CN1927944A - 树脂组合物、其固化物及使用其制得的印刷电路板 - Google Patents
树脂组合物、其固化物及使用其制得的印刷电路板 Download PDFInfo
- Publication number
- CN1927944A CN1927944A CNA2006101119009A CN200610111900A CN1927944A CN 1927944 A CN1927944 A CN 1927944A CN A2006101119009 A CNA2006101119009 A CN A2006101119009A CN 200610111900 A CN200610111900 A CN 200610111900A CN 1927944 A CN1927944 A CN 1927944A
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- CN
- China
- Prior art keywords
- resin
- carboxylic acid
- resin combination
- mentioned
- photoepolymerizationinitiater initiater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
实施例 | 比较例 | ||||||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 1 | 2 | 3 | 4 | 5 | 6 | 7 | ||
A-1清漆 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | |
A-2清漆 | 125 | 125 | 125 | 125 | 125 | 125 | 125 | 125 | 125 | 125 | 125 | 125 | 125 | 125 | |
光聚合引发剂B-1*1 | 2 | 2 | 2 | - | - | 1 | 1 | 2 | 2 | 0 | 0 | 2 | 2 | 2 | |
光聚合引发剂B-2*2 | - | - | - | 2 | - | 1 | - | - | - | - | - | - | - | - | |
光聚合引发剂B-3*3 | - | - | - | - | 2 | - | 1 | - | - | - | - | - | - | - | |
光聚合引发剂C-1*4 | 12 | 12 | 12 | 12 | 12 | 12 | 12 | 12 | 12 | 12 | 12 | 12 | 12 | 12 | |
光聚合引发剂C-2*5 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | 0.6 | |
光聚合引发剂C-3*6 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 0.2 | 1.0 | 0.2 | 0.2 | 0.2 | 0.2 | 1.0 | |
酞菁蓝 | 0.6 | 0.9 | 1.2 | 0.6 | 0.6 | 0.6 | 0.6 | 0 | 0 | 0.3 | 1.2 | 0.3 | 1.8 | 0.9 | |
黄色颜料*7 | 1.5 | 2.3 | 3.0 | 1.5 | 1.5 | 1.5 | 1.5 | 0 | 0 | 0.7 | 3.0 | 0.7 | 4.5 | 2.3 | |
D-1清漆 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | |
化合物(D-2)*8 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | 20 | |
化合物(D-3)*9 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | |
填料(E-1)*10 | 130 | 130 | 130 | 130 | 130 | 130 | 130 | 130 | 130 | 130 | 130 | 130 | 130 | 130 | |
热固化成分(F-1)*11 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | 15 | |
热固化成分(F-2)*12 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | |
微粉密胺 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | |
硅酮类消泡剂 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | |
DPM*13 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | |
#150*14 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | 5 | |
备注 | *1:2-(乙酰氧基亚氨基甲基)噻吨-9-酮*2:西巴特殊化学品公司制造的肟酯类光聚合引发剂イルガキユア一OXE01*3:西巴特殊化学品公司制造的肟酯类光聚合引发剂イルガキユア一OXE02*4:2-甲基-1-[4-(甲硫基)苯基]-2-吗啉代氨基丙烷-1-酮*5:2,4-二乙基噻吨酮*6:4,4′-双二乙基氨基二苯甲酮*7:蒽醌类黄色颜料*8:二季戊四醇六丙烯酸酯*9:三羟甲基丙烷三丙烯酸酯*10:硫酸钡(堺化学工业公司制B-30)*11:苯酚酚醛清漆型环氧树脂(日本化药公司制EPPN-201)*12:双二甲苯酚型环氧树脂(日本环氧树脂公司制YX-4000)*13:二丙二醇甲醚乙酸酯*14:出光石油化学公司制芳香族类有机溶剂 |
实施例 | 比较例 | ||||||||||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 1 | 2 | 3 | 4 | 5 | 6 | 7 | ||
吸光度 | 0.63 | 0.82 | 0.92 | 0.71 | 0.72 | 0.74 | 0.75 | 0.29 | 0.66 | 0.35 | 0.87 | 0.39 | 1.32 | 1.25 | |
