CN218873000U - Monocrystalline silicon piece belt cleaning device - Google Patents
Monocrystalline silicon piece belt cleaning device Download PDFInfo
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- CN218873000U CN218873000U CN202222435640.8U CN202222435640U CN218873000U CN 218873000 U CN218873000 U CN 218873000U CN 202222435640 U CN202222435640 U CN 202222435640U CN 218873000 U CN218873000 U CN 218873000U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The utility model discloses a monocrystalline silicon piece belt cleaning device in monocrystalline silicon technical field, including base station and clean frame, clean frame fixed connection be in the top rear side of base station, the top recess inner chamber of base station rotates and is connected with the revolving stage, open at the top of revolving stage has the mounting groove, and is the annular distribution, open on the top recess inner chamber bottom right side of base station has the through-hole, through the first motor of bolt fixedly connected with in the middle of the inner chamber bottom of base station, this monocrystalline silicon piece belt cleaning device, structural design is reasonable, and is rotatory through the revolving stage, transports the monocrystalline silicon piece after will wasing out clean frame, reachs the region of reloading, transports uncleaned monocrystalline silicon piece to the inner chamber of clean frame simultaneously, carries out cleaning process, and the staff in time changes the monocrystalline silicon piece after wasing in the region of reloading, realizes carrying out material loading and unloading operation under the circumstances of not shutting down, makes belt cleaning device reach continuous operation's effect, has improved belt cleaning device's work efficiency greatly.
Description
Technical Field
The utility model relates to a monocrystalline silicon technical field specifically is a monocrystalline silicon piece belt cleaning device.
Background
Monocrystalline silicon is a relatively active non-metallic element, is an important component of a crystal material, is in the front of the development of new materials, and is mainly used as a semiconductor material and used for solar photovoltaic power generation, heat supply and the like;
in the monocrystalline silicon production process, after monocrystalline silicon is sliced, chamfering, lapping and other steps are needed to be carried out, some impurities are generated on the surface of the monocrystalline silicon, the cleaning process needs to be continued, the later-stage processing is convenient, the conventional cleaning device needs to be closed when the feeding and the blanking are carried out in the using process, the cleaning work is stopped, the continuous work cannot be carried out, the working efficiency of the cleaning device is reduced, and therefore the monocrystalline silicon wafer cleaning device is provided.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a monocrystalline silicon piece belt cleaning device to current belt cleaning device has been proposed in solving above-mentioned background art, in the use, when material loading and unloading, needs closing device, stops cleaning, leads to unable continuous operation, has reduced belt cleaning device's work efficiency's problem.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a monocrystalline silicon piece belt cleaning device, includes base station and clean frame, clean frame fixed connection is in the top rear side of base station, the top groove cavity of base station rotates and is connected with the revolving stage, open at the top of revolving stage has the mounting groove, and is the annular and distributes, open on the top groove cavity bottom right side of base station has the through-hole, through the first motor of bolt fixedly connected with in the middle of the inner chamber bottom of base station, just the output of first motor with shaft coupling fixed connection is passed through to the bottom of revolving stage, the inner chamber top right side fixedly connected with sewage pipe of base station, and with the through-hole communicates with each other, the back side wall of base station passes through screw fixedly connected with maintenance board, the equal fixedly connected with support column in the inner chamber top left and right sides of clean frame, the inner chamber top fixedly connected with electric putter of clean frame, and be located two between the support column, the inner chamber right side integrated into one piece of clean frame has the baffle, and is located the right side of support column, the inner chamber right side wall of clean frame passes through bolt fixedly connected with air heater, the preceding lateral wall of clean frame rotates through the hinge and is connected with sealing door.
As a further description of the above technical solution:
fixedly connected with elastic telescopic column in the middle of the inner chamber bottom of mounting groove, elastic telescopic column's top fixedly connected with sucking disc, open the inner chamber bottom of mounting groove has the blowhole.
As a further description of the above technical solution:
the tail end of the sewage pipe is fixedly connected with a drainage pipe and is in through connection with the base platform.
