CN212093429U - IPA drying equipment - Google Patents

IPA drying equipment Download PDF

Info

Publication number
CN212093429U
CN212093429U CN202020370009.2U CN202020370009U CN212093429U CN 212093429 U CN212093429 U CN 212093429U CN 202020370009 U CN202020370009 U CN 202020370009U CN 212093429 U CN212093429 U CN 212093429U
Authority
CN
China
Prior art keywords
machine body
placing groove
pipe
groove plate
inner machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202020370009.2U
Other languages
Chinese (zh)
Inventor
周杰
张琪
李俊毅
杨涛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Yidong (Shanghai) Technology Co.,Ltd.
Original Assignee
Beijing Xinyidong Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Xinyidong Technology Co ltd filed Critical Beijing Xinyidong Technology Co ltd
Priority to CN202020370009.2U priority Critical patent/CN212093429U/en
Application granted granted Critical
Publication of CN212093429U publication Critical patent/CN212093429U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The utility model discloses an IPA drying equipment, in particular to IPA drying technology field, the top of the inner machine body is also provided with a nitrogen filling device, the drying mechanism comprises a placing groove plate fixed on the inner wall of the inner machine body, a plurality of uniformly arranged isolation plates arranged in the placing groove plate and a connecting pipe connected below the center of the placing groove plate, the outer wall of the placing groove plate is matched with the inner wall of the inner machine body, the middle part of the placing groove plate is sunken, the bottom of the isolation plates is provided with a drainage hole, and a recovery pipe extends downwards in the connecting pipe; the outer machine body is arranged outside the inner machine body, and the top end of the outer machine body is sleeved on the top of the inner machine body. The utility model discloses promotion silicon chip that can be by a wide margin is carrying out washing speed and cleaning performance among the IPA cleaning process, utilizes the frid and the drainage hole of placing of slope, can retrieve the foul solution that the cleaning process produced, reduces to wash to remain and to cause the influence to next round of washing drying.

