CN114632751B - Cleaning system - Google Patents
Cleaning system Download PDFInfo
- Publication number
- CN114632751B CN114632751B CN202210264827.8A CN202210264827A CN114632751B CN 114632751 B CN114632751 B CN 114632751B CN 202210264827 A CN202210264827 A CN 202210264827A CN 114632751 B CN114632751 B CN 114632751B
- Authority
- CN
- China
- Prior art keywords
- basket
- cleaning
- support
- support shaft
- frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 198
- 238000000034 method Methods 0.000 claims abstract description 62
- 238000001035 drying Methods 0.000 claims abstract description 57
- 239000007921 spray Substances 0.000 claims abstract description 51
- 238000005507 spraying Methods 0.000 claims abstract description 6
- 239000007788 liquid Substances 0.000 claims description 55
- 238000003825 pressing Methods 0.000 claims description 29
- 238000003860 storage Methods 0.000 claims description 24
- 238000005406 washing Methods 0.000 claims description 12
- 230000006835 compression Effects 0.000 claims description 7
- 238000007906 compression Methods 0.000 claims description 7
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 43
- 239000012535 impurity Substances 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 230000003749 cleanliness Effects 0.000 description 5
- 238000009825 accumulation Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2240/00—Type of materials or objects being cleaned
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The application discloses a cleaning system relates to the semiconductor field. A cleaning system comprising a cleaning device and a basket; the cleaning device comprises a device body, a supporting component and a cleaning component; the device body is provided with a process cavity; the support assembly comprises a support frame arranged in the process cavity, and the flower basket is arranged on the support frame; the cleaning assembly comprises a spray arm, wherein the spray arm is arranged in the process cavity and corresponds to the flower basket, and the spray arm is used for spraying cleaning medium or drying medium to the flower basket. The utility model provides a can solve at least self-cleaning whole in-process conveying basket of flowers and lead to the problem that cleaning efficiency is low.
Description
Technical Field
The application belongs to the technical field of semiconductor equipment, and particularly relates to a cleaning system.
Background
In semiconductor wafer fabrication processes, wafer carriers are required to carry wafers using wafer baskets to facilitate the processing of the wafers. In the process of carrying out the technology to the wafer, wafer basket and wafer direct contact, the cleanliness factor of wafer basket directly influences the yield of wafer, consequently, in wafer manufacturing process, the requirement to wafer basket cleanliness factor is higher, from this, need wash the wafer basket to guarantee its cleanliness factor. In the basket washing apparatus, in order to improve productivity, the basket is generally carried by a flower basket, and a plurality of baskets can be washed at a time.
Currently, the cleaning modes of the slice basket are divided into manual cleaning and automatic cleaning. Wherein, manual cleaning is to manually put the basket with the slice basket into a cleaning tank for soaking cleaning, and after the cleaning step is finished, manually put the basket with the slice basket into a drying tank for drying.
The automatic cleaning is to put the flower basket with the slice basket into the loading and unloading station and convey the flower basket to the cleaning station through the conveying mechanism so as to clean the flower basket; after the cleaning step is finished, the conveying mechanism conveys the flower basket with the slice basket to a drying station so as to dry the flower basket; after the drying step is completed, the conveying mechanism conveys the flower basket with the slice basket back to the loading and unloading station.
However, the manual cleaning mode has low cleaning efficiency, impurities are easily introduced into the manual basket, the yield of the wafer is affected, and the working intensity of personnel is high; above-mentioned self-cleaning mode all needs conveying mechanism to carry out the conveying at whole in-process, has increased the cleaning time, causes the low, low scheduling problem of productivity of cleaning efficiency.
Disclosure of Invention
An object of the embodiment of the application is to provide a cleaning system, which at least can solve the problem of low cleaning efficiency caused by conveying a basket in the whole process of automatic cleaning.
In order to solve the technical problems, the application is realized as follows:
the embodiment of the application provides a cleaning system for cleaning a wafer basket carrying wafers, the cleaning system comprises: the cleaning device and the flower basket matched with the cleaning device are used;
the cleaning device comprises a device body, a supporting component and a cleaning component;
the device body is provided with a process cavity;
the support assembly comprises a support frame arranged in the process cavity, and the flower basket is arranged on the support frame;
the cleaning assembly comprises a spray arm, wherein the spray arm is arranged in the process cavity and corresponds to the flower basket, and the spray arm is used for spraying cleaning medium or drying medium to the flower basket.
In the embodiment of the application, the basket to be cleaned can be positioned in the process cavity through the supporting component, so that a cleaning space and a cleaning environment can be provided for cleaning the basket; can wash the slice basket through clean subassembly to get rid of the impurity on the slice basket, make the slice basket keep clean, avoid impurity on the slice basket to influence the yield of wafer, and, can also dry the slice basket through clean subassembly.
Based on the arrangement, the embodiment of the application can realize automatic cleaning of the slice basket through the cleaning system without manually carrying the flower basket with the slice basket, thereby avoiding the risk of introducing impurities into the manual basket, ensuring the yield of wafers and reducing the manual operation intensity; meanwhile, the whole cleaning process (comprising a cleaning step and a drying step) is positioned in the process cavity, and cleaning media or drying media are sprayed to the flower basket through the spray arm, so that the switching between the cleaning step and the drying step can be realized in the process cavity, the whole cleaning process does not need to manually carry the basket or convey the slice basket through a conveying mechanism, the cleaning process time is further shortened, and the cleaning efficiency and the productivity are improved.
Drawings
FIG. 1 is a schematic view of a manual cleaning apparatus according to the related art;
FIG. 2 is a schematic diagram of a cleaning system according to an embodiment of the present disclosure;
FIG. 3 is a schematic cross-sectional view of a cleaning system disclosed in an embodiment of the present application;
fig. 4 is a schematic view of a partial structure of a support frame according to an embodiment of the present disclosure;
FIG. 5 is a schematic view of a basket of flowers with a slice basket according to an embodiment of the present application;
fig. 6 is a schematic cross-sectional view of a flower basket according to an embodiment of the present disclosure.
