CN220072584U - Semiconductor material cleaning machine - Google Patents
Semiconductor material cleaning machine Download PDFInfo
- Publication number
- CN220072584U CN220072584U CN202321227313.1U CN202321227313U CN220072584U CN 220072584 U CN220072584 U CN 220072584U CN 202321227313 U CN202321227313 U CN 202321227313U CN 220072584 U CN220072584 U CN 220072584U
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- CN
- China
- Prior art keywords
- cleaning machine
- assembly
- medicament
- clear water
- draining
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- 238000004140 cleaning Methods 0.000 title claims abstract description 73
- 239000000463 material Substances 0.000 title claims abstract description 54
- 239000004065 semiconductor Substances 0.000 title claims abstract description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 65
- 239000003814 drug Substances 0.000 claims abstract description 43
- 238000005507 spraying Methods 0.000 claims abstract description 8
- 230000005540 biological transmission Effects 0.000 claims description 60
- 238000002791 soaking Methods 0.000 claims description 20
- 239000007921 spray Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 229910052710 silicon Inorganic materials 0.000 description 14
- 239000010703 silicon Substances 0.000 description 14
- 235000012431 wafers Nutrition 0.000 description 14
- 239000007788 liquid Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 9
- 239000012535 impurity Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000005484 gravity Effects 0.000 description 3
- 238000010981 drying operation Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Abstract
The utility model relates to a semiconductor material cleaning machine, which aims to solve the technical problem of low cleaning efficiency of the current semiconductor cleaning machine and comprises a cleaning machine shell; the cleaning machine comprises a cleaning machine shell, and is characterized in that a medicament tank and a clear water tank are arranged in the cleaning machine shell, a conveying assembly for conveying materials to the clear water tank is arranged in the medicament tank, a medicament cleaning assembly is arranged in the medicament tank, a clear water spraying assembly is arranged in the clear water tank, a fixing plate is fixedly connected to the front end of the cleaning machine shell, a driving assembly is arranged at the upper end of the fixing plate, the right end of the cleaning machine shell is fixedly connected with the cleaning machine shell, and a draining assembly is arranged in the cleaning machine shell.
Description
Technical Field
The utility model relates to a cleaning device, in particular to a semiconductor material cleaning machine.
Background
The semiconductor material is a kind of electronic material with semiconductor performance, which can be used for manufacturing semiconductor devices and integrated circuits, and the most widely used materials in the market are silicon materials, and in the use process, some residual welding spots or stains exist on the surface of a silicon wafer, which can influence the later use, so the semiconductor material needs to be cleaned.
At present, the common semiconductor material cleaning modes in the market mainly comprise wet cleaning and dry cleaning, and wet cleaning is the current most mainstream cleaning mode, and is mainly performed by soaking and spraying the chemical liquid for dissolving impurities at the preparation position of the chemical agent, but the conventional semiconductor material cleaning machine still needs manual operation, and cannot finish cleaning of a large amount of materials until the cleaning efficiency is low.
Therefore, in order to solve the problem of low cleaning efficiency of the semiconductor cleaning machine, it is necessary to solve the problem of low cleaning efficiency of the cleaning machine.
Disclosure of Invention
The utility model aims to overcome the defects of the prior art, adapt to the actual needs, and provide a semiconductor material cleaning machine so as to solve the technical problem of low cleaning efficiency of the current semiconductor cleaning machine.
In order to achieve the purpose of the utility model, the technical scheme adopted by the utility model is as follows:
designing a semiconductor material cleaning machine, which comprises a cleaning machine shell; the cleaning machine is characterized in that a medicament tank and a clear water tank are arranged inside the cleaning machine shell, a conveying assembly for conveying materials to the clear water tank is arranged inside the medicament tank, a medicament cleaning assembly is arranged inside the medicament tank, a clear water spraying assembly is arranged inside the clear water tank, a fixing plate is fixedly connected to the front end of the cleaning machine shell, a driving assembly is arranged at the upper end of the fixing plate, the right end of the cleaning machine shell is fixedly connected with the fixing plate, and a draining assembly is arranged inside the cleaning machine shell.
