CN1983031A - 有机发光二极管用感光性树脂组合物 - Google Patents
有机发光二极管用感光性树脂组合物 Download PDFInfo
- Publication number
- CN1983031A CN1983031A CN 200610163334 CN200610163334A CN1983031A CN 1983031 A CN1983031 A CN 1983031A CN 200610163334 CN200610163334 CN 200610163334 CN 200610163334 A CN200610163334 A CN 200610163334A CN 1983031 A CN1983031 A CN 1983031A
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- CN
- China
- Prior art keywords
- ether
- photosensitive polymer
- polymer combination
- oled
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050117085 | 2005-12-02 | ||
KR1020050117085A KR101323201B1 (ko) | 2005-12-02 | 2005-12-02 | 오엘이디 패턴형성방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN1983031A true CN1983031A (zh) | 2007-06-20 |
Family
ID=38165651
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 200610163334 Pending CN1983031A (zh) | 2005-12-02 | 2006-12-01 | 有机发光二极管用感光性树脂组合物 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2007158324A (ja) |
KR (1) | KR101323201B1 (ja) |
CN (1) | CN1983031A (ja) |
TW (1) | TWI410747B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101132520B1 (ko) * | 2008-05-13 | 2012-04-02 | 코오롱인더스트리 주식회사 | 절연막 |
JP2014071373A (ja) * | 2012-09-28 | 2014-04-21 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物 |
JP6649433B2 (ja) * | 2018-05-31 | 2020-02-19 | 旭化成株式会社 | 感光性樹脂組成物 |
JP2020064325A (ja) * | 2020-01-16 | 2020-04-23 | 旭化成株式会社 | 感光性樹脂組成物 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW466382B (en) * | 1997-11-17 | 2001-12-01 | Sumitomo Chemical Co | A method for forming a resist pattern and a positive resist composition used for the same |
JP4221788B2 (ja) * | 1997-11-17 | 2009-02-12 | 住友化学株式会社 | 耐熱性に優れたレジストパターンの形成方法及びそれに用いられるポジ型レジスト組成物 |
JP4042142B2 (ja) * | 2000-09-08 | 2008-02-06 | Jsr株式会社 | El表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびel表示素子 |
-
2005
- 2005-12-02 KR KR1020050117085A patent/KR101323201B1/ko active IP Right Grant
-
2006
- 2006-11-21 JP JP2006313980A patent/JP2007158324A/ja active Pending
- 2006-11-24 TW TW95143511A patent/TWI410747B/zh active
- 2006-12-01 CN CN 200610163334 patent/CN1983031A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
TWI410747B (zh) | 2013-10-01 |
KR101323201B1 (ko) | 2013-10-30 |
KR20070057534A (ko) | 2007-06-07 |
TW200731009A (en) | 2007-08-16 |
JP2007158324A (ja) | 2007-06-21 |
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PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C12 | Rejection of a patent application after its publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20070620 |