CN215466309U

CN215466309U - Cleaning device for monocrystalline silicon wafer

Info

Publication number: CN215466309U
Application number: CN202021992613.5U
Authority: CN
Inventors: 王志伟
Original assignee: Tianjin Fengkaitu Technology Co ltd
Current assignee: Tianjin Fengkaitu Technology Co ltd
Priority date: 2020-09-11
Filing date: 2020-09-11
Publication date: 2022-01-11
Anticipated expiration: 2030-09-11

Abstract

The utility model discloses a cleaning device for monocrystalline silicon wafers, which comprises a cleaning box, wherein a brush plate is fixedly connected to the lower surface of a brush disc, a supporting transverse plate is fixedly connected to the inner wall of the cleaning box, a rotating device is fixedly connected to the upper surface of the supporting transverse plate, a rotating disc is rotatably connected to the upper surface of the rotating device, a fixing column is fixedly connected to the upper surface of the rotating disc, a groove is formed in the upper surface of the rotating disc, an electric telescopic rod is fixedly connected to the inner bottom surface of the groove, a placing box is fixedly connected to the upper surface of the electric telescopic rod, and a first through hole is formed in the rotating disc and located below the groove. According to the utility model, the rotating device can clean the monocrystalline silicon wafer according to the steps, so that the cleaning is more comprehensive and clean, the conveying belt can convey the cleaned monocrystalline silicon wafer out, the hydraulic device drives the brush disc to clean and wash the monocrystalline silicon wafer, the cleaning degree is ensured, and the residual dust is prevented.

Description

Cleaning device for monocrystalline silicon wafer

Technical Field

The utility model relates to the technical field of cleaning devices, in particular to a cleaning device for a monocrystalline silicon wafer.

Background

The monocrystalline silicon piece, the monocrystalline silicon, is a crystal with a basically complete lattice structure, has different properties in different directions, and is a good semiconductor material. Used for manufacturing semiconductor devices, solar cells, and the like, is formed by pulling high-purity polycrystalline silicon in a single crystal furnace.

The existing cleaning device is not thorough in cleaning, has residual dust, is inconvenient to take out, and is complex in cleaning process, so that the cleaning device for the monocrystalline silicon wafer is needed to solve the defects.

SUMMERY OF THE UTILITY MODEL

The utility model aims to solve the defects in the prior art and provides a cleaning device for a monocrystalline silicon wafer.

In order to achieve the purpose, the utility model adopts the following technical scheme: a cleaning device for monocrystalline silicon wafers comprises a cleaning box, wherein the inner top surface of the cleaning box is fixedly connected with a hydraulic device, the lower surface of the hydraulic device is fixedly connected with a motor box, the inner bottom surface of the motor box is fixedly connected with a motor, the output end of the motor is fixedly connected with a rotating shaft, the lower surface of the rotating shaft is fixedly connected with a brush disc, the lower surface of the brush disc is fixedly connected with a brush plate, the inner wall of the cleaning box is fixedly connected with a supporting transverse plate, the upper surface of the supporting transverse plate is fixedly connected with a rotating device, the upper surface of the rotating device is rotatably connected with a rotating disc, the upper surface of the rotary table is fixedly connected with a fixed column, the upper surface of the rotary table is provided with a groove, the interior bottom surface fixedly connected with electric telescopic handle of recess, electric telescopic handle's last fixed surface is connected with places the box, the inside of carousel and the below that is located the recess are provided with first through-hole.

As a further description of the above technical solution:

the inner wall of placing the box is provided with electronic splint, the quantity of placing the box is four, the lower surface of placing the box just is located the edge and rotates with the carousel and be connected.

As a further description of the above technical solution:

the upper surface fixedly connected with liquid tank of wasing the case, the upper surface of wasing the case just is located the left side fixedly connected with water pump of liquid tank, the lower fixed surface of water pump is connected with the water pipe, the lower fixed surface of water pipe is connected with the spray tube, the lower surface of spray tube is provided with the shower nozzle.

As a further description of the above technical solution:

wash the inner wall of case and be located the left side fixedly connected with conveyer belt that supports the diaphragm, the upper surface of conveyer belt is provided with the second through-hole, the left surface that washs the case and be located the conveyer belt is provided with the export.

As a further description of the above technical solution:

the left side fixedly connected with backup pad of wasing the case, the last fixed surface of backup pad is connected with the protection and fills up, the lower fixed surface who washs the case is connected with the supporting legs.

As a further description of the above technical solution:

the interior bottom surface of wasing the case is provided with the sewage chamber, the right flank of wasing the case just is located bottom fixedly connected with drainage pipe, the upper surface of drainage pipe is provided with the valve.

The utility model has the following beneficial effects:

1. compared with the prior art, the cleaning device is additionally provided with the rotating device and the conveying belt, the rotating device enables the cleaned monocrystalline silicon wafers to be cleaned according to steps, the cleaning is more comprehensive and cleaner, the cleaning process is simple, and the conveying belt enables the cleaned monocrystalline silicon wafers to be conveyed out.

2. Compared with the prior art, the cleaning device is additionally provided with the hydraulic device, the hydraulic device drives the brush disc to clean and wash the monocrystalline silicon wafer, the cleaning degree is ensured, and residual dust is prevented.

Drawings

FIG. 1 is a schematic structural diagram of a cleaning apparatus for a single crystal silicon wafer according to the present invention;

FIG. 2 is a plan view of a turntable of a cleaning apparatus for single-crystal silicon wafers according to the present invention;

FIG. 3 is an enlarged view taken at A in FIG. 1;

FIG. 4 is a plan view of a conveyor belt of a cleaning apparatus for single crystal silicon wafers according to the present invention.

Illustration of the drawings:

1. a support plate; 2. a protective pad; 3. an outlet; 4. a cleaning tank; 5. brushing the board; 6. brushing a disc; 7. a rotating shaft; 8. a motor case; 9. a hydraulic device; 10. a motor; 11. a water pump; 12. a liquid tank; 13. a water pipe; 14. a nozzle; 15. a spray head; 16. fixing a column; 17. placing the box; 18. a turntable; 19. a valve; 20. a drain pipe; 21. supporting legs; 22. a sewage chamber; 23. a rotating device; 24. supporting the transverse plate; 25. A first through hole; 26. a conveyor belt; 27. an electric splint; 28. a groove; 29. an electric telescopic rod; 30. A second via.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention; the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance, and furthermore, unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

Referring to fig. 1-4, one embodiment of the present invention is provided: a cleaning device for monocrystalline silicon wafers comprises a cleaning box 4, wherein the inner top surface of the cleaning box 4 is fixedly connected with a hydraulic device 9, a brush disc 6 is driven to move up and down, the lower surface of the hydraulic device 9 is fixedly connected with a motor box 8, the inner bottom surface of the motor box 8 is fixedly connected with a motor 10, the output end of the motor 10 is fixedly connected with a rotating shaft 7, the lower surface of the rotating shaft 7 is fixedly connected with the brush disc 6, the lower surface of the brush disc 6 is fixedly connected with a brush plate 5 for cleaning the monocrystalline silicon wafers, the inner wall of the cleaning box 4 is fixedly connected with a supporting transverse plate 24, the upper surface of the supporting transverse plate 24 is fixedly connected with a rotating device 23, the upper surface of the rotating device 23 is rotatably connected with a rotating disc 18, a placing box 17 is driven to rotate, the monocrystalline silicon wafers in the placing box 17 are cleaned according to steps, a fixing column 16 is fixedly connected to the upper surface of the rotating disc 18, and the upper surface of the rotating disc 18 is provided with a groove 28, the inner bottom surface of the groove 28 is fixedly connected with an electric telescopic rod 29, the placing box 17 is pushed to ascend, the monocrystalline silicon piece falls on the bag conveying belt 26, the placing box 17 is fixedly connected with the upper surface of the electric telescopic rod 29, and a first through hole 25 is formed in the rotary table 18 and located below the groove 28.

The inner wall of the placing box 17 is provided with an electric clamping plate 27, the number of the placing box 17 is four, the lower surface of the placing box 17 is positioned at the edge and is rotationally connected with the rotary table 18, the upper surface of the cleaning box 4 is fixedly connected with the liquid tank 12, the upper surface of the cleaning box 4 is fixedly connected with the water pump 11 positioned at the left side of the liquid tank 12, the lower surface of the water pump 11 is fixedly connected with the water pipe 13, the lower surface of the water pipe 13 is fixedly connected with the spray pipe 14, the lower surface of the spray pipe 14 is provided with the spray head 15, the inner wall of the cleaning box 4 is fixedly connected with the conveyor belt 26 positioned at the left side of the supporting transverse plate 24, the upper surface of the conveyor belt 26 is provided with a second through hole 30, the left side of the cleaning box 4 is provided with the outlet 3 positioned at the left side of the conveyor belt 26, the left side of the cleaning box 4 is fixedly connected with the supporting plate 1, the upper surface of the supporting plate 1 is fixedly connected with the protective pad 2, and the lower surface of the cleaning box 4 is fixedly connected with the supporting leg 21, the inner bottom surface of the cleaning box 4 is provided with a sewage cavity 22, the right side surface of the cleaning box 4 is fixedly connected with a drainage pipe 20 at the bottom, and the upper surface of the drainage pipe 20 is provided with a valve 19.