Reference numerals illustrate:
01-cleaning the tank; 02-a drying tank; 03-slice basket; 04-flower basket;
100-cleaning device;
110-a device body; 111-process chamber; 112-a reservoir cavity; 113-a deck plate; 1131-a through hole;
120-a support assembly; 121-a supporting frame; 1211-a containment area; 1212-first pen; 1213-a second pen; 122-supporting a shaft; 123-a driving part;
130-cleaning assembly; 131-spray arm; 132-a delivery line; 133-spray head;
200-flower basket; 210-a frame; 211-opening; 212-an elongated hole or slot; 220-a support; 230-a compression member; 240-locking member; 250-keels;
300-slice basket.
Detailed Description
The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are some, but not all, of the embodiments of the present application. All other embodiments, which can be made by one of ordinary skill in the art based on the embodiments herein without making any inventive effort, are intended to be within the scope of the present application.
The terms first, second and the like in the description and in the claims, are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged, as appropriate, such that embodiments of the present application may be implemented in sequences other than those illustrated or described herein, and that the objects identified by "first," "second," etc. are generally of a type and not limited to the number of objects, e.g., the first object may be one or more.
In the related art, a manual basket washing device is disclosed, as shown in fig. 1, which includes a washing tank 01 and a drying tank 02, and in the washing step, a basket 04 with a basket 03 is manually placed in the washing tank 01 to be soaked; after the cleaning step is finished, the basket is manually lifted and moved into a drying groove 02 for drying; after the drying step is completed, the basket 04 with the slice basket 03 is manually moved out of the drying tub 02 and placed at a predetermined position. However, the mode has the manual participation, increases the labor intensity of the manual work, and has lower cleaning efficiency; in addition, the manual basket is easy to introduce impurities, and the yield of the wafer is affected.
In order to solve the above problems, the embodiment of the application provides a cleaning system for cleaning a wafer basket carrying wafers, and the cleanliness of the wafer basket can be ensured by cleaning the wafer basket, so that the wafer yield can be effectively prevented from being influenced by the pollution of impurities on the wafer basket.
Referring to fig. 2 to 6, the disclosed cleaning system includes a cleaning device 100 and a basket 200, wherein the cleaning device 100 is used to clean a basket 300, the basket 200 is used to load the basket 300, and the basket 200 is used in cooperation with the cleaning device 100. Alternatively, the basket 200 is detachably provided to the washing apparatus 100. It should be noted that, the wafer basket 300 may also be understood as a cassette (cassette), which is mainly used for carrying wafers.
The cleaning device 100 includes a device body 110, a support assembly 120, and a cleaning assembly 130. The device body 110 is a basic mounting member, which can provide a mounting and supporting base for other members. In order to clean the wafer basket 300, the apparatus body 110 has a process chamber 111, and the wafer basket 300 is positioned in the process chamber 111 when the cleaning process is performed, so that the wafer basket 300 can be cleaned in the process chamber 111. Alternatively, the device body 110 may be a housing, e.g., a housing in a cube shape, the interior of which is used to provide a cleaning environment and a cleaning space for the cleaning sheet basket 300. Of course, the device body 110 may also have other shapes, and the specific form of the device body 110 is not limited in the embodiments of the present application.
The support assembly 120 is used to mount and support the wafer basket 300 to ensure that the wafer basket 300 is within the process chamber 111. In order to mount and support the basket 300, as shown in fig. 3, the support assembly 120 includes a support frame 121, the support frame 121 is disposed in the process chamber 111, and the basket 200 is disposed on the support frame 121. Wherein, the basket 200 is used for placing the slice basket 300, and the basket 200 is arranged on the supporting frame 121 to mount and support the basket 200 through the supporting frame 121. Alternatively, the basket 200 may be detachably disposed on the support frame 121, so that the basket 200 may be detached from the support frame 121 or mounted to the support frame 121, thereby facilitating the placement of the wafer-carrying basket 200.
Alternatively, the support 121 may be provided with one basket 200, and may be provided with a plurality of baskets 200, the specific number of baskets 200 being not limited; in addition, the flower basket 200 may be provided with one slice basket 300, and may be provided with a plurality of slice baskets 300, and the specific number of slice baskets 300 is not limited. In order to improve the washing efficiency, a plurality of slice baskets 300 may be placed on the basket 200 and a plurality of flower baskets 200 may be installed on the support frame 121, so that the plurality of slice baskets 300 may be washed at one time, and thus the washing efficiency and productivity may be improved.
The cleaning assembly 130 is used for cleaning the basket 300 to remove impurities from the surface of the basket 300, thereby ensuring the cleanliness of the basket 300. As shown in fig. 3, the cleaning assembly 130 may include a spray arm 131, where the spray arm 131 is disposed within the process chamber 111 and corresponds to the basket 200. Based on this, the cleaning medium or the drying medium may be sprayed to the chip basket 300 mounted to the flower basket 200 through the spray arm 131 to achieve cleaning or drying of the chip basket 300. Alternatively, the cleaning medium may be a cleaning liquid and the drying medium may be a drying gas. The above-mentioned corresponding arrangement means that the shower arm 131 and the basket 200 are positioned so that the cleaning medium or the drying medium sprayed from the shower arm 131 can be sprayed onto the basket 200 and the slice basket 300.
In the embodiment of the application, the support assembly 120 can enable the basket 300 to be cleaned to be located in the process cavity 111, so that a cleaning space and a cleaning environment can be provided for cleaning the basket 300; the cleaning assembly 130 can perform the entire cleaning process (including the cleaning step and the drying step) on the wafer basket 300 to remove impurities on the wafer basket 300 and dry, so that the wafer basket 300 is kept clean, and the impurities on the wafer basket 300 are prevented from affecting the yield of wafers.