Description

IPA drying equipment
Technical Field
The utility model relates to a IPA drying technology field, more specifically say, the utility model relates to an IPA drying equipment.
Background
Photosilicon wafers are the most important base material for the integrated circuit industry, and circuits are processed on the surface of polished silicon wafers. As the feature line widths of integrated circuits become smaller, polishing the polished surface of the silicon wafer allows the number and diameter of the remaining particles to become smaller. After polishing, the polished silicon wafer is generally cleaned for two times, such as once cleaning and final cleaning, so that the surface particles and the surface metal indexes meet the requirements of users.
The final cleaning OF the polished silicon wafer generally comprises the steps OF wafer loading, acid cleaning (HF), quick high-purity water washing (QDR), liquid I cleaning (SC1), high-purity water Overflowing (OF), liquid II cleaning (SC2), quick high-purity water washing (QDR), high-purity water overflowing and soaking (F/R), spin-drying or isopropanol drying, wafer taking and the like. The spin-drying is a method for drying the polished silicon wafer by removing water adsorbed on the surface thereof under the action of centrifugal force. Isopropyl alcohol (isopropyl alcohol) drying is a method of drying the surface of a polished silicon wafer under the action of isopropyl alcohol vapor and nitrogen gas.
However, most of the existing IPA cleaning and drying mechanisms are simple IPA vapor cleaning and filtering, so that the cleaning efficiency is low in the cleaning process, and the cleaning effect of the silicon wafer is easily influenced due to the fact that a large amount of residues are left in the cleaning mechanism in the long-time working process.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problem, the utility model provides a following technical scheme: an IPA drying device comprises an inner machine body, a liquid storage tank arranged at the bottom of the inner cavity of the inner machine body and a steam pipe penetrating through the side wall of the inner machine body, the steam pipe is arranged in a bending way, the lower section of the steam pipe extends to the top of the liquid storage tank in the inner machine body and is communicated with the liquid storage tank, the upper section of the steam pipe extends to the top of the inner cavity of the inner machine body, the top of the inner cavity of the inner machine body is provided with a drying mechanism, the top of the inner machine body is also provided with a nitrogen filling device, the drying mechanism comprises a placing groove plate fixed on the inner wall of the inner machine body, a plurality of uniformly arranged isolation plates arranged in the placing groove plate and a connecting pipe connected below the center of the placing groove plate, the outer wall of the placing groove plate is matched with the inner wall of the inner machine body, the middle part of the placing groove plate is sunken, drainage holes are formed in the bottoms of the isolation plates, and a recovery pipe extends downwards in the connecting pipe;
the outer machine body is arranged outside the inner machine body, the top end of the outer machine body is sleeved on the top of the inner machine body, the bottom of an inner cavity of the outer machine body and the bottom of the inner machine body are connected with a plurality of supporting rods, and a sealing valve is arranged on the top of the inner machine body.
In a preferred embodiment, a through hole is formed in the middle of the placing groove plate, and the top end of the recovery pipe is connected with the through hole.
In a preferred embodiment, a circulation heating pump is fixed at the bottom of the inner cavity of the inner machine body, a recovery box is arranged on one side of the circulation heating pump away from the liquid storage box, a heating pipe is connected between the circulation heating pump and the liquid storage box, and heat conduction oil is filled in the heating pipe.
In a preferred embodiment, a plurality of fixing rods are connected between the outer wall of the connecting pipe and the inner wall of the inner body, a discharge pipe penetrating through the inner body and the outer body is installed on the recycling tank, and a liquid inlet pipe penetrating through the inner body and the outer body is installed on the liquid storage tank.
In a preferred embodiment, the steam pipe upper section is arranged right above the placing groove plate, and a plurality of rotary spray heads are mounted on the steam pipe upper section.
In a preferred embodiment, the heating pipe is a closed pipeline, two ends of the heating pipe are connected with the input end and the output end of the circulation heating pump, and one section of the heating pipe, which is located in the liquid storage tank, is in a bent arrangement.
The utility model discloses a technological effect and advantage:
1. the cleaning device can greatly improve the cleaning speed and the cleaning effect of the silicon wafer in the IPA cleaning process, and can recycle the dirty liquid generated in the cleaning process by utilizing the inclined groove plates and the drainage holes, thereby reducing the influence of cleaning residues on the next round of cleaning and drying;
2. this practical inner structure reasonable in design, drying mechanism support fastening, stable in structure, the double-deck design of inside and outside organism makes the inside gaseous difficult production of structure leak, still has the effect that separates temperature and keep warm, reduces the temperature on outer body surface.
Drawings
Fig. 1 is a schematic view of the present invention.
Fig. 2 is a schematic diagram of a detailed structure of the position a in fig. 1 according to the present invention.
The reference signs are: 1 inner machine body, 2 liquid storage tanks, 3 steam pipes, 4 drying mechanisms, 5 placing groove plates, 6 isolation plates, 7 connecting pipes, 8 drainage holes, 9 recovery pipes, 10 outer machine bodies, 11 sealing valves, 12 fixing rods, 13 circulating heating pumps, 14 recovery boxes, 15 heating pipes, 16 rotating nozzles, 17 discharge pipes and 18 liquid inlet pipes.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
As shown in fig. 1, an IPA drying apparatus, including an inner body 1, a liquid storage tank 2 is installed at the bottom of the inner body 1, a curved heating pipe 15 is installed inside the liquid storage tank 2, the curved heating pipe 15 extends to the outside of the liquid storage tank 2 and is connected to a circulation heating pump 13, and heat conduction oil is filled in the heating pipe 15, the circulation heating pump 13 heats and drives the heat conduction oil when working, the heat conduction oil circulates in the heating pipe 15, an IPA solvent in the liquid storage tank 2 is heated, IPA hot vapor is generated after the IPA solvent is heated, the heat conduction oil is used for conducting heat and heating, the heating rate is high, compared with other heating forms such as a heating plate and a heat pipe, the IPA is less polluted and less influenced;
the top of the liquid storage tank 2 is connected with a bent steam pipe 3, after the lower section of the steam pipe 3 bends and penetrates out of the outer part of the inner machine body 1, one side of the top of the inner machine body 1 penetrates to the top of the inner cavity of the inner machine body 1, a plurality of rotary nozzles 16 are mounted on the outer wall of the upper section of the steam pipe 3, heated IPA steam is transmitted through the bent steam pipe 3 and then is sprayed out from the rotary nozzles 16 on the upper section of the steam pipe 3, and IPA steam can be uniformly sprayed to the top of the inner machine body 1;
the top of the inner machine body is also provided with a nitrogen filling device, the top of the inner cavity of the inner machine body 1 is provided with a drying mechanism 4, the drying mechanism 4 comprises a placing groove plate 5 fixed on the inner wall of the inner machine body 1, a plurality of uniformly arranged partition plates 6 arranged in the placing groove plate 5 and a connecting pipe 7 connected below the center of the placing groove plate 5, the top of the inner machine body 1 is provided with a sealing valve 11, a user places a product between the partition plates 6 in the placing groove plate 5 by opening the sealing valve 11, when IPA hot steam is sprayed out from a rotary spray head 16, the product surface between the partition plates 6 is uniformly sprayed, meanwhile, the nitrogen filling device sprays nitrogen to the top of the inner cavity of the inner machine body 1, the product surface is cleaned and dried under the action of IPA steam and nitrogen, and impurities on the product are cleaned;
as shown in fig. 1-2, the middle of the placing trough plate 5 is sunken, drainage holes 8 are formed at the bottoms of the plurality of isolation plates 6, a recovery pipe 9 extends downwards in the connecting pipe 7, a through hole is formed in the middle of the placing trough plate 5, the top end of the recovery pipe 9 is connected with the through hole, after steam is cooled, IPA dirty liquid carried to impurities is accumulated at the bottom of the isolation plate 6 under the action of gravity, flows to the middle of the placing trough plate 5 along the drainage holes 8 at the bottom of the isolation plates 6 by utilizing gravity for operation, is accumulated at the middle of the placing trough plate 5 and is collected into the recovery pipe 9 from the through hole on the placing trough plate 5, the outer wall of the placing trough plate 5 is matched with the inner wall of the inner machine body 1, and the IPA steam can be effectively prevented from leaking below the placing trough plate through a sealing connection mode;
the outer machine body 10 is arranged outside the inner machine body 1, the top end of the outer machine body 10 is sleeved on the top of the inner machine body 1, the bottom of the inner cavity of the outer machine body 10 and the bottom of the inner machine body 1 are connected with a plurality of support rods, and a double-layer structure of the inner machine body 1 and the outer machine body 10 is adopted, so that gas in the inner machine body 1 is not easy to leak in the processes of heating, steam cleaning and drying of IPA, the heat insulation and heat preservation effects are achieved, and the temperature of the surface of the outer machine body 10 is reduced;
a plurality of fixed rods 12 are connected between the outer wall of the connecting pipe 7 and the inner wall of the inner machine body 1, the space connecting pipe 7 is sleeved outside the recovery pipe 9, the connecting pipe 7 and the fixed rods 12 are connected with the inner wall of the inner machine body 1, the connecting pipe 7 and the placing groove plate 5 can be supported, the stability of the drying mechanism 4 is greatly improved,
the recycling tank 14 is provided with a discharge pipe 17 penetrating through the inner machine body 1 and the outer machine body 10, IPA dirty liquid recycled through the recycling pipe 9 is collected in the recycling tank 14 and discharged out of the outer machine body 10 of the child from the discharge pipe 17, the liquid storage tank 2 is provided with a liquid inlet pipe 18 penetrating through the inner machine body 1 and the outer machine body 10, and IPA solvent is added into the liquid storage tank 2 through the liquid inlet pipe 18.
The points to be finally explained are: first, in the description of the present application, it should be noted that, unless otherwise specified and limited, the terms "mounted," "connected," and "connected" should be understood broadly, and may be a mechanical connection or an electrical connection, or a communication between two elements, and may be a direct connection, and "upper," "lower," "left," and "right" are only used to indicate a relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may be changed;
secondly, the method comprises the following steps: in the drawings of the disclosed embodiments of the present invention, only the structures related to the disclosed embodiments are referred to, and other structures can refer to the common design, and under the condition of no conflict, the same embodiment and different embodiments of the present invention can be combined with each other;
and finally: the above description is only for the preferred embodiment of the present invention and should not be taken as limiting the invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (6)

