DD202080A5 - Verfahren und vorrichtung zur kontrolle von mikromasken - Google Patents

Verfahren und vorrichtung zur kontrolle von mikromasken Download PDF

Info

Publication number
DD202080A5
DD202080A5 DD81235629A DD23562981A DD202080A5 DD 202080 A5 DD202080 A5 DD 202080A5 DD 81235629 A DD81235629 A DD 81235629A DD 23562981 A DD23562981 A DD 23562981A DD 202080 A5 DD202080 A5 DD 202080A5
Authority
DD
German Democratic Republic
Prior art keywords
micro
mask
laser beam
intensity
signal
Prior art date
Application number
DD81235629A
Other languages
German (de)
English (en)
Inventor
Gerhard Westerberg
Original Assignee
Gerhard Westerberg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gerhard Westerberg filed Critical Gerhard Westerberg
Publication of DD202080A5 publication Critical patent/DD202080A5/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DD81235629A 1980-12-11 1981-12-10 Verfahren und vorrichtung zur kontrolle von mikromasken DD202080A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8008725A SE449531B (sv) 1980-12-11 1980-12-11 Forfarande och anordning for kontroll av mikromasker

Publications (1)

Publication Number Publication Date
DD202080A5 true DD202080A5 (de) 1983-08-24

Family

ID=20342444

Family Applications (1)

Application Number Title Priority Date Filing Date
DD81235629A DD202080A5 (de) 1980-12-11 1981-12-10 Verfahren und vorrichtung zur kontrolle von mikromasken

Country Status (6)

Country Link
US (1) US4465350A (sv)
DD (1) DD202080A5 (sv)
DE (1) DE3148121A1 (sv)
FR (1) FR2496262B1 (sv)
GB (1) GB2089504B (sv)
SE (1) SE449531B (sv)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0105661A1 (en) * 1982-10-05 1984-04-18 Kabushiki Kaisha Toshiba Apparatus for inspecting a circuit pattern drawn on a photomask used in manufacturing large scale integrated circuits

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5958586A (ja) * 1982-09-28 1984-04-04 Toshiba Mach Co Ltd マスクの検査方法および装置
US4550374A (en) * 1982-11-15 1985-10-29 Tre Semiconductor Equipment Corporation High speed alignment method for wafer stepper
CH663483A5 (fr) * 1985-03-04 1987-12-15 Eie Electronic Ind Equipment S Dispositif pour exposer des parties discretes d'une surface photosensible au moyen d'un faisceau de lumiere.
US4770536A (en) * 1986-12-04 1988-09-13 Moshe Golberstein Reflective photometry instrument
US5025826A (en) * 1990-09-04 1991-06-25 Adolf Schoepe Faucet handle universal coupling

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3670153A (en) * 1970-10-08 1972-06-13 Rca Corp Machine implemented method for positioning and inspecting an object
SE375216B (sv) * 1972-09-12 1975-04-07 G Westerberg
US3844461A (en) * 1973-04-09 1974-10-29 Gerber Scientific Instr Co Precise indexing apparatus and method
FR2257102B1 (sv) * 1973-04-19 1976-09-10 Frehling Andre
US3881098A (en) * 1973-07-05 1975-04-29 Gerber Scientific Instr Co Photoexposure system
US3903536A (en) * 1973-11-19 1975-09-02 Gerhard Westerberg Device for generating masks for microcircuits
DE2441472A1 (de) * 1974-08-29 1976-03-11 Siemens Ag Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente
SE399628B (sv) * 1975-02-13 1978-02-20 Westerberg Erik Gerhard Natana Drivanordning, speciellt for anvendning vid en avsokningsanordning for framstellning av masker for mikrokretsar
US4056716A (en) * 1976-06-30 1977-11-01 International Business Machines Corporation Defect inspection of objects such as electronic circuits
DE2700252C2 (de) * 1977-01-05 1985-03-14 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Prüfen definierter Strukturen
US4218142A (en) * 1978-03-08 1980-08-19 Aerodyne Research, Inc. Mask analysis
US4247203A (en) * 1978-04-03 1981-01-27 Kla Instrument Corporation Automatic photomask inspection system and apparatus
US4295198A (en) * 1979-04-02 1981-10-13 Cogit Systems, Inc. Automatic printed circuit dimensioning, routing and inspecting apparatus
US4231659A (en) * 1979-04-11 1980-11-04 The Gerber Scientific Instrument Company Method of making an overlay mask and a printing plate therefrom
DE2929846A1 (de) * 1979-07-23 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Opto-elektronisches pruefsystem zur automatischen beschaffenheitspruefung von leiterplatten, deren zwischenprodukte und druckwerkzeuge

