CN205722840U - A kind of flexible copper grid base transparent conducting film - Google Patents
A kind of flexible copper grid base transparent conducting film Download PDFInfo
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- CN205722840U CN205722840U CN201620497516.6U CN201620497516U CN205722840U CN 205722840 U CN205722840 U CN 205722840U CN 201620497516 U CN201620497516 U CN 201620497516U CN 205722840 U CN205722840 U CN 205722840U
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Abstract
This utility model relates to field of optical films, relates to a kind of flexible copper grid base transparent conducting film.Conductive film comprises: flexible transparent film substrate；One anti-reflection layer；And a copper mesh grid conductive layer；And described anti-reflection layer is disposed between described flexible transparent film substrate and copper mesh grid conductive layer.Described anti-reflection layer is made up of at least one of which low refractive index film layer and a floor height index film layer alternately superposition, and by rhombus, square or hexagonal copper lines and at least one of which CuO film layer are constituted described copper mesh grid conductive layer.Flexible copper grid base transparent conducting film of the present utility model can be as the succedaneum of ITO conductive film, it is widely used in the fields such as touch screen, Flexible Displays, electromagnetic shielding, compare traditional ITO conductive film, its production cost is lower, transmitance is higher, oxidation resistent susceptibility is more preferable, and the highest 1 order of magnitude of sheet resistivity, is particularly suited for large area, the preparation of high-resolution touch screen.
Description
Technical field
This utility model relates to field of optical films, relates to a kind of flexible copper grid base transparent conducting film.
Background technology
Transparent conductive film is the devices such as flat panel TV, touch screen, smart window glass, light emitting diode and photovoltaic cell
The necessary component manufactured.In recent years, along with industries such as information (as touched display), the energy (such as photovoltaic, smart window glass)
Development, the demand of transparent conductive film is increased dramatically by people, and in transparent conductive film, a most widely used class is
Tin_doped indium oxide film, the ito thin film being i.e. commonly called as.It is known that the content that phosphide element is in the earth's crust is rare (about
0.05ppm), and being difficult to purify, along with the consumption of ito thin film significantly increases, its content is more and more rare, causes price abruptly increase,
Thus increase the manufacturing cost of the industry such as touch screen, thin-film solar cells.Simultaneously as ito thin film is a kind of ceramic membrane,
Its buckle resistance is poor, easy to crack through the rear film of repeatedly deformation, so that resistance significantly increases, causes component failure.Another
Aspect, in order to manufacture the device such as giant display, large area solid luminescent plate, it is desirable to the square electricity of transparent conductive film used
Resistance is necessarily less than 5 Ω/.Although this requirement can be met by increasing the thickness of ito thin film, but, its cost dramatically increases,
The increase of this cost is because along with film thickness increases, and the sedimentation rate of ITO reduces, and causes major part ITO raw material unrestrained
Take.Therefore, it is necessary to find a kind of novel transparent conductive film that bend resistance performance is good, square resistance is adjustable and with low cost.
In order to reduce the dependency degree to ITO, research worker have developed that to have the copper metallic mesh of low resistance characteristic transparent
Conductive film.Copper metallic mesh transparent conductive film is due to its resistivity and transmitance is adjustable, bend resistance excellent performance, price are low
Honest and clean and compatible with semiconductor technology, therefore, in the preparation of the aspects such as the huge flexible touch screen of industry, solaode, it is subject to
To increasing favor, become the novel I TO substitution film that a class of primary study is feasible.But, due to general transparent lining
The visible region transmitance of end PET itself be less than 92%, therefore, prepared by this PET transparent substrates copper mesh grid conductive layer it
After, its compound transmitance is lower, is difficult to obtain high permeability and low-resistance transparent conductive film.
