CS218598B2 - Method of depositing the coating of the tin oxide of low specific resistance on the mineral base - Google Patents
Method of depositing the coating of the tin oxide of low specific resistance on the mineral base Download PDFInfo
- Publication number
- CS218598B2 CS218598B2 CS805337A CS533780A CS218598B2 CS 218598 B2 CS218598 B2 CS 218598B2 CS 805337 A CS805337 A CS 805337A CS 533780 A CS533780 A CS 533780A CS 218598 B2 CS218598 B2 CS 218598B2
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- coating
- glass
- substrate
- hydrogen
- carrier gas
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 46
- 239000011248 coating agent Substances 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title claims abstract description 28
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910001887 tin oxide Inorganic materials 0.000 title claims abstract description 17
- 238000000151 deposition Methods 0.000 title claims abstract description 11
- 229910052500 inorganic mineral Inorganic materials 0.000 title claims description 6
- 239000011707 mineral Substances 0.000 title claims description 6
- 239000011521 glass Substances 0.000 claims abstract description 60
- 239000012159 carrier gas Substances 0.000 claims abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000001257 hydrogen Substances 0.000 claims abstract description 23
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 22
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000007789 gas Substances 0.000 claims abstract description 11
- 150000003606 tin compounds Chemical class 0.000 claims abstract description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 27
- 239000000203 mixture Substances 0.000 claims description 17
- 230000008021 deposition Effects 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 3
- -1 hydro compound Chemical class 0.000 claims description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 230000001464 adherent effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 36
- 229910006404 SnO 2 Inorganic materials 0.000 description 27
- 238000006243 chemical reaction Methods 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 7
- 239000000376 reactant Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 235000011150 stannous chloride Nutrition 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000008400 supply water Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910020923 Sn-O Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000002778 food additive Substances 0.000 description 1
- 235000013373 food additive Nutrition 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003898 horticulture Methods 0.000 description 1
- 238000013003 hot bending Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004901 spalling Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Joining Of Glass To Other Materials (AREA)
- Manufacturing Of Electric Cables (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH703379 | 1979-07-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS218598B2 true CS218598B2 (en) | 1983-02-25 |
Family
ID=4318887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS805337A CS218598B2 (en) | 1979-07-31 | 1980-07-30 | Method of depositing the coating of the tin oxide of low specific resistance on the mineral base |
Country Status (15)
| Country | Link |
|---|---|
| EP (1) | EP0023471B1 (pl) |
| JP (1) | JPS5624708A (pl) |
| KR (1) | KR830002390B1 (pl) |
| AU (1) | AU535981B2 (pl) |
| BR (1) | BR8004742A (pl) |
| CA (1) | CA1159723A (pl) |
| CS (1) | CS218598B2 (pl) |
| DD (1) | DD152532A5 (pl) |
| DE (1) | DE3068519D1 (pl) |
| ES (1) | ES493840A0 (pl) |
| IT (1) | IT1132003B (pl) |
| MX (1) | MX152941A (pl) |
| PL (1) | PL124263B1 (pl) |
| TR (1) | TR21531A (pl) |
| ZA (1) | ZA804151B (pl) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4419570A (en) * | 1980-03-03 | 1983-12-06 | Societa Italiana Vetro - Siv - S.P.A. | Heating glass pane |
| CH643469A5 (fr) * | 1981-12-22 | 1984-06-15 | Siv Soc Italiana Vetro | Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide. |
| EP1054454A3 (en) | 1999-05-18 | 2004-04-21 | Nippon Sheet Glass Co., Ltd. | Glass sheet with conductive film, method of manufacturing the same, and photoelectric conversion device using the same |
| US8800482B2 (en) | 2005-12-29 | 2014-08-12 | Exatec Llc | Apparatus and method of dispensing conductive material with active Z-axis control |
| US20080099456A1 (en) * | 2006-10-25 | 2008-05-01 | Schwenke Robert A | Dispensing method for variable line volume |
| EP2229282A1 (en) | 2007-12-31 | 2010-09-22 | Exatec, LLC. | Apparatus and method for printing three-dimensional articles |
| KR101933727B1 (ko) * | 2013-08-26 | 2018-12-31 | 연세대학교 산학협력단 | 원자층 증착법으로 산화물 박막의 일부를 할로겐 원소로 도핑할 수 있는 할로겐 도핑 소스, 상기 할로겐 도핑 소스의 제조 방법, 상기 할로겐 원소 소스를 이용하여 원자층 증착법으로 산화물 박막의 일부를 할로겐으로 도핑하는 방법, 및 상기 방법을 이용하여 형성된 할로겐 원소가 도핑된 산화물 박막 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2566346A (en) * | 1948-09-08 | 1951-09-04 | Pittsburgh Plate Glass Co | Electroconductive products and production thereof |
| GB702774A (en) * | 1951-05-08 | 1954-01-20 | Pittsburgh Plate Glass Co | Electro-conductive products and production thereof |
| NL113384C (pl) * | 1957-11-04 | |||
| JPS539066B2 (pl) * | 1975-03-25 | 1978-04-03 | ||
| JPS5825090B2 (ja) * | 1975-05-08 | 1983-05-25 | 松下電器産業株式会社 | トウメイドウデンセイヒマクオユウスル コウブンシセイケイブツノセイゾウホウホウ |
| JPS5941242B2 (ja) * | 1976-12-13 | 1984-10-05 | 帝人株式会社 | 金属酸化物被膜を設ける方法 |
| FR2380997A1 (fr) * | 1977-02-16 | 1978-09-15 | Saint Gobain | Procede de fabrication de vitrages protegeant de la chaleur |
| JPS6036940B2 (ja) * | 1977-04-15 | 1985-08-23 | 帝人株式会社 | 被膜の形成方法 |
| US4317884A (en) * | 1977-10-05 | 1982-03-02 | Snamprogetti S.P.A. | Method for the production of yeast on ethanol and means therefor |
| JPS6133904A (ja) * | 1984-07-18 | 1986-02-18 | 荻原 正博 | シ−ル機 |
-
1980
- 1980-07-07 MX MX183070A patent/MX152941A/es unknown
- 1980-07-10 ZA ZA00804151A patent/ZA804151B/xx unknown
- 1980-07-28 TR TR21531A patent/TR21531A/xx unknown
- 1980-07-28 EP EP80810236A patent/EP0023471B1/fr not_active Expired
- 1980-07-28 IT IT23751/80A patent/IT1132003B/it active
- 1980-07-28 DE DE8080810236T patent/DE3068519D1/de not_active Expired
- 1980-07-29 AU AU60867/80A patent/AU535981B2/en not_active Ceased
- 1980-07-29 CA CA000357200A patent/CA1159723A/en not_active Expired
- 1980-07-29 BR BR8004742A patent/BR8004742A/pt not_active IP Right Cessation
- 1980-07-30 ES ES493840A patent/ES493840A0/es active Granted
- 1980-07-30 PL PL1980225974A patent/PL124263B1/pl unknown
- 1980-07-30 JP JP10376680A patent/JPS5624708A/ja active Pending
- 1980-07-30 DD DD80222969A patent/DD152532A5/de not_active IP Right Cessation
- 1980-07-30 CS CS805337A patent/CS218598B2/cs unknown
- 1980-07-31 KR KR1019800003057A patent/KR830002390B1/ko not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5624708A (en) | 1981-03-09 |
| TR21531A (tr) | 1984-08-15 |
| IT8023751A0 (it) | 1980-07-28 |
| AU535981B2 (en) | 1984-04-12 |
| EP0023471A1 (fr) | 1981-02-04 |
| PL225974A1 (pl) | 1981-05-08 |
| BR8004742A (pt) | 1981-02-10 |
| ES8106268A1 (es) | 1981-08-01 |
| DD152532A5 (de) | 1981-12-02 |
| PL124263B1 (en) | 1983-01-31 |
| KR830003376A (ko) | 1983-06-20 |
| MX152941A (es) | 1986-07-04 |
| CA1159723A (en) | 1984-01-03 |
| AU6086780A (en) | 1981-02-05 |
| ES493840A0 (es) | 1981-08-01 |
| ZA804151B (en) | 1981-07-29 |
| DE3068519D1 (en) | 1984-08-16 |
| IT1132003B (it) | 1986-06-25 |
| KR830002390B1 (ko) | 1983-10-25 |
| EP0023471B1 (fr) | 1984-07-11 |
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