CN217479567U - Chemical solution liquid level sweeps device - Google Patents
Chemical solution liquid level sweeps device Download PDFInfo
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- CN217479567U CN217479567U CN202221445656.0U CN202221445656U CN217479567U CN 217479567 U CN217479567 U CN 217479567U CN 202221445656 U CN202221445656 U CN 202221445656U CN 217479567 U CN217479567 U CN 217479567U
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- chemical solution
- hollow tube
- liquid level
- tank body
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Abstract
The utility model discloses a chemical solution liquid level sweeps device, including the cell body, cell lateral wall top is run through and is equipped with the intake pipe, the port that the intake pipe is located the cell body inside is connected with the bellows, the hollow tube is installed to bellows one end, the hollow tube below evenly is equipped with a plurality of air jets along length direction, be equipped with in the cell body with the swing subassembly that the hollow tube is connected, the utility model relates to an electroplate technical field, this device compact structure, accessible air jet blowout nitrogen gas sweeps the liquid level of chemical solution to the evaporation of moisture in the chemical solution with higher speed, the exhaust pipe can be used to the discharge of nitrogen gas, and drive structure can drive rack reciprocating motion to make hollow tube and air jet reciprocating swing through the gear, improve and sweep the scope, convenient to use.
Description
Technical Field
The utility model relates to an electroplate technical field, specifically be a chemical solution liquid level sweeps device.
Background
The wafer is a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and the raw material is silicon, and high-purity polycrystalline silicon is dissolved and doped into a silicon crystal seed crystal, and then slowly pulled out to form cylindrical monocrystalline silicon. After the silicon crystal bar is ground, polished and sliced, silicon crystal wafers are formed, namely, the wafer production line is mainly 8 inches and 12 inches in the wafer domestic.
In the manufacture of semiconductor chips, electroplating is a common method for forming a film on a wafer. In advanced packaging technology, electroplating is often used to form copper pillars, solder joints, etc. on the wafer because electroplating has the advantages of simple process, low cost, etc.
In the process of electroplating, the wafer full of electroplating solution needs to be cleaned at the end of electroplating, and the cleaning process needs to be completed in the electroplating bath. In the cleaning process, a small amount of water drops into the plating tank, and during continuous operation, the concentration of the entire plating solution is affected by the accumulated dropping amount of water, resulting in adverse effects.
SUMMERY OF THE UTILITY MODEL
The utility model provides a not enough to prior art, the utility model provides a chemical solution liquid level sweeps device has solved the problem that the concentration was influenced to the intaking in the current plating bath.
In order to achieve the above purpose, the utility model discloses a following technical scheme realizes: the utility model provides a chemical solution liquid level sweeps device, includes the cell body, it is equipped with the intake pipe to run through above the cell body side wall, the port that the intake pipe is located the cell body inside is connected with the bellows, the hollow tube is installed to bellows one end, evenly be equipped with a plurality of air jet along length direction below the hollow tube, be equipped with in the cell body with the swing subassembly that the hollow tube is connected.
Preferably, the swing assembly comprises a pair of support plates arranged on the inner wall of the tank body, a pair of rotating shafts are rotatably arranged on the inner walls of the support plates, two ends of the hollow pipe are fixedly connected with the pair of rotating shafts, a gear is fixedly arranged on one of the pair of rotating shafts, and a driving structure for enabling the gear to rotate in a reciprocating manner is arranged on the tank body.
Preferably, the drive structure is including locating the support of cell body outer wall, be equipped with the motor on the support, the carousel is installed to the motor drive end, the carousel lower wall just is close to excircle department and is equipped with the driving lever, cell body side wall is equipped with the through-hole, the slip cartridge of through-hole has the push rod, push rod one end be equipped with gear engagement's rack, the other end are equipped with the drive frame, be equipped with in the drive frame and stir the groove, the driving lever embedding stir the inslot and can slide in stirring the inslot.
Preferably, the upper wall of the tank body is provided with a top cover, and the top cover is provided with an exhaust pipe.
Preferably, a liquid discharge pipe is arranged at the bottom of the groove body.
Advantageous effects
The utility model discloses a chemical solution liquid level sweeps device possesses following beneficial effect: this device compact structure, accessible air nozzle blowout nitrogen gas sweeps chemical solution's liquid level to with higher speed the evaporation of moisture in the chemical solution, the exhaust pipe can be used to the discharge of nitrogen gas, and drive structure can drive rack reciprocating motion, and makes hollow tube and air nozzle reciprocating swing through the gear, improves and sweeps the scope, convenient to use.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
Fig. 2 is a schematic view of the top view of the present invention.