Based on the above arrangement, the embodiment of the application can realize automatic cleaning of the slice basket 300 through the cleaning system without manually carrying the flower basket 200 with the slice basket 300, thereby avoiding the risk of introducing impurities into the manual basket, ensuring the yield of wafers and reducing the manual labor intensity; meanwhile, the whole cleaning process (comprising a cleaning step and a drying step) is positioned in the process cavity 111, and cleaning media or drying media are sprayed to the flower basket through the spray arm 131, so that the switching between the cleaning step and the drying step is realized in the process cavity 111, the whole cleaning process does not need to manually carry the basket or transport the slice basket 300 through a conveying mechanism, and therefore, the process time is shortened, and the cleaning efficiency and the productivity are improved.
In order to further improve the cleaning efficiency, the spin cleaning may be performed on the basket 300 to enlarge the cleaning area, thereby improving the cleaning efficiency. As shown in fig. 3, the support assembly 120 may include a support shaft 122 and a driving part 123, wherein the support shaft 122 is drivingly connected to the driving part 123, and the support shaft 122 may be driven to rotate by the driving part 123. In order to allow the support shaft 122 to rotate, the support shaft 122 may be rotatably connected to the apparatus body 110 such that the support shaft 122 is rotatable with respect to the apparatus body 110, and at the same time, the support shaft 122 may be mounted through the apparatus body 110.
In order to realize the rotary cleaning of the wafer basket 300, at least part of the support shaft 122 is extended into the process chamber 111, and the support frame 121 is disposed on the support shaft 122. Considering that the chip basket 300 is placed on the flower basket 200, the flower basket 200 is disposed on the support frame 121, and the support frame 121 is disposed on the support shaft 122. In this way, under the driving action of the driving component 123, the supporting shaft 122 can drive the supporting frame 121 to rotate, and the flower basket 200 is driven to rotate through the supporting frame 121, and the flower basket 200 is used for driving the moving plate basket 300 to rotate, so that the rotating cleaning of the plate basket 300 is finally realized.
Alternatively, the driving part 123 may include a driving member, which may be in driving connection with the support shaft 122, for example, the driving member may be an electric motor or a motor, and the output shaft of the driving member may be connected with the support shaft 122 through a coupling.
Of course, a transmission part may also be connected between the driving part 123 and the support shaft 122, by means of which transmission part a transmission connection of the driving part 123 and the support shaft 122 is achieved. The transmission component can be a gear set, a chain wheel and chain set, a belt and belt set, a worm wheel and worm set and the like. By providing the transmission member, a deceleration effect can be achieved, thereby reducing the rotation speed of the basket 300 and ensuring the cleaning effect to a certain extent. Optionally, the rotation speed of the basket 300 does not exceed 30r/min, including 5r/min, 10r/min, 20r/min, 30r/min, etc., and may be specifically selected according to the actual working conditions.
In addition, a bearing may be disposed at the top wall of the apparatus body 110, a mounting hole may be disposed at the bottom wall, and a bearing may be disposed at the mounting hole, one end of the support shaft 122 may penetrate into the process chamber 111 of the apparatus body 110 and be connected with the bearing at the top wall, the other end of the support shaft 122 may be connected with the bearing at the bottom of the apparatus body 110, and the other end may extend out of the process chamber 111 so as to be in driving connection with the driving part 123 located at the bottom of the apparatus body 110.
In order to set the support frame 121 on the support shaft 122, a mounting sleeve may be disposed in the middle region of the support frame 121, and the mounting sleeve is sleeved on the support shaft 122 during mounting to realize transmission connection. Specifically, a transmission key may be disposed between the mounting sleeve and the support shaft 122, so that the power and motion of the support shaft 122 are transmitted to the support frame 121 through the transmission key, and are transmitted to the basket 200 through the support frame 121, and finally the basket 200 is used to drive the moving plate basket 300 to rotate around the axis of the support shaft 122, so as to realize the rotation cleaning. Of course, the central region of the supporting frame 121 may be directly fixed to the outer wall of the supporting shaft 122, for example, by welding, screwing, riveting, or the like.
As shown in fig. 3 and 4, in some embodiments, the support frame 121 may have a plurality of receiving areas 1211, the plurality of receiving areas 1211 being distributed around the support shaft 122 about the support shaft 122, and each receiving area 1211 being provided with a respective basket 200. Based on this, a plurality of baskets 200 may be mounted on the support frame 121 through the plurality of receiving areas 1211, so that the chip basket 300 mounted on the plurality of baskets 200 may be washed.
It should be noted that, during the cleaning process, the plurality of flower baskets 200 may be driven to rotate by the support shaft 122 and the support frame 121, so as to simultaneously perform the rotary cleaning on the slice baskets 300 installed in the plurality of flower baskets 200. Of course, during the cleaning process, the basket 300 mounted on one basket 200 may be cleaned first, and then the next basket 200 may be rotated to a position corresponding to the cleaning assembly 130 through the supporting shaft 122 and the supporting frame 121, so that the basket 300 mounted on each basket 200 may be cleaned sequentially.
As shown in fig. 4, to achieve the installation of the basket 200, the support frame 121 may include a first rail 1212 and a second rail 1213, wherein the first rail 1212 and the second rail 1213 are spaced apart along the axial direction of the support shaft 122 by a distance selected according to the size of the basket 200. Thus, by the first rail 1212 and the second rail 1213, a receiving area 1211 may be defined to facilitate installation of the basket 200.
The first rail 1212 is used to support the bottom of the basket 200 and the second rail 1213 is used to position the sides of the basket 200 when the basket 200 is installed. Based on this, the basket 200 may be supported by the first rail 1212 to prevent the basket 200 from falling off; the second rail 1213 may limit the basket 200 to prevent the rotated basket 200 from being separated from the support frame 121 by centrifugal force. In this manner, the mounting of the basket 200 is accomplished by the first rail 1212 and the second rail 1213, and the mounting stability of the basket 200 is improved, preventing the basket 200 from being separated from the support frame 121.