Summary of the invention
The purpose of this utility model is the deficiency existed for above-mentioned conductive film, proposes a kind of flexible copper grid base transparent
Conductive film.Technical solution of the present utility model is that conductive film comprises: flexible transparent substrate；One anti-reflection layer；
And a copper mesh grid conductive layer；Described anti-reflection layer is disposed in described flexible transparent film substrate and copper mesh grid conductive layer
Between.Wherein, flexible transparent substrate comprises: polyethylene terephthalate and two-sided stiffened clear coat, described two-sided adds
Hard clear coat is the polyacrylate coatings of ultra-violet curing；Anti-reflection layer comprises: low refractive index film layer and high index of refraction
Thin layer；Copper mesh grid conductive layer comprises copper mesh gate layer and Cu oxide layer.
Described low refractive index film layer and high refractive index film layer are alternately stacked, thickness be 30～110nm and 10～
140nm。
Described Cu oxide layer covers on copper metal layer or Cu oxide layer covers in copper metal top and bottom.
Described copper mesh gate layer is square by rhombus or hexagonal copper lines forms, and the live width of lines is 2～10 micro-
Rice, degree of metalization is 1.25～2%.
The thickness of described copper mesh grid conductive layer is 200～500nm.
The thickness of described Cu oxide layer is 20～60nm.
This utility model has the advantage that and beneficial effect, and this utility model uses one anti-reflection of sputter on PET substrate
Antireflection layer, improves the transmitance of substrate, and sputter copper metallic conduction composite bed, prepares high permeability low-resistance the most again
Bright conductive film.Described composite film visible light transmitance is higher than 96%, and sheet resistivity is less than 10 Ω/, and chromatic value (b*) is little
In 0.5, the reflectance on copper film surface is less than 5%, and the reflectance of the copper film back side (survey of PET film non-plated film) is less than 5%.
Transparent conductive film described in the utility model has the low-resistance characteristic of high permeability, and has the strongest environment
Tolerance performance.
Described conductive film Core Feature layer, while ensureing high visible light transmissivity, antiradar reflectivity, has the lowest
Sheet resistance.After being processed into the products such as touch screen, the visibility of lines is extremely low, can significantly improve the definition of screen.
On the other hand, under hygrothermal environment, it is possible to prevent copper metal conducting layer oxidized and lost efficacy, keep good electric property.
This utility model relates to one and has high permeability, low-resistance flexible transparent conductive film, its Core Feature layer
Including anti-reflection layer and copper mesh grid conductive layer.Described copper mesh grid conductive layer relies primarily on copper lines interconnection and has high permeability
Photoelectric characteristic with extremely low sheet resistance.Owing to the oxidation resistance of Cu is weak, in use, with air contact, easily quilt
It is oxidized to CuOx, and CuOx does not possess good electric conductivity, and copper lines shape can be made to change, thus impact is described
The electric conductivity of conductive film and photoelectric properties.Use at copper surface sputter oxide, copper mesh grid can be protected in use
Oxidized, keep good photoelectric characteristic.This utility model uses a kind of special anti-oxidation measure, i.e. at the table of copper metal film
Copper-plated oxide (CuOx) is spattered in face, thus completely cuts off copper mesh grid conductive layer and air contact, prevents Cu metal oxidized.Meanwhile,
Due to the existence of oxide (CuOx) layer of copper, it plays anti-reflection effect on copper metal layer surface, it is possible to significantly reduce Cu metal
Reflectance, so that the lines visibility of copper mesh grid conductive layer is extremely low.
Owing to the visible region transmitance of general transparent substrates PET itself is less than 92%, therefore, at the transparent lining of this PET
After preparing copper mesh grid conductive layer, its compound transmitance is lower at the end, is difficult to obtain high permeability and low-resistance electrically conducting transparent
Thin film.In order to improve the transmitance that thin film is total under the conditions of keeping low sheet resistivity, this utility model uses on PET substrate
One anti-reflection layer of sputter, improves the transmitance of substrate, and sputter copper metallic conduction composite bed, prepares high transmission the most again
The low-resistance transparent conductive film of rate.