When the cleaning machine of the technical scheme is used, a large amount of semiconductor material silicon wafers can be automatically soaked and cleaned one by one in batches through the arrangement of the conveying assembly and the medicament cleaning assembly without manual adjustment, so that the manual lifting efficiency is saved, and materials after clean water is cleaned can be drained through the arrangement of the clean water spraying assembly and the draining assembly, the later drying operation is facilitated, the follow-up working steps are saved, and the cleaning machine is convenient to take.
Further, the transportation assembly comprises a soaking frame, a guiding-out groove, a first driving roller, a first transmission belt and a guiding-out plate, wherein the soaking frame is fixedly connected with the inside of the medicament groove, the guiding-out groove is formed in the lower end of the soaking frame, the height of the guiding-out groove is identical to the thickness of a semiconductor material, the semiconductor silicon wafer is placed in the soaking frame for a long time to be soaked, impurities existing on the surface of the semiconductor silicon wafer are separated from the semiconductor silicon wafer, and the guiding-out groove is arranged, so that the semiconductor silicon wafer is conveniently guided out from the inside of the soaking frame during later transportation.
Further, the inside rotation of medicament groove is connected with first drive roller and first transmission roller, first drive roller and first transmission roller outside is provided with first conveyer belt, first conveyer belt outside fixedly connected with derives the board, first conveyer belt is the network structure, derive the board and export the groove size the same, when deriving the board and moving to soaking frame bottom in first conveyer belt outside, under the effect of deriving the groove, will export the material of lower extreme to carry to clear water inslot portion.
Further, the medicament cleaning assembly comprises a liquid medicine water delivery pipe and a first spray header, a plurality of groups of liquid medicine water delivery pipes are fixedly connected to the outer sides of the medicament tanks, a plurality of groups of first spray headers are arranged at the lower ends of the liquid medicine water delivery pipes, residues on the surfaces of materials are sprayed through the arranged liquid medicine water delivery pipes and the first spray headers, and therefore the cleaning effect is improved.
Further, clear water spray assembly is including second drive roller, second transmission band, clear water raceway and second shower head, clear water inslot portion rotates and is connected with second drive roller and second transmission roller, second drive roller and second transmission roller outside are provided with the second transmission band, clear water inslot outside fixedly connected with multiunit clear water raceway, clear water raceway lower extreme is provided with multiunit second shower head, and the material after wasing the medicament is transported backward through the second transmission band of setting, is convenient for carry out clear water spray to it, and through the setting of clear water raceway and second shower head, can make the medicament residue of material surface erode.
Further, the drive assembly comprises a drive motor, a drive gear and a transmission gear, the upper end of the fixed plate is fixedly connected with the drive motor, the rear end of the drive motor is rotationally connected with the drive gear, the front ends of the first transmission roller and the second transmission roller are fixedly connected with the transmission gear, the drive gear is meshed with the transmission gear, and the drive motor drives the two groups of transmission gears outside the drive gear to rotate, so that the drive motor drives the first transmission roller, the second transmission roller and the second transmission roller to rotate simultaneously, and power required by transportation is provided for the cleaning machine.
Further, the draining assembly comprises water leakage holes, draining frames and handles, a plurality of groups of water leakage holes are formed in the draining grooves, the draining frames are movably connected with the draining frames, the upper ends of the draining frames are fixedly connected with the handles, when materials are transported to the right end after being washed, the materials fall into the draining frames under the action of gravity, surface moisture is drained under the action of the water leakage holes formed in the draining grooves, later-stage materials are dried conveniently, and then the draining frames are lifted by the handles and taken out to obtain clean semiconductor materials.