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0105661A1 (en) * 1982-10-05 1984-04-18 Kabushiki Kaisha Toshiba Apparatus for inspecting a circuit pattern drawn on a photomask used in manufacturing large scale integrated circuits
US4559603A (en) * 1982-10-05 1985-12-17 Tokyo Shibaura Denki Kabushiki Kaisha Apparatus for inspecting a circuit pattern drawn on a photomask used in manufacturing large scale integrated circuits

Also Published As

Publication number Publication date
FR2496262A1 (fr) 1982-06-18
SE449531B (sv) 1987-05-04
DE3148121A1 (de) 1982-08-05
DE3148121C2 (sv) 1992-09-24
SE8008725L (sv) 1982-06-12
GB2089504A (en) 1982-06-23
US4465350A (en) 1984-08-14
FR2496262B1 (fr) 1985-07-26
GB2089504B (en) 1985-04-11

Similar Documents

Publication Publication Date Title
EP0252133B1 (de) Verfahren zur abbildenden laserinterferometrie
DE69332314T2 (de) Mustererzeugungsapparat unter Verwendung eines Lasers
DE3025469A1 (de) Strahlaufzeichnungseinrichtung
DE69210923T2 (de) Optische Messeinrichtung für Verschiebung
DE2851943A1 (de) Verbesserungen bei einer abtastvorrichtung
DE2944602A1 (de) Lichtstrahl-aufzeichnungsvorrichtung
DE4313111C2 (de) Verfahren zur Herstellung einer druckenden Vorlage, insbesondere einer Druckform einer Druckmaschine
EP0048489A1 (de) Vorrichtung zum Untersuchen eines Fingerreliefs
DE2230650A1 (de) Verfahren und Vorrichtung zur optischen Untersuchung von Gegenständen
DE69124052T2 (de) Laserstrahlstreifencodeleser
DE4111185A1 (de) Verfahren und vorrichtung zum ausloesen der modulation eines abtastlaserstrahls
DE2845124A1 (de) Optisches sichtgeraet mit einem abtastspiegel
DE69323951T2 (de) Schnelle Abtastspotkorrektur mit Pulsbreitenmodulator in einem Rasterabtastpolygon
DE69528127T2 (de) Gerät zur Aufzeichnung von Bildern auf der Innenfläche eines Zylinders
DE19953144A1 (de) Verfahren zum Verlängern der Belichtungszeit in Laserscannern
DD202080A5 (de) Verfahren und vorrichtung zur kontrolle von mikromasken
DE4029259A1 (de) Optisches abtastsystem
EP1279005A1 (de) Abtasteinheit für eine optische positionsmesseinrichtung
DE2324823A1 (de) Elektronisches graviersystem
DE69227212T2 (de) Verfahren für die Abtastung eines Aufzeichnungsträgers
DE2655892A1 (de) Lichtabtastvorrichtung
DE2825993A1 (de) Strahlablenkungssystem fuer anzeigevorrichtungen
DE3030840A1 (de) Einrichtung zum korrigieren der verschiebung eines formular-bildes in einem aufzeichnungssystem mit lichtstrahlabtastung
DE3545144A1 (de) Verfahren zum aufbringen von schriftzeichen und vorrichtung zur durchfuehrung des verfahrens
WO2003026831A2 (de) Verfahren und vorrichtung zur laserbeschriftung von datenträgern, insbesondere kartenkörper