1. The utility model provides a IPA drying equipment, includes interior organism, sets up in the liquid reserve tank of interior organism inner chamber bottom and runs through the steam pipe on interior organism lateral wall, the steam pipe bending sets up, the steam pipe hypomere extends to the inside liquid reserve tank top of interior organism and communicates with the liquid reserve tank, the inner chamber top of organism in the steam pipe upper segment extends to, interior organism inner chamber top is provided with drying mechanism, interior organism top still sets up nitrogen gas filling device, its characterized in that: the drying mechanism comprises a placing groove plate fixed on the inner wall of the inner machine body, a plurality of uniformly arranged isolation plates arranged in the placing groove plate and a connecting pipe connected below the center of the placing groove plate, wherein the outer wall of the placing groove plate is matched with the inner wall of the inner machine body, the middle part of the placing groove plate is sunken, drainage holes are formed in the bottoms of the isolation plates, and a recovery pipe extends downwards in the connecting pipe;
the outer machine body is arranged outside the inner machine body, the top end of the outer machine body is sleeved on the top of the inner machine body, the bottom of an inner cavity of the outer machine body and the bottom of the inner machine body are connected with a plurality of supporting rods, and a sealing valve is arranged on the top of the inner machine body.
2. The IPA drying apparatus of claim 1, wherein: the middle part of the placing groove plate is provided with a through hole, and the top end of the recovery pipe is connected with the through hole.
3. The IPA drying apparatus of claim 1, wherein: a circulating heating pump is fixed at the bottom of the inner cavity of the inner machine body, a recovery box is arranged on one side, away from the liquid storage box, of the circulating heating pump, a heating pipe is connected between the circulating heating pump and the liquid storage box, and heat conduction oil is filled in the heating pipe.
4. The IPA drying apparatus of claim 3, wherein: a plurality of fixing rods are connected between the outer wall of the connecting pipe and the inner wall of the inner machine body, a discharge pipe penetrating through the inner machine body and the outer machine body is installed on the recovery box, and a liquid inlet pipe penetrating through the inner machine body and the outer machine body is installed on the liquid storage box.
5. The IPA drying apparatus of claim 1, wherein: the upper section of the steam pipe is arranged right above the placing groove plate, and a plurality of rotary nozzles are installed on the upper section of the steam pipe.
6. The IPA drying apparatus of claim 3, wherein: the heating pipe is closed pipeline and both ends are connected with the input and the output of circulation heat pump, one section that the heating pipe is located the liquid reserve tank is crooked setting.
CN202020370009.2U 2020-03-23 2020-03-23 IPA drying equipment Active CN212093429U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202020370009.2U CN212093429U (en) 2020-03-23 2020-03-23 IPA drying equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202020370009.2U CN212093429U (en) 2020-03-23 2020-03-23 IPA drying equipment