The utility model has the beneficial effects that:
1. according to the utility model, through the arrangement of the transportation assembly and the medicament cleaning assembly, a large amount of semiconductor material silicon wafers can be soaked and cleaned in batches one by one automatically, without manual adjustment, so that the manual improvement efficiency is saved.
2. According to the utility model, through the arrangement of the clean water spraying assembly and the draining assembly, the material washed by clean water can be drained, so that the later drying operation is convenient, the subsequent working steps are saved, and the material is convenient to take.
Drawings
FIG. 1 is a schematic perspective view of the present utility model;
FIG. 2 is a schematic cross-sectional view of the present utility model;
FIG. 3 is a schematic view of a transport assembly according to the present utility model;
FIG. 4 is a schematic cross-sectional view of a drain tank according to the present utility model.
In the figure: 1. a cleaning machine housing; 2. a medicament tank; 3. a clean water tank; 4. a soaking frame; 5. a lead-out groove; 6. a first driving roller; 7. a first conveying roller; 8. a first conveyor belt; 9. a lead-out plate; 10. a liquid medicine delivery pipe; 11. a first showerhead; 12. a second driving roller; 13. a second conveying roller; 14. a second conveyor belt; 15. clear water delivery pipe; 16. a second showerhead; 17. a fixing plate; 18. a driving motor; 19. a drive gear; 20. a transmission gear; 21. a water draining tank; 22. a water leakage hole; 23. a draining frame; 24. a handle; 100. a transport assembly; 200. a medicament cleaning assembly; 300. a clean water spray assembly; 400. a drive assembly; 500. and a draining assembly.
Detailed Description
The utility model is further illustrated by the following examples in conjunction with the accompanying drawings:
example 1: a semiconductor material cleaning machine, see fig. 1-4; comprises a cleaner housing 1; the cleaning machine is characterized in that a medicament tank 2 and a clear water tank 3 are arranged inside the cleaning machine shell 1, a conveying assembly 100 for conveying materials to the clear water tank 3 is arranged inside the medicament tank 2, a medicament cleaning assembly 200 is arranged inside the medicament tank 2, a clear water spraying assembly 300 is arranged inside the clear water tank 3, a fixing plate 17 is fixedly connected to the front end of the cleaning machine shell 1, a driving assembly 400 is arranged at the upper end of the fixing plate 17, a water draining tank 21 is fixedly connected to the right end of the cleaning machine shell 1, and a water draining assembly 500 is arranged inside the water draining tank 21.
The transportation assembly 100 comprises a soaking frame 4, a guiding-out groove 5, a first driving roller 6, a first transmission roller 7, a first transmission belt 8 and a guiding-out plate 9, the soaking frame 4 is fixedly connected to the outer side of the medicament groove 2, the guiding-out groove 5 is formed in the lower end of the soaking frame 4, the height of the guiding-out groove 5 is identical to the thickness of a semiconductor material, the semiconductor silicon wafer is placed in the soaking frame 4 for a long time to soak impurities existing on the surface of the semiconductor silicon wafer and separate from the semiconductor silicon wafer, the guiding-out groove 5 is arranged, the chemical is conveniently guided out from the inside of the soaking frame 4 during later transportation, the first driving roller 6 and the first transmission roller 7 are rotatably connected to the inner side of the medicament groove 2, the first driving roller 6 and the first transmission roller 7 are fixedly connected with the first transmission belt 8, the guiding-out plate 9 is fixedly connected to the outer side of the first transmission belt 8, the first transmission belt 8 is of a net-shaped structure, the guiding-out plate 9 is identical to the size of the guiding-out groove 5, when the semiconductor silicon wafer is placed in the bottom of the soaking frame 4 on the outer side of the first transmission belt 8, impurities existing on the surface of the chemical is separated from the guiding-out groove 5, the chemical is conveniently guided out from the inner side of the soaking frame 4, the chemical is rotatably connected with the first transmission belt 10 through the first transmission belt 10, the chemical spray head 10 and the chemical liquid spray head 10 is fixedly arranged on the inner side of the chemical liquid conveying head 10, and the chemical liquid spray head 10.
