CN114632751A - Cleaning system - Google Patents

Cleaning system Download PDF

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Publication number
CN114632751A
CN114632751A CN202210264827.8A CN202210264827A CN114632751A CN 114632751 A CN114632751 A CN 114632751A CN 202210264827 A CN202210264827 A CN 202210264827A CN 114632751 A CN114632751 A CN 114632751A
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CN
China
Prior art keywords
cleaning
basket
support
flower basket
supporting
Prior art date
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Granted
Application number
CN202210264827.8A
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Chinese (zh)
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CN114632751B (en
Inventor
李广义
南建辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Naura Microelectronics Equipment Co Ltd
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Beijing Naura Microelectronics Equipment Co Ltd
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Application filed by Beijing Naura Microelectronics Equipment Co Ltd filed Critical Beijing Naura Microelectronics Equipment Co Ltd
Priority to CN202210264827.8A priority Critical patent/CN114632751B/en
Publication of CN114632751A publication Critical patent/CN114632751A/en
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Publication of CN114632751B publication Critical patent/CN114632751B/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/004Nozzle assemblies; Air knives; Air distributors; Blow boxes
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00Drying solid materials or objects by processes not involving the application of heat
    • F26B5/08Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2240/00Type of materials or objects being cleaned
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The application discloses cleaning system relates to the semiconductor field. A cleaning system comprises a cleaning device and a flower basket; the cleaning device comprises a device body, a supporting component and a cleaning component; the device body is provided with a process cavity; the supporting assembly comprises a supporting frame arranged in the process cavity, and the flower basket is arranged on the supporting frame; the cleaning assembly comprises a spray arm, the spray arm is arranged in the process cavity and corresponds to the flower basket, and the spray arm is used for spraying cleaning media or drying media to the flower basket. This application can solve the whole in-process conveying basket of flowers of self-cleaning at least and lead to the problem that cleaning efficiency is low.

Description

Cleaning system
Technical Field
The application belongs to the technical field of semiconductor equipment, and particularly relates to a cleaning system.
Background
In a semiconductor wafer manufacturing process, a wafer basket is required to carry the wafer so as to facilitate the wafer processing. In the process of carrying out technology to the wafer, piece basket and wafer direct contact, the yield of piece basket's cleanliness factor direct influence wafer, consequently, in wafer manufacturing process, the requirement to piece basket cleanliness factor is higher, from this, need wash the piece basket to guarantee its cleanliness factor. In order to improve productivity, a wafer basket is generally carried by a basket of flowers, and a plurality of wafer baskets can be cleaned at a time.
Currently, the cleaning mode of the wafer basket is divided into manual cleaning and automatic cleaning. The manual cleaning is to manually place the flower basket with the piece basket into a cleaning tank for soaking cleaning, and after the cleaning step is completed, manually place the flower basket with the piece basket into a drying tank for drying.
The automatic cleaning is to place the flower basket with the piece basket at the feeding and discharging station and convey the flower basket to the cleaning station through the conveying mechanism so as to clean the flower basket; after the cleaning step is finished, the conveying mechanism conveys the flower basket provided with the piece basket to a drying station to dry the flower basket; and after the drying step is finished, the conveying mechanism conveys the flower basket provided with the piece basket back to the loading and unloading station.
However, the manual cleaning mode has low cleaning efficiency, impurities are easily introduced into the manual basket, the yield of wafers is affected, and the working intensity of personnel is high; the automatic cleaning mode needs the conveying mechanism to convey in the whole process, so that the cleaning time is prolonged, and the problems of low cleaning efficiency, low productivity and the like are caused.
Disclosure of Invention
The embodiment of the application aims at providing a cleaning system, which at least can solve the problem of low cleaning efficiency caused by conveying a flower basket in the whole automatic cleaning process.
In order to solve the technical problem, the present application is implemented as follows:
the embodiment of the application provides a cleaning system for wash the wafer basket who bears the weight of the wafer, and this cleaning system includes: the flower basket is matched with the cleaning device;
the cleaning device comprises a device body, a supporting component and a cleaning component;
the device body is provided with a process cavity;
the supporting assembly comprises a supporting frame arranged in the process cavity, and the flower basket is arranged on the supporting frame;
the cleaning assembly comprises a spray arm, the spray arm is arranged in the process cavity and corresponds to the flower basket, and the spray arm is used for spraying cleaning media or drying media to the flower basket.
In the embodiment of the application, the wafer basket to be cleaned can be positioned in the process cavity through the supporting assembly, so that a cleaning space and a cleaning environment can be provided for cleaning the wafer basket; can wash the piece basket through clean subassembly to get rid of the impurity on the piece basket, make the piece basket keep clean, avoid impurity on the piece basket to influence the yield of wafer, and, can also dry the piece basket through clean subassembly.