Publications (1)

Publication Number Publication Date
CN212093429U true CN212093429U (en) 2020-12-08

Family

ID=73638728

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202020370009.2U Active CN212093429U (en) 2020-03-23 2020-03-23 IPA drying equipment

Country Status (1)

Country Link
CN (1) CN212093429U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113418383A (en) * 2021-06-24 2021-09-21 湖南智信微电子科技有限公司 Dry isopropanol steam reflux unit that uses of chromium version wet cleaning process
CN116884888A (en) * 2023-09-07 2023-10-13 苏州智程半导体科技股份有限公司 Drying device and semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113418383A (en) * 2021-06-24 2021-09-21 湖南智信微电子科技有限公司 Dry isopropanol steam reflux unit that uses of chromium version wet cleaning process
CN113418383B (en) * 2021-06-24 2022-05-17 长沙韶光铬版有限公司 Dry isopropanol steam reflux unit that uses of chromium version wet cleaning process
CN116884888A (en) * 2023-09-07 2023-10-13 苏州智程半导体科技股份有限公司 Drying device and semiconductor device
CN116884888B (en) * 2023-09-07 2023-11-28 苏州智程半导体科技股份有限公司 Drying device and semiconductor device

Similar Documents

Publication Publication Date Title
CN212093429U (en) IPA drying equipment
CN104078389B (en) Recovery unit, matrix processing equipment and recovery method using the recovery unit
US5259407A (en) Surface treatment method and apparatus for a semiconductor wafer
JP2003297795A (en) Cleaner and dryer, and cleaning and drying method of semiconductor wafer
CN203250724U (en) Wafer cleaning device
US20060237054A1 (en) Apparatus and method for washing quartz parts, particularly for process equipment used in semiconductor industries
CN109148327A (en) The method of substrate drying device, the equipment of manufacturing semiconductor devices and dry substrate
CN102496590A (en) Isopropyl alcohol dryer with ultrasonic or megasonic vibrators
CN102698977A (en) Vacuum cleaning device
CN212944360U (en) Cleaning device for silicon nitride ceramic ring for polycrystalline silicon reduction furnace
KR100354456B1 (en) An wet-rinsing and drying apparatus and the method thereof
CN211578706U (en) Chain type alkali-acid simultaneous polishing equipment
KR102163293B1 (en) Flux cleaning system for semiconductor wafer
CN110404869B (en) Cleaning method and cleaning equipment for solar silicon crystal plate
JP5129911B2 (en) Moisture removal device
KR900003225B1 (en) Cleaning device
KR100877110B1 (en) Apparatus for drying wafers
JPH06252115A (en) Method for cleaning object to be cleaned
KR20240047397A (en) Supercritical fluid-based drying device and method
JP4228721B2 (en) Drainer / dryer
CN216977255U (en) Tower type evaporative condenser
JPS63194787A (en) Washing method and device
CN217560229U (en) Water removing device
JP2823019B2 (en) Pure water vapor drying method
JP3009006B2 (en) Equipment for drying semiconductor substrates

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: Building C5, No. 1568, Feidu Road, Lingang New Area, China (Shanghai) Pilot Free Trade Zone, Pudong New Area, Shanghai, 201311

Patentee after: New Yidong (Shanghai) Technology Co.,Ltd.

Address before: 1212, 12 / F, building 4, yard 6, Zhengda Road, Shijingshan District, Beijing 100043

Patentee before: Beijing xinyidong Technology Co.,Ltd.