As a further description of the above technical solution:
the bottom of the support column is fixedly connected with a cleaning spray head.
As a further description of the above technical solution:
the output end of the electric push rod is fixedly connected with a second motor, and the output end of the second motor is fixedly connected with a cleaning disc.
As a further description of the above technical solution:
a control panel is embedded in the left side of the front side wall of the sealing door, and a hand groove is formed in the right side of the front side wall of the sealing door.
Compared with the prior art, the beneficial effects of the utility model are that: this monocrystalline silicon piece belt cleaning device, it is fixed to place monocrystalline silicon piece on the sucking disc and press through directly, provide power through first motor, it is rotatory to drive the revolving stage, make the monocrystalline silicon piece in the mounting groove do the circular motion, transport the inner chamber of clean frame with it, use through clean shower nozzle and clean dish cooperation, carry out cleaning process to monocrystalline silicon piece, it is rotatory through the revolving stage, transport the cleaned monocrystalline silicon piece out of clean frame, reach the region of reloading, simultaneously transport the not abluent monocrystalline silicon piece to the inner chamber of clean frame, carry out cleaning process, when wasing, the staff in time changes the cleaned monocrystalline silicon piece in the region of reloading, realize carrying out material loading and unloading operation under the condition of not shutting down, make belt cleaning device reach continuous operation's effect, belt cleaning device's work efficiency has been improved greatly.
Drawings
Fig. 1 is a schematic structural view of a single crystal silicon wafer cleaning apparatus provided by the present invention;
FIG. 2 is a schematic view of a front cross-sectional structure of a single crystal silicon wafer cleaning apparatus according to the present invention;
FIG. 3 is a schematic view of a rear view of a cleaning apparatus for monocrystalline silicon wafers according to the present invention;
fig. 4 is a schematic view of a top view structure of a turntable of a single crystal silicon wafer cleaning device according to the present invention.
In the figure: 100. a base station; 110. a turntable; 120. mounting grooves; 121. an elastic telescopic column; 122. a suction cup; 123. a sewage draining hole; 130. a through hole; 140. a first motor; 150. a sewage pipe; 151. a drainage tube; 160. maintaining the guard plate; 200. cleaning the frame; 210. a support pillar; 211. cleaning the spray head; 220. an electric push rod; 221. a second motor; 222. cleaning the disc; 230. a partition plate; 240. a hot air blower; 250. a sealing door; 251. a control panel; 252. and (4) a hand groove.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like, indicate the orientation or positional relationship indicated based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention. Furthermore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected" and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The utility model provides a monocrystalline silicon piece belt cleaning device, it is rotatory through the revolving stage, transport the cleaned monocrystalline silicon piece out clean frame, reach the region of reloading, transport the uncleaned monocrystalline silicon piece to the inner chamber of clean frame simultaneously, carry out cleaning process, when wasing, the staff in time changes the rinsed monocrystalline silicon piece in the region of reloading, realize carrying out material loading and unloading operation under the condition of not shutting down, make belt cleaning device reach the effect of continuous operation, greatly improved belt cleaning device's work efficiency, please refer to fig. 1-4, including base station 100 and clean frame 200;
referring to fig. 1-4 again, the cavity of the top groove of the base 100 is rotatably connected with a turntable 110, the turntable 110 is used for opening a mounting groove 120, the top of the turntable 110 is provided with the mounting groove 120 which is annularly distributed, the mounting groove 120 is used for mounting a monocrystalline silicon wafer, the right side of the bottom of the cavity of the top groove of the base 100 is provided with a through hole 130, the through hole 130 is used for discharging sewage, the middle of the bottom of the cavity of the base 100 is fixedly connected with a first motor 140 through a bolt, an output end of the first motor 140 is fixedly connected with the bottom of the turntable 110 through a coupler, the first motor 140 is used for providing power, the right side of the top of the cavity of the base 100 is fixedly connected with a sewage pipe 150 which is communicated with the through hole 130, the sewage pipe 150 is used for discharging waste water, the rear side wall of the base 100 is fixedly connected with a maintenance plate 160 through a screw, and the maintenance plate 160 is used for maintaining a cleaning device;
referring to fig. 1-3, a cleaning frame 200 is fixedly connected to the rear side of the top of a base platform 100, support pillars 210 are fixedly connected to the left and right sides of the top of an inner cavity of the cleaning frame 200, the support pillars 210 are used for mounting a cleaning nozzle 211, an electric push rod 220 is fixedly connected to the top of the inner cavity of the cleaning frame 200 and located between the two support pillars 210, the electric push rod 220 is used for providing power, a partition plate 230 is integrally formed on the right side of the inner cavity of the cleaning frame 200 and located on the right side of the support pillars 210, the partition plate 230 is used for partitioning the inner cavity space of the cleaning frame 200, a hot air blower 240 is fixedly connected to the right side wall of the inner cavity of the cleaning frame 200 through bolts, the hot air blower 240 is used for drying a single crystal silicon wafer, a sealing door 250 is rotatably connected to the front side wall of the cleaning frame 200 through a hinge, and the sealing door 250 is used for sealing the cleaning frame 200.
