JP6286268B2 - エネルギー選択的検出器系を有する走査型粒子顕微鏡 - Google Patents
エネルギー選択的検出器系を有する走査型粒子顕微鏡 Download PDFInfo
- Publication number
- JP6286268B2 JP6286268B2 JP2014083065A JP2014083065A JP6286268B2 JP 6286268 B2 JP6286268 B2 JP 6286268B2 JP 2014083065 A JP2014083065 A JP 2014083065A JP 2014083065 A JP2014083065 A JP 2014083065A JP 6286268 B2 JP6286268 B2 JP 6286268B2
- Authority
- JP
- Japan
- Prior art keywords
- field
- particle
- particles
- particle beam
- grid electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24485—Energy spectrometers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24578—Spatial variables, e.g. position, distance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013006535.6 | 2013-04-15 | ||
| DE102013006535.6A DE102013006535B4 (de) | 2013-04-15 | 2013-04-15 | Raster-Partikelstrahlmikroskop mit energiefilterndem Detektorsystem |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014209482A JP2014209482A (ja) | 2014-11-06 |
| JP2014209482A5 JP2014209482A5 (enExample) | 2017-06-15 |
| JP6286268B2 true JP6286268B2 (ja) | 2018-02-28 |
Family
ID=50896418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014083065A Active JP6286268B2 (ja) | 2013-04-15 | 2014-04-14 | エネルギー選択的検出器系を有する走査型粒子顕微鏡 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9653255B2 (enExample) |
| JP (1) | JP6286268B2 (enExample) |
| CZ (1) | CZ309577B6 (enExample) |
| DE (1) | DE102013006535B4 (enExample) |
| NL (1) | NL2012618B1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10541103B2 (en) * | 2014-12-10 | 2020-01-21 | Hitachi High-Technologies Corporation | Charged particle beam device |
| DE102015210893B4 (de) | 2015-06-15 | 2019-05-09 | Carl Zeiss Microscopy Gmbh | Analyseeinrichtung zur Analyse der Energie geladener Teilchen und Teilchenstrahlgerät mit einer Analyseeinrichtung |
| US20190385810A1 (en) * | 2017-02-22 | 2019-12-19 | Hitachi High-Technologies Corporation | Charged Particle Beam Device |
| DE112017008344B4 (de) | 2017-03-24 | 2024-05-29 | Hitachi High-Tech Corporation | Ladungsteilchenstrahl-vorrichtung |
| WO2018173242A1 (ja) | 2017-03-24 | 2018-09-27 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
| DE112018007343B4 (de) | 2018-04-26 | 2023-11-23 | Hitachi High-Tech Corporation | Mit einem strahl geladener teilchen arbeitende vorrichtung |
| US20200373115A1 (en) * | 2019-05-23 | 2020-11-26 | Fei Company | Multi-beam scanning electron microscope |
| JP7294981B2 (ja) * | 2019-10-18 | 2023-06-20 | 株式会社荏原製作所 | 電子線装置及び電極 |
| JP7250661B2 (ja) | 2019-10-31 | 2023-04-03 | 株式会社日立ハイテク | 荷電粒子線装置 |
| CN110927194B (zh) * | 2019-12-11 | 2020-08-18 | 中国科学院地质与地球物理研究所 | 确定泥页岩有机孔含量和孔径分布的方法 |
| US11508591B2 (en) * | 2021-02-08 | 2022-11-22 | Kla Corporation | High resolution electron beam apparatus with dual-aperture schemes |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4205226A (en) * | 1978-09-01 | 1980-05-27 | The Perkin-Elmer Corporation | Auger electron spectroscopy |
| WO1982002624A1 (en) * | 1981-01-16 | 1982-08-05 | Turner David Warren | Emission-electron microscope |
| DE3532781A1 (de) * | 1985-09-13 | 1987-03-19 | Siemens Ag | Anordnung zur detektion von sekundaer- und/oder rueckstreuelektronen in einem elektronenstrahlgeraet |
| NL8602177A (nl) * | 1986-08-27 | 1988-03-16 | Philips Nv | Electronen detectie met energie discriminatie. |
| DE3638682A1 (de) * | 1986-11-13 | 1988-05-19 | Siemens Ag | Spektrometerobjektiv fuer korpuskularstrahlmesstechnik |