Flexible copper grid base transparent conducting film of the present utility model can be as the succedaneum of ITO conductive film, by extensively
General being applied to the fields such as touch screen, Flexible Displays, electromagnetic shielding, compare traditional ITO conductive film, its production cost is lower,
Transmitance is higher, and oxidation resistent susceptibility is more preferable, and the highest 1 order of magnitude of sheet resistivity, is particularly suited for large area, high-resolution
The preparation of touch screen.
Accompanying drawing explanation
The profile of Fig. 1 a kind of flexible copper grid base transparent conducting film, in figure, anti-reflection layer is 2 layers, and copper mesh grid are led
Electric layer is 2 layers；
The profile of Fig. 2 a kind of flexible copper grid base transparent conducting film, in figure, anti-reflection layer is 4 layers, and copper mesh grid are led
Electric layer is 2 layers；
The profile of Fig. 3 a kind of flexible copper grid base transparent conducting film, in figure, anti-reflection layer is 5 layers, and copper mesh grid are led
Electric layer is 3 layers.
Detailed description of the invention
As it can be seen, described laminated film comprises flexible and transparent polyethylene terephthalate (PET) substrate film, subtract
Anti-antireflection layer and copper mesh grid conductive layer.
Transparent membrane substrate is by flexible and transparent polyethylene terephthalate and at dual coating ultra-violet curing
Polyacrylate hardening coat is constituted.The thickness of flexible transparent substrate is 50 microns-125 microns.Poly-the third of described ultra-violet curing
Olefin(e) acid Ester cured coating, uses traditional takeup type rubbing method to be coated uniformly on the both sides of flexible and transparent PET substrate, soft to improve
The property intensity of transparent substrates, hardness and durability etc..
Described anti-reflection layer is multilayer lamination structure, covers the top layer of flexible and transparent PET substrate.Described stacked structure by
Constitute selected from high refractive index film layer and low refractive index film layer.Described high refractive index film layer includes but not limited to selected from five oxygen
Change two niobium (Nb2O5) or titanium dioxide (TiO2) material that formed.Described low refractive index film layer includes but not limited to selected from two
Silicon oxide (SiO2) or Afluon (Asta) (MgF2) material that formed.Each layer in anti-reflection layer is by winding magnetic control sputtering
Plated film is formed, and is sputtered by multi-chamber simultaneously, once completes the deposition of multilayer film.
Described copper mesh grid conductive layer is multilayer lamination structure, covers the upper strata of anti-reflection layer.Described stacked structure is by copper
Metal film layer and copper oxide film layer composition.Copper metal film layer and copper oxide film layer are by winding magnetic control sputtering
Plated film is formed, and is sputtered by multi-chamber simultaneously, once completes the deposition of multilayer film.After the films are deposited, quasiconductor is used to add
Work technique, is processed into copper metal film layer and Cu oxide layer that rhombus is square or hexagonal grid, and its degree of metalization is
1.25%.
Embodiment one
As it is shown in figure 1, this illustrates an embodiment of a kind of flexible copper grid base transparent conducting film, described compound
Thin film comprises flexible and transparent polyethylene terephthalate (PET) substrate film 1, anti-reflection layer 2 and copper mesh grid conductive layer
3。
Transparent membrane substrate 1 is by flexible and transparent polyethylene terephthalate and at dual coating ultra-violet curing
Polyacrylate hardening coat is constituted.Preferably, the thickness of flexible transparent substrate 1 is 50 microns, it is also possible to be 125 microns.Institute
State the polyacrylate hardening coat of ultra-violet curing, use traditional takeup type rubbing method to be coated uniformly on flexible and transparent PET lining
The both sides at the end, to improve the intensity of flexible transparent substrate 1, hardness and durability etc..