In conclusion, the cleaned monocrystalline silicon wafers are conveyed out of the cleaning frame 200 to the material changing area through the rotation of the rotary table 110, meanwhile, the uncleaned monocrystalline silicon wafers are conveyed to the inner cavity of the cleaning frame 200 to carry out the cleaning process, and during cleaning, workers timely replace the cleaned monocrystalline silicon wafers in the material changing area, so that the feeding and discharging operations are carried out without stopping the machine, the cleaning device achieves the effect of continuous operation, and the working efficiency of the cleaning device is greatly improved.
Referring to fig. 2, an elastic telescopic column 121 is fixedly connected to the middle of the bottom of the inner cavity of the mounting groove 120, a suction cup 122 is fixedly connected to the top of the elastic telescopic column 121, and a drain hole 123 is formed at the bottom of the inner cavity of the mounting groove 120, so that the single crystal silicon wafer can be conveniently fixed.
Referring to fig. 2 again, the end of the sewage pipe 150 is fixedly connected with a drainage pipe 151 and is connected to the base 100 for draining the waste water.
Referring to fig. 2 again, the bottom of the supporting column 210 is fixedly connected with a cleaning nozzle 211 to facilitate cleaning of the single crystal silicon wafer.
Referring to fig. 2 again, the output end of the electric pushing rod 220 is fixedly connected with a second motor 221, and the output end of the second motor 221 is fixedly connected with a cleaning disc 222, so as to facilitate cleaning of the monocrystalline silicon wafer.
Referring to fig. 1, a control panel 251 is embedded in the left side of the front side wall of the sealing door 250, and a hand slot 252 is formed in the right side of the front side wall of the sealing door 250, so as to control the start and the stop of the first motor 140, the second motor 221, the electric push rod 220 and the hot air blower 240.
When the cleaning device is used specifically, a person skilled in the art can manually and directly place the monocrystalline silicon wafer on the suction cup 122 and press the monocrystalline silicon wafer to fix the monocrystalline silicon wafer, manually control the control panel 251 to start the first motor 140 to operate, drive the turntable 110 to rotate through the first motor 140 to enable the monocrystalline silicon wafer in the mounting groove 120 to do circular motion, transport the monocrystalline silicon wafer to the cleaning area at the left side of the inner cavity of the cleaning frame 200, eject the cleaning liquid through the cleaning nozzle 211 at the left side to act on the monocrystalline silicon wafer, continue to rotate and transport the monocrystalline silicon wafer, drive the cleaning disc 222 to rotate through the second motor 221, drive the second motor 221 to vertically move through the electric push rod 220 to enable the cleaning fluff at the bottom of the cleaning disc 222 to contact with the monocrystalline silicon wafer and perform cleaning treatment, and buffer the impact force of the cleaning disc 222 on the monocrystalline silicon wafer through the elastic telescopic column 121, the cleaning device has the advantages that the cleaning device has a protection effect, the monocrystalline silicon wafers are washed for the second time through the right cleaning nozzle 211 and then continuously transported to a drying area after the washing is finished, the monocrystalline silicon wafers are dried through the hot air blower 240 and then transported out of the cleaning frame 200 to complete the cleaning process, the cleaned monocrystalline silicon wafers are transported to a material changing area through rotation of the rotary table 110, workers can replace the cleaned monocrystalline silicon wafers in the material changing area in time, meanwhile, the unwashed monocrystalline silicon wafers are transported to the inner cavity of the cleaning frame 200 to carry out the cleaning process, feeding and discharging operations are carried out without stopping the machine, the cleaning device achieves the effect of continuous work, waste water in the mounting groove 120 is discharged through the sewage discharge hole 123, enters the sewage pipe 150 through the through hole 130, and is discharged out of the cleaning device in time through the drainage pipe 151.
