CN1906287A - 改进的用于cmp后清洗的碱性化学处理法 - Google Patents

改进的用于cmp后清洗的碱性化学处理法 Download PDF

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CN1906287A
CN1906287A CNA2005800019365A CN200580001936A CN1906287A CN 1906287 A CN1906287 A CN 1906287A CN A2005800019365 A CNA2005800019365 A CN A2005800019365A CN 200580001936 A CN200580001936 A CN 200580001936A CN 1906287 A CN1906287 A CN 1906287A
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acid
composition
cleaning
anticorrosion
surfactant
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Chinese (zh)
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M·L·菲施尔
A·米斯拉
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LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
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LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
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Application filed by LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Publication of CN1906287A publication Critical patent/CN1906287A/zh
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  • Condensed Matter Physics & Semiconductors (AREA)
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  • Cleaning Or Drying Semiconductors (AREA)
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CNA2005800019365A 2004-02-12 2005-01-12 改进的用于cmp后清洗的碱性化学处理法 Pending CN1906287A (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US54427204P 2004-02-12 2004-02-12
US60/544,272 2004-02-12
US10/956,273 2004-10-01
US10/956,273 US7435712B2 (en) 2004-02-12 2004-10-01 Alkaline chemistry for post-CMP cleaning
PCT/IB2005/000081 WO2005085408A1 (en) 2004-02-12 2005-01-12 Improved alkaline chemistry for post-cmp cleaning

Publications (1)

Publication Number Publication Date
CN1906287A true CN1906287A (zh) 2007-01-31

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CNA2005800019365A Pending CN1906287A (zh) 2004-02-12 2005-01-12 改进的用于cmp后清洗的碱性化学处理法

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US (1) US7435712B2 (enExample)
EP (1) EP1720965B1 (enExample)
JP (1) JP4550838B2 (enExample)
KR (1) KR101087916B1 (enExample)
CN (1) CN1906287A (enExample)
AT (1) ATE432974T1 (enExample)
DE (1) DE602005014746D1 (enExample)
WO (1) WO2005085408A1 (enExample)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012009941A1 (zh) * 2010-07-21 2012-01-26 河北工业大学 超大规模集成电路多层铜布线化学机械抛光后的洁净方法
CN101730929B (zh) * 2007-05-08 2012-07-18 朗姆研究公司 清洁cmp后的晶片的热学方法
CN102623327A (zh) * 2011-01-31 2012-08-01 中芯国际集成电路制造(上海)有限公司 一种化学机械研磨方法
CN101807540B (zh) * 2009-02-16 2013-02-13 海力士半导体有限公司 在半导体器件中形成铜布线的方法
CN106854461A (zh) * 2016-12-11 2017-06-16 周益铭 一种高渗透快速注水井除垢剂的制备方法
CN108998267A (zh) * 2018-08-29 2018-12-14 李少伟 一种半导体器件防蚀剂清洗剂及制备方法
CN109988675A (zh) * 2019-04-24 2019-07-09 上海新阳半导体材料股份有限公司 长效型化学机械抛光后清洗液、其制备方法和应用
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