Based on the arrangement, the automatic cleaning of the wafer basket can be realized through the cleaning system, and the flower basket with the wafer basket is not required to be manually carried, so that the risk of introducing impurities into the manual basket is avoided, the yield of wafers is ensured, and the manual operation intensity is reduced; meanwhile, the whole cleaning process (comprising the cleaning step and the drying step) is positioned in the process cavity, and the cleaning medium or the drying medium is sprayed to the flower basket through the spray arm, so that the cleaning step and the drying step can be switched in the process cavity, the whole cleaning process does not need to manually lift the basket or convey the wafer basket through a conveying mechanism, the cleaning process time is reduced, and the cleaning efficiency and the cleaning capacity are improved.
Drawings
Fig. 1 is a schematic structural view of a manual washing apparatus in the related art;
FIG. 2 is a schematic structural diagram of a cleaning system disclosed in an embodiment of the present application;
FIG. 3 is a schematic cross-sectional view of a cleaning system according to an embodiment of the present disclosure;
FIG. 4 is a schematic view of a portion of a support stand according to an embodiment of the present disclosure;
FIG. 5 is a schematic structural diagram of a flower basket with a sheet basket according to an embodiment of the present disclosure;
fig. 6 is a schematic cross-sectional view of a flower basket disclosed in an embodiment of the present application.
Description of reference numerals:
01-a cleaning tank; 02-drying tank; 03-piece basket; 04-flower basket;
100-a cleaning device;
110-the device body; 111-a process chamber; 112-a reservoir cavity; 113-a deck plate; 1131-through hole;
120-a support assembly; 121-a support frame; 1211 — an accommodation region; 1212-a first fence; 1213-second pen; 122-support shaft; 123-a drive member;
130-a cleaning component; 131-a spray arm; 132-a delivery line; 133-a spray head;
200-flower basket; 210-a frame; 211-an opening; 212-elongated hole or slot; 220-a support; 230-a compression member; 240-a retaining member; 250-keel;
300-piece basket.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some, but not all, embodiments of the present application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
The terms first, second and the like in the description and in the claims of the present application are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It will be appreciated that the data so used may be interchanged under appropriate circumstances such that embodiments of the application are capable of operation in sequences other than those illustrated or described herein, and that the terms "first," "second," etc. are generally used in a generic sense and do not limit the number of terms, e.g., a first term can be one or more than one.
In the related art, as shown in fig. 1, a manual wafer basket cleaning device is disclosed, which includes a cleaning tank 01 and a drying tank 02, and in the cleaning step, a flower basket 04 with a wafer basket 03 is manually placed in the cleaning tank 01 for soaking; after the cleaning step is completed, manually lifting the basket and moving the basket into a drying tank 02 for drying; after the drying step is completed, the flower basket 04 with the sheet basket 03 is manually moved out of the drying tank 02 and placed at a preset position. However, the above method has manual participation, which increases the labor intensity of the manual work and has lower cleaning efficiency; in addition, impurities are easily introduced into the manual lifting basket, and the yield of the wafer is influenced.
In order to solve the problem, the embodiment of the application provides a cleaning system for wash the piece basket that bears the weight of the wafer, through the washing to the piece basket, can guarantee the cleanliness factor of piece basket, thereby can effectively avoid the impurity on the piece basket to pollute the wafer and influence the wafer yields.
Referring to fig. 2-6, the disclosed cleaning system includes a cleaning device 100 and a flower basket 200, wherein the cleaning device 100 is used for cleaning a wafer basket 300, the flower basket 200 is used for carrying the wafer basket 300, and the flower basket 200 is used in cooperation with the cleaning device 100. Optionally, the flower basket 200 is detachably provided to the washing apparatus 100. It should be noted here that the wafer basket 300 may also be understood as a cassette (cassette) which is mainly used for carrying wafers.
The washing device 100 includes a device body 110, a support assembly 120, and a cleaning assembly 130. The device body 110 is a base mounting member, which can provide a mounting and supporting base for other members. In order to clean the wafer basket 300, the apparatus body 110 has a process chamber 111, and the wafer basket 300 is located in the process chamber 111 when a cleaning process is performed, so that the wafer basket 300 can be cleaned in the process chamber 111. Alternatively, the device body 110 may be a housing, e.g., a housing in the shape of a cube, the interior of which is used to provide a cleaning environment and a cleaning space for the cleaning sheet basket 300. Of course, the device body 110 may have other shapes, and the specific form of the device body 110 is not limited in the embodiments of the present application.
The support assembly 120 is used to mount and support the wafer basket 300 to ensure that the wafer basket 300 is within the process chamber 111. In order to mount and support the wafer basket 300, as shown in fig. 3, the support assembly 120 includes a support frame 121, the support frame 121 is disposed in the process chamber 111, and the flower basket 200 is disposed on the support frame 121. The flower basket 200 is used for placing the piece basket 300, and the flower basket 200 is arranged on the support frame 121 so as to mount and support the flower basket 200 through the support frame 121. Optionally, the flower basket 200 is detachably disposed on the supporting frame 121, so that the flower basket 200 can be detached from the supporting frame 121 or mounted to the supporting frame 121, thereby facilitating placement of the wafer-bearing wafer sheet basket 200.