Described anti-reflection layer 2 is multilayer lamination structure, covers the top layer of flexible and transparent PET substrate 1.Described stacked structure
Constituted by selected from high refractive index film layer 21 and low refractive index film layer 22.Described high refractive index film layer 21 includes but not limited to
Selected from niobium pentaoxide (Nb2O5) or titanium dioxide (TiO2) material that formed.Described low refractive index film layer 22 include but not
It is limited to selected from silicon dioxide (SiO2) or Afluon (Asta) (MgF2) material that formed.In preferred embodiments, high refractive index film
Layer 21 is all niobium pentaoxide (Nb2O5), low refractive index film layer 22 is all silicon dioxide (SiO2).Layer (21 and 22) is by rolling up
Wound magnetron sputtering plating is formed, and is sputtered by multi-chamber simultaneously, once completes the deposition of multilayer film.First deposition five oxidation two
Niobium 21, its thickness is about 107nm, covers silicon dioxide layer 22 the most thereon, and its thickness is about 89nm.
Described copper mesh grid conductive layer 3 is multilayer lamination structure, covers the upper strata of anti-reflection layer 2.Described stacked structure by
Copper metal film layer 31 and copper oxide film layer 32 form.Copper metal film layer 31 and copper oxide film layer 32 are by winding
Formula magnetron sputtering plating is formed, and is sputtered by multi-chamber simultaneously, once completes the deposition of multilayer film.First deposited copper metal thin film
Layer 31, its thickness is about 300nm, covers copper oxide film layer 32 the most thereon, and its thickness is about 35nm.In thin film deposition
Afterwards, use semiconducter process, copper metal film layer 31 and Cu oxide layer 32 are processed into rhombus or square or six limits
The grid of shape, its degree of metalization is 1.25%.Described composite film visible light transmitance is higher than 93%, and sheet resistivity is less than 10
Ω/, chromatic value (b*) is less than 0.5, and the reflectance on copper film surface is less than 5%, the reflection of the copper film back side (survey of PET film non-plated film)
Rate is less than 60%.
Embodiment two
As in figure 2 it is shown, this illustrates an embodiment of a kind of flexible copper grid base transparent conducting film, described compound
Thin film comprises flexible and transparent polyethylene terephtalate substrate film 1, anti-reflection layer 12 and copper mesh grid conductive layer
13。
Transparent membrane substrate 1 is by flexible and transparent polyethylene terephthalate and at dual coating ultra-violet curing
Polyacrylate hardening coat is constituted.Preferably, the thickness of flexible transparent substrate 1 is 50 microns, it is also possible to be 125 microns.Institute
State the polyacrylate hardening coat of ultra-violet curing, use traditional takeup type rubbing method to be coated uniformly on flexible and transparent PET lining
The both sides at the end, to improve the intensity of flexible transparent substrate 1, hardness and durability etc..
Described anti-reflection layer 12 is multilayer lamination structure, covers the top layer of flexible and transparent PET substrate 1.Described stacking knot
Structure by selected from high refractive index film layer 121 and 123 and low refractive index film layer 122 and 124 constitute.Described high refractive index film layer
121 and 123 include but not limited to selected from niobium pentaoxide Nb2O5Or titanium dioxide (TiO2) material that formed.Described low refraction
Rate thin layer 122 and 124 includes but not limited to selected from silicon dioxide (SiO2) or Afluon (Asta) (MgF2) material that formed.Excellent
Selecting in embodiment, high refractive index film layer (121 and 123) is all niobium pentaoxide (Nb2O5), low refractive index film layer 122 He
124 is all silicon dioxide (SiO2)。
In preferred embodiments, anti-reflection layer 12 is by being deposited on substrate 1 and thickness is about the first medium of 18nm
Layer 121, thickness about 23nm and the covering second dielectric layer 122 of first medium layer 121, thickness are about 117nm and cover second Jie
4th dielectric layer 124 of the 3rd dielectric layer 123 of matter layer 122 and thickness about 89nm and covering the 3rd dielectric layer 123 forms.The
One dielectric layer 121 to the 4th dielectric layer 124 is to be formed by winding magnetic control sputtering plated film, is sputtered by multi-chamber, once simultaneously
Complete the deposition of multilayer film.