Alternatively, as shown in fig. 4, the first rail 1212 may include a first ring beam and a plurality of support beams, wherein each of the plurality of support beams has an inner end connected to the support shaft 122 and an outer end connected to the first ring beam. In this manner, the basket 200 may be supported by a plurality of support beams.
As shown in fig. 4, the second rail 1213 may include a second ring beam, an upper left beam, an upper right beam, a lower left beam and a lower right beam, wherein the second ring beam is disposed around the outer side of the support shaft 122, inner side ends of the upper left beam, the upper right beam, the lower left beam and the lower right beam are respectively connected with the support shaft 122, outer side ends of the upper left beam, the lower left beam and the lower right beam are respectively connected with the second ring beam, the upper left beam and the lower left beam are disposed in an up-down correspondence manner, the upper right beam and the lower right beam are disposed in an up-down correspondence manner, the upper left beam and the upper right beam are disposed at left-right intervals, and the lower left beam and the lower right beam are disposed at left-right intervals. Based on this, the left side wall of the basket 200 is limited by the upper left bent beam and the lower left bent beam, and the right side wall of the basket 200 is limited by the upper right bent beam and the lower right bent beam, respectively, thereby ensuring that the basket 200 does not move along the circumferential direction of the second rail 1213.
In order to ensure the stability of the second rail 1213, the upper left bent beam and the upper right bent beam may be connected through a connecting beam, so as to enhance the bearing capacity of the upper left bent beam and the upper right bent beam, and further improve the overall strength and stability of the second rail 1213.
Considering that the liquid accumulation phenomenon is not easy to occur in the basket 200 when the basket 200 is inclined, and the liquid accumulation is not easy to occur on the basket 300 which is provided with the first rail 1212, the outer side of the first rail 1212 is lower than the inner side, so that the basket 200 arranged on the support frame 121 and the basket 300 arranged on the basket 200 are high in inner side and low in outer side, so that the cleaning medium can flow from the inner side to the outer side, and the problem that the basket 200 and the basket 300 accumulate the cleaning medium can be relieved.
Based on this, in the embodiment of the present application, along the radial direction of the support shaft 122 and the direction away from the support shaft 122, the first rail 1212 is inclined toward the direction away from the second rail 1213, so that the liquid accumulation of the flower basket 200 and the chip basket 300 can be relieved. In some embodiments, the supporting curved beam may be an L-shaped structure, where a long side of the L-shaped structure is used for supporting the bottom of the basket 200, and a short side of the L-shaped structure connects the long side with the first ring beam, so that the long side of the L-shaped structure may gradually incline downward from inside to outside, and further may incline the basket 200 and the slice basket 300. In addition, the supporting bent beam is recessed downward in a region close to the first ring beam, so that the side wall of the basket 200 can be limited by the first ring beam to prevent the basket 200 from being thrown out when rotating.
To place the chip basket 300 through the flower basket 200, as shown in fig. 5, the flower basket 200 may include a frame 210, a support 220, and a pressing member 230. The supporting members 220 are disposed at intervals at the bottom of the frame 210, and are used for supporting the basket 300, the pressing members 230 are disposed at the top of the frame 210, and are used for pressing the basket 300, and the frame 210, the supporting members 220 and the pressing members 230 enclose an accommodating space for accommodating the basket 300.
To reduce the blockage of the cleaning or drying media by the frame 210, and to anchor the sheet basket 300, in some embodiments, an opening 211 may be provided in the sides of the frame 210, with the frame 210 being provided with a keel 250 for confining the sheet basket 300. Thus, when placing the slice basket 300, the slice basket 300 may be placed inside the frame 210 with the edge of the slice basket 300 engaging the keel 250 to limit the slice basket 300 by the keel 250. By providing the opening 211, the cleaning medium or the drying medium can easily pass through the opening 211 to be in contact with the basket 300, thereby preventing the side wall of the frame 210 from blocking the cleaning medium or the drying medium to affect the cleaning and drying effects of the basket 300.
Alternatively, the supporting member 220 may have a diamond-shaped structure or a shuttle-shaped structure, and in order to reduce the blocking effect on the cleaning medium or the drying medium, two corners corresponding to respective long diagonals of the diamond-shaped structure or the shuttle-shaped structure may be abutted against the bottom end surfaces of the basket 300 and the basket 200, respectively. Based on this, the bottom end of the slice basket 300 may be supported by the plurality of supports 220 so that the slice basket 300 does not fall off; meanwhile, the plurality of supporting members 220 which are arranged at intervals and have a diamond-shaped structure or a spindle-shaped structure can also minimize the blocking effect on the cleaning medium or the drying medium, thereby ensuring the cleaning and drying effects on the basket 300.
In addition, the movement of the basket 300 may be restricted by the pressing member 230, so that the basket 300 may be effectively prevented from being thrown out from the top of the basket 200.
As shown in fig. 5 and 6, long holes or long grooves 212 may be formed at the top of two opposite side walls of the frame 210, and the pressing member 230 is a pressing rod, two ends of the pressing rod are respectively movably disposed in the opposite long holes or long grooves 212, and the distance between the pressing rod and the top end of the basket 300 can be adjusted by moving the pressing rod.
Wherein the slot or groove 212 extends in a direction of the basket 200 away from the bottom end such that the plunger may move toward the bottom end of the basket 200 or away from the bottom end of the basket 200. When the compression bar moves towards the bottom end of the flower basket 200, the top end of the slice basket 300 can be compressed to prevent the slice basket 300 from moving or being thrown out; when the compression bar moves away from the bottom end of the basket 200, the spacing is increased, which may be suitable for compressing the larger sized chip basket 300.
In order to facilitate the assembly and disassembly of the basket 300, some embodiments adopt a mode of arranging a long groove, wherein the notch of the long groove faces away from the bottom end direction of the flower basket 200, so that the compression bar can be conveniently placed in or taken down from the long groove, and the basket 300 can be assembled and disassembled when the compression bar is taken down, thereby improving the efficiency of assembly and disassembly of the basket 300.
Optionally, the number of the compression bars may be one or more, and may be specifically selected according to the actual working conditions.