Optionally, one flower basket 200 may be installed on the supporting frame 121, and a plurality of flower baskets 200 may also be installed on the supporting frame, and the specific number of the flower baskets 200 is not limited; in addition, the flower basket 200 may contain one piece basket 300, and may also contain a plurality of piece baskets 300, and the specific number of piece baskets 300 is not limited. In order to improve the cleaning efficiency, a plurality of sheet baskets 300 may be placed on the flower basket 200, and a plurality of flower baskets 200 may be mounted on the supporting frame 121, so that the plurality of sheet baskets 300 may be cleaned at one time, and the cleaning efficiency and productivity may be improved.
Cleaning assembly 130 is used to perform a cleaning process on wafer basket 300 to remove impurities from the surface of wafer basket 300, thereby ensuring the cleanliness of wafer basket 300. As shown in fig. 3, the cleaning assembly 130 may include a spray arm 131, and the spray arm 131 is disposed in the process chamber 111 and corresponds to the flower basket 200. Based on this, the cleaning medium or the drying medium may be sprayed to the chip basket 300 mounted to the flower basket 200 by the spray arm 131 to clean or dry the chip basket 300. Alternatively, the cleaning medium may be a cleaning liquid and the drying medium may be a drying gas. The corresponding arrangement means that the spray arms 131 and the baskets 230 are located at positions where the cleaning medium or the drying medium sprayed from the spray arms 131 can be sprayed to the baskets 200 and 300.
In the embodiment of the present application, the wafer basket 300 to be cleaned can be located in the process chamber 111 through the support assembly 120, so as to provide a cleaning space and a cleaning environment for the wafer basket 300; the cleaning assembly 130 can perform a whole cleaning process (including a cleaning step and a drying step) on the wafer basket 300 to remove impurities on the wafer basket 300 and dry the wafer basket 300, so that the wafer basket 300 is kept clean and the impurities on the wafer basket 300 are prevented from affecting the yield of wafers.
Based on the arrangement, the cleaning system can automatically clean the wafer basket 300, and the flower basket 200 with the wafer basket 300 is not required to be manually carried, so that the risk of introducing impurities into a manual basket is avoided, the yield of wafers is ensured, and the manual labor intensity is reduced; meanwhile, the whole cleaning process (including the cleaning step and the drying step) is positioned in the process cavity 111, and the cleaning medium or the drying medium is sprayed to the flower basket through the spray arm 131, so that the cleaning step and the drying step are switched in the process cavity 111, the whole cleaning process does not need to be carried out manually or the wafer basket 300 is conveyed through a conveying mechanism, the process time is shortened, and the cleaning efficiency and the productivity are improved.
In order to further improve the cleaning efficiency, the spin cleaning may be further performed on the sheet basket 300 to enlarge the cleaning area, thereby improving the cleaning efficiency. As shown in fig. 3, the supporting assembly 120 may include a supporting shaft 122 and a driving member 123, wherein the supporting shaft 122 is in transmission connection with the driving member 123, and the supporting shaft 122 may be driven to rotate by the driving member 123. In order to allow the support shaft 122 to rotate, the support shaft 122 may be rotatably coupled to the apparatus body 110 such that the support shaft 122 is rotatable with respect to the apparatus body 110, and at the same time, the support shaft 122 may be further installed through the apparatus body 110.
To accomplish the spin cleaning of the wafer basket 300, at least a portion of the support shaft 122 is extended into the process chamber 111, and the support frame 121 is disposed on the support shaft 122. Considering that the sheet basket 300 is placed on the flower basket 200, the flower basket 200 is disposed on the supporting frame 121, and the supporting frame 121 is disposed on the supporting shaft 122. Thus, under the driving action of the driving part 123, the supporting shaft 122 can drive the supporting frame 121 to rotate, the supporting frame 121 drives the flower basket 200 to rotate, the flower basket 200 drives the piece basket 300 to rotate, and finally the piece basket 300 is cleaned in a rotating mode.
Alternatively, the driving member 123 may include a driving member, and the driving member may be in transmission connection with the supporting shaft 122, for example, the driving member may be an electric motor or a motor, and in this case, the output shaft of the driving member may be connected with the supporting shaft 122 through a coupling.
Of course, a transmission member may be connected between the driving member 123 and the supporting shaft 122, and the driving member 123 and the supporting shaft 122 are in transmission connection through the transmission member. Wherein, the transmission component can be a gear set, a chain wheel and chain set, a belt and belt wheel set, a worm wheel and worm set and the like. Through setting up drive disk assembly, can play the deceleration effect to can reduce the rotational speed of piece basket 300, can guarantee the cleaning performance to a certain extent. Optionally, the rotation speed of the sheet basket 300 is not more than 30r/min, including 5r/min, 10r/min, 20r/min, 30r/min, and the like, and may be specifically selected according to actual working conditions.