Described copper mesh grid conductive layer 13 is multilayer lamination structure, covers the upper strata of anti-reflection layer 12.Described stacked structure
It is made up of copper metal film layer 131 and copper oxide film layer 132.Copper metal film layer 131 and 132 is to be spattered by takeup type magnetic control
Penetrate plated film to be formed, sputtered by multi-chamber simultaneously, once complete the deposition of multilayer film.First deposited copper metal thin layer 131, its
Thickness is about 300nm, covers copper oxide film layer 132 the most thereon, and its thickness is 3nm.After the films are deposited, use
Semiconducter process, is processed into copper metal film layer 131 and Cu oxide layer 132 that rhombus is square or hexagonal net
Grid, its degree of metalization is 1.25%.Described composite film visible light transmitance is higher than 96%, and sheet resistivity is less than 10 Ω/, color
Angle value b* is less than 0.5, and the reflectance on copper film surface is less than 5%, and the reflectance of the copper film back side (survey of PET film non-plated film) is less than
60%.
Embodiment three
As it is shown on figure 3, this illustrates an embodiment of a kind of flexible copper grid base transparent conducting film, described compound
Thin film comprises flexible and transparent polyethylene terephtalate substrate film 1, anti-reflection layer 22 and copper mesh grid conductive layer
23。
Transparent membrane substrate 1 is by flexible and transparent polyethylene terephthalate and at dual coating ultra-violet curing
Polyacrylate hardening coat is constituted.Preferably, the thickness of flexible transparent substrate 1 is 50 microns, it is also possible to be 125 microns.Institute
State the polyacrylate hardening coat of ultra-violet curing, use traditional takeup type rubbing method to be coated uniformly on flexible and transparent PET lining
The both sides at the end, to improve the intensity of flexible transparent substrate 1, hardness and durability etc..
Described anti-reflection layer 22 is multilayer lamination structure, covers the top layer of flexible and transparent PET substrate 1.Described stacking knot
Structure by selected from high refractive index film layer 222 and 224 and low refractive index film layer 221,223 and 225 constitute.Described high index of refraction is thin
Film layer 222 and 224 includes but not limited to selected from niobium pentaoxide (Nb2O5) or titanium dioxide (TiO2) material that formed.Described
Low refractive index film 221,223 and 22 includes but not limited to selected from silicon dioxide (SiO2) or Afluon (Asta) (MgF2) material that formed
Material.In preferred embodiments, high refractive index film layer 222 and 224 is all titanium dioxide (TiO2), low refractive index film layer
221,223 and 225 is all Afluon (Asta) (MgF2)。
In preferred embodiments, anti-reflection layer 22 is by being deposited on substrate 1 and first medium layer that thickness is 45nm
221, thickness is 17nm and covers the second dielectric layer 222 of first medium layer 221, thickness is 38nm and covers second dielectric layer
3rd dielectric layer 223 of 222, thickness are 105nm and the 4th dielectric layer 224 and the thickness that cover the 3rd dielectric layer 223 is
5th dielectric layer 225 of 80nm and covering the 4th dielectric layer 224 forms.First medium layer 221 to 225 is to be spattered by takeup type magnetic control
Penetrate plated film to be formed, sputtered by multi-chamber simultaneously, once complete the deposition of multilayer film.
Described copper mesh grid conductive layer 23 is multilayer lamination structure, covers the upper strata of anti-reflection layer 22.Described stacked structure
It is made up of copper metal film layer 232 and copper oxide film layer 231 and 233.Copper oxide film layer 231 and 233 and copper metal
Thin layer 232 is to be formed by winding magnetic control sputtering plated film, is sputtered by multi-chamber simultaneously, once completes the deposition of multilayer film.
First deposition copper oxide film layer 231, its thickness is 40nm, covers copper metal film layer 232 the most thereon, and its thickness is
300nm, finally one layer of copper oxide film layer 233 of deposition, its thickness is 35nm.After the films are deposited, quasiconductor is used to add
Work technique, is processed into copper metal film layer 232 and Cu oxide layer 231 and 233 that rhombus is square or hexagonal grid, its
Degree of metalization is 1.25%.Described composite film visible light transmitance is higher than 96%, and sheet resistivity is less than 10 Ω/, chromatic value
(b*) less than 0.5, the reflectance on copper film surface is less than 5%, and the reflectance of the copper film back side (survey of PET film non-plated film) is less than 5%.
