスク、位相シフトマスクの製造方法および半導体デバイスの製造方法 |
JP6058757B1 (ja) * | 2015-07-15 | 2017-01-11 | Hoya株式会社 | マスクブランク、位相シフトマスク、位相シフトマスクの製造方法および半導体デバイスの製造方法 |
JP6087401B2 (ja) | 2015-08-14 | 2017-03-01 | Hoya株式会社 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
TWI684822B (zh) * | 2015-09-30 | 2020-02-11 | 日商Hoya股份有限公司 | 空白遮罩、相位移轉遮罩及半導體元件之製造方法 |
JP6730141B2 (ja) * | 2016-09-06 | 2020-07-29 | アルバック成膜株式会社 | 位相シフタ膜の製造方法、位相シフトマスクブランクの製造方法、及び、位相シフトマスクの製造方法 |
JP6271780B2 (ja) * | 2017-02-01 | 2018-01-31 | Hoya株式会社 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
JP6526938B1 (ja) | 2017-11-24 | 2019-06-05 | Hoya株式会社 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
JP6938428B2 (ja) * | 2018-05-30 | 2021-09-22 | Hoya株式会社 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
JP6896694B2 (ja) * | 2018-12-25 | 2021-06-30 | Hoya株式会社 | マスクブランク、位相シフトマスク、位相シフトマスクの製造方法および半導体デバイスの製造方法 |
CN113383271B (zh) * | 2019-02-13 | 2024-01-30 | Hoya株式会社 | 掩模坯料、相移掩模、相移掩模的制造方法以及半导体器件的制造方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3231900B2 (ja) * | 1992-10-28 | 2001-11-26 | 株式会社アルバック | 成膜装置 |
JP3064769B2 (ja) * | 1992-11-21 | 2000-07-12 | アルバック成膜株式会社 | 位相シフトマスクおよびその製造方法ならびにその位相シフトマスクを用いた露光方法 |
WO1994017449A1 (en) * | 1993-01-21 | 1994-08-04 | Sematech, Inc. | Phase shifting mask structure with multilayer optical coating for improved transmission |
JP3262302B2 (ja) * | 1993-04-09 | 2002-03-04 | 大日本印刷株式会社 | 位相シフトフォトマスク、位相シフトフォトマスク用ブランクス及びそれらの製造方法 |
JP3115185B2 (ja) * | 1993-05-25 | 2000-12-04 | 株式会社東芝 | 露光用マスクとパターン形成方法 |
KR0168134B1 (ko) * | 1993-05-25 | 1999-01-15 | 사토 후미오 | 반사형 위상쉬프트 마스크와, 투과형 위상쉬프트 마스크 및, 패턴형성방법 |
JPH07253655A (ja) * | 1994-03-15 | 1995-10-03 | Fujitsu Ltd | 露光マスク |
JP3594659B2 (ja) * | 1994-09-08 | 2004-12-02 | アルバック成膜株式会社 | 位相シフトフォトマスクブランクス製造方法、位相シフトフォトマスクブランクス、及び位相シフトフォトマスク |
JPH08123010A (ja) * | 1994-10-28 | 1996-05-17 | Toppan Printing Co Ltd | 位相シフトマスクおよびそれに用いるマスクブランク |
JP3615801B2 (ja) * | 1994-11-01 | 2005-02-02 | 株式会社アルバック | 窒化チタン薄膜成膜方法 |
JP3397933B2 (ja) * | 1995-03-24 | 2003-04-21 | アルバック成膜株式会社 | 位相シフトフォトマスクブランクス、位相シフトフォトマスク、及びそれらの製造方法。 |
JP2658966B2 (ja) * | 1995-04-20 | 1997-09-30 | 日本電気株式会社 | フォトマスク及びその製造方法 |
KR970048985A (ko) * | 1995-12-26 | 1997-07-29 | 김광호 | 더미 패턴을 가지는 하프톤형 위상 반전 마스크 및 그 제조 방법 |
JPH09304912A (ja) * | 1996-05-15 | 1997-11-28 | Mitsubishi Electric Corp | 位相シフトマスク、位相シフトマスク用ブランクスおよび位相シフトマスクの製造方法 |
US5935735A (en) * | 1996-10-24 | 1999-08-10 | Toppan Printing Co., Ltd. | Halftone phase shift mask, blank for the same, and methods of manufacturing these |
JPH10186632A (ja) * | 1996-10-24 | 1998-07-14 | Toppan Printing Co Ltd | ハーフトーン型位相シフトマスク用ブランク及びハーフトーン型位相シフトマスク |
JP3478067B2 (ja) * | 1997-06-25 | 2003-12-10 | 凸版印刷株式会社 | ハーフトーン型位相シフトマスク及びハーフトーン型位相シフトマスク用ブランク |
-
2000
- 2000-08-10 JP JP2000243103A patent/JP2001201842A/ja active Pending
- 2000-11-03 US US09/704,697 patent/US6569577B1/en not_active Expired - Lifetime
- 2000-11-08 DE DE10055280A patent/DE10055280B4/de not_active Expired - Lifetime