Referring to fig. 5 and 6, in order to achieve locking of the pressing member 230, the basket 200 further includes a locking member 240, and the pressing member 230 may be locked with respect to the frame 210 by the locking member 240 to prevent the pressing member 230 from moving with respect to the frame 210. Alternatively, the locking member 240 may be a locking nut, and accordingly, an external thread is provided at least one end of the pressing member 230 to screw the locking member 240 with the pressing member 230. Thus, when the position of the pressing member 230 needs to be adjusted, the locking member 240 can be unscrewed, and when the position of the pressing member 230 does not need to be adjusted, the locking member 240 can be screwed, so that timely adjustment of the pressing member 230 can be realized.
Referring to fig. 3, in order to convey the cleaning medium or the drying medium to the spray arm 131 and spray the cleaning medium to the basket 300 to be cleaned through the spray arm 131, the cleaning assembly 130 may further include a conveying pipe 132, one end of the conveying pipe 132 extends into the process chamber 111, and the spray arm 131 is connected to the conveying pipe 132.
To provide the cleaning medium or the drying medium, the other end of the conveying pipeline 132 may be connected to a liquid supply device or a gas supply device; alternatively, the liquid supply device and the air supply device may be connected to the conveying line 132, and control valves may be provided at both the outlet of the liquid supply device and the outlet of the air supply device to switch the supplied cleaning medium or drying medium by opening or closing the control valves. In this way, the cleaning medium can be conveyed to the spray arm 131 through the conveying pipeline 132 by the liquid supply device, so that the wafer basket 300 is cleaned; alternatively, the drying of the cleaned basket 300 may be achieved by supplying a drying medium to the spray arm 131 via the supply line 132.
It should be noted that, the drying medium supplied by the air supply device is finally sprayed to the slice basket 300 by the spray arm 131, without first filling the process cavity 111 with the drying medium, so that the usage amount of the drying medium can be reduced, and the purpose of saving the drying medium is achieved.
Alternatively, the transfer line 132 may be one or more, and in addition, the transfer line 132 may be disposed at an inner wall of the process chamber 111 to prevent interference with the rotation of the support frame 121.
Alternatively, the liquid supply device may be a cleaning liquid storage tank with a liquid pump, and the gas supply device may be an air pump or a pressure gas tank.
Referring to fig. 3, in order to increase the number of washing of the basket 300, the support assembly 120 may include a plurality of support frames 121, and the plurality of support frames 121 are disposed at intervals along the axial direction of the support shaft 122, so that the basket 200 may be respectively installed through the plurality of support frames 121 to increase the number of the basket 200, and thus the number of the basket 300 placed on the plurality of basket 200 may be increased.
Of course, in other embodiments, the support assembly 120 may further include one support frame 121, and the number of support frames 121 is not limited in this application.
With continued reference to fig. 3, in order to expand the cleaning area, the cleaning assembly 130 may include a plurality of spray arms 131, and the plurality of spray arms 131 are connected to the conveying line 132, so that the cleaning medium or the drying medium may be conveyed to the plurality of spray arms 131 through the conveying line 132, and the plurality of spray arms 131 may spray the cleaning medium or the drying medium to the basket 300 at the same time, so that the plurality of basket 300 may be cleaned at the same time, the cleaning and drying area may be expanded, and the cleaning and drying efficiency and the productivity may be improved.
In order to improve the cleaning effect, spray arms 131 may be provided at both sides of each support frame 121 in the axial direction of the support shaft 122, respectively, and thus, the cleaning effect may be improved by spraying the cleaning medium or the drying medium from both upper and lower directions simultaneously through the spray arms 131 at both sides.
In some embodiments, a plurality of spray nozzles 133 may be disposed on the spray arm 131, and by disposing the spray nozzles 133, the spray speed of the cleaning medium or the drying medium may be increased, thereby improving the cleaning effect.
Of course, a plurality of spray heads 133 may be disposed on the conveying pipeline 132 to spray the cleaning medium or the drying medium to the slice basket 300 together in cooperation with the spray heads 133 on the spray arms 131, so that the cleaning and drying area can be enlarged, and the cleaning and drying effects and the productivity can be improved.
In order to collect the cleaning solution, the device body 110 may have a liquid storage cavity 112, where the liquid storage cavity 112 is disposed below the process cavity 111, and a table board 113 is disposed between the liquid storage cavity 112 and the process cavity 111, where the table board 113 is provided with a through hole 1311, and the liquid storage cavity 112 and the process cavity 111 may be communicated through the through hole 1311. Based on this, the cleaning medium sprayed into the process chamber 111 through the spray arm 131 falls onto the deck plate 113 and flows into the liquid storage chamber 112 through the through hole 1311, so that the cleaning medium can be collected through the liquid storage chamber 112.
It is contemplated that the cleaning medium may generate steam and the steam may rise along the through holes 1311 and return into the process chamber 111, thereby again contacting the surface of the basket 300, causing secondary pollution. Based on this, in some embodiments, the through holes 1311 may be small-bore through holes, and at this time, the total area of the table panel 113 where the through holes 1311 are formed is relatively small, so that the rising of the cleaning medium steam into the process chamber 111 through the through holes 1311 can be reduced, and the problem that the wafer basket 300 is secondarily polluted can be effectively alleviated.
In order to release the cleaning medium in the liquid storage cavity 112, a drain valve may be disposed at the bottom of the liquid storage cavity 112, so as to control the discharge of the cleaning medium through the opening and closing of the drain valve.
To save the cleaning medium, the cleaning medium may be recycled, based on which the cleaning assembly 130 may include a circulation pipe (not shown in the figure), one end of which is connected to the delivery pipe 132, the other end of which extends into the liquid storage cavity 112, and the circulation pipe is provided with a pump body. In this way, the cleaning medium collected in the liquid storage cavity 112 can be sequentially conveyed to the spray arm 131 through the pump body and the conveying pipeline 132, and sprayed into the process cavity 111 through the spray arm 131, and the cleaning medium after cleaning the wafer basket 300 flows back into the liquid storage cavity 112 through the through hole 1311 again, so that the recycling of the cleaning medium is realized, and the purpose of saving the cleaning medium can be achieved.