In the description of the present specification, reference to the description of "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (6)
1. A monocrystalline silicon piece belt cleaning device which characterized in that: comprises a base platform (100) and a cleaning frame (200), wherein the cleaning frame (200) is fixedly connected with the rear side of the top of the base platform (100), the inner cavity of the groove at the top of the base platform (100) is rotationally connected with a rotary table (110), the top of the rotary table (110) is provided with a mounting groove (120), and are distributed annularly, the right side of the bottom of the inner cavity of the groove at the top of the base (100) is provided with a through hole (130), the middle of the bottom of the inner cavity of the base platform (100) is fixedly connected with a first motor (140) through a bolt, and the output end of the first motor (140) is fixedly connected with the bottom of the rotary table (110) through a coupling, the right side of the top of the inner cavity of the base platform (100) is fixedly connected with a sewage pipe (150), and is communicated with the through hole (130), the rear side wall of the base station (100) is fixedly connected with a maintenance plate (160) through screws, the left side and the right side of the top of the inner cavity of the cleaning frame (200) are fixedly connected with supporting columns (210), the top of the inner cavity of the cleaning frame (200) is fixedly connected with an electric push rod (220), and is positioned between the two supporting columns (210), a clapboard (230) is integrally formed at the right side of the inner cavity of the cleaning frame (200), and is positioned at the right side of the supporting column (210), the right side wall of the inner cavity of the cleaning frame (200) is fixedly connected with an air heater (240) through a bolt, the front side wall of the cleaning frame (200) is rotatably connected with a sealing door (250) through a hinge.
2. The cleaning apparatus for the single crystal silicon wafer according to claim 1, wherein: fixedly connected with flexible post (121) in the middle of the inner chamber bottom of mounting groove (120), the top fixedly connected with sucking disc (122) of flexible post (121), open the inner chamber bottom of mounting groove (120) has blowoff hole (123).
3. The cleaning apparatus for the single crystal silicon wafer according to claim 1, wherein: the tail end of the sewage pipe (150) is fixedly connected with a drainage pipe (151) and is in penetrating connection with the base (100).
4. The cleaning apparatus for the single crystal silicon wafer according to claim 1, wherein: the bottom of the supporting column (210) is fixedly connected with a cleaning spray head (211).
5. The cleaning apparatus for the single crystal silicon wafer according to claim 1, wherein: the output end of the electric push rod (220) is fixedly connected with a second motor (221), and the output end of the second motor (221) is fixedly connected with a cleaning disc (222).
6. The cleaning apparatus for the single crystal silicon wafer according to claim 1, wherein: a control panel (251) is embedded in the left side of the front side wall of the sealing door (250), and a hand groove (252) is formed in the right side of the front side wall of the sealing door (250).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222435640.8U CN218873000U (en) | 2022-09-13 | 2022-09-13 | Monocrystalline silicon piece belt cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222435640.8U CN218873000U (en) | 2022-09-13 | 2022-09-13 | Monocrystalline silicon piece belt cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218873000U true CN218873000U (en) | 2023-04-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222435640.8U Active CN218873000U (en) | 2022-09-13 | 2022-09-13 | Monocrystalline silicon piece belt cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218873000U (en) |
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2022
- 2022-09-13 CN CN202222435640.8U patent/CN218873000U/en active Active
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