In addition, a bearing may be disposed at the top wall of the apparatus body 110, a mounting hole may be disposed at the bottom wall, and a bearing may be disposed at the mounting hole, one end of the supporting shaft 122 penetrates into the process chamber 111 of the apparatus body 110 and is connected to the bearing at the top wall, the other end of the supporting shaft 122 is connected to the bearing at the bottom of the apparatus body 110, and the other end extends out of the process chamber 111 so as to be in transmission connection with the driving part 123 at the bottom of the apparatus body 110.
In order to arrange the supporting frame 121 on the supporting shaft 122, an installation sleeve may be arranged in the middle area of the supporting frame 121, and when being installed, the installation sleeve is sleeved on the supporting shaft 122 to realize transmission connection. Specifically, a transmission key may be provided between the mounting sleeve and the supporting shaft 122 to transmit the power and motion of the supporting shaft 122 to the supporting frame 121 through the transmission key, and to the flower basket 200 through the supporting frame 121, and finally the piece basket 300 is driven to rotate around the axis of the supporting shaft 122 by the flower basket 200 to achieve spin cleaning. Of course, it is also possible to directly fix the central region of the supporting frame 121 to the outer wall of the supporting shaft 122, for example, by welding, screwing, riveting, etc.
As shown in fig. 3 and 4, in some embodiments, the supporting frame 121 may have a plurality of receiving areas 1211, the plurality of receiving areas 1211 are distributed around the supporting shaft 122, and each receiving area 1211 is respectively provided with the flower basket 200. In this way, the plurality of baskets 200 can be mounted on the support frame 121 through the plurality of receiving regions 1211, so that the sheet basket 300 mounted on the plurality of baskets 200 can be cleaned.
It should be noted that, during the cleaning process, the plurality of flower baskets 200 can be rotated by the supporting shaft 122 and the supporting frame 121, so as to simultaneously perform the rotation cleaning on the piece baskets 300 contained in the plurality of flower baskets 200. Of course, during the cleaning process, the sheet basket 300 mounted on one flower basket 200 may be cleaned first, and then the next flower basket 200 may be rotated to the position corresponding to the cleaning assembly 130 by rotating the supporting shaft 122 and the supporting frame 121, so that the sheet baskets 300 mounted on each flower basket 200 may be cleaned sequentially.
As shown in fig. 4, to mount the flower basket 200, the supporting frame 121 may include a first rail 1212 and a second rail 1213, wherein the first rail 1212 and the second rail 1213 are spaced apart from each other in the axial direction of the supporting shaft 122 by a distance selected according to the size of the flower basket 200. Thus, the first and second fences 1212 and 1213 enclose an accommodation area 1211 for facilitating installation of the flower basket 200.
When the flower basket 200 is installed, the first rail 1212 is used to support the bottom of the flower basket 200, and the second rail 1213 is used to limit the sides of the flower basket 200. Based on this, the flower basket 200 can be supported by the first fence 1212 to prevent the flower basket 200 from falling; the flower basket 200 can be limited by the second rail 1213 to prevent the rotating flower basket 200 from being separated from the supporting frame 121 by centrifugal force. In this way, the first rail 1212 and the second rail 1213 can be used to mount the flower basket 200, so as to improve the mounting stability of the flower basket 200 and prevent the flower basket 200 from being separated from the supporting frame 121.
Alternatively, as shown in fig. 4, the first fence 1212 may include a first ring beam and a plurality of supporting beams, wherein respective inner ends of the plurality of supporting beams are connected to the supporting shafts 122, respectively, and respective outer ends are connected to the first ring beam, respectively. In this way, the flower basket 200 may be supported by a plurality of supporting beams.
As shown in fig. 4, the second fence 1213 may include a second annular beam, an upper left curved beam, an upper right curved beam, a lower left curved beam, and a lower right curved beam, wherein the second annular beam is disposed around the outer side of the support shaft 122, inner ends of the upper left curved beam, the upper right curved beam, the lower left curved beam, and the lower right curved beam are respectively connected to the support shaft 122, outer ends of the upper left curved beam, the upper right curved beam, the lower left curved beam, and the lower right curved beam are respectively connected to the second annular beam, and the upper left curved beam and the lower left curved beam are vertically disposed in a corresponding manner, the upper left curved beam and the upper right curved beam are disposed at a left-right interval, and the lower left curved beam and the lower right curved beam are disposed at a left-right interval. Based on this, the left side wall of the basket 200 is limited by the upper left bent beam and the lower left bent beam, and the right side wall of the basket 200 is limited by the upper right bent beam and the lower right bent beam, so that it is ensured that the basket 200 does not move in the circumferential direction of the second fence 1213.