In addition, the clean water spray assembly 300 comprises a second driving roller 12, a second transmission roller 13, a second transmission belt 14, a clean water delivery pipe 15 and a second spray head 16, the second driving roller 12 and the second transmission roller 13 are rotatably connected inside the clean water tank 3, the second transmission belt 14 is arranged outside the second driving roller 12 and the second transmission roller 13, a plurality of groups of clean water delivery pipes 15 are fixedly connected outside the clean water tank 3, a plurality of groups of second spray heads 16 are arranged at the lower end of the clean water delivery pipe 15, the material cleaned by the medicament is transported backwards through the arranged second transmission belt 14, so that the clean water is conveniently sprayed, medicament residues on the outer surface of the material can be washed through the arrangement of the clean water delivery pipe 15 and the second spray heads 16, the driving assembly 400 comprises a driving motor 18, a driving gear 19 and a transmission gear 20, the driving motor 18 is fixedly connected at the upper end of the fixing plate 17, the rear end of the driving motor 18 is rotationally connected with a driving gear 19, the front ends of the first transmission roller 7 and the second transmission roller 12 are fixedly connected with a transmission gear 20, the driving gear 19 is meshed with the transmission gear 20, the driving motor 18 drives the two groups of transmission gears 20 outside the driving gear 19 to rotate so as to drive the first transmission roller 6, the first transmission roller 7, the second transmission roller 12 and the second transmission roller 13 to rotate simultaneously, so as to provide power required by transportation for the cleaning machine, the draining assembly 500 comprises a water leakage hole 22, a draining frame 23 and a lifting handle 24, a plurality of groups of water leakage holes 22 are formed in the draining groove 21, a draining frame 23 is movably connected in the draining groove 21, the lifting handle 24 is fixedly connected with the upper end of the draining frame 23, and falls into the draining frame 23 under the action of gravity when the material is transported to the right end after the cleaning is completed, and the surface water is drained under the action of the water leakage holes 22 formed in the draining groove 21, so that the later-stage material drying is facilitated, and then the draining frame 23 is lifted up and taken out through the lifting handle 24, so that the clean semiconductor material can be obtained.
When the cleaning machine of the technical scheme is used, firstly, a semiconductor silicon wafer is placed in the soaking frame 4 for a long time to be soaked, impurities existing on the surface of the semiconductor silicon wafer are separated from the semiconductor silicon wafer, then the driving motor 18 is started to drive the two groups of transmission gears 20 on the outer side of the driving gear 19 to rotate, the driving motor drives the first driving roller 6, the first transmission roller 7, the second driving roller 12 and the second transmission roller 13 to rotate simultaneously, power required by the cleaning machine in transportation is provided for the cleaning machine, when the guiding-out plate 9 moves to the bottom end of the soaking frame 4 on the outer side of the first transmission belt 8, materials at the bottommost end are guided out under the action of the guiding-out groove 5 and conveyed to the inside of the clear water groove 3, in the process, residues on the surfaces of the materials are sprayed through the arranged liquid medicine water conveying pipe 10 and the first spraying head 11, the cleaning effect is improved, the materials after the materials are cleaned are transported to the right end through the arranged second transmission belt 14, the residues on the outer surfaces of the materials can be washed, finally, when the materials are transported to the right end, the materials fall into the draining frame 23 under the action of gravity and fall into the draining groove 23 under the action of the draining groove 23, the draining effect is achieved, and the draining of the materials can be conveniently dried after the draining holes are formed in the draining groove 24, and the draining holes are dried, and the materials can be conveniently dried.
The embodiments of the present utility model are disclosed as preferred embodiments, but not limited thereto, and those skilled in the art will readily appreciate from the foregoing description that various modifications and variations can be made without departing from the spirit of the present utility model.
Claims (7)
1. A semiconductor material cleaning machine, comprising a cleaning machine housing (1); the method is characterized in that: the cleaning machine is characterized in that a medicament tank (2) and a clear water tank (3) are arranged inside the cleaning machine shell (1), a conveying assembly (100) for conveying materials to the clear water tank (3) is arranged inside the medicament tank (2), a medicament cleaning assembly (200) is arranged inside the medicament tank (2), a clear water spraying assembly (300) is arranged inside the clear water tank (3), a fixing plate (17) is fixedly connected to the front end of the cleaning machine shell (1), a driving assembly (400) is arranged at the upper end of the fixing plate (17), a draining tank (21) is fixedly connected to the right end of the cleaning machine shell (1), and a draining assembly (500) is arranged inside the draining tank (21).
2. A semiconductor material cleaning machine as defined in claim 1, wherein: the conveying assembly (100) comprises a soaking frame (4), a guiding-out groove (5), a first driving roller (6), a first conveying roller (7), a first conveying belt (8) and a guiding-out plate (9), wherein the soaking frame (4) is fixedly connected inside the medicament groove (2), the guiding-out groove (5) is formed in the lower end of the soaking frame (4), and the height of the guiding-out groove (5) is identical to the thickness of a semiconductor material.
3. A semiconductor material cleaning machine as defined in claim 2, wherein: the inside rotation of medicament groove (2) is connected with first drive roller (6) and first transmission roller (7), first drive roller (6) and first transmission roller (7) outside are provided with first conveyer belt (8), first conveyer belt (8) outside fixedly connected with derives board (9), first conveyer belt (8) are network structure, derive board (9) and export groove (5) size the same.
4. A semiconductor material cleaning machine as defined in claim 1, wherein: the medicament cleaning assembly (200) comprises a medicament delivery pipe (10) and a first spray header (11), wherein a plurality of groups of medicament delivery pipes (10) are fixedly connected to the outer side of the medicament tank (2), and a plurality of groups of first spray headers (11) are arranged at the lower end of the medicament delivery pipe (10).
5. A semiconductor material cleaning machine as defined in claim 2, wherein: clear water spray assembly (300) is including second drive roller (12), second transmission roller (13), second transmission band (14), clear water raceway (15) and second shower head (16), clear water groove (3) inside rotation is connected with second drive roller (12) and second transmission roller (13), second drive roller (12) and second transmission roller (13) outside are provided with second transmission band (14), clear water groove (3) outside fixedly connected with multiunit clear water raceway (15), clear water raceway (15) lower extreme is provided with multiunit second shower head (16).
6. A semiconductor material cleaning machine as defined in claim 5, wherein: the driving assembly (400) comprises a driving motor (18), a driving gear (19) and a transmission gear (20), the driving motor (18) is fixedly connected to the upper end of the fixing plate (17), the driving gear (19) is rotationally connected to the rear end of the driving motor (18), the transmission gear (20) is fixedly connected to the front ends of the first transmission roller (7) and the second driving roller (12), and the driving gear (19) is meshed with the transmission gear (20).
7. A semiconductor material cleaning machine as defined in claim 1, wherein: the draining assembly (500) comprises water leakage holes (22), draining frames (23) and handles (24), wherein a plurality of groups of water leakage holes (22) are formed in the draining grooves (21), the draining frames (23) are movably connected in the draining grooves (21), and the upper ends of the draining frames (23) are fixedly connected with the handles (24).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321227313.1U CN220072584U (en) | 2023-05-18 | 2023-05-18 | Semiconductor material cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321227313.1U CN220072584U (en) | 2023-05-18 | 2023-05-18 | Semiconductor material cleaning machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220072584U true CN220072584U (en) | 2023-11-24 |
Family
ID=88817938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321227313.1U Active CN220072584U (en) | 2023-05-18 | 2023-05-18 | Semiconductor material cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220072584U (en) |
-
2023
- 2023-05-18 CN CN202321227313.1U patent/CN220072584U/en active Active
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| GR01 | Patent grant |