| US5032724A (en) * | 1990-08-09 | 1991-07-16 | The Perkin-Elmer Corporation | Multichannel charged-particle analyzer |
| US5408098A (en) * | 1993-09-10 | 1995-04-18 | International Business Machines Corporation | Method and apparatus for detecting low loss electrons in a scanning electron microscope |
| US5466940A (en) | 1994-06-20 | 1995-11-14 | Opal Technologies Ltd. | Electron detector with high backscattered electron acceptance for particle beam apparatus |
| DE69504294T2 (de) | 1994-12-19 | 1999-04-08 | Opal Technologies Ltd., Nes Ziona | System zur Hochauflösungsbildgebung und Messung von topographischen Characteristiken und Materialcharakteristiken einer Probe |
| JP4302316B2 (ja) * | 1998-03-09 | 2009-07-22 | 株式会社日立製作所 | 走査形電子顕微鏡 |
| US6787772B2 (en) * | 2000-01-25 | 2004-09-07 | Hitachi, Ltd. | Scanning electron microscope |
| US6847038B2 (en) * | 2002-07-15 | 2005-01-25 | Hitachi, Ltd. | Scanning electron microscope |
| EP1271603B1 (en) * | 2000-03-31 | 2009-08-12 | Hitachi, Ltd. | Scanning electron microscope |
| JP2001357808A (ja) * | 2000-06-14 | 2001-12-26 | Hitachi Ltd | 回路パターン検査装置および方法 |
| TW579536B (en) * | 2001-07-02 | 2004-03-11 | Zeiss Carl Semiconductor Mfg | Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same |
| DE10235456B4 (de) * | 2002-08-02 | 2008-07-10 | Leo Elektronenmikroskopie Gmbh | Elektronenmikroskopiesystem |
| DE10301579A1 (de) * | 2003-01-16 | 2004-07-29 | Leo Elektronenmikroskopie Gmbh | Elektronenstrahlgerät und Detektoranordnung |
| JP4794444B2 (ja) * | 2003-09-05 | 2011-10-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 粒子光学システム及び装置、並びに、かかるシステム及び装置用の粒子光学部品 |
| EP1605492B1 (en) * | 2004-06-11 | 2015-11-18 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle beam device with retarding field analyzer |
| JP4500646B2 (ja) * | 2004-10-18 | 2010-07-14 | 株式会社日立ハイテクノロジーズ | 試料観察方法及び電子顕微鏡 |
| EP1657736B1 (en) * | 2004-11-15 | 2016-12-14 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | High current density particle beam system |
| US7928381B1 (en) | 2006-05-19 | 2011-04-19 | Apparati, Inc. | Coaxial charged particle energy analyzer |
| WO2008010777A1 (en) * | 2006-07-21 | 2008-01-24 | National University Of Singapore | A multi-beam ion/electron spectra-microscope |
| US8110799B2 (en) * | 2006-08-31 | 2012-02-07 | Kla-Tencor Corporation | Confocal secondary electron imaging |
| DE102006043895B9 (de) * | 2006-09-19 | 2012-02-09 | Carl Zeiss Nts Gmbh | Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen |
| GB0700754D0 (en) * | 2007-01-15 | 2007-02-21 | Oxford Instr Analytical Ltd | Charged particle analyser and method |
| JP2010055756A (ja) * | 2008-08-26 | 2010-03-11 | Hitachi High-Technologies Corp | 荷電粒子線の照射方法及び荷電粒子線装置 |
| EP2211366B1 (en) * | 2009-01-23 | 2011-10-19 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | High resolution gas field ion column |
| US8071942B2 (en) * | 2009-03-20 | 2011-12-06 | Physical Electronics USA, Inc. | Sample holder apparatus to reduce energy of electrons in an analyzer system and method |
| DE102010061178A1 (de) * | 2010-12-13 | 2012-06-14 | Gsi Helmholtzzentrum Für Schwerionenforschung Gmbh | Chromatischer Energiefilter |
| US20130292568A1 (en) * | 2010-12-16 | 2013-11-07 | Daisuke Bizen | Scanning electron microscope and length measuring method using the same |
| JP5663412B2 (ja) * | 2011-06-16 | 2015-02-04 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| EP2555220A1 (en) * | 2011-08-03 | 2013-02-06 | Fei Company | Charged particle detector system comprising a conversion electrode |
