CN110196524A - Electrochromic device and preparation method thereof, electronic equipment - Google Patents
Electrochromic device and preparation method thereof, electronic equipment Download PDFInfo
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- CN110196524A CN110196524A CN201910465599.9A CN201910465599A CN110196524A CN 110196524 A CN110196524 A CN 110196524A CN 201910465599 A CN201910465599 A CN 201910465599A CN 110196524 A CN110196524 A CN 110196524A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/157—Structural association of cells with optical devices, e.g. reflectors or illuminating devices
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/163—Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
- H04M1/026—Details of the structure or mounting of specific components
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- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Signal Processing (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
The invention discloses electrochromic devices and preparation method thereof, electronic equipment.Specifically, the invention proposes a kind of electrochromic devices, it include: the first substrate and the second substrate being oppositely arranged, and the first transparency conducting layer and the second transparency conducting layer between first substrate and second substrate, there is electrochromic layer between first transparency conducting layer and second transparency conducting layer, wherein, first substrate and second substrate are transparent substrate, and at least one of first substrate and second substrate further comprise: at least one antireflection film layer；The electrochromic device is not less than 85% in the light transmission rate of non-staining state.Electrochromic device light transmittance with higher as a result,.
Description
Technical field
The present invention relates to electronic equipment manufacturing fields, and in particular, to electrochromic device and preparation method thereof, electronics are set
It is standby.
Background technique
Electrochromic material is the material with electrochromic property, and electrochromism refers to the optical properties (reflection of material
Rate, transmitance, absorptivity etc.) color change under the action of extra electric field there is a phenomenon where stablizing, reversible, table in appearance
It is now the reversible change of color and transparency.Electrochromic material is in the side such as information, electronics, the energy, building and national defence at present
Face all has been widely used.For example, electrochromic material is applied when on automobile rearview mirror, automobile rearview mirror can be presented from mirror
Face silver can play the role of anti-dazzle to the variation of dark mirror surface；For another example, electrochromic material be applied to aircraft rotation window or
On person's building glass, color change from shallow to deep can be presented in aircraft rotation window or building glass, have shading purposes etc..
With the continuous development of information technology, electronic equipment in daily life using more and more extensive.Consumer couple
Electronic product not only pursues the diversification of function, but also also has increasingly higher demands to its appearance, texture etc..
However, current electrochromic device and preparation method thereof, electronic equipment, still have much room for improvement.
Summary of the invention
The application is to be made based on inventor to the discovery of following facts and problem and understanding:
Inventors have found that current electrochromic device, light transmission rate when non-staining state is relatively low, thus it is answered
It is relatively more limited with range, for example, other than being able to achieve color changeable effect, not being able to satisfy when applying it on electronic equipment
Other functional requirements, such as when not needing discoloration, the transparency of the electrochromic device can be higher, does not influence electronics
Appearance and service performance of equipment itself etc..Currently, electrochromic device is applied in automobile and building field than wide,
For example, electrochromic material is applied when on automobile rearview mirror, play the role of anti-dazzle；For another example, electrochromic material is answered
It uses on aircraft rotation window or building glass, there is shading purposes etc..It is saturating to the light of electrochromic device due in such use
The property crossed is (as long as in the light transmission of non-staining state energy) of less demanding, therefore, the electrochromic device applied at present, in non-staining
The light transmission rate of state be not generally it is very high, for example, by using inorganic electrochromic material production electrochromic device light transmission rate
Between 5% (coloured state) -65% (transparent state), the light transmission rate using the electrochromic device of small organic molecule production exists
Between 5% (coloured state) -75% (transparent state).Therefore, by current electrochromic device be applied to light transmission rate requirement compared with
When high electronic equipment or other scenes, there are certain obstacles.For example, electrochromic device is applied to surface of camera head
When, camera is high in the light transmission rate requirement of non-staining state to electrochromic device, and current electrochromic device can't
Meet above-mentioned requirements.Therefore, it if a kind of new electrochromic device can be proposed, is penetrated in non-staining state light with higher
Rate will greatly widen the application range of electrochromic device, will largely solve the above problems.
The present invention is directed to solve at least some of the technical problems in related technologies.
In one aspect of the invention, the invention proposes a kind of electrochromic devices.According to an embodiment of the invention, should
Electrochromic device includes: the first substrate and the second substrate being oppositely arranged, and is located at first substrate and described the
The first transparency conducting layer and the second transparency conducting layer between two substrates, first transparency conducting layer and described second is thoroughly
There is electrochromic layer, wherein first substrate and second substrate are transparent substrate, described between bright conductive layer
At least one of first substrate and second substrate further comprise: at least one antireflection film layer；The electroluminescent change
Color device is not less than 85% in the light transmission rate of non-staining state.The antireflection film layer of first substrate and the second substrate as a result,
Reflection and absorption of light etc. can be preferably reduced, the transmitance of light is improved, the electrochromic device is in non-staining state
When light transmission rate with higher, application scenarios are extensive, and service performance is good.
In another aspect of this invention, the invention proposes a kind of methods for making electrochromic device.According to the present invention
Embodiment, this method comprises: provide transparent substrate, to form the first substrate and the second substrate；By first substrate
It is oppositely arranged with second substrate, between first substrate and second substrate being oppositely arranged, forms first
Transparency conducting layer, electrochromic layer and the second transparency conducting layer, wherein the electrochromic device is saturating in the light of non-staining state
Rate is crossed not less than 85%, wherein be formed at least one at least one of first substrate and second substrate and subtract
Reflective coating.This method can easily make the higher electrochromic device of light transmission rate as a result, which answers
It is extensive with scene, and service performance is good.
In still another aspect of the invention, the invention proposes a kind of electronic equipment.According to an embodiment of the invention, the electronics
Equipment includes: mentioned-above electrochromic device；Control circuit, the control circuit are used for the fortune according to the electronic equipment
Row state controls the electrochromic device discoloration.There is the electronic equipment mentioned-above electrochromic device to be had as a result,
The whole features and advantage having, details are not described herein.Generally speaking, which has good appearance and makes
Use effect.
Detailed description of the invention
Fig. 1 shows the structural schematic diagram of electrochromic device according to an embodiment of the invention；
Fig. 2 shows the structural schematic diagram of electrochromic device in accordance with another embodiment of the present invention；
Fig. 3 shows the structural schematic diagram of the electrochromic device of another embodiment according to the present invention；
Fig. 4 shows the structural schematic diagram of the first substrate according to an embodiment of the invention；
Fig. 5 shows the method flow diagram of production electrochromic device according to an embodiment of the invention；
Fig. 6 shows the method flow diagram of production electrochromic device in accordance with another embodiment of the present invention；
Fig. 7 shows the structural schematic diagram of electronic equipment according to an embodiment of the invention；
Fig. 8 shows the cut-away section structural schematic diagram of electronic equipment according to an embodiment of the invention；And
Fig. 9 shows the structural schematic diagram of electronic equipment in accordance with another embodiment of the present invention.
Description of symbols:
100: the first substrates；110: transparent substrate；120: antireflection film layer；10: high refractive index sub-layer；20: low-refraction
Sub-layer；200: the first transparency conducting layers；300: electrochromic layer；400: the second transparency conducting layers；500: the second substrates；1000:
Electrochromic device；1100: electronic equipment；1200: camera；1300: shell；1400: transparent cover plate；1500: film plating layer；
1600: optical adhesive layer；1700: anti-fingerprint film layer.
Specific embodiment
The embodiment of the present invention is described below in detail, examples of the embodiments are shown in the accompanying drawings.Below with reference to
The embodiment of attached drawing description is exemplary, it is intended to is used to explain the present invention, and is not considered as limiting the invention.
In one aspect of the invention, the invention proposes a kind of electrochromic devices.According to an embodiment of the invention, ginseng
Fig. 1-Fig. 3 is examined, which includes: the first substrate 100 and the second substrate 500, Yi Jiwei being oppositely arranged
The first transparency conducting layer 200 and the second transparency conducting layer 400 between the first substrate 100 and the second substrate 500, first thoroughly
There is electrochromic layer 300, wherein the first substrate 100 and the between bright conductive layer 200 and the second transparency conducting layer 400
Two substrates 500 are transparent substrate (transparent substrate 110A and 110B with reference to shown in Fig. 1), the first substrate 100 and second
At least one of substrate 500 further comprise at least one antireflection film layer (the antireflection film layer 120A with reference to shown in Fig. 1 and
120B)；Electrochromic device 1000 is not less than 85% in the light transmission rate of non-staining state.First substrate 100 and as a result,
The antireflection film layer 120 of two substrates 500 can preferably reduce reflection and absorption of light etc., improve the transmitance of light,
The electrochromic device 1000 light transmission rate with higher in non-staining state, application scenarios are extensive, and service performance is good.
It should be noted that applying different directions or different size of voltage to electrochromic device, and not to electroluminescent
When color-changing device applies voltage, the color of the electrochromic layer of electrochromic device may change, according to electrochromism
The difference of material, the color and color change of electrochromic layer are diversified, and the electrochromic devices in the application,
It refers in particular in a certain voltage status, colourless electrochromic device can be presented in electrochromic layer, " non-staining state " in the application
Refer to state when electrochromic device is presented colourless, " coloured state " refers to that the color of electrochromic device is occurred by colorless state
State after variation (such as does not apply in non-staining state for example, specifically, electrochromic device according to an embodiment of the present invention
When voltage) when be it is colourless, the color at coloured state (apply voltage after) becomes grey or black etc..
In order to facilitate understanding, above-mentioned technical effect is able to achieve to electrochromic device according to an embodiment of the present invention below
Principle is illustrated:
As previously mentioned, current electrochromic device, the light transmission rate in non-staining state is relatively low, thus it is answered
It is relatively more limited with range.Therefore, current electrochromic device is applied to more demanding to the light transmission rate of non-staining state
When electronic equipment or other scenes, the service performance of electronic equipment etc. and the appearance of electronic equipment itself etc. will affect.Example
Such as, when electrochromic device being applied to surface of camera head, camera to electrochromic device non-staining state light transmission rate
It is required that high, current electrochromic device is not met by above-mentioned requirements.And electrochromism dress according to an embodiment of the present invention
It sets, by the way that antireflection film layer (i.e. AR film layer) is arranged at least one of the first substrate and the second substrate, the antireflective coating
Layer can preferably reduce reflection and absorption of light etc., improve the transmitance of light, so as to improve the first substrate, the
Two substrates, and the light transmission rate of entire electrochromic device, also, the light transmission rate of the electrochromic device can be improved to not
Less than 85%, therefore, the light transmission rate of the electrochromic device is higher, and application scenarios are extensive, and service performance is good.
According to an embodiment of the invention, antireflection film layer 120 can be set close in transparent substrate 110 with reference to Fig. 1-Fig. 3
Transparency conducting layer side and transparent substrate 110 are gone up (before " transparency conducting layer " refers to far from least one of transparency conducting layer side
First transparency conducting layer 200 and the second transparency conducting layer 400 described in face).
According to an embodiment of the invention, the setting position of antireflection film layer is not particularly limited, antireflection film layer can be set
It sets between the different interface of any two refractive index, for example, antireflection film layer 120A can be set in transparent base with reference to Fig. 1
Side of the plate 110A far from the first transparency conducting layer 200, antireflection film layer 120B can be set in transparent substrate 110B far from
The side of two transparency conducting layers 400, i.e. antireflection film layer 120 can be set on the interface of transparent substrate 110 and air, thus
Can reduce the light reflection when light that electrochromic layer 300 issues is projected from transparent substrate 110 and absorb etc., it improves
The transmitance of light.Specifically, it can be set with reference to Fig. 2, antireflection film layer 120A transparent far from first in transparent substrate 110A
One close to the first transparency conducting layer 200 in transparent substrate 110A can be set in the side of conductive layer 200, antireflection film layer 120C
Side, antireflection film layer 120B can be set in side of the transparent substrate 110B far from the second transparency conducting layer 400, antireflection film layer
120D can be set in transparent substrate 110B close to the side of the second transparency conducting layer 400, i.e. antireflection film layer 120 can be set
On the interface of transparent substrate 110 and air and on the interface of transparent substrate 110 and transparency conducting layer, and then it can reduce
Light reflection and absorption when the light issued from electrochromic layer 300 projects outward etc., improve the transmitance of light.Specifically
Ground, with reference to Fig. 3, transparent substrate 110A can also be arranged in close to the side of the first transparency conducting layer 200 in antireflection film layer 120C,
Antireflection film layer 120B can be set in side of the transparent substrate 110B far from the second transparency conducting layer 400, antireflection film layer
120D can be set in transparent substrate 110B close to the side of the second transparency conducting layer 400.In summary, antireflection film layer 120
Setting position be not particularly limited, those skilled in the art can be according to actual transparent substrate 110 and transparency conducting layer
Material, thickness, refractive index etc. selected and designed, as long as the light that can increase final electrochromic device 1000 penetrates
Rate.
It should be noted that inventors have found that in the application scenarios of current electrochromic device, such as automotive rear-view
Mirror, aircraft windows or building glass etc. require light transmission rate of the electrochromic device in non-staining state lower (as long as can be thoroughly
Light), and it is more demanding to light reflectivity of the electrochromic device in non-staining state, therefore, current electrochromism
In device, seldom the structure of electrochromic device can be improved and be optimized, to improve electrochromic device in non-staining state
When light transmission rate, and reduce light reflectivity of the electrochromic device in non-staining state.And electricity according to an embodiment of the present invention
Color-changing device is caused, improves and optimizes by the structure to electrochromic device, by reducing electrochromic device non-
Light reflectivity etc. when color state, light transmission rate of the Lai Tigao electrochromic device in non-staining state, and then electroluminescent change can be made
Color device is applied in the more demanding electronic equipment of some pairs of light transmission rates or other scenes, to greatly widen electroluminescent
The application range of color-changing device, and service performance is good.For example, currently used electrochromic device, in non-staining state
When light transmission rate be about 75%, and electrochromic device according to an embodiment of the present invention, the light in non-staining state are saturating
Rate is crossed not less than 85%, such as can be 87%, can be 89%, can be 90%, can be 92%, can with 93% etc., from
And largely improve the light transmission rate of electrochromic device.
According to an embodiment of the invention, the first substrate 100 and the second substrate 500 include transparent substrate 110 and anti-reflection
Penetrate film layer 120, the light transmission rate of the first substrate 100 and the second substrate 500 can be not less than 99%, such as can be
99.2%, it can be 99.5%, can be 99.7% etc., the light of first substrate 100 and the second substrate 500 penetrates as a result,
Rate is higher, so that the light transmission rate of electrochromic device 1000 is higher.According to an embodiment of the invention, transparent substrate 110
It can be and formed by glass, the light transmission rate of currently used glass is about 92%, formed in electrochromic device by it
The first substrate and the second substrate when, the light transmission rate of the first substrate and the second substrate is also about 92%, and according to the present invention
The first substrate 100 and the second substrate 500 of embodiment, by the way that antireflection film layer 120, anti-reflection are arranged on transparent substrate 110
The reflection of light can be reduced by penetrating film layer 120, therefore, the first substrate 100 according to an embodiment of the present invention and the second substrate 500
Light transmission rate can achieve 99% or more, to improve light transmission rate of the electrochromic device in non-staining state.
According to an embodiment of the invention, the specific material of antireflection film layer 120 and structure etc. are not particularly limited, as long as
Light reflection and the light absorption etc. that transparent substrate 110 can preferably be reduced, improve the light transmission of transparent substrate 110.Tool
Body, with reference to Fig. 4, antireflection film layer 120 may include high refractive index sub-layer 10 and the low-refraction Asia of alternately laminated setting
Layer 20 (such as high refractive index sub-layer 10A, 10B and low-refraction sub-layer with reference to alternately laminated setting illustrated in fig. 4
20A, 20B), as a result, by the way that the different sub-layer of multiple refractive index is arranged, each sub-layer can cooperate, and utilize light
Principle of interference reduces reflection and absorption of the light of different wave length etc., improves the light transmission rate of transparent substrate 110.According to this
Specific number, thickness and combination of the embodiment of invention, high refractive index sub-layer 10 and low-refraction sub-layer 20 etc. are no
It is particularly limited, (such as is not less than the light transmission rate of transparent substrate 110 as long as the light transmission rate of transparent substrate 110 can be improved
99%), those skilled in the art can be according to the material of transparent substrate 110 and transparency conducting layer, thickness, refractive index etc.
It is selected and is designed.Specifically, high refractive index sub-layer 10 may include niobium oxygen compound etc., and low-refraction sub-layer 20 can wrap
Include silicon oxide compound etc..The antireflection film layer 120 may include two layers of high refractive index sub-layer 10 and the low-refraction Asia of stacking
Layer 20 also may include 4 layers of alternately laminated setting or 5 layers of high refractive index sub-layer 10 and low-refraction sub-layer 20.
It according to an embodiment of the invention, the thickness of antireflection film layer 120 can be 20-400nm, such as can be 50nm,
It can be 100nm, can be 200nm, can be 300nm, can be 350nm etc., specifically, the thickness of high refractive index sub-layer 10
It can be 5-60nm, such as can be 7nm, can be 10nm, can be 20nm, can be 30nm etc., low-refraction sub-layer 20
With a thickness of 5-60nm, such as can be 7nm, can be 10nm, can be 20nm, can be for 30nm etc..Work as antireflective as a result,
The thickness of film layer 120 is in above range, antireflection film layer 120 and the first transparency conducting layer 200 and the second transparency conducting layer
400 thickness matches, and can preferably improve the whole light transmission rate in non-staining state of electrochromic device 1000.
According to an embodiment of the invention, the first transparency conducting layer 200 and the second transparency conducting layer 400 can be by aoxidizing
What at least one of indium tin (ITO) and indium zinc oxide (IZO) were formed.The first transparency conducting layer 200 and second is transparent as a result,
Conductive layer 400 can have good electric conductivity and transparency.According to an embodiment of the invention, the first substrate 100 and first
Light transmission rate after transparency conducting layer 200 is laminated can be not less than 95%, can be 97% etc. for example, can be 96%；Equally
Light transmission rate after ground, the second substrate 500 and the stacking of the second transparency conducting layer 400 can be not less than 95%.Thus, it is possible into one
Step improves light transmission rate of the electrochromic device in non-staining state.Specifically, currently used formed by tin indium oxide (ITO)
The first transparency conducting layer and the second transparency conducting layer, be respectively formed at glass formation the first substrate and second
Behind the surface of substrate, the light transmission rate after the first substrate and the first electrically conducting transparent layer stackup is about 86%, and according to the present invention
In the electrochromic device of embodiment, the light transmission rate after the first substrate 100 and the stacking of the first transparency conducting layer 200 can be
95% or more, thus, it is possible to further increase light transmission rate of the electrochromic device in non-staining state.
It should be noted that due to including two substrates (i.e. the first substrate 100 and the second substrates in electrochromic device
500), and two transparency conducting layers being arranged between two substrates (i.e. the first transparency conducting layer 200 and second transparent are led
Electric layer 400), it and further include the stepped constructions such as electrochromic layer 300, each layer structure can all have certain absorption and anti-to light
It penetrates, can all reduce the whole light transmission rate in non-staining state of electrochromic device, therefore, in order to improve entire electrochromism dress
The light transmission rate in non-staining state is set, each layer of light transmission rate can be improved.Therefore, according to an embodiment of the invention, being
The light transmission rate of the first transparency conducting layer 200 and second transparency conducting layer 400 is improved, can guarantee transparency conducting layer
Under conditions of electrode performance, reduce the thickness of the first transparency conducting layer 200 and the second transparency conducting layer 400.
In order to improve the light transmittance of the first transparency conducting layer 200 and the second transparency conducting layer 400, such as make the first lining
Light transmission rate behind bottom 100 and the stacking of the first transparency conducting layer 200 is 95% or more, and the second substrate 500 and second transparent is led
Electric layer 400 be laminated after light transmission rate 95% or more, the first transparency conducting layer 200 according to an embodiment of the present invention and the
The thickness and sheet resistance value of two transparency conducting layers 400 can be smaller.For example, according to an embodiment of the invention, the first electrically conducting transparent
The thickness of layer 200 and the second transparency conducting layer 400 can be 100-200nm, specifically, can be 120nm, Ke Yiwei
150nm can be 180nm etc., and the thickness of the first transparency conducting layer 200 and the second transparency conducting layer 400 is smaller as a result, right
The absorption of light is less, and the transmitance of light can be improved.
It should be noted that inventor passes through further investigation discovery, the first transparency conducting layer 200 and the second electrically conducting transparent
The thickness of layer 400 and the specific structure of mentioned-above antireflection film layer 120 and the thickness of each sub-layer etc. have substantial connection, when
When the thickness change of the first transparency conducting layer 200 and the second transparency conducting layer 400, from the first transparency conducting layer 200 and
The angle of light etc. that two transparency conducting layers 400 transmit outward can also change, therefore, in order to realize final electroluminescent change
Thickness of the high transmittance of color device, the specific structure of antireflection film layer 120 and each sub-layer etc. needs and the first electrically conducting transparent
The thickness etc. of layer 200 and the second transparency conducting layer 400 matches, and then could preferably improve light transmission rate.For example, as before
Described, the thickness of antireflection film layer 120 can be 20-400nm, and the thickness of high refractive index sub-layer 10 can be 5-60nm, low folding
Penetrate rate sub-layer 20 with a thickness of 5-60nm, as a result, when the thickness of antireflection film layer 120 is in above range, antireflection film layer 120
With the thickness comparison match of mentioned-above first transparency conducting layer 200 and the second transparency conducting layer 400, can preferably mention
The whole light transmission rate in non-staining state of high electrochromic device.
It should be noted that the sheet resistance and thickness of the first transparency conducting layer 200 and the second transparency conducting layer 400 also have
Close ties, according to an embodiment of the invention, the thickness value of the first transparency conducting layer 200 and the second transparency conducting layer 400 exists
When mentioned-above range, the sheet resistance of the first transparency conducting layer 200 and the second transparency conducting layer 400 can be 10-20 Ω, tool
Body, can be for 12 Ω, 15 Ω, 18 Ω etc., the side of first transparency conducting layer 200 and the second transparency conducting layer 400 as a result,
Resistance and its thickness match, and not only can preferably improve the light of the first transparency conducting layer 200 and the second transparency conducting layer 400
Transmitance, also, there is preferable electrode performance.
According to an embodiment of the invention, the refractive index of the first transparency conducting layer 200 and the second transparency conducting layer 400 is
1.9-2.3, the refractive index of transparent substrate 110 (such as glass) are 1.48-1.52, then are arranged in 200 He of the first transparency conducting layer
The refractive index of antireflection film layer (with reference to the antireflection film layer 120C in Fig. 3) between transparent substrate 110 is 1.5-1.7 or so,
For example, 1.69, antireflection film layer of second transparency conducting layer 400 far from 110 side of transparent substrate is set (with reference in Fig. 3
Antireflection film layer 120B) refractive index be 1.1-1.4 or so, for example, 1.23, so as to preferably reduce the reflection of light
With absorb etc., improve the transmitance of light.
According to an embodiment of the invention, the specific material of electrochromic layer 300 is not particularly limited, it can be inorganic matter,
It may be organic matter, which can be presented different electrochromism face under different voltage swings and direction
Color, and can present in the case where not applying voltage or a certain voltage colourless.For example, the inorganic electroluminescence for forming electrochromic layer 300 becomes
Color material can be transistion metal compound, Prussian blue etc., and the organic matter for forming electrochromic layer 300 can be organic small point
Sub- electrochromic material, such as purple sieve essence class compound etc.；The organic matter for forming electrochromic layer 300 may be conducting polymer
Object etc..As previously mentioned, each layer in electrochromic device can absorb light and reflection light etc., it therefore, can be to shape
It is adjusted at the specific material of electrochromic layer 300, formula, thickness, concentration etc., is inhaled with reducing the light of electrochromic layer 300
Yield etc. improves the light transmission rate of electrochromic layer 300.According to an embodiment of the invention, the thickness of electrochromic layer 300 can be with
It is 30-100 μm, such as can is 50 μm.According to an embodiment of the invention, the refractive index of electrochromic layer 300 can be with first
The refractive index of transparency conducting layer 200 and the second transparency conducting layer 200 is same or similar, thus, it is possible to further increase light
Transmissivity.For example, the refractive index of mentioned-above first transparency conducting layer 200 and the second transparency conducting layer 400 is 1.9-2.3
When, the refractive index of electrochromic layer 300 may be 1.9-2.3.According to an embodiment of the invention, the light of electrochromic layer 300
Transmitance can be not less than 97%, such as can be 98%, can be 99% etc., as a result, the light transmission rate of the electrochromic layer
It is higher, the whole light transmission rate in non-staining state of electrochromic device can be improved.According to a particular embodiment of the invention, electric
Mutagens chromatograph 300 may include purple sieve essence class compound, and the concentration etc. by reducing purple sieve essence class compound, can make to make
The light transmission rate of the electrochromic layer 300 obtained is higher.
In summary, in electrochromic device according to an embodiment of the present invention, the first substrate 100 and the first transparency conducting layer
Light transmission rate after 200 stackings can be not less than 95%, and the light transmission rate of mutagens chromatograph 300 can be not less than 97%, the second lining
Light transmission rate behind bottom 100 and the stacking of the second transparency conducting layer 200 can be not less than 95%, thus, it is possible to calculate according to this hair
Light transmission rate of the electrochromic device 1000 of bright embodiment in non-staining state can not less than 87.5% (95% × 97% ×
95%), light transmission rate of the electrochromic device in non-staining state is higher as a result, can apply to light transmission rate requirement
In higher electronic equipment and other scenes, the application range of the electrochromic device is wider, and service performance is good.
In another aspect of this invention, the invention proposes a kind of methods for making electrochromic device.According to the present invention
Embodiment, this method production electrochromic device can be mentioned-above electrochromic device, as a result, this method make
Electrochromic device have the advantages that whole feature possessed by mentioned-above electrochromic device and, it is no longer superfluous herein
It states.Specifically, the electrochromic device is not less than 85% in the light transmission rate of non-staining state, this method can be easily as a result,
The higher electrochromic device of light transmission rate is made, the electrochromic device application scenarios are extensive, and service performance is good.
According to an embodiment of the invention, with reference to Fig. 5, this method comprises:
S100: the first substrate and the second substrate are formed
In this step, the first substrate and the second substrate are formed.According to an embodiment of the invention, the first substrate and
Two substrates can be transparent substrate, and transparent substrate can be glass formation.According to an embodiment of the invention, can be first
At least one antireflection film layer is formed at least one of substrate and the second substrate.It specifically, can be described saturating in front
The one or both sides of bright substrate form antireflection film layer.According to an embodiment of the invention, can be by coating method in transparent substrate
One or both sides formed antireflection film layer.According to an embodiment of the invention, the antireflection film layer can subtract to be mentioned-above
Reflective coating, therefore, the antireflection film layer have the advantages that whole features of mentioned-above antireflection film layer and, for example, subtracting
Reflective coating, which can be, to be formed by the high refractive index layer and low-index film of alternately laminated setting.
S200: the first transparency conducting layer, electrochromic layer, the second transparency conducting layer are formed
In this step, the first substrate that preceding step is formed and second substrate are oppositely arranged, and are being oppositely arranged
Between first substrate and the second substrate, the first transparency conducting layer, electrochromic layer and the second transparency conducting layer are formed.According to
The embodiment of the present invention, with reference to Fig. 6, this method be may further include:
S210: forming the first transparency conducting layer in the side of the first substrate, and it is transparent to form second in the side of the second substrate
Conductive layer
In this step, the first transparency conducting layer is formed in the side of the first substrate, and is formed in the side of the second substrate
Second transparency conducting layer.Specifically, the first transparency conducting layer and the second transparency conducting layer can be by tin indium oxide and oxygen
Change what at least one of indium zinc was formed.Specifically, can by coating method in the first substrate and the second substrate far from antireflective
The side of film layer is respectively formed the first transparency conducting layer and the second transparency conducting layer.Specifically, first transparency conducting layer with
And second transparency conducting layer can be mentioned-above first transparency conducting layer and the second transparency conducting layer, therefore, this first
Transparency conducting layer and the second transparency conducting layer have mentioned-above first transparency conducting layer and the second transparency conducting layer
Whole features and advantage, for example, the sheet resistance of the first transparency conducting layer and the second transparency conducting layer is 10-20 Ω, with a thickness of
100-200nm etc..According to an embodiment of the invention, the first substrate may include transparent substrate and antireflection film layer, Ke Yitong
It crosses coating method to form the first transparency conducting layer on the transparent substrate, the first transparency conducting layer directly can also be formed in anti-reflection
It penetrates in film layer.
According to an embodiment of the invention, the first substrate of stacking and the light transmission rate of the first transparency conducting layer are not less than
95%, the second substrate of stacking and the light transmission rate of the second transparency conducting layer are not less than 95%, thus, it is possible to further increase institute
Light transmission rate of the electrochromic device of production in non-staining state.
S220: electrochromic layer is formed between the first transparency conducting layer and the second transparency conducting layer
In this step, electrochromism is set between first transparency conducting layer and the second transparency conducting layer in front
Solution, to form electrochromic layer, wherein the light transmission rate of electrochromic layer is not less than 97%.Thus, it is possible to further mention
Light transmission rate of the electrochromic device made by height in non-staining state.Specifically, can be in the first transparency conducting layer far from
The side of the side of one substrate or the second transparency conducting layer far from the second substrate is molten by Dipcoat method coating electrolyte
Liquid, to form electrochromic layer.
In still another aspect of the invention, the invention proposes a kind of electronic equipment.According to an embodiment of the invention, with reference to figure
7, which includes mentioned-above electrochromic device 1000 and control circuit (not shown), control electricity
Road is used for the operating status according to electronics 1100, and control institute's electrochromic device 1000 changes colour.The electronic equipment 1100 has as a result,
There are whole feature and advantage possessed by mentioned-above electrochromic device 1000, details are not described herein.Generally speaking, should
Electronic equipment has good appearance and using effect.
According to a particular embodiment of the invention, with reference to Fig. 7, electronic equipment 1100 may further include screen (in Fig. 7 not
Show), shell 1300 and camera 1200, wherein for showing information, shell 1300 is connected screen with screen, before institute
The electrochromic device (being not shown in Fig. 7) stated can cover on the incidence surface for being located at camera 1200.Specifically, with reference to Fig. 8 (figure
8 for the direction BB ' in Fig. 7 cut-away section structural schematic diagram, 8 "outside" direction refers to towards extraneous direction, "inner" in figure
Refer to the direction towards electronic equipment internal), electrochromic device 1000 can cover on the incidence surface for being located at camera 1200
(entering light direction with reference to the arrow A in Fig. 8).According to an embodiment of the invention, being taken the photograph as previously mentioned, electrochromic device lid is located at
As head incidence surface when, to electrochromic device non-staining state light transmission rate require it is very high, it is according to an embodiment of the present invention
Electrochromic device 1000 can satisfy the requirement, and therefore, the incidence surface upper cover of the camera 1200 sets electrochromic device
After 1000, when using camera 1200, the light transmission rate of the electrochromic device 1000 is higher, does not influence taking pictures for camera
Performance；Also, when not using camera 1200, which is in coloured state, and in coloured state
The color of electrochromic device 1000 can be identical with the color of the outer surface of shell 1300, is not using camera as a result,
When 1200, camera can " stealthy ", further improve the appearance consistency and product expressive force of the electronic equipment.Further
Ground, electrochromic device 1000 can not only cover on the incidence surface for being located at camera 1200, and it is remote that shell 1300 can also be arranged in
Side from electronic equipment internal.Specifically, electrochromic device 1000 can be set in the part of the surface of shell 1300 or complete
Portion surface (not shown), such as electrochromic device 1000 can cover outer surface and the camera of entire shell 1300
1200 incidence surface (not shown), as a result, when not using camera 1200, the outer surface of entire shell and camera
Color of the electrochromic device 1000 in coloured state can be presented in 1200 incidence surface, further improve the electronic equipment
Appearance consistency.
According to an embodiment of the invention, the incidence surface of camera 1200 may be located on screen far from electronic equipment 1100
The side (not shown) in portion, electrochromic device 1000 can only lid be located on the incidence surface of camera 1200, exist as a result,
When using camera 1200, the light transmission rate of the electrochromic device 1000 is higher, does not influence the performance of taking pictures of camera 1200,
When not using camera 1200, which can be presented the color of coloured state, enrich electronic equipment 1100
Appearance.Also, the part of the surface or all surfaces of screen, such as electrochromism can also be arranged in electrochromic device 1000
Device 1000 can cover the outer surface of entire screen and the incidence surface of camera 1200, due to the electrochromic device 1000
It is very high in the transmitance of non-staining state, the camera shooting performance of camera 1200 is neither influenced, the display performance of the screen is nor affected on,
Also, when not using the camera 1200 and not using screen, which can be coloured state, by
This, can enrich the appearance of screen and entire electronic equipment 1100.
According to an embodiment of the invention, electronics when on shell 1300 is arranged in electrochromic device 1000 with reference to Fig. 9
The shell of equipment may include: transparent cover plate 1400, film plating layer 1500, optical adhesive layer 1600 and anti-fingerprint film layer 1700.Thoroughly
Bright cover board 1400 can be that the substrate of shell 1300 is realized by structures such as above-mentioned film plating layer 1500, electrochromic devices 1000
The appearance of shell.Specifically, electrochromic device 1000 can be located at side of the shell 1300 towards electronic equipment internal,
Transparent cover plate 1400 is arranged in close to the side of electrochromic device 1000 in film plating layer 1500, and optical adhesive layer 1600 is arranged in plated film
Between layer 1500 and electrochromic device 1000, transparent cover plate 1400 is arranged in far from film plating layer 1500 in anti-fingerprint film layer 1700
Side.As a result, by the way that film plating layer 1500 and anti-fingerprint film layer 1700, Ke Yijin is respectively set in the two sides of transparent cover plate 1400
One step enriches the appearance of shell 1300, and improves the service performance of the shell 1300, also, this is provided with film plating layer
1500 and anti-fingerprint film layer 1700 transparent cover plate 1400, optical adhesive layer 1600 and electrochromic device 1000 can be passed through and pasted
It closes.According to an embodiment of the invention, the light transmission rate of optical adhesive layer 1600 can be not less than 99%, the optical adhesive layer as a result,
1600 will not influence the light transmission rate of electrochromic device 1000.
According to an embodiment of the invention, film plating layer 1500 can be through non-conducting vacuum galvanoplastic (NCVM) formation,
The thickness of film plating layer 1500 can be 20-100nm.The film plating layer 1500 can enrich the appearance of shell 1300 as a result, again
The appearance of electrochromic device 1000 is not influenced.According to an embodiment of the invention, the thickness of optical adhesive layer 1600 can be
20-100nm.Facilitate for transparent cover plate 1400 and electrochromic device 1000 to be bonded as a result,.