The parameter of embodiment one to embodiment three is as shown in table 1 to table 3.
Table 1
Table 2
Table 3
Preferred embodiment described in the utility model, its detailed description is intended to illustrative, and it is right to should not be understood as
The restriction of disclosure scope.Any independent material disclosed in the utility model, numerical value or characteristic all can any with the disclosure
Other materials, numerical value or characteristic are exchanged and are used, as the specific embodiments given by the present invention.Anyone is in this practicality
Other various forms of products all can be drawn under novel enlightenment, no matter but in its material, shape or structure, make any change,
Every have same as the present application or similar technical scheme, within all falling within protection scope of the present invention.
Claims (6)
1. a flexible copper grid base transparent conducting film, is characterized in that, conductive film comprises: flexible transparent substrate；One subtracts
Anti-antireflection layer；And a copper mesh grid conductive layer；Described anti-reflection layer is disposed in described flexible transparent film substrate and copper
Between grid conductive layer, wherein, flexible transparent substrate comprises: polyethylene terephthalate and two-sided stiffened clear coat,
Described two-sided stiffened clear coat is the polyacrylate coatings of ultra-violet curing；Anti-reflection layer comprises: low refractive index film layer
With high refractive index film layer；Copper mesh grid conductive layer comprises copper mesh gate layer and Cu oxide layer.
A kind of flexible copper grid base transparent conducting film the most according to claim 1, is characterized in that, described low-refraction is thin
Film layer and high refractive index film layer are alternately stacked, and thickness is 30～110nm and 10～140nm.
A kind of flexible copper grid base transparent conducting film the most according to claim 1, is characterized in that, described Cu oxide layer
Cover on copper metal layer or Cu oxide layer covers in copper metal top and bottom.
A kind of flexible copper grid base transparent conducting film the most according to claim 1, is characterized in that, described copper mesh gate layer
Or hexagonal copper lines square by rhombus forms, and the live width of lines is 2～10 microns, and degree of metalization is 1.25～2%.
A kind of flexible copper grid base transparent conducting film the most according to claim 1, is characterized in that, described copper mesh grid are led
The thickness of electric layer is 200～500nm.
A kind of flexible copper grid base transparent conducting film the most according to claim 1, is characterized in that, described Cu oxide layer
Thickness be 20～60nm.
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| CN201620497516.6U CN205722840U (en) | 2016-05-26 | 2016-05-26 | A kind of flexible copper grid base transparent conducting film |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107170509A (en) * | 2017-06-23 | 2017-09-15 | 中国南玻集团股份有限公司 | Flexible conductive film and preparation method thereof |
| CN108089771A (en) * | 2018-02-13 | 2018-05-29 | 京东方科技集团股份有限公司 | Touch base plate, display panel, display device |
| CN110196524A (en) * | 2019-05-30 | 2019-09-03 | Oppo广东移动通信有限公司 | Electrochromic device and preparation method thereof, electronic equipment |
| CN116368176A (en) * | 2020-10-06 | 2023-06-30 | 捷德货币技术有限责任公司 | Transparent conductive film and application thereof |
-
2016
- 2016-05-26 CN CN201620497516.6U patent/CN205722840U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107170509A (en) * | 2017-06-23 | 2017-09-15 | 中国南玻集团股份有限公司 | Flexible conductive film and preparation method thereof |
| CN108089771A (en) * | 2018-02-13 | 2018-05-29 | 京东方科技集团股份有限公司 | Touch base plate, display panel, display device |
| CN110196524A (en) * | 2019-05-30 | 2019-09-03 | Oppo广东移动通信有限公司 | Electrochromic device and preparation method thereof, electronic equipment |
| CN116368176A (en) * | 2020-10-06 | 2023-06-30 | 捷德货币技术有限责任公司 | Transparent conductive film and application thereof |
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