| US8723115B2 (en) * | 2012-03-27 | 2014-05-13 | Kla-Tencor Corporation | Method and apparatus for detecting buried defects |
| US9000395B2 (en) * | 2013-03-25 | 2015-04-07 | Hermes Microvision, Inc. | Energy filter for charged particle beam apparatus |
| JP6295027B2 (ja) * | 2013-04-03 | 2018-03-14 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置およびそれを用いた計測方法 |
-
2013
- 2013-04-15 DE DE102013006535.6A patent/DE102013006535B4/de active Active
-
2014
- 2014-04-14 CZ CZ2014-256A patent/CZ309577B6/cs unknown
- 2014-04-14 NL NL2012618A patent/NL2012618B1/en not_active IP Right Cessation
- 2014-04-14 JP JP2014083065A patent/JP6286268B2/ja active Active
- 2014-04-14 US US14/252,034 patent/US9653255B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20140306110A1 (en) | 2014-10-16 |
| CZ2014256A3 (cs) | 2014-11-19 |
| DE102013006535B4 (de) | 2025-11-06 |
| JP2014209482A (ja) | 2014-11-06 |
| NL2012618A (en) | 2014-10-16 |
| CZ309577B6 (cs) | 2023-04-26 |
| DE102013006535A1 (de) | 2014-10-30 |
| NL2012618B1 (en) | 2016-05-09 |
| US9653255B2 (en) | 2017-05-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6286268B2 (ja) | エネルギー選択的検出器系を有する走査型粒子顕微鏡 | |
| JP4460542B2 (ja) | 高空間分解能および多視点結像用の荷電粒子ビーム装置 | |
| CN105340051B (zh) | 扫描电子显微镜 | |
| CN112703573B (zh) | 粒子束系统 | |
| US20090309024A1 (en) | Electron-beam device and detector system | |
| JP6736756B2 (ja) | 荷電粒子線装置 | |
| TWI622077B (zh) | 帶電粒子束裝置、用於帶電粒子束裝置的系統、及用於操作帶電粒子束裝置的方法 | |
| US9984848B2 (en) | Multi-beam lens device, charged particle beam device, and method of operating a multi-beam lens device | |
| KR20210075184A (ko) | 전자기 복합 렌즈 및 이러한 렌즈를 갖는 하전 입자 광학 시스템 | |
| US11908657B2 (en) | Scanning electron microscope device and electron beam inspection apparatus | |
| JP2019046642A (ja) | 走査電子顕微鏡 | |
| US9905391B2 (en) | System and method for imaging a sample with an electron beam with a filtered energy spread | |
| JP4785830B2 (ja) | 高電流密度粒子ビームシステム | |
| US10446360B2 (en) | Particle source for producing a particle beam and particle-optical apparatus | |
| US7847266B2 (en) | Device and method for selecting an emission area of an emission pattern | |
| US9543115B2 (en) | Electron microscope | |
| US20090039257A1 (en) | Electron beam device | |
| US20220230835A1 (en) | Electron Gun and Charged Particle Beam Device Equipped With Electron Gun | |
| US11404260B2 (en) | Input lens and electron spectrometer | |
| JP2016152233A (ja) | 信号荷電粒子偏向装置、信号荷電粒子検出システム、荷電粒子ビーム装置、および信号荷電粒子ビームの検出の方法 | |
| CN111739775A (zh) | 生成结果图像的方法 | |
| US20240274394A1 (en) | Insulating structure, electrostatic lens, and charged particle beam device | |
| KR20250162319A (ko) | 분할 칼럼 가속 튜브 주사 전자 현미경 | |
| CN119208117A (zh) | 磁透镜、包括磁透镜的带电粒子显微镜系统以及相关方法 | |
| WO2014185060A1 (ja) | 荷電粒子光学レンズ装置及び荷電粒子光学レンズ装置の制御方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170412 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170428 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20170428 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20170510 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170606 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170901 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171024 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20171108 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180109 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180205 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6286268 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |