CN218975405U

CN218975405U - Silicon wafer cleaning machine

Info

Publication number: CN218975405U
Application number: CN202320164201.XU
Authority: CN
Inventors: 师伟; 张翠芸; 苏江涛
Original assignee: Xi'an Zhongjing Semiconductor Material Co ltd
Current assignee: Xi'an Zhongjing Semiconductor Material Co ltd
Priority date: 2023-02-09
Filing date: 2023-02-09
Publication date: 2023-05-05
Anticipated expiration: 2033-02-09

Abstract

The utility model relates to the technical field of silicon wafer processing, in particular to a silicon wafer cleaning machine table. The technical proposal comprises: the device comprises a table pool and a mounting frame, wherein a soaking cavity is formed in one side of the inside of the table pool, a cleaning cavity is formed in one side of the soaking cavity, a first conveying chain is installed in the inner rotary mode of the soaking cavity, a second conveying chain is installed in the inner rotary mode of the cleaning cavity, a plurality of groups of mounting seats are fixedly installed on the front face and the back face of the table pool, ultrasonic vibration rods are fixedly installed on the inner sides of the mounting seats, and a third conveying chain is installed in one side of the second conveying chain in a rotary mode. According to the utility model, through the combination of various structures, the cleaning machine platform cleans the silicon wafer in an ultrasonic manner, the quality of cleaning the silicon wafer is improved in an ultrasonic cleaning manner, the condition of damaging the surface of the silicon wafer during cleaning is avoided, and the cleaning machine platform can dry the cleaned silicon wafer, so that subsequent equipment is convenient for processing the silicon wafer.

Description

Silicon wafer cleaning machine

Technical Field

The utility model relates to the technical field of silicon wafer processing, in particular to a silicon wafer cleaning machine table.

Background

The silicon wafer is an important material for manufacturing integrated circuits, various semiconductor devices can be manufactured by means of photoetching, ion implantation and the like, and the silicon wafer needs to be cleaned during processing, wherein the application number is as follows: the silicon wafer cleaning device disclosed by CN209266366U solves the technical defect that residual liquid on the surface of a silicon wafer cannot be cleaned, and further searches to find that the silicon wafer cleaning device disclosed by the application number of CN204216011U really solves the defect that the silicon wafer is not thoroughly cleaned through the arrangement of a specific technical structure, but devices with similar structures have a plurality of defects in actual use, such as the fact that the silicon wafer is cleaned in a spraying mode, the spraying cleaning quality is low, and meanwhile, the surface of the silicon wafer is damaged due to the impact of spraying in use; meanwhile, the silicon wafer cleaning machine table does not have the function of dewatering and drying the surface of the silicon wafer after the silicon wafer is cleaned, so that subsequent equipment cannot process the silicon wafer at the first time, and therefore, the silicon wafer cleaning machine table is required to be designed.

Disclosure of Invention

The utility model aims to provide a silicon wafer cleaning machine table for solving the problems in the background technology.

In order to achieve the above purpose, the present utility model provides the following technical solutions: the utility model provides a silicon chip cleaning machine platform, includes platform pond and mounting bracket, one side in platform pond inside is provided with soaks the chamber, and soaks one side in chamber and be provided with the cleaning chamber, the inside in soaking chamber rotates and installs first conveying chain, and the inside in cleaning chamber rotates and install the second conveying chain, the front in platform pond and back fixed mounting have multiunit mount pad, and the inboard fixed mounting of mount pad has the ultrasonic vibration stick, one side of second conveying chain rotates and installs the third conveying chain, the inside rotation of mounting bracket installs the fourth conveying chain, the front fixed mounting of platform pond and mounting bracket has driving motor, the top fixed mounting of mounting bracket has the stoving cover, and the top fixed mounting of stoving cover has the drying-machine, the bottom fixed mounting of platform pond has the control box.

According to the silicon wafer cleaning machine table, the cleaning liquid can be stored in the table pool, the soaking cavity is formed in one side of the interior of the table pool, the silicon wafer can be pre-wetted and soaked through the soaking cavity, the cleaning cavity is formed in one side of the soaking cavity, a plurality of groups of mounting seats are fixedly arranged on the front surface and the back surface of the table pool, the ultrasonic vibration rod is fixedly arranged on the inner side of the mounting seat, the mounting seats can be connected with an external power supply, therefore the silicon wafer in the cleaning cavity can be cleaned in an ultrasonic mode through the ultrasonic vibration rod, the quality of cleaning the silicon wafer is improved in an ultrasonic mode, and meanwhile the situation that the surface of the silicon wafer is damaged during cleaning is avoided;

the inside of the soaking cavity is rotatably provided with a first conveying chain, the first conveying chain can convey the soaked and pumped silicon wafers in the soaking cavity into the cleaning cavity, the inside of the cleaning cavity is rotatably provided with a second conveying chain, the second conveying chain can convey and move the cleaned silicon wafers through rotation, one side of the second conveying chain is rotatably provided with a third conveying chain, and the cleaned silicon wafers can be drained through the third conveying chain;

the mounting bracket fixed mounting is in the opposite side in platform pond, and the inside rotation of mounting bracket installs fourth conveying chain, and the top fixed mounting of mounting bracket has the stoving cover, and the top fixed mounting of stoving cover has the drying-machine, can carry out the stoving to the silicon chip of transmission on the fourth conveying chain through stoving cover and the cooperation of drying-machine and handle, and follow-up equipment of being convenient for carries out processing to the silicon chip, and driving motor can provide power to first conveying chain, second conveying chain, third conveying chain, fourth conveying chain.

Preferably, the other side of the bottom of the table pool is fixedly provided with a drain pipe, one side of the bottom of the table pool is fixedly provided with a water adding pipe, and the bottoms of the water adding pipe and the drain pipe are fixedly provided with electromagnetic valves. The other side fixed mounting of platform pond bottom has the drain pipe, can discharge the inside washing liquid of platform pond through the drain pipe, and the water pipe is connected with outside washing liquid pipeline simultaneously to can annotate the washing liquid in the platform pond through the water pipe, the bottom fixed mounting of water pipe and drain pipe has the solenoid valve, can control opening and closing of water pipe and drain pipe through the solenoid valve, thereby has realized the function to the automatic washing liquid of changing in the platform pond.

Preferably, a PLC controller is fixedly arranged in the control box, and a frequency converter is fixedly arranged on one side of the PLC controller. The PLC controller can automatically control the operation of the cleaning table, and the frequency converter can control the rotating speed of the driving motor during the operation.

Preferably, a partition plate is slidably arranged on one side of the soaking cavity, and an electric push rod is fixedly arranged on the back of the table pool. The isolation plate can isolate the soaking cavity from the cleaning cavity, and meanwhile, the electric push rod can lift the isolation plate through stretching, so that silicon wafers in the soaking cavity are conveniently transmitted into the cleaning cavity.

Preferably, the front face of the control box is movably provided with a sealing door, and one side of the front face of the sealing door is fixedly provided with a safety lock. The sealing door can be used for closing and sealing the front face of the control box, and meanwhile, the sealing door can be locked when being closed through the safety lock.

Preferably, the two sides of the bottom of the table pool are fixedly provided with supporting frames, and the bottoms of the supporting frames are fixedly provided with foot plates. The support frame can support the bottom of cleaning machine when placing the use, and the sole has increased the atress area of support frame bottom simultaneously, has improved the steadiness of support frame when supporting cleaning machine.

Compared with the prior art, the utility model has the beneficial effects that:

1. through setting up the casing and soaking the chamber, wash chamber, ultrasonic vibration stick, first conveying chain, second conveying chain cooperation, the casing can be stored the washing liquid, can be to the silicon chip through soaking the chamber simultaneously and wet soaking treatment in advance, wash the chamber and can wash the silicon chip through the mode of inside ultrasonic vibration stick, the abluent quality of silicon chip has been increased through ultrasonic cleaning's mode, cause the circumstances of silicon chip surface damage when avoiding wasing simultaneously, first conveying chain can be to soaking the silicon chip in the chamber, the second conveying belt can wash the silicon chip after wasing.

2. Through setting up water pipe and drain pipe, solenoid valve, third conveying chain, fourth conveying chain, stoving cover, drying-machine cooperation, the water pipe can be to the washing platform filling washing liquid, and the drain pipe can be discharged the washing liquid in the washing platform simultaneously, can control the switch of water pipe and drain pipe through the solenoid valve to realized carrying out the function of automatic liquid exchange to the washing platform, the third conveying chain can carry out the waterlogging caused by excessive rainfall processing to the silicon chip after wasing the completion, and stoving cover and drying-machine can carry out the stoving processing to the silicon chip on the fourth conveying chain, thereby be convenient for follow-up equipment carries out the processing operation to the silicon chip.

Drawings

FIG. 1 is a perspective view of the present utility model;

FIG. 2 is a schematic view of the back structure of the present utility model;

FIG. 3 is a schematic view of a mounting frame according to the present utility model;

fig. 4 is a schematic diagram of the internal structure of the control box according to the present utility model.

In the figure: 1. a support frame; 101. foot plates; 2. a pool; 201. a soaking cavity; 202. cleaning the cavity; 3. a driving motor; 4. a control box; 5. sealing the door; 501. a safety lock; 6. a partition plate; 7. an ultrasonic vibration rod; 701. a mounting base; 8. a mounting frame; 9. a drying cover; 901. a dryer; 10. an electric push rod; 11. a first conveyor chain; 12. a second conveyor chain; 13. a third conveyor chain; 14. a fourth conveyor chain; 15. a water supply pipe; 1501. a drain pipe; 1502. an electromagnetic valve; 16. a PLC controller; 1601. a frequency converter.

Detailed Description

The technical scheme of the utility model is further described below with reference to the attached drawings and specific embodiments.

Example 1

As shown in fig. 1, 2, 3 and 4, the silicon wafer cleaning machine provided by the utility model comprises a table pool 2 and a mounting frame 8, wherein a soaking cavity 201 is arranged on one side of the inside of the table pool 2, a cleaning cavity 202 is arranged on one side of the soaking cavity 201, a first conveying chain 11 is rotatably installed in the soaking cavity 201, a second conveying chain 12 is rotatably installed in the cleaning cavity 202, a plurality of groups of mounting seats 701 are fixedly installed on the front and back surfaces of the table pool 2, an ultrasonic vibration rod 7 is fixedly installed on the inner side of each mounting seat 701, a third conveying chain 13 is rotatably installed on one side of each second conveying chain 12, a fourth conveying chain 14 is rotatably installed in the inside of each mounting frame 8, a driving motor 3 is fixedly installed on the front surfaces of the table pool 2 and the mounting frame 8, a drying cover 9 is fixedly installed on the top of the mounting frame 8, a dryer 901 is fixedly installed on the top of the drying cover 9, and a control box 4 is fixedly installed on the bottom of the table pool 2.

The working principle of the silicon wafer cleaning machine based on the embodiment 1 is as follows: the cleaning solution can be stored in the bench pond 2, the soaking cavity 201 is arranged on one side of the interior of the bench pond 2, the silicon wafer can be pre-wetted and soaked through the soaking cavity 201, the cleaning cavity 202 is arranged on one side of the soaking cavity 201, a plurality of groups of mounting seats 701 are fixedly arranged on the front surface and the back surface of the bench pond 2, the ultrasonic vibration rod 7 is fixedly arranged on the inner side of the mounting seat 701, the mounting seats 701 can be connected with an external power supply through the ultrasonic vibration rod 7, so that the silicon wafer in the cleaning cavity 202 can be cleaned through the ultrasonic vibration rod 7, the quality of cleaning the silicon wafer is improved through the ultrasonic mode, and meanwhile, the condition that the surface of the silicon wafer is damaged during cleaning is avoided;

the first conveying chain 11 is rotatably arranged in the soaking cavity 201, the first conveying chain 11 can convey the soaked silicon wafers in the soaking cavity 201 into the cleaning cavity 202, the second conveying chain 12 is rotatably arranged in the cleaning cavity 202, the second conveying chain 12 can convey and move the cleaned silicon wafers through rotation, the third conveying chain 13 is rotatably arranged on one side of the second conveying chain 12, and the cleaned silicon wafers can be drained through the third conveying chain 13;

the mounting bracket 8 fixed mounting is in the opposite side of platform pond 2, and the inside rotation of mounting bracket 8 installs fourth conveying chain 14, and the top fixed mounting of mounting bracket 8 has stoving cover 9, and the top fixed mounting of stoving cover 9 has drying-machine 901, can carry out the stoving to the silicon chip of transmission on the fourth conveying chain 14 through stoving cover 9 and the cooperation of drying-machine 901 and handle, the follow-up equipment of being convenient for carries out processing to the silicon chip, driving motor 3 can provide power to first conveying chain 11, second conveying chain 12, third conveying chain 13, fourth conveying chain 14.

Example two

As shown in fig. 1, fig. 2, fig. 3 and fig. 4, the silicon wafer cleaning machine provided by the present utility model, compared with the first embodiment, further includes: the other side fixed mounting of platform pond 2 bottom has drain pipe 1501, and one side fixed mounting of platform pond 2 bottom has water pipe 15, the bottom fixed mounting of water pipe 15 and drain pipe 1501 has solenoid valve 1502, the inside fixed mounting of control box 4 has PLC controller 16, and one side fixed mounting of PLC controller 16 has converter 1601, one side slidable mounting of soaking chamber 201 has division board 6, and the back fixed mounting of platform pond 2 has electric putter 10, the front movable mounting of control box 4 has sealing door 5, and the positive one side fixed mounting of sealing door 5 has safety lock 501, the both sides fixed mounting of platform pond 2 bottom has support frame 1, and the bottom fixed mounting of support frame 1 has sole 101.

In this embodiment, as shown in fig. 4, a drain pipe 1501 is fixedly installed on the other side of the bottom of the tank 2, the cleaning solution in the tank 2 can be drained through the drain pipe 1501, and meanwhile, a water adding pipe 15 is connected with an external cleaning solution pipeline, so that the cleaning solution can be added into the tank 2 through the water adding pipe 15, an electromagnetic valve 1502 is fixedly installed at the bottoms of the water adding pipe 15 and the drain pipe 1501, and the opening and closing of the water adding pipe 15 and the drain pipe 1501 can be controlled through the electromagnetic valve 1502, so that the function of automatically replacing the cleaning solution in the tank 2 is realized; as shown in fig. 4, the PLC controller 16 may automatically control the operation of the washing station, while the inverter 1601 may control the rotation speed of the driving motor 3 during the operation;

as shown in fig. 2 and 3, the isolation plate 6 can isolate the soaking cavity 201 from the cleaning cavity 202, and meanwhile, the electric push rod 10 can lift the isolation plate 6 by stretching, so that silicon wafers in the soaking cavity 201 are conveniently transmitted into the cleaning cavity 202; as shown in fig. 1, the sealing door 5 can close and seal the front surface of the control box 4, and the sealing door 5 can be locked when being closed by the safety lock 501; as shown in fig. 1, 2, 3 and 4, the support frame 1 can support the bottom of the cleaning machine when in use, and meanwhile, the foot plate 101 increases the stress area of the bottom of the support frame 1, so that the stability of the support frame 1 for supporting the cleaning machine is improved.

The above-described embodiments are merely a few preferred embodiments of the present utility model, and many alternative modifications and combinations of the above-described embodiments will be apparent to those skilled in the art based on the technical solutions of the present utility model and the related teachings of the above-described embodiments.

Claims

1. The utility model provides a silicon chip cleaning machine platform, includes platform pond (2) and mounting bracket (8), its characterized in that: the utility model discloses a table pond, including table pond (2), including first conveying chain (9), second conveying chain (12), first conveying chain (11), second conveying chain (13), third conveying chain (13), fourth conveying chain (14), driving motor (3), stoving cover (9), stoving cover (901), control box (4) are installed to the bottom of table pond (2), control box (4) are installed to the inside one side of table pond (2), including table pond (2), first conveying chain (11), second conveying chain (12), third conveying chain (13), fourth conveying chain (14), driving motor (3), stoving cover (9), stoving cover (901), control box (4) are installed to the top of table pond (2).

2. The wafer cleaning machine according to claim 1, wherein: the other side of the bottom of the platform pool (2) is fixedly provided with a drain pipe (1501), one side of the bottom of the platform pool (2) is fixedly provided with a water adding pipe (15), and the bottoms of the water adding pipe (15) and the drain pipe (1501) are fixedly provided with an electromagnetic valve (1502).

3. The wafer cleaning machine according to claim 1, wherein: the PLC (16) is fixedly arranged in the control box (4), and a frequency converter (1601) is fixedly arranged on one side of the PLC (16).

4. The wafer cleaning machine according to claim 1, wherein: one side of the soaking cavity (201) is slidably provided with a separation plate (6), and the back of the table pool (2) is fixedly provided with an electric push rod (10).

5. The wafer cleaning machine according to claim 1, wherein: the front of the control box (4) is movably provided with a sealing door (5), and one side of the front of the sealing door (5) is fixedly provided with a safety lock (501).

6. The wafer cleaning machine according to claim 1, wherein: the two sides of the bottom of the table pool (2) are fixedly provided with supporting frames (1), and the bottom of each supporting frame (1) is fixedly provided with a foot plate (101).