The working principle is as follows: when the device is used, monocrystalline silicon wafers are placed into a placing box 17 by an operator and clamped by an electric clamping plate 27, a rotating device 23 drives a rotating disc 18 to rotate, the rotating disc 18 drives the placing box to rotate 17, a water pump 11 pumps liquid in a liquid tank 12 and sprays the liquid onto the monocrystalline silicon wafers in the placing box 17 through a spray head 15, a hydraulic device 9 is controlled to drive a motor box 8 to move up and down, the motor box 8 drives a brush disc 6 to move up and down, a motor 10 drives the brush disc 6 to rotate, when a lower surface brush plate 5 of the brush disc 6 is driven by the hydraulic device 9 to contact the monocrystalline silicon wafers in the placing box 17, the motor 10 starts to work to clean the monocrystalline silicon wafers, after the cleaning is completed, an electric telescopic rod 29 lifts the placing box 17, the electric clamping plate 27 is loosened, the monocrystalline silicon wafers fall onto a conveying belt 26 and are conveyed out through an outlet 3, and the cleaned sewage is discharged through a drainage pipe 20.

Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments or portions thereof without departing from the spirit and scope of the utility model.

Claims

1. A cleaning device for a single crystal silicon wafer, comprising a cleaning tank (4), characterized in that: the inner top surface of the cleaning box (4) is fixedly connected with a hydraulic device (9), the lower surface of the hydraulic device (9) is fixedly connected with a motor box (8), the inner bottom surface of the motor box (8) is fixedly connected with a motor (10), the output end of the motor (10) is fixedly connected with a rotating shaft (7), the lower surface of the rotating shaft (7) is fixedly connected with a brush disc (6), the lower surface of the brush disc (6) is fixedly connected with a brush plate (5), the inner wall of the cleaning box (4) is fixedly connected with a supporting transverse plate (24), the upper surface of the supporting transverse plate (24) is fixedly connected with a rotating device (23), the upper surface of the rotating device (23) is rotatably connected with a rotating disc (18), the upper surface of the rotating disc (18) is fixedly connected with a fixing column (16), the upper surface of the rotating disc (18) is provided with a groove (28), and the inner bottom surface of the groove (28) is fixedly connected with an electric telescopic rod (29), the upper surface of electric telescopic handle (29) is fixedly connected with places box (17), the inside of carousel (18) just is located the below of recess (28) and is provided with first through-hole (25).

2. A cleaning apparatus for a single crystal silicon wafer according to claim 1, wherein: wash upper surface fixedly connected with liquid tank (12) of case (4), the upper surface of washing case (4) just is located left side fixedly connected with water pump (11) of liquid tank (12), the lower fixed surface of water pump (11) is connected with water pipe (13), the lower fixed surface of water pipe (13) is connected with spray tube (14), the lower surface of spray tube (14) is provided with shower nozzle (15).

3. A cleaning apparatus for a single crystal silicon wafer according to claim 1, wherein: wash the inner wall of case (4) and be located left side fixedly connected with conveyer belt (26) that support diaphragm (24), the upper surface of conveyer belt (26) is provided with second through-hole (30), the left surface that just is located conveyer belt (26) of washing case (4) is provided with export (3).

4. A cleaning apparatus for a single crystal silicon wafer according to claim 1, wherein: the cleaning box is characterized in that a supporting plate (1) is fixedly connected to the left side face of the cleaning box (4), a protective pad (2) is fixedly connected to the upper surface of the supporting plate (1), and supporting legs (21) are fixedly connected to the lower surface of the cleaning box (4).

5. A cleaning apparatus for a single crystal silicon wafer according to claim 1, wherein: the interior bottom surface of wasing case (4) is provided with sewage chamber (22), the right flank of wasing case (4) just is located bottom fixedly connected with discharge tube (20), the upper surface of discharge tube (20) is provided with valve (19).