For guaranteeing the stability of second rail 1213, can also make and realize being connected through the tie-beam between upper left camber beam and the upper right camber beam to strengthen the bearing capacity of upper left camber beam and upper right camber beam, and then improve the bulk strength and the stability of second rail 1213.
In consideration of the fact that the flower basket 200 is not easy to accumulate liquid when inclined, and the plate basket 300 mounted with the flower basket 200 is also not easy to accumulate liquid, the outer side of the first fence 1212 can be lower than the inner side, so that the flower basket 200 arranged on the support frame 121 and the plate basket 300 placed on the flower basket 200 can be high on the inner side and low on the outer side, cleaning media can flow from the inner side to the outer side, and the problem that the cleaning media are accumulated in the flower basket 200 and the plate basket 300 can be solved.
Based on this, in the embodiment of the present application, the first rail 1212 is inclined toward a direction away from the second rail 1213 along a radial direction of the support shaft 122 and away from the support shaft 122, so that the liquid accumulation in the flower basket 200 and the piece basket 300 can be relieved. In some embodiments, the support curved beam may be an L-shaped structure, the long side of the L-shaped structure is used for supporting the bottom of the flower basket 200, and the short side of the L-shaped structure connects the long side with the first ring beam, so that the long side of the L-shaped structure is gradually inclined downward from inside to outside, and the flower basket 200 and the sheet basket 300 are inclined. In addition, the supporting bent beams are recessed downward at the regions close to the first ring beam, so that the side walls of the flower basket 200 can be limited by the first ring beam to prevent the flower basket 200 from being thrown out when rotating.
In order to place the pannier 300 through the flower basket 200, as shown in fig. 5, the flower basket 200 may include a frame 210, a supporting member 220, and a pressing member 230. The plurality of supporting members 220 are arranged at the bottom of the frame 210 at intervals and used for supporting the sheet basket 300, the pressing member 230 is arranged at the top of the frame 210 and used for pressing the sheet basket 300, and the frame 210, the supporting members 220 and the pressing member 230 enclose an accommodating space for accommodating the sheet basket 300.
To reduce the obstruction of the frame 210 to the cleaning or drying medium, and to secure the sheet basket 300, in some embodiments, an opening 211 may be provided in a side of the frame 210, and the frame 210 may be provided with a keel 250 for restraining the sheet basket 300. As such, when placing the sheet basket 300, the sheet basket 300 may be placed inside the frame 210 with the edges of the sheet basket 300 engaging the keels 250 to restrain the sheet basket 300 by the keels 250. By providing the opening 211, the cleaning medium or the drying medium can easily contact the sheet basket 300 through the opening 211, thereby preventing the side wall of the frame 210 from blocking the cleaning medium or the drying medium to affect the cleaning and drying effects of the sheet basket 300.
Alternatively, the supporting member 220 may have a diamond structure or a shuttle structure, and in order to reduce the blocking effect on the cleaning medium or the drying medium, two angles corresponding to the long diagonal lines of each of the diamond structure or the shuttle structure may be abutted against the bottom end surfaces of the plate basket 300 and the flower basket 200, respectively. Based on this, the bottom end of the sheet basket 300 may be supported by the plurality of supporters 220 so that the sheet basket 300 may not fall; meanwhile, the supporting members 220 arranged at intervals and having a diamond structure or a shuttle structure can also reduce the blocking effect on the cleaning medium or the drying medium to the maximum extent, thereby ensuring the cleaning and drying effects on the chip basket 300.
In addition, the pressing member 230 can limit the movement of the sheet basket 300, so that the sheet basket 300 can be effectively prevented from being thrown out of the top of the flower basket 200.
As shown in fig. 5 and 6, the top of each of the two opposite side walls of the frame 210 may be provided with a long hole or a long groove 212, the pressing member 230 is a pressing rod, two ends of the pressing rod are movably disposed in the long holes or the long grooves 212, respectively, and the distance between the pressing rod and the top end of the sheet basket 300 can be adjusted through the movement of the pressing rod.
The long hole or slot 212 extends in a direction away from the bottom end of the flower basket 200, so that the pressing rod can move towards the bottom end of the flower basket 200 or away from the bottom end of the flower basket 200. When the pressing rod moves towards the bottom end direction of the flower basket 200, the top end of the piece basket 300 can be pressed tightly to prevent the piece basket 300 from moving or throwing out; when the pressing rod moves away from the bottom end direction of the flower basket 200, the distance is increased, so that the pressing rod can be suitable for pressing the sheet basket 300 with larger size.