According to an embodiment of the invention, transparent cover plate 1400 can be glass, the refractive index of transparent cover plate 1400 can be
1.48-1.52, the refractive index of anti-fingerprint film layer 1700 may be 1.48-1.52, and the refractive index of optical adhesive layer 1600 can also be with
For 1.48-1.52, as a result, transparent cover plate 1400, anti-fingerprint film layer 1700 and optical adhesive layer 1600 refractive index close, can be with
The transmitance for improving light does not influence color effects of the electrochromic device 1000 in coloured state and in non-staining state
Light transmission rate.
The solution of the present invention is explained below in conjunction with embodiment.It will be understood to those of skill in the art that following
Embodiment is merely to illustrate the present invention, and should not be taken as limiting the scope of the invention.Particular technique or item are not specified in embodiment
Part, it described technology or conditions or is carried out according to the literature in the art according to product description.Agents useful for same or instrument
Production firm person is not specified in device, is that can buy the conventional products obtained by market.
Embodiment 1 prepares electrochromic device A
(1) provide glass substrate as the first substrate and the second substrate, glass substrate with a thickness of 0.15mm, refractive index
For 1.48-1.52；
(2) vacuum coating is carried out in the side of the first substrate and form the first antireflective coating, sequentially form the first Si oxide
Sub-layer, the first niobium oxide sub-layer, the second Si oxide sub-layer, the second niobium oxide sub-layer and third Si oxide sub-layer,
To form the first antireflection film layer, the thickness of the first antireflection film layer is about 205nm, and refractive index is about 1.69, the tool of each layer
Body thickness is detailed in the following table 1；
(3) the second substrate side carry out vacuum coating formed the second antireflective coating, the structure of the second antireflective coating with
First antireflective coating is identical；
(4) side in the first substrate far from the first antireflective sub-layer and the second substrate are far from the second antireflective sub-layer
Side, tin indium oxide is deposited respectively, to form the first transparency conducting layer and the second transparency conducting layer, the first of formation is thoroughly
The thickness of bright conductive layer and the second transparency conducting layer is 150nm；
(5) electrochromic layer, the thickness of electrochromic layer are set between the first transparency conducting layer and the second transparency conducting layer
Degree is 50 μm, refractive index 1.425.
Embodiment 2 prepares electrochromic device B
Remaining step all has an antireflective coating on the first substrate and the second substrate with embodiment 1, the difference is that
The antireflection film layer of formation includes the first Si oxide sub-layer and the first niobium oxide sub-layer of two-layer laminate, the first antireflective
The thickness of film layer is about 32nm, and refractive index is about 1.23, and design parameter please be detailed in the following table 1；First formed in step (4) is transparent
The thickness of conductive layer and the second transparency conducting layer is 120nm.
The thickness parameter of 1. first antireflection film layer of table
The electrochromic device that embodiment 1 and embodiment 2 obtain is measured by testing, it is equal in the light transmission rate of non-staining state
Not less than 85%.
Illustratively, electronic equipment can be various types of departments of computer science that are mobile or portable and executing wireless communication
Any one of equipment of uniting.Specifically, electronic equipment can be mobile phone or smart phone (for example, being based on iPhone
TM, the phone based on Android TM), portable gaming device (such as Nintendo DS TM, PlayStation
Portable TM, Gameboy Advance TM, iPhone TM), laptop computer, PDA, portable Internet appliance, sound
Happy player and data storage device, other handheld devices and such as wrist-watch, In-Ear Headphones, pendant, headphone
It can also be other wearable devices (for example, such as electronic glasses, electronics clothes, electronics bracelet, electronics Deng, electronic equipment
Necklace, electronics tatoo, the headset equipment (HMD) of electronic equipment or smartwatch).
Electronic equipment can also be that any one of multiple electronic equipments, multiple electronic equipments include but is not limited to honeycomb
Phone, smart phone, other wireless telecom equipments, personal digital assistant, audio player, other media players, music note
It records device, video recorder, camera, other medium recorders, radio, Medical Devices, vehicle transport instrument, calculator, may be programmed
Remote controler, pager, laptop computer, desktop computer, printer, netbook computer, personal digital assistant (PDA), just
Formula multimedia player (PMP), Motion Picture Experts Group (MPEG-1 or MPEG-2) audio layer 3 (MP3) player are taken, it is portable
Medical Devices and digital camera and combinations thereof.
In some cases, electronic equipment can execute multiple functions and (for example, playing music, show video, store picture
And send and receive call).If desired, electronic equipment can be such as cellular phone, media player, other hands
The portable device of holding equipment, watch equipment, pendant equipment, receiver device or other compact portable equipment.
In the description of this specification, reference term " one embodiment ", " some embodiments " or " some examples " etc.
Description mean particular features, structures, materials, or characteristics described in conjunction with this embodiment or example be contained in it is of the invention at least
In one embodiment or example.In the present specification, schematic expression of the above terms are necessarily directed to identical reality
Apply example or example.Moreover, particular features, structures, materials, or characteristics described in any one or more embodiments or can be shown
It can be combined in any suitable manner in example.In addition, without conflicting with each other, those skilled in the art can be by this specification
Described in the features of different embodiments or examples and different embodiments or examples be combined.
Although the embodiments of the present invention has been shown and described above, it is to be understood that above-described embodiment is example
Property, it is not considered as limiting the invention, those skilled in the art within the scope of the invention can be to above-mentioned
Embodiment is changed, modifies, replacement and variant.
Claims (17)
1. a kind of electrochromic device characterized by comprising the first substrate and the second substrate being oppositely arranged, Yi Jiwei
The first transparency conducting layer and the second transparency conducting layer between first substrate and second substrate, described first thoroughly
There is electrochromic layer between bright conductive layer and second transparency conducting layer, wherein
First substrate and second substrate include transparent substrate, in first substrate and second substrate
At least one of further comprise: at least one antireflection film layer；
The electrochromic device is not less than 85% in the light transmission rate of non-staining state.
2. electrochromic device according to claim 1, which is characterized in that the antireflection film layer is arranged in following position
At least one of place:
The transparent substrate close to transparency conducting layer side, and
The transparent substrate is far from the transparency conducting layer side.
3. electrochromic device according to claim 1, which is characterized in that first substrate and second substrate
Light transmission rate be not less than 99%.
4. electrochromic device according to claim 1, which is characterized in that the antireflection film layer further comprises: handing over
For the high refractive index sub-layer and low-refraction sub-layer being stacked.
5. electrochromic device according to claim 4, which is characterized in that the antireflection film layer with a thickness of 20-
400nm, the high refractive index sub-layer with a thickness of 5-60nm, the low-refraction sub-layer with a thickness of 5-60nm.
6. electrochromic device according to claim 1, which is characterized in that first transparency conducting layer and described
Two transparency conducting layers are formed by least one of tin indium oxide and indium zinc oxide.
7. electrochromic device according to claim 6, which is characterized in that first substrate and described first transparent is led
Light transmission rate after electric layer stacking is not less than 95%.
8. electrochromic device according to claim 7, which is characterized in that first transparency conducting layer with a thickness of
100-200nm。
9. electrochromic device according to claim 7, which is characterized in that the sheet resistance of first transparency conducting layer is
10-20Ω。
10. electrochromic device according to claim 1, which is characterized in that the electrochromic layer is in non-staining state
Light transmission rate is not less than 97%.
11. electrochromic device according to claim 10, which is characterized in that the electrochromic layer includes purple sieve essence class
Compound.
12. a kind of method for making electrochromic device characterized by comprising
Transparent substrate is provided, to form the first substrate and the second substrate；
First substrate and second substrate are oppositely arranged, in first substrate being oppositely arranged and described second
Between substrate, the first transparency conducting layer, electrochromic layer and the second transparency conducting layer are formed, wherein the electrochromism dress
The light transmission rate set in non-staining state is not less than 85%,
Wherein, at least one antireflection film layer is formed at least one of first substrate and second substrate.
13. according to the method for claim 12, which is characterized in that formation first transparency conducting layer, electrochromic layer
And second transparency conducting layer further comprise:
First transparency conducting layer is formed in the side of first substrate, forms described in the side of second substrate
Two transparency conducting layers, wherein first substrate of stacking and the light transmission rate of first transparency conducting layer are not less than 95%,
Second substrate of stacking and the light transmission rate of second transparency conducting layer are not less than 95%；
Electrochromic solutions are set between first transparency conducting layer and second transparency conducting layer, it is electroluminescent to be formed
Photochromic layer, wherein the electrochromic layer is not less than 97% in the light transmission rate of non-staining state.
14. a kind of electronic equipment characterized by comprising
The described in any item electrochromic devices of claim 1-11；
Control circuit, the control circuit are used for the operating status according to the electronic equipment, control the electrochromic device
Discoloration.
15. electronic equipment according to claim 14, which is characterized in that further comprise:
Screen, the screen is for showing information；
Shell, the shell are connected with the screen；And
Camera,
Wherein, the electrochromic device is covered on the incidence surface of the camera.
16. electronic equipment according to claim 15, which is characterized in that the shell is transparent, the electrochromism
Device is located at the shell towards the side of the electronic equipment internal, and the shell further comprises:
The shell is arranged in close to the side of the electrochromic device in film plating layer, the film plating layer；
Optical adhesive layer, the optical adhesive layer are arranged between the film plating layer and the electrochromic device；
Side of the shell far from the film plating layer is arranged in anti-fingerprint film layer, the anti-fingerprint film layer.
17. electronic equipment according to claim 16, which is characterized in that the refractive index of the shell is 1.48-1.52, institute
The refractive index for stating anti-fingerprint film layer is 1.48-1.52, and the refractive index of the optical adhesive layer is 1.48-1.52, the optical adhesive layer
Light transmission rate be not less than 99%.
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| CN201910465599.9A CN110196524A (en) | 2019-05-30 | 2019-05-30 | Electrochromic device and preparation method thereof, electronic equipment |
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|---|---|---|---|
| CN201910465599.9A CN110196524A (en) | 2019-05-30 | 2019-05-30 | Electrochromic device and preparation method thereof, electronic equipment |
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| CN110646995A (en) * | 2019-09-25 | 2020-01-03 | Oppo（重庆）智能科技有限公司 | Lens assembly, periscopic camera and electronic equipment |
| CN110706609A (en) * | 2019-10-12 | 2020-01-17 | Oppo广东移动通信有限公司 | Display module and electronic device |
| CN111025810A (en) * | 2019-12-09 | 2020-04-17 | Oppo广东移动通信有限公司 | Electrochromic assembly, housing and electronic device |
| CN111123599A (en) * | 2020-01-08 | 2020-05-08 | Oppo广东移动通信有限公司 | Light shield with electrochromic function and manufacturing method thereof |
| CN111405152A (en) * | 2020-03-12 | 2020-07-10 | Oppo广东移动通信有限公司 | Electronic equipment and shooting direction control method thereof |
| CN112954093A (en) * | 2021-02-10 | 2021-06-11 | 东莞市聚龙高科电子技术有限公司 | Mobile phone rear cover with gradually changed colors and preparation method thereof |
| CN113473763A (en) * | 2020-03-31 | 2021-10-01 | Oppo广东移动通信有限公司 | Shell, preparation method and electronic equipment |
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| CN110646995A (en) * | 2019-09-25 | 2020-01-03 | Oppo（重庆）智能科技有限公司 | Lens assembly, periscopic camera and electronic equipment |
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| CN112954093A (en) * | 2021-02-10 | 2021-06-11 | 东莞市聚龙高科电子技术有限公司 | Mobile phone rear cover with gradually changed colors and preparation method thereof |
| CN115202124A (en) * | 2021-04-02 | 2022-10-18 | 丰田自动车株式会社 | Electrically-controlled color film and vehicle outer plate |
| CN113791504A (en) * | 2021-07-14 | 2021-12-14 | 信利光电股份有限公司 | Glass cover plate capable of reducing chromatic aberration and display device |
| CN113791504B (en) * | 2021-07-14 | 2024-04-30 | 信利光电股份有限公司 | Glass cover plate capable of reducing chromatic aberration and display equipment |
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Application publication date: 20190903 |