最适曝光度(mJ/cm2) | 50 | 50 | 50 | 80 | 70 | 70 | 60 | 30 | 50 | 30 | 100< | 100< | 50 | 100< | 90 |
表面固化性 | 良好 | 良好 | 良好 | 良好 | 良好 | 良好 | 良好 | 不良 | 良好 | 良好 | 不良 | 不良 | 不良 | 良好 | 良好 |
形状 | A | A | A | A | A | A | A | A | D | E | C | 不能显影 | A | E | E |
Claims (15)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005257525 | 2005-09-06 | ||
JP2005257525 | 2005-09-06 | ||
JP2005-257525 | 2005-09-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1927944A true CN1927944A (zh) | 2007-03-14 |
CN1927944B CN1927944B (zh) | 2010-05-12 |
Family
ID=37858091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006101119009A Active CN1927944B (zh) | 2005-09-06 | 2006-09-06 | 树脂组合物、其固化物及使用其制得的印刷电路板 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5567543B2 (zh) |
KR (1) | KR100787341B1 (zh) |
CN (1) | CN1927944B (zh) |
TW (1) | TW200728379A (zh) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101430506A (zh) * | 2007-11-07 | 2009-05-13 | 太阳油墨制造株式会社 | 光固化性树脂组合物和固化物图案以及印刷电路板 |
CN101403856B (zh) * | 2007-10-01 | 2011-12-07 | 太阳控股株式会社 | 组合物、干膜、固化物和印刷线路板 |
CN101303527B (zh) * | 2007-05-08 | 2013-02-13 | 太阳控股株式会社 | 光固化性树脂组合物、干膜、固化物以及印刷电路板 |
CN101403859B (zh) * | 2007-10-01 | 2013-06-19 | 太阳控股株式会社 | 感光性树脂组合物及其固化物 |
TWI401531B (zh) * | 2007-05-08 | 2013-07-11 | Taiyo Holdings Co Ltd | A photohardenable resin composition and a hardened product thereof |
CN103562267A (zh) * | 2011-05-31 | 2014-02-05 | 电气化学工业株式会社 | 能量线固化性树脂组合物 |
CN101681102B (zh) * | 2007-12-19 | 2014-04-02 | 东洋油墨制造株式会社 | 着色组合物、滤色器的制造方法和滤色器 |
CN113025202A (zh) * | 2021-02-25 | 2021-06-25 | 管善月 | 一种丙烯酸改性环氧化有机硅光固化涂料及其制备方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013084282A1 (ja) | 2011-12-05 | 2013-06-13 | 日立化成株式会社 | 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント |
WO2013084283A1 (ja) | 2011-12-05 | 2013-06-13 | 日立化成株式会社 | タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント |
JP2014006499A (ja) * | 2012-05-29 | 2014-01-16 | Taiyo Ink Mfg Ltd | 感光性組成物及びその硬化層を有するプリント配線板 |
JP5523642B1 (ja) * | 2013-07-26 | 2014-06-18 | 太陽インキ製造株式会社 | プリント配線板製造用光硬化性組成物、その硬化物およびプリント配線板 |
KR101835500B1 (ko) * | 2014-12-24 | 2018-03-07 | 삼성에스디아이 주식회사 | 감광성 수지 조성물 및 이를 이용한 컬러필터 |
JP6783600B2 (ja) * | 2016-09-20 | 2020-11-11 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、ドライフィルム、プリント配線板、および、プリント配線板の製造方法 |
KR101840584B1 (ko) | 2017-01-17 | 2018-03-20 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치 |
Family Cites Families (13)
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JPH0755925B2 (ja) | 1986-02-28 | 1995-06-14 | 旭化成工業株式会社 | 新規なオキシムエステル化合物及びその合成法 |
JPS62286961A (ja) | 1986-06-05 | 1987-12-12 | Asahi Chem Ind Co Ltd | 新規なオキシムエステル化合物及びその製造方法 |
JP3782134B2 (ja) * | 1995-07-20 | 2006-06-07 | 旭化成エレクトロニクス株式会社 | プリント配線板の製造方法 |
TW494276B (en) * | 1999-05-06 | 2002-07-11 | Solar Blak Water Co Ltd | Solder resist ink composition |
NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
EP1395615B1 (en) * | 2001-06-11 | 2009-10-21 | Basf Se | Oxime ester photoinitiators having a combined structure |
JP4008273B2 (ja) * | 2002-03-26 | 2007-11-14 | 太陽インキ製造株式会社 | アルカリ現像型感光性樹脂組成物及びそれを用いたプリント配線基板 |
JP4087650B2 (ja) * | 2002-07-12 | 2008-05-21 | 太陽インキ製造株式会社 | 光硬化性・熱硬化性樹脂組成物及びその硬化物 |
TW200417294A (en) * | 2002-11-28 | 2004-09-01 | Taiyo Ink Mfg Co Ltd | Photo- and thermo-setting resin composition and printed wiring boards made by using the same |
JP4437651B2 (ja) * | 2003-08-28 | 2010-03-24 | 新日鐵化学株式会社 | 感光性樹脂組成物及びそれを用いたカラーフィルター |
JP4489566B2 (ja) * | 2003-11-27 | 2010-06-23 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、その硬化物、およびプリント配線板 |
JP2005221739A (ja) * | 2004-02-05 | 2005-08-18 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、フォトレジストパターンの製造法及びプリント配線板の製造法 |
JP2005232195A (ja) * | 2004-02-05 | 2005-09-02 | Taiyo Ink Mfg Ltd | 熱硬化性樹脂組成物、及びその硬化塗膜 |
-
2006
- 2006-09-05 TW TW095132758A patent/TW200728379A/zh unknown
- 2006-09-05 KR KR1020060085140A patent/KR100787341B1/ko active IP Right Grant
- 2006-09-06 CN CN2006101119009A patent/CN1927944B/zh active Active
-
2011
- 2011-11-28 JP JP2011259566A patent/JP5567543B2/ja active Active
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI401531B (zh) * | 2007-05-08 | 2013-07-11 | Taiyo Holdings Co Ltd | A photohardenable resin composition and a hardened product thereof |
CN102393603B (zh) * | 2007-05-08 | 2014-11-05 | 太阳控股株式会社 | 光固化性树脂组合物、干膜、固化物以及印刷电路板 |
CN102419514B (zh) * | 2007-05-08 | 2014-05-28 | 太阳控股株式会社 | 光固化性树脂组合物及其固化物、干膜、印刷电路板 |
CN101303527B (zh) * | 2007-05-08 | 2013-02-13 | 太阳控股株式会社 | 光固化性树脂组合物、干膜、固化物以及印刷电路板 |
TWI456344B (zh) * | 2007-10-01 | 2014-10-11 | Taiyo Holdings Co Ltd | 組成物,乾薄膜,硬化物及印刷電路板 |
CN101403859B (zh) * | 2007-10-01 | 2013-06-19 | 太阳控股株式会社 | 感光性树脂组合物及其固化物 |
CN101403856B (zh) * | 2007-10-01 | 2011-12-07 | 太阳控股株式会社 | 组合物、干膜、固化物和印刷线路板 |
CN101430506B (zh) * | 2007-11-07 | 2012-09-26 | 太阳控股株式会社 | 光固化性树脂组合物和固化物图案以及印刷电路板 |
CN101430506A (zh) * | 2007-11-07 | 2009-05-13 | 太阳油墨制造株式会社 | 光固化性树脂组合物和固化物图案以及印刷电路板 |
CN101681102B (zh) * | 2007-12-19 | 2014-04-02 | 东洋油墨制造株式会社 | 着色组合物、滤色器的制造方法和滤色器 |
CN103562267A (zh) * | 2011-05-31 | 2014-02-05 | 电气化学工业株式会社 | 能量线固化性树脂组合物 |
CN113025202A (zh) * | 2021-02-25 | 2021-06-25 | 管善月 | 一种丙烯酸改性环氧化有机硅光固化涂料及其制备方法 |
CN113025202B (zh) * | 2021-02-25 | 2022-04-15 | 长沙市湘鼎涂料有限公司 | 一种丙烯酸改性环氧化有机硅光固化涂料及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20070027459A (ko) | 2007-03-09 |
CN1927944B (zh) | 2010-05-12 |
TWI333499B (zh) | 2010-11-21 |
JP2012103703A (ja) | 2012-05-31 |
JP5567543B2 (ja) | 2014-08-06 |
TW200728379A (en) | 2007-08-01 |
KR100787341B1 (ko) | 2007-12-18 |
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