In order to facilitate the assembly and disassembly of the sheet basket 300, in some embodiments, a manner of providing a long groove is adopted, and a notch of the long groove deviates from the bottom end direction of the flower basket 200, so that the pressing rod can be conveniently placed into or taken down from the long groove, and the sheet basket 300 can be assembled and disassembled when the pressing rod is taken down, thereby improving the efficiency of assembling and disassembling the sheet basket 300.
Optionally, the number of the pressing rods can be one or more, and the pressing rods can be selected according to actual working conditions.
Referring to fig. 5 and 6, in order to lock the pressing member 230, the flower basket 200 further includes a locking member 240, and the pressing member 230 may be locked with respect to the frame 210 by the locking member 240 to prevent the pressing member 230 from moving with respect to the frame 210. Alternatively, the locker 240 may be a lock nut, and accordingly, an external thread is provided at least one end of the pressing member 230 to screw-couple the locker 240 with the pressing member 230. So, when the position that compresses tightly piece 230 is adjusted to needs, can loosen retaining member 240 by screwing, when the position that compresses tightly piece 230 need not be adjusted, retaining member 240 can be screwed to can realize compressing tightly the in good time regulation of piece 230.
Referring to fig. 3, in order to deliver the cleaning medium or the drying medium to the spray arm 131 and spray the cleaning medium toward the sheet basket 300 to be cleaned via the spray arm 131, the cleaning assembly 130 may further include a delivery pipe 132, one end of the delivery pipe 132 extends into the process chamber 111, and the spray arm 131 is connected to the delivery pipe 132.
In order to provide the cleaning medium or the drying medium, the other end of the conveying pipeline 132 may be connected with a liquid supply device or a gas supply device; alternatively, both the liquid supply device and the gas supply device may be connected to the delivery pipe 132, and control valves may be provided at both the outlet of the liquid supply device and the outlet of the gas supply device to switch the supply of the cleaning medium or the drying medium by opening or closing the control valves. In this way, the cleaning medium can be conveyed to the spray arm 131 through the conveying pipeline 132 by the liquid supply device, so that the wafer basket 300 can be cleaned; alternatively, the drying medium may be supplied to the spray arm 131 through the supply line 132 by the air supply device, thereby drying the washed wafer basket 300.
It should be noted here that the drying medium supplied by the air supply device is finally sprayed to the wafer basket 300 by the spray arm 131 without filling the drying medium into the process chamber 111 first, so that the usage amount of the drying medium can be reduced, and the purpose of saving the drying medium can be achieved.
Alternatively, the delivery pipe 132 may be one or more, and in addition, the delivery pipe 132 may be disposed at an inner wall of the process chamber 111 to prevent interference with the rotation of the support frame 121.
Alternatively, the liquid supply device may be a cleaning liquid storage tank with a liquid pump, and the gas supply device may be an air pump or a pressure gas tank.
Referring to fig. 3, in order to increase the number of sheets baskets 300 to be washed, the support assembly 120 may include a plurality of support frames 121, the plurality of support frames 121 being spaced apart from each other in the axial direction of the support shaft 122, and thus, the baskets 200 may be respectively mounted through the plurality of support frames 121 to increase the number of the baskets 200, and thus, the number of sheets baskets 300 placed in the plurality of baskets 200 may be increased.
Of course, in other embodiments, the support assembly 120 may further include a support frame 121, and the number of the support frames 121 is not limited in this application.
With continued reference to fig. 3, in order to enlarge the washing area, the cleaning assembly 130 may include a plurality of spray arms 131, and the plurality of spray arms 131 are connected to the conveying pipe 132, such that the washing medium or the drying medium may be conveyed to the plurality of spray arms 131 through the conveying pipe 132, and the plurality of spray arms 131 may simultaneously spray the washing medium or the drying medium to the sheet basket 300, thereby simultaneously washing the plurality of sheet baskets 300, enlarging the washing and drying areas, and improving the washing and drying efficiency and productivity.
In order to improve the cleaning effect, the spray arms 131 may be respectively disposed at both sides of each support frame 121 in the axial direction of the support shaft 122, and thus, the cleaning medium or the drying medium may be simultaneously sprayed from both upper and lower directions through the spray arms 131 at both sides, so that the cleaning effect may be improved.
In some embodiments, a plurality of nozzles 133 may be disposed on the spray arm 131, and by disposing the nozzles 133, the spraying speed of the cleaning medium or the drying medium may be increased, thereby improving the cleaning effect.
Of course, a plurality of nozzles 133 may be disposed on the conveying pipeline 132 to cooperate with the nozzles 133 of the spray arms 131 to spray the cleaning medium or the drying medium to the wafer basket 300, so as to enlarge the cleaning and drying area and improve the cleaning and drying effect and the productivity.
