CZ309577B6 - Rastrovací částicový mikroskop mající energeticky selektivní detektorový systém - Google Patents

Rastrovací částicový mikroskop mající energeticky selektivní detektorový systém Download PDF

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Publication number
CZ309577B6
CZ309577B6 CZ2014-256A CZ2014256A CZ309577B6 CZ 309577 B6 CZ309577 B6 CZ 309577B6 CZ 2014256 A CZ2014256 A CZ 2014256A CZ 309577 B6 CZ309577 B6 CZ 309577B6
Authority
CZ
Czechia
Prior art keywords
field
particle
emitted particles
electrode
emitted
Prior art date
Application number
CZ2014-256A
Other languages
Czech (cs)
English (en)
Other versions
CZ2014256A3 (cs
Inventor
Stefan Schubert
Original Assignee
Carl Zeiss Microscopy Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Microscopy Gmbh filed Critical Carl Zeiss Microscopy Gmbh
Publication of CZ2014256A3 publication Critical patent/CZ2014256A3/cs
Publication of CZ309577B6 publication Critical patent/CZ309577B6/cs

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CZ2014-256A 2013-04-15 2014-04-14 Rastrovací částicový mikroskop mající energeticky selektivní detektorový systém CZ309577B6 (cs)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013006535.6 2013-04-15
DE102013006535.6A DE102013006535B4 (de) 2013-04-15 2013-04-15 Raster-Partikelstrahlmikroskop mit energiefilterndem Detektorsystem

Publications (2)

Publication Number Publication Date
CZ2014256A3 CZ2014256A3 (cs) 2014-11-19
CZ309577B6 true CZ309577B6 (cs) 2023-04-26

Family

ID=50896418

Family Applications (1)

Application Number Title Priority Date Filing Date
CZ2014-256A CZ309577B6 (cs) 2013-04-15 2014-04-14 Rastrovací částicový mikroskop mající energeticky selektivní detektorový systém

Country Status (5)

Country Link
US (1) US9653255B2 (enExample)
JP (1) JP6286268B2 (enExample)
CZ (1) CZ309577B6 (enExample)
DE (1) DE102013006535B4 (enExample)
NL (1) NL2012618B1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10541103B2 (en) * 2014-12-10 2020-01-21 Hitachi High-Technologies Corporation Charged particle beam device
DE102015210893B4 (de) 2015-06-15 2019-05-09 Carl Zeiss Microscopy Gmbh Analyseeinrichtung zur Analyse der Energie geladener Teilchen und Teilchenstrahlgerät mit einer Analyseeinrichtung
US20190385810A1 (en) * 2017-02-22 2019-12-19 Hitachi High-Technologies Corporation Charged Particle Beam Device
DE112017008344B4 (de) 2017-03-24 2024-05-29 Hitachi High-Tech Corporation Ladungsteilchenstrahl-vorrichtung
WO2018173242A1 (ja) 2017-03-24 2018-09-27 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
DE112018007343B4 (de) 2018-04-26 2023-11-23 Hitachi High-Tech Corporation Mit einem strahl geladener teilchen arbeitende vorrichtung
US20200373115A1 (en) * 2019-05-23 2020-11-26 Fei Company Multi-beam scanning electron microscope
JP7294981B2 (ja) * 2019-10-18 2023-06-20 株式会社荏原製作所 電子線装置及び電極
JP7250661B2 (ja) 2019-10-31 2023-04-03 株式会社日立ハイテク 荷電粒子線装置
CN110927194B (zh) * 2019-12-11 2020-08-18 中国科学院地质与地球物理研究所 确定泥页岩有机孔含量和孔径分布的方法
US11508591B2 (en) * 2021-02-08 2022-11-22 Kla Corporation High resolution electron beam apparatus with dual-aperture schemes