- 2000-11-08 KR KR1020000066133A patent/KR100669871B1/ko active Pre-grant Review Request
- 2000-11-08 TW TW089123600A patent/TW460746B/zh not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1286217A3 (de) * | 2001-06-26 | 2003-05-07 | Shin-Etsu Chemical Co., Ltd. | Rohling für Phasenschiebermaske, deren Herstellung und Gebrauch |
US7037625B2 (en) | 2001-06-26 | 2006-05-02 | Shin-Etsu Chemical Co., Ltd. | Phase shift mask blank and method of manufacture |
US7592106B2 (en) | 2002-02-22 | 2009-09-22 | Hoya Corporation | Halftone type phase shift mask blank and phase shift mask thereof |
US7862963B2 (en) | 2002-02-22 | 2011-01-04 | Hoya Corporation | Halftone type phase shift mask blank and phase shift mask thereof |
Also Published As
Publication number | Publication date |
---|---|
US6569577B1 (en) | 2003-05-27 |
KR100669871B1 (ko) | 2007-01-17 |
KR20010051529A (ko) | 2001-06-25 |
TW460746B (en) | 2001-10-21 |
JP2001201842A (ja) | 2001-07-27 |
DE10055280B4 (de) | 2011-05-05 |
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Legal Events
Date | Code | Title | Description |
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R020 | Patent grant now final |
Effective date: 20110806 |
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R082 | Change of representative |
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Free format text: PREVIOUS MAIN CLASS: G03F0001140000 Ipc: G03F0001320000 Effective date: 20141014 |
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R081 | Change of applicant/patentee |
Owner name: RENESAS ELECTRONICS CORPORATION, KAWASAKI-SHI, JP Free format text: FORMER OWNERS: ULVAC COATING CORP., CHICHIBU, SAITAMA, JP; MITSUBISHI DENKI K.K., TOKYO, JP Effective date: 20140915 Owner name: ULVAC COATING CORP., CHICHIBU, JP Free format text: FORMER OWNERS: ULVAC COATING CORP., CHICHIBU, SAITAMA, JP; MITSUBISHI DENKI K.K., TOKYO, JP Effective date: 20140915 Owner name: ULVAC COATING CORP., CHICHIBU, JP Free format text: FORMER OWNER: ULVAC COATING CORP., MITSUBISHI DENKI K.K., , JP Effective date: 20140915 Owner name: RENESAS ELECTRONICS CORPORATION, KAWASAKI-SHI, JP Free format text: FORMER OWNER: ULVAC COATING CORP., MITSUBISHI DENKI K.K., , JP Effective date: 20140915 Owner name: RENESAS ELECTRONICS CORPORATION, JP Free format text: FORMER OWNERS: ULVAC COATING CORP., CHICHIBU, SAITAMA, JP; MITSUBISHI DENKI K.K., TOKYO, JP Effective date: 20140915 |
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Owner name: ULVAC COATING CORP., CHICHIBU, JP Free format text: FORMER OWNERS: RENESAS ELECTRONICS CORPORATION, KAWASAKI-SHI, KANAGAWA, JP; ULVAC COATING CORP., CHICHIBU, SAITAMA, JP Owner name: RENESAS ELECTRONICS CORPORATION, JP Free format text: FORMER OWNERS: RENESAS ELECTRONICS CORPORATION, KAWASAKI-SHI, KANAGAWA, JP; ULVAC COATING CORP., CHICHIBU, SAITAMA, JP |
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