In order to collect the cleaning solution, the apparatus body 110 may have a liquid storage chamber 112, the liquid storage chamber 112 is disposed below the process chamber 111, a platform 113 is disposed between the liquid storage chamber and the process chamber, the platform 113 has a through hole 1311, and the liquid storage chamber 112 and the process chamber 111 can be communicated through the through hole 1311. Based on this, the cleaning medium injected into the process chamber 111 through the spray arm 131 falls onto the platen 113 and flows into the reservoir 112 through the through hole 1311, so that the cleaning medium can be collected by the reservoir 112.
It is considered that the cleaning medium generates steam, and the steam rises along the through holes 1311 and returns into the process chamber 111 to come into contact with the surface of the sheet basket 300 again, causing secondary contamination. Based on this, in some embodiments, the through holes 1311 may be small-diameter through holes, and at this time, the total area of the region on the platform panel 113 where the through holes 1311 are formed is relatively small, so that the cleaning medium steam may be reduced from rising into the process chamber 111 through the through holes 1311, and the problem of secondary pollution of the wafer basket 300 may be effectively alleviated.
In order to discharge the cleaning medium in the reservoir 112, a drain valve may be disposed at the bottom of the reservoir 112 to control the discharge of the cleaning medium by opening and closing the drain valve.
To save the cleaning medium, the cleaning assembly 130 may include a circulation line (not shown), one end of the circulation line is connected to the delivery line 132, the other end of the circulation line extends into the liquid storage cavity 112, and the circulation line has a pump body. Therefore, the cleaning medium collected in the liquid storage cavity 112 can be conveyed to the spray arm 131 through the circulation pipeline and the conveying pipeline 132 in sequence through the pump body, and is sprayed into the process cavity 111 through the spray arm 131, and the cleaning medium after the wafer basket 300 is cleaned flows back to the liquid storage cavity 112 through the through hole 1311 again, so that the cyclic utilization of the cleaning medium is realized, and the purpose of saving the cleaning medium can be achieved.
It should be noted that, when there is no cleaning medium in the liquid storage cavity 112, the cleaning medium may be first delivered to the spray arm 131 through the delivery pipe 132 by the liquid supply device, and after a certain amount of cleaning medium is collected in the liquid storage cavity 112, the liquid supply device may be closed, and the pump body may be opened, so as to recycle the cleaning medium collected in the liquid storage cavity 112.
Based on the cleaning system, the embodiment of the application also discloses a cleaning method, which is applied to the cleaning system, and the cleaning method comprises the following steps:
placing the piece basket in the flower basket;
placing the flower basket with the piece basket on a support frame;
washing the wafer basket with deionized water;
cleaning the wafer basket with cleaning solution;
carrying out rotary spin-drying on the piece basket;
drying the sheet basket;
taking down the flower basket;
and taking down the sheet basket.
It should be noted here that the cleaning method in the embodiment of the present application is implemented based on the above cleaning system. Referring to fig. 2 to 6, the cleaning process is as follows:
first, a plurality of piece baskets 300 are placed in the flower basket 200, the distance between the pressing member 230 and the piece baskets 300 is adjusted by the long holes or slots 212 at the top of the flower basket 200, and the pressing member 230 is locked by the locker 240.
Next, the flower basket 200 with the piece basket 300 is placed on the supporting frame 121, the driving part 123 drives the supporting frame 121 to rotate through the supporting shaft 122, the supporting frame 121 drives the flower basket 200 and the piece basket 300 placed on the flower basket 200 to rotate, and simultaneously, the DI liquid supply device (i.e., the Deionized liquid supply device) and the liquid discharge valve of the liquid storage cavity 112 are opened, at this time, the nozzle 133 can spray DI water (i.e., Deionized water) to the piece basket 300, so that the piece basket 300 is pre-cleaned in the process cavity 111.
After a period of time, the fluid supply to the cleaning fluid is switched and the drain valve of the reservoir 112 is closed, and the spray arm 131 can spray the cleaning fluid to the wafer basket 300 to perform the cleaning process. The liquid supply device of the cleaning liquid is turned off when the cleaning liquid in the liquid storage cavity 112 reaches a certain liquid level along with the flow of the cleaning liquid into the liquid storage cavity 112; and simultaneously, the pump body is opened to recycle the cleaning liquid in the liquid storage cavity 112. After the cleaning solution cleaning step is completed, the driving part 123 drives the flower basket 200 and the sheet basket 300 placed on the flower basket 200 to rotate for a certain time through the supporting shaft 122 and the supporting frame 121, so as to spin off the cleaning solution on the sheet basket 300, the flower basket 200 and the supporting frame 121.
Subsequently, the gas supply means for supplying the dry gas is turned on to spray the dry gas to the sheet basket 300 through the spray head 133 so as to dry the sheet basket 300, and at the same time, the driving part 123 drives the flower basket 200 and the sheet basket 300 placed on the flower basket 200 to rotate through the support shaft 122 and the support frame 121, so that the drying speed can be increased.