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5032724A (en) * 1990-08-09 1991-07-16 The Perkin-Elmer Corporation Multichannel charged-particle analyzer
US20100163725A1 (en) * 2007-01-15 2010-07-01 Ian Richard Barkshire Charged particle analyser and method
WO2012081428A1 (ja) * 2010-12-16 2012-06-21 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及びそれを用いた測長方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4205226A (en) * 1978-09-01 1980-05-27 The Perkin-Elmer Corporation Auger electron spectroscopy
WO1982002624A1 (en) * 1981-01-16 1982-08-05 Turner David Warren Emission-electron microscope
DE3532781A1 (de) * 1985-09-13 1987-03-19 Siemens Ag Anordnung zur detektion von sekundaer- und/oder rueckstreuelektronen in einem elektronenstrahlgeraet
NL8602177A (nl) * 1986-08-27 1988-03-16 Philips Nv Electronen detectie met energie discriminatie.
DE3638682A1 (de) * 1986-11-13 1988-05-19 Siemens Ag Spektrometerobjektiv fuer korpuskularstrahlmesstechnik
US5408098A (en) * 1993-09-10 1995-04-18 International Business Machines Corporation Method and apparatus for detecting low loss electrons in a scanning electron microscope
US5466940A (en) 1994-06-20 1995-11-14 Opal Technologies Ltd. Electron detector with high backscattered electron acceptance for particle beam apparatus
DE69504294T2 (de) 1994-12-19 1999-04-08 Opal Technologies Ltd., Nes Ziona System zur Hochauflösungsbildgebung und Messung von topographischen Characteristiken und Materialcharakteristiken einer Probe
JP4302316B2 (ja) * 1998-03-09 2009-07-22 株式会社日立製作所 走査形電子顕微鏡
US6787772B2 (en) * 2000-01-25 2004-09-07 Hitachi, Ltd. Scanning electron microscope
US6847038B2 (en) * 2002-07-15 2005-01-25 Hitachi, Ltd. Scanning electron microscope
EP1271603B1 (en) * 2000-03-31 2009-08-12 Hitachi, Ltd. Scanning electron microscope
JP2001357808A (ja) * 2000-06-14 2001-12-26 Hitachi Ltd 回路パターン検査装置および方法
TW579536B (en) * 2001-07-02 2004-03-11 Zeiss Carl Semiconductor Mfg Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same
DE10235456B4 (de) * 2002-08-02 2008-07-10 Leo Elektronenmikroskopie Gmbh Elektronenmikroskopiesystem
DE10301579A1 (de) * 2003-01-16 2004-07-29 Leo Elektronenmikroskopie Gmbh Elektronenstrahlgerät und Detektoranordnung
JP4794444B2 (ja) * 2003-09-05 2011-10-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 粒子光学システム及び装置、並びに、かかるシステム及び装置用の粒子光学部品
EP1605492B1 (en) * 2004-06-11 2015-11-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device with retarding field analyzer
JP4500646B2 (ja) * 2004-10-18 2010-07-14 株式会社日立ハイテクノロジーズ 試料観察方法及び電子顕微鏡
EP1657736B1 (en) * 2004-11-15 2016-12-14 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High current density particle beam system
US7928381B1 (en) 2006-05-19 2011-04-19 Apparati, Inc. Coaxial charged particle energy analyzer
WO2008010777A1 (en) * 2006-07-21 2008-01-24 National University Of Singapore A multi-beam ion/electron spectra-microscope
US8110799B2 (en) * 2006-08-31 2012-02-07 Kla-Tencor Corporation Confocal secondary electron imaging
DE102006043895B9 (de) * 2006-09-19 2012-02-09 Carl Zeiss Nts Gmbh Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen
JP2010055756A (ja) * 2008-08-26 2010-03-11 Hitachi High-Technologies Corp 荷電粒子線の照射方法及び荷電粒子線装置
EP2211366B1 (en) * 2009-01-23 2011-10-19 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High resolution gas field ion column
US8071942B2 (en) * 2009-03-20 2011-12-06 Physical Electronics USA, Inc. Sample holder apparatus to reduce energy of electrons in an analyzer system and method
DE102010061178A1 (de) * 2010-12-13 2012-06-14 Gsi Helmholtzzentrum Für Schwerionenforschung Gmbh Chromatischer Energiefilter
JP5663412B2 (ja) * 2011-06-16 2015-02-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置
EP2555220A1 (en) * 2011-08-03 2013-02-06 Fei Company Charged particle detector system comprising a conversion electrode
US8723115B2 (en) * 2012-03-27 2014-05-13 Kla-Tencor Corporation Method and apparatus for detecting buried defects
US9000395B2 (en) * 2013-03-25 2015-04-07 Hermes Microvision, Inc. Energy filter for charged particle beam apparatus
JP6295027B2 (ja) * 2013-04-03 2018-03-14 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびそれを用いた計測方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5032724A (en) * 1990-08-09 1991-07-16 The Perkin-Elmer Corporation Multichannel charged-particle analyzer
US20100163725A1 (en) * 2007-01-15 2010-07-01 Ian Richard Barkshire Charged particle analyser and method
WO2012081428A1 (ja) * 2010-12-16 2012-06-21 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及びそれを用いた測長方法
US20130292568A1 (en) * 2010-12-16 2013-11-07 Daisuke Bizen Scanning electron microscope and length measuring method using the same

Also Published As

Publication number Publication date
JP6286268B2 (ja) 2018-02-28
US20140306110A1 (en) 2014-10-16
CZ2014256A3 (cs) 2014-11-19
DE102013006535B4 (de) 2025-11-06
JP2014209482A (ja) 2014-11-06
NL2012618A (en) 2014-10-16
DE102013006535A1 (de) 2014-10-30
NL2012618B1 (en) 2016-05-09
US9653255B2 (en) 2017-05-16

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