In the figure: 1. a tank body; 2. a top cover; 3. an air inlet pipe; 4. a bellows; 5. a hollow tube; 6. an air nozzle; 7. a support plate; 8. a rotating shaft; 9. a gear; 10. a support; 11. a motor; 12. a turntable; 13. a deflector rod; 14. a push rod; 15. a rack; 16. a driving frame; 17. a poking groove; 18. an exhaust duct; 19. and a liquid discharge pipe.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-2, the present invention provides a technical solution: a chemical solution liquid level purging device comprises a tank body 1, wherein an air inlet pipe 3 penetrates through the upper portion of the side wall of the tank body 1, a port, located inside the tank body 1, of the air inlet pipe 3 is connected with a corrugated pipe 4, a hollow pipe 5 is installed at one end of the corrugated pipe 4, a plurality of air nozzles 6 are uniformly arranged below the hollow pipe 5 along the length direction, and a swinging assembly connected with the hollow pipe 5 is arranged in the tank body 1; the swinging assembly comprises a pair of support plates 7 arranged on the inner wall of the tank body 1, a pair of rotating shafts 8 are rotatably arranged on the inner walls of the support plates 7, two ends of the hollow pipe 5 are fixedly connected with the pair of rotating shafts 8, a gear 9 is fixedly arranged on one of the pair of rotating shafts 8, and a driving structure for enabling the gear 9 to rotate in a reciprocating manner is arranged on the tank body 1; the driving structure comprises a support 10 arranged on the outer wall of the tank body 1, a motor 11 is arranged on the support 10, a rotary disc 12 is mounted at the driving end of the motor 11, a shifting rod 13 is arranged on the lower wall of the rotary disc 12 and close to the outer circle, a through hole is formed in the side wall of the tank body 1, a push rod 14 is slidably inserted into the through hole, a rack 15 meshed with the gear 9 is arranged at one end of the push rod 14, a driving frame 16 is arranged at the other end of the push rod, a shifting groove 17 is formed in the driving frame 16, and the shifting rod 13 is embedded into the shifting groove 17 and can slide in the shifting groove 17; a top cover 2 is arranged on the upper wall of the tank body 1, and an exhaust pipe 18 is arranged on the top cover 2; a liquid discharge pipe 19 is arranged at the bottom of the tank body 1.
The following working principles, detailed connecting means thereof, and the following main descriptions of the working principles and processes thereof are well known in the art, and will be referred to by those skilled in the art for the specific connection and operation sequence of the components in the present disclosure.
Example (b): during the use, carry the nitrogen gas to hollow tube 5 in through intake pipe 3, spout by air nozzle 6 to the chemical solution liquid level again, start motor 11 simultaneously, motor 11 drives carousel 12 and rotates, and make driving lever 13 slide in stirring groove 17, and along with the rotation of driving lever 13, driving lever 13 can drive the drive frame 16 simultaneously and make horizontal reciprocating motion, push rod 14 drives rack 15 thereupon and makes the same motion, gear 9 with rack 15 meshing drives pivot 8 and hollow tube 5 and makes reciprocating swing, thereby increase and sweep the area, accelerate the evaporation of the interior moisture of chemical solution.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation. The use of the phrase "comprising one of the elements does not exclude the presence of other like elements in the process, method, article, or apparatus that comprises the element.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (5)
1. The utility model provides a chemical solution liquid level sweeps device, includes cell body (1), its characterized in that, cell body (1) lateral wall top is run through and is equipped with intake pipe (3), intake pipe (3) are located the inside port of cell body (1) and are connected with bellows (4), hollow tube (5) are installed to bellows (4) one end, evenly be equipped with a plurality of air jet (6) along length direction in hollow tube (5) below, be equipped with in cell body (1) with the swing subassembly that hollow tube (5) are connected.
2. The chemical solution liquid level purging device according to claim 1, wherein the swing assembly comprises a pair of support plates (7) arranged on the inner wall of the tank body (1), a pair of rotating shafts (8) are rotatably mounted on the inner walls of the support plates (7), two ends of the hollow tube (5) are fixedly connected with the rotating shafts (8), a gear (9) is fixedly arranged on one of the rotating shafts (8), and a driving structure for driving the gear (9) to rotate in a reciprocating manner is arranged on the tank body (1).
3. The chemical solution liquid level purging device according to claim 2, wherein the driving structure comprises a support (10) arranged on the outer wall of the tank body (1), a motor (11) is arranged on the support (10), a rotary disc (12) is installed at the driving end of the motor (11), a shifting rod (13) is arranged on the lower wall of the rotary disc (12) and close to an excircle, a through hole is formed in the side wall of the tank body (1), a push rod (14) is slidably inserted into the through hole, one end of the push rod (14) is provided with a rack (15) meshed with the gear (9), the other end of the push rod is provided with a driving frame (16), a shifting groove (17) is formed in the driving frame (16), and the shifting rod (13) is embedded into the shifting groove (17) and can slide in the shifting groove (17).
4. A chemical solution liquid level purging device as claimed in claim 2, wherein a top cover (2) is arranged on the upper wall of the tank body (1), and an exhaust pipe (18) is arranged on the top cover (2).
5. A chemical solution level sweeping device according to claim 2, wherein a drain pipe (19) is arranged at the bottom of the tank body (1).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202221445656.0U CN217479567U (en) | 2022-06-10 | 2022-06-10 | Chemical solution liquid level sweeps device |
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CN202221445656.0U CN217479567U (en) | 2022-06-10 | 2022-06-10 | Chemical solution liquid level sweeps device |
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CN217479567U true CN217479567U (en) | 2022-09-23 |
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CN202221445656.0U Active CN217479567U (en) | 2022-06-10 | 2022-06-10 | Chemical solution liquid level sweeps device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115889310A (en) * | 2022-12-29 | 2023-04-04 | 重庆宇隆电子技术研究院有限公司 | Chip mounter suction nozzle belt cleaning device |
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2022
- 2022-06-10 CN CN202221445656.0U patent/CN217479567U/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115889310A (en) * | 2022-12-29 | 2023-04-04 | 重庆宇隆电子技术研究院有限公司 | Chip mounter suction nozzle belt cleaning device |
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