Finally, after the drying step is finished, the driving part 123 is closed, the flower basket 200 is removed from the supporting frame 121, the locking part 240 releases the locking of the pressing part 230, and the pressing part 230 is removed or opened, so that the piece basket 300 can be taken out, and the cleaning process of the piece basket 300 is finished.
To sum up, the embodiment of the application can realize the automatic, comprehensive and thorough cleaning of the sheet basket 300, has higher cleaning efficiency, overcomes the capacity limitation, and can save cleaning liquid and drying gas.
While the present embodiments have been described with reference to the accompanying drawings, it is to be understood that the invention is not limited to the precise embodiments described above, which are meant to be illustrative and not restrictive, and that various changes may be made therein by those skilled in the art without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (10)

1. A cleaning system for cleaning a wafer basket (300) carrying wafers, the cleaning system comprising: a cleaning device (100) and a flower basket (200) used in cooperation with the cleaning device (100);
the cleaning device (100) comprises: a device body (110), a support assembly (120) and a cleaning assembly (130);
the device body (110) is provided with a process cavity (111);
the support assembly (120) comprises a support frame (121) arranged in the process cavity (111), and the flower basket (200) is arranged on the support frame (121);
the cleaning assembly (130) comprises a spray arm (131), the spray arm (131) is arranged in the process cavity (111) and corresponds to the flower basket (200), and the spray arm (131) is used for spraying a cleaning medium or a drying medium to the flower basket (200).
2. The washing system according to claim 1, characterized in that the support assembly (120) further comprises a support shaft (122) and a drive member (123) in driving connection with the support shaft (122);
the supporting shaft (122) is rotatably connected with the device body (110), at least part of the supporting shaft (122) extends into the process cavity (111), and the supporting frame (121) is arranged on the supporting shaft (122).
3. A washing system according to claim 2, characterized in that the support frame (121) has a plurality of receiving areas (1211), the receiving areas (1211) are distributed around the support shaft (122), and the flower basket (200) is placed in each receiving area (1211).
4. The washing system according to claim 3, characterized in that the support frame (121) comprises a first fence (1212) for supporting the bottom of the basket (200) and a second fence (1213) for restraining the sides of the basket (200);
the first fence (1212) and the second fence (1213) are arranged at an interval in the axial direction of the support shaft (122);
the first fence (1212) is inclined in a direction away from the second fence (1213) in a radial direction of the support shaft (122) and away from the support shaft (122).
5. The washing system according to claim 1, characterized in that the flower basket (200) comprises a frame (210), a support (220) and a hold-down (230);
a plurality of the supporting pieces (220) are arranged at the bottom of the frame (210) at intervals and used for supporting the sheet basket (300);
the pressing piece (230) is arranged at the top of the frame (210) and is used for pressing the sheet basket (300);
the frame (210), the supporting member (220) and the pressing member (230) enclose a receiving space for receiving the sheet basket (300).
6. The cleaning system according to claim 5, wherein the top of the two opposite side walls of the frame (210) are provided with long holes or slots (212);
the pressing piece (230) is a pressing rod, and two ends of the pressing rod are movably arranged in the long holes or the long grooves (212) opposite to each other respectively so as to adjust the distance between the pressing rod and the top end of the sheet basket (300).
7. The cleaning system of claim 2, wherein the cleaning assembly (130) further comprises a delivery line (132), one end of the delivery line (132) extending into the process chamber (111), the spray arm (131) being connected to the delivery line (132);
the other end of the conveying pipeline (132) is used for being connected with a liquid supply device or a gas supply device,
or the other end of the conveying pipeline (132) is used for being respectively connected with a liquid supply device and an air supply device, and the outlet of the liquid supply device and the outlet of the air supply device are both provided with control valves.
8. The washing system according to claim 7, characterized in that the support assembly (120) comprises a plurality of the support frames (121), the plurality of the support frames (121) being arranged at intervals along an axial direction of the support shaft (122);
the cleaning assembly (130) comprises a plurality of spray arms (131), and the spray arms (131) are respectively arranged on two sides of each support frame (121) along the axial direction of the support shaft (122).
9. The cleaning system according to claim 1, 2, 7 or 8, wherein the device body (110) is provided with a liquid storage cavity (112), the liquid storage cavity (112) is arranged below the process cavity (111) with a platform plate (113) arranged therebetween, and the platform plate (113) is provided with a through hole (1311) for communicating the liquid storage cavity (112) and the process cavity (111).
10. The washing system according to claim 9, characterized in that the cleaning assembly (130) further comprises a delivery line (132) and a circulation line;
one end of the conveying pipeline (132) extends into the process cavity (111), and the spray arm (131) is connected with the conveying pipeline (132);
one end of the circulating pipeline is connected with the conveying pipeline (132), the other end of the circulating pipeline extends into the liquid storage cavity (112), and the circulating pipeline is provided with a pump body.
CN202210264827.8A 2022-03-17 2022-03-17 Cleaning system Active CN114632751B (en)

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