It should be noted that, when no cleaning medium exists in the liquid storage cavity 112, the cleaning medium may be first conveyed to the spray arm 131 through the conveying pipeline 132 by the liquid supply device, and after a certain amount of cleaning medium is collected in the liquid storage cavity 112, the liquid supply device may be turned off, and the pump body may be turned on, so that the cleaning medium collected in the liquid storage cavity 112 may be recycled.
Based on the above cleaning system, the embodiment of the application also discloses a cleaning method, which is applied to the above cleaning system, and the cleaning method comprises the following steps:
placing the slice basket on the flower basket;
placing a flower basket with a slice basket on a support frame;
deionized water cleaning is carried out on the slice basket;
cleaning the slice basket with cleaning liquid;
spin-drying the slice basket;
drying the slice basket;
taking down the flower basket;
and taking down the slice basket.
It should be noted that the cleaning method in the embodiments of the present application is implemented based on the above-described cleaning system. Referring to fig. 2 to 6, the cleaning process is specifically as follows:
first, a plurality of slice baskets 300 are placed in the basket 200, the interval between the pressing member 230 and the slice basket 300 is adjusted through the long hole or the long groove 212 at the top of the basket 200, and the pressing member 230 is locked by the locking member 240.
Next, the basket 200 with the basket 300 is placed on the support 121, the driving part 123 drives the support 121 to rotate through the support shaft 122, and the basket 200 and the basket 300 placed on the basket 200 are driven by the support 121 to rotate, and simultaneously the DI liquid supply device (i.e. the Deionized liquid supply device) and the liquid discharge valve of the liquid storage cavity 112 are opened, at this time, the spray head 133 can spray DI water (i.e. Deionized water) to the basket 300, so that the basket 300 is pre-cleaned in the process cavity 111.
After a period of time, the device is switched to a liquid supply device of the cleaning liquid, and the liquid discharge valve of the liquid storage cavity 112 is closed, at this time, the spraying arm 131 can spray the cleaning liquid to the basket 300 to perform the cleaning process of the cleaning liquid. As the cleaning liquid flows into the liquid storage cavity 112, when the cleaning liquid in the liquid storage cavity 112 reaches a certain liquid level, the liquid supply device of the cleaning liquid is turned off; and simultaneously, the pump body is started to recycle the cleaning liquid in the liquid storage cavity 112. After the cleaning step of the cleaning solution is completed, the driving part 123 drives the basket 200 and the basket 300 placed on the basket 200 to rotate for a certain time through the supporting shaft 122 and the supporting frame 121, so as to throw the cleaning solution out of the basket 300, the basket 200 and the supporting frame 121.
Subsequently, the air supply device for supplying the drying air is turned on, and the drying air is sprayed to the basket 300 through the spray head 133 so as to dry the basket 300, and at the same time, the driving part 123 drives the basket 200 and the basket 300 placed on the basket 200 to rotate through the support shaft 122 and the support frame 121, thereby accelerating the drying speed.
Finally, after the drying step is completed, the driving part 123 is closed, the basket 200 is removed from the supporting frame 121, the locking member 240 releases the locking of the pressing member 230, and the pressing member 230 is removed or opened, so that the basket 300 is taken out, and thus the cleaning process of the basket 300 is completed.
In summary, the embodiment of the present application can realize automatic, comprehensive and thorough cleaning of the wafer basket 300, and has higher cleaning efficiency, overcomes the productivity limitation, and can save cleaning liquid and drying gas.
The embodiments of the present application have been described above with reference to the accompanying drawings, but the present application is not limited to the above-described embodiments, which are merely illustrative and not restrictive, and many forms may be made by those of ordinary skill in the art without departing from the spirit of the present application and the scope of the claims, which are also within the protection of the present application.
Claims (10)
1. A cleaning system for cleaning a wafer-carrying wafer basket (300), the cleaning system comprising: a cleaning device (100) and a plurality of flower baskets (200) used together with the cleaning device (100), wherein each flower basket (200) is used for containing a plurality of slice baskets (300);
the cleaning device (100) comprises: a device body (110), a support assembly (120), and a cleaning assembly (130);
the device body (110) has a process chamber (111);
the support assembly (120) comprises a support frame (121) arranged in the process cavity (111), and a plurality of flower baskets (200) are respectively and detachably arranged on the support frame (121);
the cleaning assembly (130) comprises a spray arm (131), wherein the spray arm (131) is arranged in the process cavity (111) and corresponds to the flower basket (200), and the spray arm (131) is used for simultaneously spraying cleaning media or simultaneously spraying drying media from the upper side and the lower side of the flower basket (200) to the flower basket (200);
the support assembly (120) further comprises a support shaft (122), the support shaft (122) is rotatably connected with the device body (110), the support shaft (122) at least partially extends into the process cavity (111), the support frames (121) are arranged on the support shaft (122), and spray arms 131 are respectively arranged on two sides of each support frame 121 along the axial direction of the support shaft 122;
the support assembly (120) comprises a plurality of support frames (121), the support frames (121) are arranged at intervals along the axial direction of the support shaft 122, each support frame (121) is provided with a plurality of containing areas (1211), and each containing area (1211) is respectively provided with the flower basket (200).
2. The washing system according to claim 1, characterized in that the support assembly (120) further comprises a drive member (123) in driving connection with the support shaft (122).
3. The washing system according to claim 1, characterized in that a plurality of said receiving areas (1211) are distributed around said support shaft (122).
4. A cleaning system according to claim 3, characterized in that the support frame (121) comprises a first rail (1212) for supporting the bottom of the basket (200) and a second rail (1213) for limiting the sides of the basket (200);
-the first rail (1212) and the second rail (1213) are arranged at intervals along the axial direction of the support shaft (122);
in a direction radial to the support shaft (122) and away from the support shaft (122), the first rail (1212) is arranged obliquely in a direction away from the second rail (1213).
5. The washing system according to claim 1, wherein the basket (200) comprises a frame (210), a support (220) and a compression member (230);
a plurality of the supporting pieces (220) are arranged at intervals at the bottom of the frame (210) and used for supporting the slice basket (300);
the pressing piece (230) is arranged at the top of the frame (210) and is used for pressing the slice basket (300);
the frame (210), the supporting member (220) and the pressing member (230) enclose an accommodating space accommodating the basket (300).
6. The cleaning system of claim 5, wherein the top of two opposite side walls of the frame (210) are provided with elongated holes or slots (212);
the pressing piece (230) is a pressing rod, and two ends of the pressing rod are respectively movably arranged in the opposite long holes or long grooves (212) so as to adjust the distance between the pressing rod and the top end of the slice basket (300).
7. The cleaning system of claim 2, wherein the cleaning assembly (130) further comprises a delivery line (132), one end of the delivery line (132) extending into the process chamber (111), the spray arm (131) being connected to the delivery line (132);
the other end of the conveying pipeline (132) is used for being connected with a liquid supply device or a gas supply device,
or the other end of the conveying pipeline (132) is used for being connected with a liquid supply device and a gas supply device respectively, and the outlet of the liquid supply device and the outlet of the gas supply device are both provided with control valves.
8. The cleaning system of claim 7, wherein the support assembly (120) comprises a plurality of the support brackets (121), the plurality of support brackets (121) being spaced apart along an axial direction of the support shaft (122);
the cleaning assembly (130) comprises a plurality of spray arms (131), and each support frame (121) is provided with the spray arms (131) along two axial sides of the support shaft (122).
9. The cleaning system according to claim 1, 2, 7 or 8, wherein the device body (110) has a liquid storage cavity (112), the liquid storage cavity (112) is disposed below the process cavity (111) with a deck plate (113) disposed therebetween, and the deck plate (113) is provided with a through hole (1311) communicating the liquid storage cavity (112) with the process cavity (111).
10. The cleaning system of claim 9, wherein the cleaning assembly (130) further comprises a delivery line (132) and a circulation line;
one end of the conveying pipeline (132) extends into the process cavity (111), and the spray arm (131) is connected with the conveying pipeline (132);
one end of the circulating pipeline is connected with the conveying pipeline (132), the other end of the circulating pipeline extends into the liquid storage cavity (112), and the circulating pipeline is provided with a pump body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210264827.8A CN114632751B (en) | 2022-03-17 | 2022-03-17 | Cleaning system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210264827.8A CN114632751B (en) | 2022-03-17 | 2022-03-17 | Cleaning system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114632751A CN114632751A (en) | 2022-06-17 |
| CN114632751B true CN114632751B (en) | 2023-12-22 |
Family
ID=81950581
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210264827.8A Active CN114632751B (en) | 2022-03-17 | 2022-03-17 | Cleaning system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114632751B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115069644A (en) * | 2022-07-12 | 2022-09-20 | 江苏格林保尔光伏有限公司 | Cleaning equipment for solar cell dry flower basket |
Citations (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07211686A (en) * | 1994-01-14 | 1995-08-11 | Sony Corp | Drying method and drying tank for substrate and cleaning equipment therefor |
| EP1263024A2 (en) * | 2001-05-30 | 2002-12-04 | S.E.S. Company Limited | Single wafer type cleaning method and apparatus |
| JP2004065356A (en) * | 2002-08-02 | 2004-03-04 | Matsushita Electric Ind Co Ltd | Dishwasher |
| JP2009056451A (en) * | 2007-09-03 | 2009-03-19 | Purex Corp | Cleaning device |
| JP2010149013A (en) * | 2008-12-24 | 2010-07-08 | Nihon Giken Kogyo Kk | Cleaning device |
| CN103170469A (en) * | 2011-12-22 | 2013-06-26 | 中芯国际集成电路制造(上海)有限公司 | Device and method for cleaning and drying wafer cassettes |
| CN205613783U (en) * | 2016-05-14 | 2016-10-05 | 东莞伟时科技有限公司 | Adjustable washs tool basket |
| JP2018022746A (en) * | 2016-08-02 | 2018-02-08 | 東朋テクノロジー株式会社 | Substrate cassette cleaning device |
| CN108968866A (en) * | 2018-08-24 | 2018-12-11 | 浙江欧琳生活健康科技有限公司 | A kind of integrated dish-washing machine of rotation bowl basket |
| CN208449992U (en) * | 2018-05-23 | 2019-02-01 | 盐城大捷实业有限公司 | A kind of cleaning device in automotive seat process |
| CN209328867U (en) * | 2019-02-13 | 2019-08-30 | 安徽宏实自动化装备有限公司 | A kind of carrying gaily decorated basket for capableing of rapid draing compression bar |
| CN111603121A (en) * | 2020-05-14 | 2020-09-01 | 海信(广东)厨卫系统有限公司 | Dish washing machine |
| WO2020224401A1 (en) * | 2019-05-08 | 2020-11-12 | 北京北方华创微电子装备有限公司 | Cleaning chamber and cleaning device |
| CN112038257A (en) * | 2019-06-04 | 2020-12-04 | 北京北方华创微电子装备有限公司 | Cleaning equipment |
| CN112201593A (en) * | 2020-09-23 | 2021-01-08 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment |
| CN112222062A (en) * | 2020-09-21 | 2021-01-15 | 南通大学 | Rotary corrosion cleaning equipment for substrate and cleaning method thereof |
| CN112317424A (en) * | 2020-10-15 | 2021-02-05 | 皖西学院 | Mechanical engineering spare part washs processing equipment |
| CN215496647U (en) * | 2021-08-27 | 2022-01-11 | 太仓丞泰机电设备有限公司 | Integrated equipment for cleaning semiconductor chip |
| CN113941573A (en) * | 2021-10-25 | 2022-01-18 | 常州阿普智能科技有限公司 | Device for cleaning flower basket tool |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6904920B2 (en) * | 1998-07-10 | 2005-06-14 | Semitool, Inc. | Method and apparatus for cleaning containers |
| KR101995421B1 (en) * | 2010-12-31 | 2019-07-02 | 엘지전자 주식회사 | Dishwasher |
-
2022
- 2022-03-17 CN CN202210264827.8A patent/CN114632751B/en active Active
Patent Citations (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07211686A (en) * | 1994-01-14 | 1995-08-11 | Sony Corp | Drying method and drying tank for substrate and cleaning equipment therefor |
| EP1263024A2 (en) * | 2001-05-30 | 2002-12-04 | S.E.S. Company Limited | Single wafer type cleaning method and apparatus |
| JP2004065356A (en) * | 2002-08-02 | 2004-03-04 | Matsushita Electric Ind Co Ltd | Dishwasher |
| JP2009056451A (en) * | 2007-09-03 | 2009-03-19 | Purex Corp | Cleaning device |
| JP2010149013A (en) * | 2008-12-24 | 2010-07-08 | Nihon Giken Kogyo Kk | Cleaning device |
| CN103170469A (en) * | 2011-12-22 | 2013-06-26 | 中芯国际集成电路制造(上海)有限公司 | Device and method for cleaning and drying wafer cassettes |
| CN205613783U (en) * | 2016-05-14 | 2016-10-05 | 东莞伟时科技有限公司 | Adjustable washs tool basket |
| JP2018022746A (en) * | 2016-08-02 | 2018-02-08 | 東朋テクノロジー株式会社 | Substrate cassette cleaning device |
| CN208449992U (en) * | 2018-05-23 | 2019-02-01 | 盐城大捷实业有限公司 | A kind of cleaning device in automotive seat process |
| CN108968866A (en) * | 2018-08-24 | 2018-12-11 | 浙江欧琳生活健康科技有限公司 | A kind of integrated dish-washing machine of rotation bowl basket |
| CN209328867U (en) * | 2019-02-13 | 2019-08-30 | 安徽宏实自动化装备有限公司 | A kind of carrying gaily decorated basket for capableing of rapid draing compression bar |
| WO2020224401A1 (en) * | 2019-05-08 | 2020-11-12 | 北京北方华创微电子装备有限公司 | Cleaning chamber and cleaning device |
| CN112038257A (en) * | 2019-06-04 | 2020-12-04 | 北京北方华创微电子装备有限公司 | Cleaning equipment |
| CN111603121A (en) * | 2020-05-14 | 2020-09-01 | 海信(广东)厨卫系统有限公司 | Dish washing machine |
| CN112222062A (en) * | 2020-09-21 | 2021-01-15 | 南通大学 | Rotary corrosion cleaning equipment for substrate and cleaning method thereof |
| CN112201593A (en) * | 2020-09-23 | 2021-01-08 | 北京北方华创微电子装备有限公司 | Wafer cleaning equipment |
| CN112317424A (en) * | 2020-10-15 | 2021-02-05 | 皖西学院 | Mechanical engineering spare part washs processing equipment |
| CN215496647U (en) * | 2021-08-27 | 2022-01-11 | 太仓丞泰机电设备有限公司 | Integrated equipment for cleaning semiconductor chip |
| CN113941573A (en) * | 2021-10-25 | 2022-01-18 | 常州阿普智能科技有限公司 | Device for cleaning flower basket tool |
Non-Patent Citations (3)
| Title |
|---|
| 一种平移式OLED基板清洗装置;王银果;;机电信息(11);全文 * |
| 基于Pro/Innovator提高太阳能电池硅片预清洗度的研究;陆亦工;邓永胜;代元军;;机械制造(08);全文 * |
| 旋转式晶圆自动干燥装置的设计与研究;陈平;舒福璋;段成龙;郑佳晶;;科技创新与应用(05);全文 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114632751A (en) | 2022-06-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN114632751B (en) | Cleaning system | |
| CN216988926U (en) | Wafer cleaning, drying and saving device based on fluctuation and swing | |
| CN113857125A (en) | Full-automatic efficient brushing and cleaning device for silicon wafer surface and operation method | |
| CN113967629A (en) | 3C product glass lens ultrasonic cleaning machine and cleaning process | |
| CN214865687U (en) | Automatic cleaning equipment for high-precision grinding tool production | |
| CN210092034U (en) | Substrate post-processing device | |
| CN110648901B (en) | Pickling method for manufacturing and processing semiconductor diode | |
| CN218638027U (en) | Cleaning equipment and cleaning mechanism | |
| CN114267616B (en) | Fast-punching and fast-discharging groove for integrated circulating cooling cleaning of semiconductor wafer | |
| CN110193895B (en) | Chemical fiber silk production preparation polyester master batch processing apparatus | |
| CN111700559A (en) | Hydrodynamic force container cleaning equipment | |
| JP2004008929A (en) | Cleaning apparatus | |
| CN113305093B (en) | Cleaning tank in semiconductor cleaning equipment and semiconductor cleaning equipment | |
| CN108703726A (en) | Three bodies of one kind rotatably cleaning dish washer | |
| CN110013984A (en) | LED light tiles intelligent cleaning system | |
| CN112452986A (en) | Automatic crucible cleaning equipment | |
| CN218873000U (en) | Monocrystalline silicon piece belt cleaning device | |
| JP2000037669A (en) | Washing apparatus and method | |
| CN112246756A (en) | Chemical production is with high-efficient raw materials rinsing device | |
| CN212442285U (en) | Mould cleaning device | |
| CN215696284U (en) | Automatic cleaning machine for gravure roller | |
| CN217963798U (en) | Cleaning and drying machine | |
| CN220921717U (en) | Roller processing device | |
| CN220072584U (en) | Semiconductor material cleaning machine | |
| CN221204041U (en) | Rotary cage cleaning machine for quick-frozen bean production |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |